Vacuum Division Catalogue

We offer more than 'just the box'

SupportSalesSolutions Servicewww.johnmorrisgroup.com

Vacuum Division Summary

Vacuum Pumps

Vacuum Components

Page 15

Vacuum Chambers

Page 15

Vacuum Manipulation (Heating & Cooling)

Page 15

Leak Detection

Page 16

Vacuum & Pressure Measurement

Pages 17 - 21

Mass Flow, Control & Verification (Gas & Vapour)

Pages 22 - 24

Diaphragm

Multi-Stage Roots Booster

Scroll

Screw

Rotary Vane/Hybrid

Central Network Systems

Roots Booster

Industrial Vacuum Systems

Turbomolecular Oil Diffusion Cryogenic & Cryostats Ion (Sputter)

Flanges/Fittings & Oils/Fluids

Feedthroughs

Motion feedthroughs, sample transfer & rotation, translation devices, XYZ & Z only manipulation, rotary & linear drives, wobble sticks, etc

Heating & cooling stages from 1,800 °C to liquid helium temperatures

We supply an extensive range of remanufactured pumps

Front Cover image courtesy Australian Synchrotron – soft x-ray beamline

Vacuum Valves

Traps & Filters

Thermal Based MFCs & Meters

In-Situ Mass Flow Verifiers

Flow Ratio Controllers

Pressure Controllers

Vacuum Gauges & Transducers

(Gas-Type Independent)

Coarse to Rough Pumps

Pages 4 - 11

High to Ultra High Vacuum Pumps

Pages 12 - 14

Remanufactured Vacuum Pumps

Page 14


(Gas-Type Dependent)

Vacuum Gauge Controllers

Vacuum Test - Portable Vacuum Test - ProductionOverpressure (Sniffer)

Australia - Free Call: 1800 251 799 2 www.johnmorrisgroup.com

Gas Analysis - Mass Spectrometry

Pages 25 - 26

Plasma & Surface Modification

Pages 30 - 31

Recirculating ChillersPage 29

Thin Film Systems, Nano Fabrication & Materials

Pages 27 - 29

Rotational Vacuum Concentrators

Page 35

Maintenance & Repair Services

Page 36

Installation & Customisation

Page 37

Freeze Drying

Pages 33 - 35

Gloveboxes & Anhydrous Solvent Purification

Page 32

To ensure you select the right instruments for your needs, contact John Morris Vacuum for professional assistance


SupportSalesSolutions Service

Vacuum Quality Monitor (VQM) Systems

Physical Vapour Deposition (PVD)

Residual Gas Analysers (Quadrupole)

Chemical Vapour Deposition (CVD)

Non-Dispersive InfraRed (NDIR)

Plasma Enhanced Chemical Vapour

Deposition (PECVD)

Fourier Transform InfraRed Spectroscopy (FTIR)

Atomic Layer Deposition (ALD)

DRIE & RIE Organic Deposition & Metalisation System

Gloveboxes Anhydrous SolventPurification

Thin Film System Components & Materials

Nanomaterials

Direct Current Power Generators

Pulsed Direct Current Power Generators

We service all types of vacuum pumps for all brands

Our trained engineers custom design & install purpose-built solutions plus

conduct staff training on your premises

Perfect for PVD, Etching, Sputtering, Wet Benches

Radio Frequency Power Generators

Microwave Power Generators

Routine Lab Applications Advanced Applications Pilot Applications Production Applications

Various models from basic requirements to HCI resistant & infrared heating

New Zealand - Toll Free: 0800 651 700 3 www.johnmorrisgroup.com

Depends on staging configuration


Pumping SpeedMeasures a pump’s capacity to remove gas from the chamber (measure of the gas volume displaced versus time) - common units of measurement are m3/hour & L/second

Ultimate Vacuum RangeThe lower a vacuum pump’s pressure (eg 10-10) the higher the vacuum level (as there are less gas molecules within the vacuum chamber) - measured in millibar (mbar), Torr, Pascal, etc.

Pumping Speed Conversion Table

To determine the correct type of pump for your particular application consider the following factors.

Transfer v’s Capture Pumps Transfer Pumps - force gas molecules in a preferred direction by positive displacement or momentum exchange where the gas

is compressed until slightly above atmospheric pressure when ejected

Capture Pumps - immobilise gas molecules from re-entering the vacuum system via a cold surface or by ionisation

Wet v’s Dry Pumps Wet Pumps - use low vapour pressure oil in the pumping mechanism for sealing/lubricating the vacuum compression stages

(rotary vane) or compressing the gas molecules in vapour form (diffusion)

Dry Pumps - have no oil sealing fluid which avoids hydrocarbon contamination. Some pumps truly have no oil lubricants while others may have lubricated gears/bearings sealed from the vacuum track by o-rings/seals

