Update of One Hundred watt HVM LPP-EUV Source …euvlsymposium.lbl.gov/pdf/2015/Oral_Monday/Session3_EUV...Update of One Hundred watt HVM LPP-EUV Source performance 5-7.Oct. 2015 EUVL

Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography Copyright © 2015 Gigaphoton Inc. International Symposium on Extreme Ultraviolet Symposium 2015

Update of One Hundred watt HVM LPP-EUV Source performance 5-7.Oct. 2015 EUVL Symposium, Maastricht, Netherland

Hakaru Mizoguchi, Hiroaki Nakarai, Tamotsu Abe, Takeshi Ohta, Krzysztof M Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida, Georg Soumagne, Tsuyoshi Yamada, Taku Yamazaki , Shinji Okazaki and Takashi Saitou Gigaphoton Inc. Hiratsuka facility: 3-25-1 Shinomiya Hiratsuka Kanagawa,254-8567, JAPAN

Oct. 5, 2015 DOC#: ED15L-498

Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography International Symposium on Extreme Ultraviolet Symposium 2015

• Power-Up Scenario and Key Technologies Update

• Prototype LPP Source System Development Update » Proto Device #1 » Proto Device #2

• New Pilot System Development Update • Summary

OUTLINE

Oct. 5, 2015 DOC#: ED15L-498





OUTLINE

Oct. 5, 2015 DOC#: ED15L-498


Gigaphoton’s LPP Light Source Concept

• High ionization rate and CE EUV tin (Sn) plasma generated by CO2 and pre-pulse solid laser dual wavelength shooting

• Hybrid CO2 laser system with short pulse high repetition rate oscillator and commercial cw-amplifiers

• Accurate shooting control with droplet and laser beam control

• Tin (Sn) debris mitigation with a super conductive magnetic field

• High efficient out of band light reduction with grating structured C1 mirror

Droplet Generator

Super Conductive Magnet

Corrector Mirror

Pre-pulse Laser

CO2 Pulse Laser Droplet Catcher

Ion Catcher

4

Oct. 5, 2015 DOC#: ED15L-498


Power up scenario 5

Current configuration High speed droplet

DoneReady DevelopmentResearch

27kWCO2

3.5% CE 4% CE

20kWCO2

50% Mirror 45% Mirror

17kWCO2 14kWCO2 2kWCO2

3.0% CE

20kHz 35kHz 70kHz 100kHz

Ave

rage

Pow

er

with

dose

contr

ol

Conversion Efficiency

CO2 laser power

Repetition rate

Reflectance of C1 mirror

Pres

ent

Nex

t

Oct. 5, 2015 DOC#: ED15L-498


• Based on basic physical consideration and experiments, Gigaphoton has chosen to adopt the pre-pulse technology since 2009

• In 2012 Gigaphoton discovered that shortening the pre-pulses duration dramatically enhance the conversion efficiency

Pre-Pulse Technology (1) 6

Oct. 5, 2015 DOC#: ED15L-498


• The mist shape of a picosecond pre-pulse is different from the nanosecond

• Nano-cluster distribution could be a key factor for high CE

Pre-Pulse Technology (2) Fragment distribution measurement

7

Oct. 5, 2015 DOC#: ED15L-498


Pre-Pulse Technology (5) 8

EUV plasma parameters measurement by “Thomson Scattering” is ongoing in Kyushu University

To develop a diagnostic system for laser-produced plasmas for extreme ultraviolet (EUV) light sources, collective laser Thomson scattering (LTS) was applied to laser-produced carbon plasmas to measure plasma parameters such as electron density (ne) and electron temperature (Te). Plasmas having parameters necessary for an EUV light source (ne = 1024-1025 m-3, Te = 30-50 eV) were achieved, and these parameters were successfully evaluated by a pilot diagnostic system with errors below 10%. From these results, an LTS system for diagnostics of tin plasmas for real EUV light sources was designed. © 2013 The Japan Society of Applied Physics

A Collective Laser Thomson Scattering System for Diagnostics of Laser-Produced Plasmas for Extreme Ultraviolet Light Sources Kentaro Tomita1, Kazuki Nakayama1, Kazuya Inoue1, Atsushi Sunahara2, and Kiichiro Uchino1

1Interdisciplinary Graduate School of Engineering and Sciences, Kyushu University, Kasuga, Fukuoka 816-8580, Japan 2Institute for Laser Technology, Suita, Osaka 565-0871, Japan

→Dr. K. Tomita will be report New data in EUV Source Workshop in Dublin Nov. 2015

Oct. 5, 2015 DOC#: ED15L-498

Copyright © 2015 Gigaphoton Inc. 2015 International Workshop on EUV Lithography

9

International Symposium on Extreme Ultraviolet Symposium 2015

10ショット平均値5.5% average in

10 pulses

- In small experimental device, we observed 5.5% Ce under optimized condition.

