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Photolithography Prof. Tianhong Cui, Mechanical Engineering ME 8254

Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master

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Page 1: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master

Photolithography

Prof. Tianhong Cui, Mechanical Engineering

ME 8254

Page 2: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master

Standard IC Processes

Photolithography Source:Jaeger

Page 3: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 4: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 5: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 6: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 7: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 8: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 9: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 10: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 11: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 12: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 13: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 14: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 15: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 16: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 17: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 18: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 19: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 20: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 21: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 22: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 23: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 24: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 25: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 26: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 27: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 28: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 29: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 30: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 31: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 32: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 33: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 34: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 35: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 36: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 37: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 38: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 39: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 40: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 41: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 42: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 43: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 44: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 45: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 46: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 47: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 48: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 49: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 50: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 51: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 52: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 53: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master
Page 54: Photolithography - University of Minnesota 04... · Fig. 2.4 Resist and silicon dioxide patterns following photolithography with positive and nega- tiye resists. Photomasks Master

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