Ultimate Vacuum (mbar)Vacuum Pump Types

Pumping Speed Range

m3/secL/secm3/hourl/mnCFM

Min Max

Ultra High

<10-10 10-210-6 10210-10 10-110-5 10310-9 10-8 10010-410-7 101 10-3

High Rough Coarse

m3/sec L/sec m3/hour l/mn CFM 1 103 3,600 6 x 104 2.12 x 103

10-3 1 3.6 60 2.12 2.78 x 10-4 0.278 1 16.7 5.89 x 10-1 1.67 x 10-5 1.67 x 10-2 6 x 10-2 1 3.53 x 10-2

4.72 x 10-4 0.472 1.699 28.32 1

High to Ultra High

Turbomolecular

Oil Diffusion

Cryogenic & Cryostats

Ion (Sputter)

7.5 to

3,000 to

2,600 to

0.2 to

3,200 L/sec

50,000 L/sec

60,000 L/sec

1,200 L/sec

Vacuum Pump Selection Guide

25 m3/hour

25 m3/hour

0.7 m3/hour

60 m3/hour

1,200 m3/hour

10,000 m3/hour

4,800 m3/hour

5,000 m3/hour

0.7 to

0.7 to

-

5.4 to

1.5 to

250 to

16 to

270 to

Pages 5 -11

Pages 12 -14

Coarse to Rough

i

Diaphragm

- Turbo Backing

- Chemistry Resistant

- Liquid Aspiration

Scroll

Rotary Vane/Hybrid

Roots Blower

Multi-Stage Roots Booster

Screw




Depends on configuration

Depends on configuration


Coarse to Rough Vacuum Pumps

Description Rough Vacuum • Gas Transfer Removal Method • Dry PumpOperation A flexible diaphragm mechanically moves to increase/decrease a pumping chamber volume - this change in volume compresses & expands process gas to create a vacuumApplications Vacuum filtration, rotary evaporation, distillation, gel drying, centrifugal concentration, vacuum drying & turbo backing applications

Ultimate Vacuum mbar

(without gas ballast)

Pumping Speed (m3/h) 50 Hz

ATEX Category 3

(internal Atm only)

Comment/Application

Model

Turbo Backing

MV 10 NT VARIO 0.3 12.1Variable speed control

motor & ideal for larger turbo pumps

(>500 L/sec)

-

-

-

-

Suitable for small hybrid turbo pumps

(<150 L/s)

For hybrid turbo pumps

(<700 L/sec)


(<300 L/s)


(<300 L/s)


(<700 L/s)


(<150 L/s)

Divac 0.8 LT ≤0.5 0.77

MD 4 NT 1 3.8

Divac 1.4HV3 ≤1.5 1.3

Divac 4.8VT ≤2.0 4.8

MD 1 1.5 1.2

Divac 0.8 T ≤3.0 0.77

Diaphragm Pumps


Model Ultimate Vacuum

mbar(without

gas ballast)

Ultimate Vacuum

mbar(with gas ballast)


Base Pump

ATEX - Category 3(internal

Atm only)

Inlet/Outlet

Catchpot

Suitability

Chemistry Resistant

Divac 2.2L Optional Evaporation (rotary &

rotational vacuum)- -2.0-≤8

PC 101 NT Both Gel dryingME 2C

NT2.0127

MZ 1C -Rotary/parallel evaporation-0.752012

ME 1 Both Aqueous filtration only-0.7-100

Divac 1.2L Optional

Small volume evaporation (rotary &

rotational vacuum)- -102-≤8

Divac 0.6L Optional

Small volume evaporation (rotary &

rotational vacuum)- -0.6-≤8

ME 2C NT Both Multiple filtrations &

solid phase extraction-2.0-70

ME 1C BothSolvent filtration & solid

phase extraction-0.7-100

PC 3003 VARIO Both

Evaporating high boiling point solvents

MV 2C NT

VARIO2.820.6

MD 4CNT+ AK+EK

Both

Rotational vacuum concentrators, multiple

rotary evaporators & large vacuum ovens

MD 4C NT3.431.5

PC 3001 VARIO Pro Both

Automatic rotary evaporation, rotational vacuum concentration

& vacuum ovens

MD 1C VARIO

-SP2.042

Divac 1.4HV3C Optional

Variable speed for rotary evaporation

& rotational vacuum concentration

- -1.3-≤2

MZ 2C NT+ AK+EK

BothRotary evaporation, rotational vacuum concentration & vacuum ovens

MZ 2C NT

2.0127


Liquid Aspiration

Low Base Vacuum & High Effective Pumping Speed

Single-Stage Pumps

Base Pump

4 L PP Collection Flask

Pressure Switch Type

Comments Ideal for labs with ‘central house’ vacuum

Mechanical

-

BVC Basic

With integrated ME 1C Vacuum pump - quiet &

vibration free

Electronic

ME 1C

BVC Control

Integrated vacuum pump & non-contact liquid

level sensor

Electronic

ME 1C

BVC Professional

Description Rough Vacuum • Gas Transfer Removal Method • Dry Pump Operation 2openspiralmetalstripsarenestedtogether(oneisfixed&theother‘orbits’) sealedwithatipseal.Astheorbitoccurs,theconnectionwiththeinletcloses,trapping &compressingavolumeofgasuntilitreachesaminimumvolume&maximum pressureatthespirals’centre(whereoutletislocated)Applications Suitedinapplicationsrequiringdry&cleanvacuum(typicallyreplacingrotaryvane pumps)-predominantlyforbackingturbopumpswithinleakdetectionsystems, accelerators/synchrotrons,surfaceanalysisinstruments,scanningelectron microscopes,loadlock/transferchambers,spectroscopy

