EUV/Debris 3. HVM EUV light source Remaining atoms was ... · Power (at present) peak/average 104W/21W Plasma No electrode Mitigation Pre pulse + Magnet Life limitation ( several

When will we reach the end of the tunnel ?

■ Copyright 2012 GIGAPHOTON INC. all rights reserved.

Type LPP

Power (at present) peak/average 104W/21W

Plasma No electrode

Mitigation Pre pulse + Magnet

Life limitation ( several 1000 hr )

Remark ・Theoretically no limit

・Engineering works still to be done

LPP：CO2 laser and Tin source High power pulsed CO2 laser

Magnetic field plasma mitigation

Pre-Pulse plasma technology

EUV sources


SPIE 2010

(Feb.2010)

EUV Symposium

(Oct.2010)

SPIE2011

(Feb,2011)

EUV power ( @ I/F) 69 W 104 W 42 W

EUV power ( clean @ I/F) 33 W 50 W 20 W

Duty cycle 20 % 20 % 5%

Max. non stop op. time >1 hr <1 hr >7 hr

Average CE 2.3 % 2.5 % 2.1%

Dose stability :simulation (+/- 0.15%) -

Droplet diameter 60mm 60mm 30mm

CO2 laser power 5.6 kW 7.9 kW 3.6kW

System operation Data ( ETS device)


0

5

10

15

20

25

30

0 1 2 3 4 5 6 7 8

Time [H]

EU

V p

ow

er

@ IF

cle

an

[W

]

System operation result on ETS

Long time system operation demonstrated

Operation duration: 7 hours

Droplet 30 mm diameter

Full repetition rate: 100 kHz

In burst clean power: 20W (average)

25W (max)

Conditions;

Control: Droplet position control ON, EUV energy control OFF

CO2 laser = 3.6kW @ 100kHz

Duty=5% (50msecON、950msecOFF)

25W= CE 2.6%

20W= CE 2.1%


Higher CE challenge more than 5%

3 key challenges

Small droplet supply with Droplet on Demand

Dual wavelength Laser Produced Plasma

Perfect ionization and Magnetic mitigation

- Stable and small droplet

- high power CO2 laser

- the best plasma creation

main-pulse

CO2 laser

pre-pulse laserDroplet generator


Droplet Generator on Demand

0

10

20

30

40

50

60

70

0 10 20 30 40 50

Ve

loci

ty [m

/s]

Accelerating Voltage VA [kV]

5kV

6kV

7KV

8KV

Extracting Voltage VE

Large controllability of droplet

Timing SpeedTiming Speed Direction

Current

performance

Target

for pilot


Conversion Efficiency vs.. CO2 Laser Intensity

After CE optimization

3.3% →3.8%→4.7% (@ pilot condition)

Final Target

After Optimization

Before

optimization

New champion data of CE = 4.7% (June.2012)

CO2 intensity (a.u.)


EUV Output Power vs. CO2 Input Power

We expect 2.5mJ EUV output corresponds to 250W clean

power with CE >4.7%

SPIE2012

Champion data at

present

CE=4.7%

CO2=23kW


Magnetic mitigation

Collector mirror protection Concept

Droplet

(liquid)

Crashed-mist

(liquid)

Plasma

(gas)

mist size <300mm,

100% vaporization to atom

droplet <20mm

CO2 laser irradiation

100% ionization

Guided ion Ion trapped

Ions with low energy

trapped by B field

pre-pulse main-pulse

No Large Fragment s

atom 0 ion 0

All Tin atoms should be ionized.

① Magnet field is effective for guiding ions to protect mirror

② All Tin fragments and atoms are needed to be ionized


Critical issue investigation with 10Hz device

- Double pulse optimization

- Debris mitigation mechanism

- Higher CE investigation


Proper pre-pulse condition

Droplet shooting scheme

a) without main-pulse laser

pre-pulse irradiationTime

Main pulse laser

/ EUV emission after EUV emission

b) with main-pulse laser

Back

illuminator

CCD

camera

EU

V

sensor

Drive laser

Tin droplet

LIF

camera

EUV/Debris

Measurement

port

Corrector mirror

Intermediate focus

EUV/Debris

Measurement

port

Back

illuminator

CCD

camera

EU

V

sensor

Drive laser

Tin droplet

LIF

camera

EUV/Debris

Measurement

port

Corrector mirror

Intermediate focus

EUV/Debris

Measurement

port

Perfect

vaporization!