- 17 % increase from old champion data ( Ce=4.7%).

Pre-Pulse Technology (6)

Small experrimental device

Oct. 5, 2015 DOC#: ED15L-498


10

2013 Jan Proto#1

2014 Sep Proto#2

2015 Oct Pilot#1

Droplet speed m/s 45 60 90

Repetition rate limit

kHz 50 70 100

Status Proven Proven under Development

• Droplet generator for higher power will 100kHz operation from Oct 2015.

• High speed droplet is one of key item to reduce the plasma interaction.

Droplet Generator technology (1)

Oct. 5, 2015 DOC#: ED15L-498

GIGAPHOTON CONFIDENTIAL International Symposium on Extreme Ultraviolet Symposium 2015

T T T T T T PO PO T PM PO PO PM PM PM PO PM PO PM PM PM

225

PO PO

249

206

88

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150

200

250

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Emis

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pls)

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ratio

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me

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our)

Droplet Generator Operation Status in System

Operation Time in System(via TB) Operation Time in System(Proto Direct) EUV Emission

Droplet Generator technology (2) 11

Process improvement enables more than 200hrs droplet generation

Process improvement-1

> 300

Process improvement-2

Oct. 5, 2015 DOC#: ED15L-498


Gigaphoton Oscillator Laser

High Power CO2 Laser Technology (1) 12

Driver Laser System

July 30, 2015 DOC#: ED15L-020

Timing Controller

Main Pulse CO2 Laser System

PA MA#1 MA#2 OSC EO isolator MA#3

Amplifier Lasers

DLG

Gigaphoton, in cooperation with CW-CO2 laser companies, has been jointly developing a unique high power pulsed CO2 laser system since 2004

plifier


13

• Potential of 20kW CO2 power at plasma was confirmed in proto#2 system. This is close to 250W target in pilot#1 system, which is 23kW.

Osc Pre amp. MA2 MA3 Is

olat

or

MA1

QCL Seeder 1

(λ1)

Special design custom-built “regenerative” CO2 amplifier

QCL Seeder 2

(λ2)

QCL Seeder n

(λn)

● ●

Multi-line oscillator and regenerative amplifier (Patented)

λ11=P18 λ22=P20 λ32=P22 λ42=P24

14 ns FWHM

Plasma

20kW

17kW

High Power CO2 Laser Technology (2)

Oct. 5, 2015 DOC#: ED15L-498


14

Laser Power

System Oscillator Pre-Amplifier Main Amplifier

5kW Endurance Testing Platform

8kW Power Up Testing

20kW Power Up Testing

>27kW Customer Beta Unit

GPI R T T

GPI R T T T

GPI M T T T

GPI M M M M

Proto #1

Proto #2

Under Construction Pilot #1

validated performances at system

High Power CO2 Laser Technology (3)

Oct. 5, 2015 DOC#: ED15L-498


Driver CO2 laser Sn Droplet

Magnetic Mitigation

EUV Plasma

Corrector Mirror

Intermediate Focus

EUV light clean power ＞[email protected]

Corrector Mirror

4

Role of Corrector Mirror - Transmit the EUV light from plasma point to

intermediate focus - Filtering the IR light originate from driver CO2

laser ( Patented ) - Periodical maintenance is required

( Refurbishments )

15/40

Corrector Mirror Technology (1)

Oct. 5, 2015 DOC#: ED15L-498


• Collector reflectivity is one of the key item for power improvement

Corrector Mirror Technology (2) 16

Current 250W target

Collector type V5 V5+

H2 Pressure <20Pa <20Pa

Collector Efficiency >74% >74%

Collector Reflectivity >45% >50%

Gas Transmittance >95% >95%

Plasma to clean 31.6% 35.1%

V5: 45.1%

Current status: 48.1%

Oct. 5, 2015 DOC#: ED15L-498





OUTLINE

Oct. 5, 2015 DOC#: ED15L-498


Gigaphoton EUV Sources

EV

EV

Back

yard

Utilities Area

B#1

B#3

B#2

Proto #1 From Oct 2012

Proto #2 From Nov 2013

Pilot #1 (under construction)

2 – proto system are in operation 1 – pilot system is under construction

NEW

18

Oct. 5, 2015 DOC#: ED15L-498


Proto Systems in Operation 19

Target System Specification

Operational Specification Proto #1 Proto #2 Pilot #1 (under construction)

