Electrodeposition Models

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  • 7/31/2019 Electrodeposition Models

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    Model GalleryCopper Deposition In A Trenchh Model ID: 2112

    ELECTRODEPOSITION: This model demonstrates the effect

    of a moving boundary in the application of copper

    electrodeposition on circuit boards. The model is time-

    dependent and results clearly show that the mouth of the

    trench narrows, due to the non-uniform deposition of the

    copper.

    This model demonstrates the use of moving meshes in the

    application of copper electrodeposition on circuit boards. In

    these environments, the presence of cavities or 'trenches'

    are apparent.

    The model makes use of the Tertiary, Nernst-Planck

    interface for electrodeposition to keep track of the

    deformation of the mesh. Furthermore, electrochemical

    reaction kinetics through use of the Butler-Volmer equation

    for copper deposition are freely entered at the boundaries.

    The model is inherently time-dependent and results clearly

    show that the mouth of the trench narrows, due to non-

    uniform deposition of the copper. In addition, the simulation

    shows a substantial variation in copper ion concentration

    along the length of the trench. Such effects can be

    detrimental to the quality of the deposition, create corrosion

    possibilities, and lead to material waste.

    > REQUEST FOR MODEL INFORMATION

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    Secondary Current Distribution Model ID: 10188In A Zinc Electrowinning Cell

    Electrolyte current density distribution for a cathode

    displacement of +40 mm

    This is a model of the secondary current distribution in a zinc

    electrowinning cell.

    The model investigates the impact on the current distribution

    when changing the electrode alignment in a parametric

    study. The geometry is in 2D..> REQUEST FOR MODEL INFORMATION

    Electrode Growth Next To Model ID: 10212

    An Insulator

    Electrolyte potential (surface) and electrolyte currentdirection (arrows) at t=96 h.

    This example shows how to model secondary current

    distribution and electrode growth with a moving geometry.

    To avoid numerical instabilities, a seed layer is introduced

    in the initial geometry to obtain a right angle at the edge

    between the growing electrode and the insulator.

    > REQUEST FOR MODEL INFORMATION

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    Decorative Plating Model ID: 10320

    DECORATIVE ELECTROPLATING In this example, the anodeis planar and dissolves, while the cathode is a furniture fittingthat is to be decorated by the dissolved metal

    Tutorial model of electroplating. The model uses secondary

    current distribution with full Butler-Volmer kinetics for both

    anode and cathode. The thickness of the deposited layer at

    the cathode is computed as well as the pattern caused by

    dissolution of the anode surface.

    > REQUEST FOR MODEL INFORMATION