100micron

20 micron

droplet


Atom measurement by LIF - 2

3 mm

①w/o CO2 laser ②w/ CO2 laser

Laser

Remaining atoms was estimated by subtracting

w/ CO2 vs. w/o CO2 measurement


0

0.2

0.4

0.6

0.8

1

1.2

0 0.25 0.5 0.75 1

Ion

nu

mb

er

(arb

. u

nit

)

Magnetic Field (arb. unit)

Ion Measurements by Faraday cups

Amount of ion is measured by Faraday cup

>99% of Tin goes to Tin ion catcher !!

Faraday

cup 1 @

mirror

position

Magnetic

Field

EUV Collector

Mirror position

Drive laser

Amount of ions

going to Tin ion

catchers

Amount of Tin ions not

going to ion catchers

Faraday cup 2

@ Tin ion catcher

position

Proto / Pilot


Results Summary

Tin molecule measurement results

pre-pulse laser + CO2 laser irradiation : ionized 93% of Tin

Only pre-pulse laser irradiation : ionized 3% of Tin

This

time

Proto

Condition

Repetition

rateHz 10 100k

Experimental Condition:

Same as proto machine

only

Pre-pulse

Irradiation

pre-pulse laser + CO2 laser

Irradiation


Estimated deposition and cleaning rates

Deposition rate: 1.2 nm / Mpls*

Cleaning rate: 4.4 nm / Mpls**

Clean operation feasibility proven

*Estimation of Tin atom dispersion

: isotropic

** Estimation based on experimental

data under pilot conditions

Cleaning rate

CO2 Laser Energy [a.u.]

CO2 energy at

final proto / pilot

Clean operation is proven by test data with

ETS and 10Hz source


Gigaphoton’s Light at the End of the

EUV Tunnel!


GL200E system overview


GL200E proto constructed at Hiratsuka facility

Main-

AMP2

Main-

AMP1

BDU3

BDU4

Pre-AMP

OSC

Pre-AMP

CO2 laser OSC+Pre-AMP

CO2 laser Main-AMP

EUV-chamber


EUV light generated at Proto system

PROTO Source

90kHz operation

30% Duty

Max. 7W clean power within burst

Maximum 7W clean power at Proto system is on line


EUV Source product roadmap

GL200E pilot will be delivered to Scanner maker Q4 2012

Initially at 50W clean power

Follow-on upgrade to 250W

★ 1st source delivery

Power

250W

100W

2014 201520132010 201220112009

ETS

GL200E


Summary

1st generation integrated setup LPP source (ETS) and 10 Hz device:

Smaller droplet (droplet size reduction from 60mm to 30 mm) extends operation time to 7 hours around 20W(clean power @I/F, 5%duty) level

operation.

10Hz experiment proved debris mitigation concept experimentally.

That is proper pre-ionization and main ionization make >93% ionization. This technology enables clean light source in combination with magnetic field.

10Hz experiment clarify CE (Conversion Efficiency) improvement, with <20mm droplet we found the region where CE >4.7% and perfect vaporization are simultaneously possible.

2st generation LPP source (GL200E):

Concept of design and outline is reported.

Our final goal of GL-200E is 250W and the feasibility is supported by high CE experimental data.

We observed 1st EUV light on proto source with 18W equivalent level at present. Next target is 50W level demonstration by 4Q 2012.


0

1

2

3

4

5

0 5 10 15 20 25 30

EU

V C

lea

n P

uls

e E

nerg

y (

mJ

)CO2 Laser Power(kW)

CE 3%

CE 4%

EU

V C

lea

n P

ow

er

(W)

0

300

100

200

CE 5%400

500

After CE optimization

3.3% →3.8%→4.7% (@ pilot condition)

New champion data of CE = 4.7% (May.2012)

Dual wavelength Laser Produced Plasma

Outline

1. Introduction

2. Engineering Test source

1st Generation (ETS) device: System experiment

– Operation Data

10Hz device: Critical issue experiment

– Vaporization experiment

– Ionization experiment

– Magnetic mitigation

– Pre-pulse and high CE

3. HVM EUV light source

Product roadmap

2nd Generation device: Development status

– Configuration

– Latest status

4. Summary

High CE technology for HVM EUV source 1 2 3 4 5 6

7 8 9 10 11 12

13 14 15 16 17 18

19 20 21 22 23

Hakaru Mizoguchi and Shinji Okazaki / GIGAPHOTON INC.

Documents

EUV/Debris 3. HVM EUV light source Remaining atoms was ... · Power (at present) peak/average 104W/21W Plasma No electrode Mitigation Pre pulse + Magnet Life limitation ( several