Target Performance

EUV Power 25 W > 100 W 250 W

CE 3% 3.5% 4%

Pulse rate 100 kHz 100 kHz 100 kHz

Output angle Horizontal 62°upper (matched to NXE)

62°upper (matched to NXE)

Availability 1 week operation 1 week operation > 75%

Technology

Droplet generator 20 – 25 μm 20 μm < 20 μm

CO2 laser 5 kW 20 kW 27 kW

Pre-pulse laser picosecond picosecond picosecond

Debris mitigation validation of magnetic mitigation in system 10 days > 3 month

Oct. 5, 2015 DOC#: ED15L-498


Gigaphoton’s High Power EUV Light Source 20

Prototype high power EUV light source is in operation

Light Outlet

Chamber

Magnet

Proto 1 Exposure & Mitigation test Proto 2 High power Experiment

Oct. 5, 2015 DOC#: ED15L-498


Long lifetime operation in Proto#1 system 21

77 hours

Dose control, 20kHz, 80% duty cycle

• 77 hours operation with 25% dose margin

0.14%

Oct. 5, 2015 DOC#: ED15L-498


Tin Back-diffusion Issue from the Ion Catcher 22

Tim Deposition Simulation Actual Tin Deposited on Collector

• Issue: tin depositions on mirror caused by back-diffusion from the ion catcher • Reduction of the back-diffusion from the ion catcher is key

Ion Catcher

Back-diffusion Back-diffusion

Oct. 5, 2015 DOC#: ED15L-498


Proto #2: EUV Power Data (short term) 23

Champion Data: 140W EUV in burst power with 70kHz, 50% duty cycle

2014/8/20 Number of Pulses

Puls

e En

ergy

[mJ]

140W@50%Duty

Rep. rate [kHz]

EUV

Pow

er [W

]

(data shown at SPIE Feb. 2015)

Oct. 5, 2015 DOC#: ED15L-498


• Proto#2: 74W in burst, 6 hours operation （July 2015） » 50kHz, 25-50% Duty cycle, Closed loop

24

Proto#2: Long-term operation with Dose Control

6 hrs.

Oct. 5, 2015 DOC#: ED15L-498


Proto#2: High Duty Cycle with Dose Control 25

Dose control capability up to 95% duty cycle with 20% dose margin was confirmed in proto#2 system at 75W in burst level operation

35kHz, 20% dose margin

70W

37W

75W

Oct. 5, 2015 DOC#: ED15L-498

GIGAPHOTON CONFIDENTIAL

30%

Dose stability

Power (in Burst) 49-87W Operation time 24.9 hr Number of Pulse 1.5BPls Repetition rate 35kHz

Duty ratio 50-90% Power (average) 24-83W Dose3σ <0.2%

Proto#2

Proto #2: EUV Power Data (long term)

Oct. 5, 2015 DOC#: ED15L-498 International Symposium on Extreme Ultraviolet Symposium 2015





OUTLINE

Oct. 5, 2015 DOC#: ED15L-498


Pilot #1 EUV Light Source for HVM Layout of 250W EUV Light Source

Operational specification (Target) HVM Source

Performance

EUV Power > 250W

CE > 4.0 %

Pulse rate 100kHz

Availability > 75％

Technology

Dropletgenerator Droplet size < 20mm

CO2 laser Power > 20kWPre-pulselaser

Pulseduration psec

Debrismitigation

Magnet,Etching > 15 days ( >1500Mpls)

Operational specification (Target) HVM Source

Performance

EUV Power > 250W

CE > 4.0 %

Pulse rate 100kHz

Availability > 75％

Technology

Dropletgenerator Droplet size < 20mm

CO2 laser Power > 20kWPre-pulselaser

Pulseduration psec

Debrismitigation

Magnet,Etching > 15 days ( >1500Mpls)

EUV Exposure Tool First HVM EUV Source

• 250W EUV source

28

Oct. 5, 2015 DOC#: ED15L-498


Pre-AMP

Main-AMP

Pilot #1: Configuration 29

2,30

0

Driver Laser system

EUV chamber System

Beam Transfer System

Oct. 5, 2015 DOC#: ED15L-498


• GPI specification of Pilot#1. • It is remarkable low consumption compare with other source.

30

Pilot#1 Specification (EXPECTED) Value Units

EUV Power 250 W Electrical power input (at full load) 880 kVA Thermal load to water 780 kW Cooling water flow rate (at 17 ºC) 1,608 L/min Hydrogen gas consumption 30 NL/min

Pilot #1: Utility Specification



Pilot #1 construction status (1) : Driver Laser System

• Mitsubishi CO2 amplifiers were set in driver laser frame.

