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1 ISPD 2007 Austin, TX Rules vs. Tools Lou Scheffer. Lars Liebmann, , Riko Radojcic, David White ISPD Austin, March 2006

Rules vs. Tools

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Rules vs. Tools. Lou Scheffer. Lars Liebmann, , Riko Radojcic , David White ISPD Austin, March 2006. What’s the problem?. What are designers allowed to design? Design rules are the traditional solution But modern processes are very complex - PowerPoint PPT Presentation

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Page 1: Rules vs. Tools

1 ISPD 2007Austin, TX

Rules vs. Tools

Lou Scheffer. Lars Liebmann, , Riko Radojcic, David White

ISPD

Austin, March 2006

Page 2: Rules vs. Tools

2 ISPD 2007Austin, TX

What’s the problem?

• What are designers allowed to design?

• Design rules are the traditional solution

• But modern processes are very complex

‑ Rule books become huge (>600 pages)

‑ Too much to easily remember and use

‑ Still do not tell enough

• Two possible solutions

‑ Restricted rules - ‘Rules’

‑ Model based design – ‘Tools’

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What’s wrong with the current system

• In the beginning, there was a rule for contact spacing…

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What’s wrong with the current system

• Then there were different same-net rules

‑ This was pretty easy to understand

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What’s wrong with the current system

• Then the spacing started to depend on the number of neighbors

0, 1, or 2 Neighbors

> 2 neighbors

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What’s wrong with the current system

• Now need a rule on what constitutes a neighbor

These are officially neighbors

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What’s wrong with the current system

• So a 3x3 array uniformly needs the ‘big’ rule

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What’s wrong with the current system

• And some clever designer notices this

Now you can use the 2 neighbor rule!

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What’s wrong with the current system

• But the fab does not think this should be allowed

No, you cannot use the 2 neighbor rule!

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What’s wrong with the current system

• So now there is a rule stating ‘It is not legal to remove the middle via of a 3x3 array in order to use the 2 neighbor rule’

• Hard to check in DRC

• Hard to remember

• Is this a good use of everyone’s time?

• Does it really make a yield difference?

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So what could you do?

• ‘Rules’ – here is a list of the legal via arrays. You must use one of these.

• ‘Tools’ – here is a test that tells which via arrays are manufacturable. Any via array this passes this test is OK.

• ‘Extreme tools’ – here is a model that predicts via fail rate in manufacturing. You decide.

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Can do this at many levels

• Layout

‑ Example : Restricted design rules

• Circuit

‑ Example: No dynamic logic

• Architecture

‑ Example: Must have latches on block boundaries

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Problem not unique to IC design

• 3 cases from other fields

‑ One where both approaches are used, with extreme size differences

‑ One where rules are used

‑ One where models are used

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Law vs ethics

• What is allowed behavior?

‑ Rules based – legal systems

‑ Tools based – honor codes

• Specify by laws (info from Wikipedia, USA federal only)

‑ Divided into 50 ‘titles’; each 1 or more printed volumes

‑ Titles may optionally be divided into subtitles, parts, subparts, chapters, and subchapters.

‑ For example, privacy act of 1974 is “Title five, United States Code, section five hundred fifty-two A."

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Law vs Ethics

• The basic intent of all these laws can be replaced by an ‘honor code’, such as

‑ A cadet will not lie, cheat, steal, or tolerate those who do

• Much, much shorter (5 orders of magnitude?) but requires interpretation

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Example where rules are the accepted way

• Civil engineering – building codes

• Detailed code not needed in principle

• Quite conservative (6x safety factors)

• Reduces the chance of error

‑ Designed to be easy to inspect

• Reduces the consequence of error

‑ Big safety factor

‑ Makes sure common failures are addressed

‣Multiple exits, exit lighting, width of doorways, etc.

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Example where models are the rule

• Food – both rules and info are possible:

• Rule: Eat your vegetables before dessert

• Tool: each food lists calories and ingredients; you decide what to eat.

• Different people have different tradeoffs

• Disclose, then let people decide for themselves

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Benefits from restricted rules?

• Problem: Even a simple wire is hard to predict

• Lithography is a complex operation

‑ Designer draws a polygon

‑ OPC is applied (very non-linear)

‑ Exposure through a complex optical system

‑ Develops a non-linear resist, then etch

• Need to add CMP to model vertical dimension

• Then need to compute range of variation

• Can all be modelled, but it’s not easy

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Possible solution: Instead of this:

Page 20: Rules vs. Tools

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Restricted design rules: Do this

• One direction, one width, one spacing, all wires on grid, all empty spaces filled

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Tried this as an experiment

• Forbid wrong way in router

• Wire length only 1% greater

• Routability unchanged

• 10% more vias

• But if this lets you print smaller, it’s a (big) net win!

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Same true for devices

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Implications for Designer

For designer/CAD, looks like lots of restrictions

‑ Power routes must be wires in parallel

‑ Wide signal nets must be parallel wires

‣ Delay computation must handle loops

‑ Routers cannot jog – more vias

‑ IP blocks cannot be rotated

• Litho folks often phrase this as ‘This is needed, or you won’t get 45 (or 32 or 22 nm…)

• Designers don’t believe this for historical reasons

• Looks like the fab is saying “Eat your vegetables”

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Implications for Fab

• Litho is very easy; can be tuned for direction

‑ Illumination and polarization can be optimized

• CMP is very easy

‑ No width effects, small density variations

• Can help with non-modelled effects

• These are nice for the fab, but designer does not care

• Can produce a smaller pitch

• Variation can be (much) less

• These are things designers value

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Political implications

• Fab needs to ‘share’ the benefits, e.g.

‑ 90 nm pitch with restricted rules

‑ Smaller variation

• Or

‑ 100 nm pitch with arbitrary geometries but larger variation

• Then designers could see the benefit, and decide for themselves…

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And now our panelists

• Each with a different perspective

• Lar Liebmann

‑ Litho guy

• David White

‑ CMP modeller

• Riko Radojcic‑ User perspective

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Questions to keep in mind

• Can the average engineer use complex models productively? 

• Can the EDA tools use these models? 

• Can the fabs provide these models, keep them updated, and stand behind them? 

• Won't this keep fabs from making improvements to their process? 

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More questions

• What's the relative importance of time to market and getting the most out of the silicon? 

• How big is the penalty, or benefit, for using restricted rules? 

• Of the many problems (litho, CMP, lifetime degradation, etc.) which should be treated by rules and which by models? 

• Should this be design dependent?