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Center for High-rate Nanomanufacturing C N H C N H Numerical Simulation of the Phase Separation of a Ternary System on a Heterogeneously Functionalized Substrate ngrui Shang, David Kazmer, Ming Wei, Joey Mead, and Carol Bar University of Massachusetts Lowell

Center for High-rate Nanomanufacturing Numerical Simulation of the Phase Separation of a Ternary System on a Heterogeneously Functionalized Substrate Yingrui

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Page 1: Center for High-rate Nanomanufacturing Numerical Simulation of the Phase Separation of a Ternary System on a Heterogeneously Functionalized Substrate Yingrui

Center for High-rate Nanomanufacturing

C NH

C NH

Numerical Simulation of the Phase Separation of a Ternary System on a

Heterogeneously Functionalized Substrate

Yingrui Shang, David Kazmer, Ming Wei, Joey Mead, and Carol BarryUniversity of Massachusetts Lowell

Page 2: Center for High-rate Nanomanufacturing Numerical Simulation of the Phase Separation of a Ternary System on a Heterogeneously Functionalized Substrate Yingrui

Center for High-rate Nanomanufacturing

C NH

C NH

ObjectivePhase separation of polymer blends on a patterned substrate

Unguided

Template directed assembly

Highly ordered structures

Polymer A Polymer B

PAA/PS (30/70) polymer blends in a solvent

Ming, Wei et.al., ACS meeting, Spring 2008, New Orleans US

Page 3: Center for High-rate Nanomanufacturing Numerical Simulation of the Phase Separation of a Ternary System on a Heterogeneously Functionalized Substrate Yingrui

Center for High-rate Nanomanufacturing

C NH

C NH

• Numerical simulation– The morphology in the bulk of the material– The morphology near patterned surfaces– Dynamics of the morphology development– Influence of the process parameters and material

properties on morphology

Experimental results Simulation results

Yingrui Shang & David Kazmer, J. Chem. Phys, 2008, accepted

Page 4: Center for High-rate Nanomanufacturing Numerical Simulation of the Phase Separation of a Ternary System on a Heterogeneously Functionalized Substrate Yingrui

Center for High-rate Nanomanufacturing

C NH

C NH

Introduction

Template Resulting concentration:

• Modeling assumptions– Random distribution initial situation– Incompressible fluid– Isothermal– Bulk-diffusion-controlled coarsening

Page 5: Center for High-rate Nanomanufacturing Numerical Simulation of the Phase Separation of a Ternary System on a Heterogeneously Functionalized Substrate Yingrui

Center for High-rate Nanomanufacturing

C NH

C NH

Fundamentals

• The total free energy of the ternary (Cahn-Hilliard equation),

– F : total free energy– f : local free energy– : the composition gradient energy coefficient

– Ci : the composition of component i

Page 6: Center for High-rate Nanomanufacturing Numerical Simulation of the Phase Separation of a Ternary System on a Heterogeneously Functionalized Substrate Yingrui

Center for High-rate Nanomanufacturing

C NH

C NH

Fundamentals

Cahn-Hilliard Equation

C1+C2+C3=1

– i,j : represent component 1 and component 2.– Mij : mobility

Page 7: Center for High-rate Nanomanufacturing Numerical Simulation of the Phase Separation of a Ternary System on a Heterogeneously Functionalized Substrate Yingrui

Center for High-rate Nanomanufacturing

C NH

C NH

Flory-Huggins Free Energy

• The bulk free energy

– R : gas constant– T : absolute temperature

– mi : degree of polymerization of i

– ij : interaction parameter of i and j

Page 8: Center for High-rate Nanomanufacturing Numerical Simulation of the Phase Separation of a Ternary System on a Heterogeneously Functionalized Substrate Yingrui

Center for High-rate Nanomanufacturing

C NH

C NH

Phase Diagram

Free energy of ternary blends

Phase diagram of ternary blends

Page 9: Center for High-rate Nanomanufacturing Numerical Simulation of the Phase Separation of a Ternary System on a Heterogeneously Functionalized Substrate Yingrui

Center for High-rate Nanomanufacturing

C NH

C NH

Numerical Method

• Discrete cosine transform method for PDEs

– and are the DCT of and – is the transformed discrete laplacian,

Page 10: Center for High-rate Nanomanufacturing Numerical Simulation of the Phase Separation of a Ternary System on a Heterogeneously Functionalized Substrate Yingrui