• Oscillator construction is going on.

GIGAPHOTON CONFIDENTIAL

31

PA-RF

PA-Chamber

Sub Fab Area

Left side of driver laser

Right side of driver laser

MA3

MA2

MA1

PA

OSC PPL

→Dr. K.Yasui will report at next aural presentation; “Low-loss and high-gain CO2 amplifiers to generate extreme ultraviolet, ・・・”

Oct. 5, 2015 DOC#: ED15L-498


• Super conductive magnet » Installation is finished

• EUV Vessel » Under fabrication

EUV chamber system

Pilot #1 construction status (3) : EUV Chamber System






OUTLINE

Oct. 5, 2015 DOC#: ED15L-498


Power-Up Milestones 34

We are achieving solid and steady progress towards realizing our HVM EUV source

Proto #2 (current work)

Pilot #1 (under construction)

2015 Feb 2015 Mar. 2015 Jul 2015 Aug MS1 MS2

System Proto#2 Proto#2 Proto#2 Proto#2 Proto#2 Pilot#1

Main Performance

Average with dose 57W 70W 19/38W 24-83W 100W 200W

Duty ratio 90% 95% 25/50% 50-95% >90% ＞90％

In burst power 64W 74W 76W 49-87W 120W 250W

Dose margin 30% 20% 30% 55-20% 20% <20%

CE 3.2% 3.2% 2.8% 3.5％ 3.5% 4.0％

Availability (10x5) 12.8% 14.1% 10.1% 16.3% 20% >75%

Operation time Pulse number

- 0.5hour 60Mpls

6h 450Mpls

24.9h 1.5Bpls

24hour 5.4Bpls

>3 month -

Repetition rate 40kHz 35kHz 50kHz 35kHz 70kHz 100kHz

CO2 power 9.5kW 7.2kW 12.9kW 10kW ⒛kW 27ｋＷ

Oct. 5, 2015 DOC#: ED15L-498


Summary

• Progress of Proto #1 unit » Further improvement of “Magnetic debris mitigation” » Simulation expect further improvement of back-diffusion » Report new data: 77 hrs., 10W operation data without maintenance was reported. » Magnetic mitigation capability is discussed by using Tin distribution simulation.

• Progress of Proto #2 unit » Driver CO2 laser system achieved 20 kW by multiline amplification with new pre-amplifier. » Maximum power champion data:140 W (CE 3.7%) in burst at 70 kHz, 50% duty. » Report new data: 49-87 W power in burst, 50-95 % duty under closed loop, 24-87W average

( 60W long time average ) was demonstrated for more than 24 hours. » Next step is higher average power operations during more than 24 hrs.

• Pilot #1 is under construction » Design of system is almost fixed - most parts are already ordered » Construction will finish in Q4, 2015. First data will be expected in Q1, 2016

35



Acknowledgements 36

Thanks for co-operation: Mitsubishi electric CO2 laser amp. develop. team: Dr. Yoichi Tanino*, Dr. Junichi Nishimae, Dr. Shuichi

Fujikawa and others. * The authors would like to express their deepest condolences to the family of Dr. Yoichi Tanino who suddenly passed

away on February 1st, 2014. We are all indebted to his incredible achievements in CO2 amplifier development. He will be missed very much.

Dr. Akira Endo :HiLase Project (Prague) and Prof. Masakazu Washio and others in Waseda University Dr. Kentaro Tomita, Prof. Kiichiro Uchino and others in Kyushu University Dr. Jun Sunahara, Dr. Katsunori Nishihara, Prof. Hiroaki Nishimura, and others in Osaka University Thanks for you funding: EUV source development funding is partially support by NEDO（ New Energy and Industrial Technology

Development Organization） in JAPAN Thanks to my colleagues:

EUV development team of Gigaphoton; Hiroaki Nakarai, Tamotsu Abe, Takeshi Ohta, Krzysztof M Nowak, Yasufumi Kawasuji, Hiroshi Tanaka, Yukio Watanabe, Tsukasa Hori, Takeshi Kodama, Yutaka Shiraishi, Tatsuya Yanagida,Tsuyoshi Yamada, Taku Yamazaki, Takashi Saitou and other engineers.

Oct. 5, 2015 DOC#: ED15L-498


THANK YOU

Oct. 5, 2015 DOC#: ED15L-498

Documents

Update of One Hundred watt HVM LPP-EUV Source …euvlsymposium.lbl.gov/pdf/2015/Oral_Monday/Session3_EUV...Update of One Hundred watt HVM LPP-EUV Source performance 5-7.Oct. 2015 EUVL