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Symposia on VLSI Technology and Circuits
Statistical Characterization of Radiation-Induced Pulse Waveforms and Flip-Flop Soft Errors in 14nm Tri-Gate CMOS Using a Back-
Sampling Chain (BSC) Technique
Saurabh Kumar1, M. Cho2, L. Everson1, H. Kim1, Q. Tang1, P. Mazanec1, P. Meinerzhagen2, A. Malavasi2, D. Lake2, C. Tokunaga2, H. Quinn3,
M. Khellah2, J. Tschanz2, S. Borkar2, V. De2 and C. H. Kim1
1 University of Minnesota, Minneapolis, MN2 Intel Corporation, Hillsboro, OR
3 Los Alamos National Laboratory, Los Alamos, NM
This research was, in part, funded by the U.S. government. The views and conclusions contained in this documentare those of the authors and should not be interpreted as representing the official policies, either expressed orimplied, of the U.S. government
Outline
• Motivation
• Back-sampling chain (BSC) technique
• 14nm test-chip and board design
• Neutron irradiation test results
• Strike pulse re-construction results
• Conclusion
Slide 1
Slide 2
Charge
collection
S
G
Fin
D
G
S D
Charge
collection
Technology (nm)65 45 32 28 14
FIT
/Mb
(L
og
Sc
ale
)S. Lee et. al. IRPS 2015
Planar Finfet
High energy neutron
Alpha particle
Thermal neutron
Technology (nm)65 45 32 28 14
FIT
/Mb
(L
og
Sc
ale
)S. Lee et. al. IRPS 2015
Planar Finfet
High energy neutron
Alpha particle
Thermal neutron
• Device level soft errorrate has been decreasingwith scaling
Soft Error: Planar vs. Tri-Gate
G
10nm14nm
Smaller cross-section
S D
Narrower path
Scaling Impact on SER in Tri-Gate
Slide 3
• Lower SER with tri-gate scaling
‒ Taller/narrower fins, higher resistance
‒ Smaller cross-section
Slide 4
• Lower per-transistor SER
• Higher transistor count, lower VDD ���� increasedchip-level SER
• Challenge: Collecting statistically significantamount of data in limited beam time
Tra
ns
isto
r d
en
sit
y
(MT
r / m
m2)
100
101
102
103
‘07
Year of production
‘08 ‘09 ‘10 ‘11 ‘12 ‘13 ‘14 ‘15 ‘16 ‘17 ‘18
45nm
32nm
22nm
14nm
10nm Su
pp
ly V
olta
ge
(a.u
.)0
0.2
0.4
0.6
0.8
1.0
1.2
1.4
Scaling Impact on SER in Tri-Gate
����
☺☺☺☺
1 1
Vn
od
e
Time
Trip point of next stage
VDD
Vn
od
e
Time
Flipping threshold
VDD
To slave
Clk
Clk’
Clk’
Clk
Clk
D01
Logic SET vs. Sequential SEU/MBU
Slide 5
Flop storage nodeCombinational logic path
Circuit Dependencies
Slide 6
• For higher SER sensitivity:
- Irestore
- Istrike
- Cnode
- Vsw
: High VT , smaller size (N1): High flux/LET (radiation parameter): Small fan-out, device size: High VT , smaller device (P2)
1 Vnode
Cnode
Istrike
Irestore
1
VswN1 N2
P1 P2
Technique #1: Current Starved Buffers
Slide 7
• Starved buffer chain: High sensitivity
Long chain of current starved buffers: detection circuit
Technique #1: Current Starved Buffers
Slide 8
• Alternate starving:
SER strike
VPO
VNO
VPE
VNE VNO VNE
VPO VPE
• Analog bias knobs:Tunable resolution and sensitivity
Lower Irestore, lower Vsw
0.2 0.4 0.6 0.8
4
8
12
20
Cri
tica
l ch
arg
e
(Qc
rit, n
orm
ali
zed
)
Voltage (V)
1x INV, TT, 27°C
0
16
Higher sensitivity
Standard chain
This work
Technique #2: Back-Sampling Chain
Slide 9
• Later stage rising edgeback-samples previousstage falling edge
SER strike
'0''0''0' '0' '0'
'0''0''0''0''0'
'1' '1' '1' '1' '1'
Time
Sta
ge
Ou
tpu
t
'0'
'0'
'0'
'0'
'0'
'1''1'
'1'
'1'
'1'
# of 0's indicate original pulse width
'0'
'0'
VPO
VNO
VPE
VNE VNO VNEN2
VPO VPE
Example: Short vs. Long Strike Pulse
Slide 10
Time
Sta
ge O
utp
ut
'1'
'1'
'1'
'1'Unsampled original bits
'0'
'0'
'0'
'0'
'0'
'0'
'0'
'0'
'0'
'0'
'0'
'0''1'
'1'
'1'
'1'
'1'
Long trail
of 0's
'1'
'1'
'1'
'1'
Time
Sta
ge O
utp
ut
'0'
'0'
'0'
'0'
'0'
'0'
'0''1'
'1'
'1'
'1'
'1'
'1'
'1'
'1'
'1'
'1'
Short trail
of 0's