Center for High-rate Nanomanufacturing

C NH

C NH

Constant Solvent Concentration

Polymer 1 Polymer 2 Solvent Polymer 1 Polymer 2 Solvent

t*=1024

t*=4096

t*=2048

(a) (b)

(a) Csolvent=60% (b) Csolvent=30%

Page 11: Center for High-rate Nanomanufacturing Numerical Simulation of the Phase Separation of a Ternary System on a Heterogeneously Functionalized Substrate Yingrui

Center for High-rate Nanomanufacturing

C NH

C NH

Evolution Mechanisms

• Measurement of the characteristic length, R

– The evolution of the domain size, R(t)~t, fits the rule that R(t) t∝ 1/3

Page 12: Center for High-rate Nanomanufacturing Numerical Simulation of the Phase Separation of a Ternary System on a Heterogeneously Functionalized Substrate Yingrui

Center for High-rate Nanomanufacturing

C NH

C NH

Effects of the Patterned Substrate

(a).Csolvent=60%;

(b).Csolvent=50%;

(c). Csolvent=40%;

(d). Csolvent=30%,

where Cpolymer 1=Cpolymer 2, t*=4096

The more condensed the blends, the higher surface attraction needed for a refined pattern. This may be due to the stronger intermolecular force of the polymers.

(a)

(b)

(c)

(d)

Page 13: Center for High-rate Nanomanufacturing Numerical Simulation of the Phase Separation of a Ternary System on a Heterogeneously Functionalized Substrate Yingrui

Center for High-rate Nanomanufacturing

C NH

C NH

Phase Separation with Solvent Evaporation

Lz=L0+exp(-a*t), where t is the time, a is a constant, and Lz is the thicknessof the film at time t, and L0 is the thickness at t=0

t*=1024, Csolvent=0.088

t*=2048, Csolvent=0.018

t*=4096, Csolvent=0

Polymer 1 Polymer 2 Solvent

Time

Thickn

ess

Page 14: Center for High-rate Nanomanufacturing Numerical Simulation of the Phase Separation of a Ternary System on a Heterogeneously Functionalized Substrate Yingrui

Center for High-rate Nanomanufacturing

C NH

C NH

Compatibility of the Substrate Pattern to the Blend Surface

• Compatibility between template and ternary system is measured by Cs defined as:

• Examples:

– Cs=0.606

– Cs=0.581

– Cs=0.413

– Cs=0.376

Page 15: Center for High-rate Nanomanufacturing Numerical Simulation of the Phase Separation of a Ternary System on a Heterogeneously Functionalized Substrate Yingrui

Center for High-rate Nanomanufacturing

C NH

C NH

Compatibility of the Substrate Pattern to the Blend Surface

• There is a critical time and solvent for the evolution of Cs

• Cs will decrease for lower solvent concentrations• The evaporation will stabilize the decrease of Cs

Page 16: Center for High-rate Nanomanufacturing Numerical Simulation of the Phase Separation of a Ternary System on a Heterogeneously Functionalized Substrate Yingrui

Center for High-rate Nanomanufacturing

C NH

C NH

Conclusion

– The 3D numerical model for ternary system is established

– The evolution mechanism is investigated. The R(t) t∝ 1/3 rule is fitted.

– The condensed system has a faster agglomeration pace.

– In the situation with patterned substrate the condensed solution patterns evolute faster in the early stage but in the late stage the surface pattern tends to phase separate randomly.

– The evaporation of the solvent can stabilize the replication of the patterns according to the patterned substrate.

– The modelling will be verified by the experiment data in the spin coating of polymer solvent

Page 17: Center for High-rate Nanomanufacturing Numerical Simulation of the Phase Separation of a Ternary System on a Heterogeneously Functionalized Substrate Yingrui

Center for High-rate Nanomanufacturing

C NH

C NH

Acknowledgement

• National Science Foundation funds (#NSF-0425826)

• All the people contributed to this work

Page 18: Center for High-rate Nanomanufacturing Numerical Simulation of the Phase Separation of a Ternary System on a Heterogeneously Functionalized Substrate Yingrui

Center for High-rate Nanomanufacturing

C NH

C NH

Questions