Unsampled original bits
Tunable Resolution and Sensitivity
Slide 11
• Allows multiple resolution-sensitivity sweeps
• Facilitates strike pulse re-construction
10 20 30 50
0.40
Min
. d
ete
cti
on
am
plitu
de
(n
orm
ali
zed
to
VD
D)
Resolution (ps)
0.24
0.16
0.08
0.32
0.0400
Sensitivity vs resolution trade-off
VPO
VNO
VPE
VNE VNO VNEN2
VPO VPE
Back-Sampling Chain (BSC) Array
Slide 12
QD
Q D
QD
Q D
QD
Q D
QD
Q D
QD
Q D
QD
Q D
QD
Q D
QD
Q D
QD
Q D
QD
Q D
QD
Q D
QD
Q D
Buff In
Scan Out
Buff Out
Scan In
C1
QD
Q D
Unit Cell
SER Test Board
Slide 13
• Beam diameter = 3inches
• 3x3 SER test-chips fitwithin beam area
• FPGA: JTAG supportfor automated control
• 15.3 million BSCstages per board
Fa
bri
ca
ted
Bo
ard
LANL Neutron Irradiation Test
Slide 14
• 10 stacked boards with 90 test-chips in parallelirradiated under neutron beam at Los AlamosNational Laboratory (LANL)
Neutron Beam Parameters
Slide 15
Source: Los Alamos National Laboratory
• Neutron beam specs
• Avg. energy spectrum range: 1.38 – 750MeV
• Avg. neutron flux: ~ 4.2x104 neutrons/cm2/s
Neutron Test Data: SET
Slide 16
A strike on buffer
node induces SET
FF Data = '0'
FF Data = '1'
Neutron Test Data: SEU/ MBU
Slide 17
MBU
SEUFF Data = '0'
FF Data = '1'
A strike on flop
storage node induces
SEU/ MBU
Strike Pulse Width Distribution
Slide 18
• With lower VDD, sampling cut-off drops andwider SET pulses are sampled
• Qcrit decreases with lower VDD, increasing SER
0
Pulse width (ns)
0.40V VDD, 0.30V VGS
0.50V VDD, 0.30V VGS
0.60V VDD, 0.30V VGS
1.E+02
1.E+03
1.E+04
1.E+05
1.E+01
Pu
lse
co
un
t
0.15 0.30 0.45 0.60 0.75 0.90
0.4V0.5V0.6V Sampling
cut-offsVo
ltag
e
Time
Strike Pulse Width Distribution
Slide 19
• With stronger starving (lower VGS), sensitivityincreases and sampling threshold drops,sampling wider SET pulses
Pu
lse
co
un
t
1.E+02
1.E+03
1.E+04
1.E+05
0.40V VDD, 0.20V VGS
0.40V VDD, 0.25V VGS
0.40V VDD, 0.30V VGS
1.E+010
Pulse width (ns)0.15 0.30 0.45 0.60 0.75 0.90
0.25V VGS
0.20V VGS
0.30V VGSSampling
cut-offs
Vo
ltag
e
Time
SET Pulse Re-construction
Slide 20
SET Pulse Re-construction
Slide 21
SET Pulse Re-construction
Slide 22
FWHM: Full width at half maximum
SET Pulse Re-construction
Slide 23
• Higher amplitude = shorter pulse width (lowerFWHM)
• To our knowledge, this is the first time individualstrike pulses are reconstructed
FWHM: Full width at half maximum
SET Pulse Re-construction
Slide 24
0.1
0.2
0.3
0.4
0.5
0.00.2 0.6 1.0
FWHMAVG: 218ps
AmplitudeAVG: 0.42
Vo
lta
ge
(V
)
Time (ns)
VDD=0.5V
0.2 0.6 1.0
FWHMAVG: 222 ps
AmplitudeAVG: 0.45
Time (ns)
VDD=0.4V
• Lower VDD: pulse amplitude ↑, pulse width ↑
Comparison with Prior Art
Slide 25
Pulse shrinking [2]
TDC based circuit [1]
This work
Unit cell layout Irregular, not easily scalable
Regular, scalable Regular, scalable
Sensitivity tuning
Fixed by design Variable using bias knobs
Resolution > 30ps > 1ps > 1.3ps
Qcrit sensitivity 1x 0.6x 9x
Fixed by design
To TDC
*
*
[1] T. D. Loveless et. al. TNS 2012[2] J. Furuta et.al. IRPS 2011
* Results reproduced in 14nm process
Flip-Flop SEU/MBU
Slide 26
• SER exponentially increases with lower VDD
• At lower VDDs, MBU become more dominant
Fail
ure
In
Tim
e
(no
rma
lized
)
100
102
104
106
108
0.2 0.4 0.6 0.8
VDD (V)
FIT: # of SER per flop per billion hours
Cro
ss-s
ecti
on
(no
rma
lized
)
100
0.2 0.4 0.6 0.8
VDD (V)
102
104
106
108
5-bit4-bit3-bit2-bit1-bit
Conclusion
Slide 27
• BSC chain technique proposed with 9x lowerQcrit and picosecond range resolution
• BSC circuit detects SET, SEU, and MBU
• 14nm test-chip irradiated under neutron beam
• Individual strike pulses re-constructed basedon neutron irradiation data
• Next step: SER model framework development