Description Coarse or Rough Vacuum • Gas Transfer Removal Method • Wet (Oil-Sealed)Operation An eccentric rotor compresses process gas within a pump chamber (stator). Oil is injectedintothestatortocreatethevacuumseal,lubrication&coolingApplications Rough Pumps - used primarily as backing pumps for roots/high-vacuum gas transferpumps(egturbomolecular&diffusion) Coarse Pumps-usedinfreezedrying,vacuumfiltering/vacuumimpregnation, materialshandling&‘house’vacuumsystems

Sogevac range of pumps are market leading for industrial, manufacturing & R&D rough vacuumapplications ATEXRL94/9/ECcertifiedversionsavailable(explosionprotected) PumpingSpeed(50Hz):9.5to1,150m3/h UltimatePartialPressure(withoutgasballast):Downto5x10-2mbar WaterVapourCapacity:20to34,000grams/hour

Lownoise&vibration Completely oil free & easy to maintain Nominal Pumping Speed (50 Hz): 5.4 to 60.0 m3/h AttainableUltimateVacuum:Downto0.01mbar LeakRate:10-6 mbar L/s

Scroll Pumps

Rotary Vane/Hybrid Pumps

Sogevac SV 10B

Scrollvac Pumps

Single stage diaphragm pump with goodsuctionpower Excellentchemicalcompatibilityfor solventsample&disinfecting Vacuumregulationtodefinethe aspirationflowrate Collectionflaskwithsterilefilterto protectthepump&workplacefrom biologicalhazards


Dual-Stage Pumps Idealforcontinuousoperation ATEXRL94/9/ECcertifiedversionavailable(explosionprotected) Low&easymaintenance Largerangeofaccessoriestosuityourapplication

Model Nominal Pumping

Speed (m3/h) 50 Hz


(without gas ballast)


(with gas ballast)

Water Vapour Capacity

(grams/hour)

Inlet Flange

(KF)

Motor Rating (Watts)

Trivac D 25 B

75025480<5 x 10-310-429.5

Trivac D 8 B

37016160<5 x 10-310-49.7

Trivac D 65 B 2,200401,925<5 x 10-310-475.0

Trivac D 40 B 2,200401,185<5 x 10-310-446.0

Trivac D 16 B 550 to 75025305<5 x 10-310-418.9

S1.5 8016195 x 10-13 x 10-21.9

RZ 2.5 18016621 x 10-24 x 10-42.3

RZ 6 300161631 x 10-24 x 10-45.7

Trivac D 4 B

3701695<5 x 10-310-44.8

RC 637016>1631 x 10-24 x 10-45.9Chemical resistant

with unique ‘hybrid’ design


Roots Booster Pumps

Multi-Stage Roots Booster Pumps

Description Coarse to Rough Vacuum • Gas Transfer Removal Method • Dry PumpOperation Apositivedisplacementlobepumpwhichpumpsgaseswithapairofcontactless meshinglobesApplications High gas load/high pumping speed requirements

Description Rough Vacuum • Gas Transfer Removal Method • Dry Pump (Atmosphere to 10-4 mbar)Operation SimilartoRootsBlowerbuthavemultiplestagesforimprovedultimatevacuumApplications Turbopumpbacking,loadlocks,PVDsystems,analyticalinstruments(LCMS,ICPMS), electron microscopes, oxygen plasma systems & helium cryostats - ideal for replacing wet pumps plus Scroll type dry vacuum pumps

High Reliability & Rapid Pumpdown

Non-Contact Pumping Mechanism

Increasedprocessgasthroughputviasignificantly exhanced pumping speed Suitableformultitudeofindustrial&R&D applications UltimatePressuredownto10-4 mbar (3stagesystem) Vertical&horizontalgaspathconfigurations ATEX(94/9/EG)compliantversionsavailable

Dry roughing pump achieves 10-2 mbar ultimatevacuum Highestwatervapourpumping&vacuum

level of any air-cooled dry pump Single&three-phasemotorsalsoavailable Lowpoweratultimatevacuum

Nominal Pumping Speed (50 Hz):

Pumping Speed (m3/h)

Max Permissible Pressure Difference (continuous operation)

Ultimate Pressure (mbar) - Gas Ballast Off/On

Motor Power

Max Water Vapour Pumping Rate - Gas Ballast Off

Connection - Gas Inlet/Outlet

Power at Ultimate Vacuum (kW)

2.2 to 11 kW

250 grams/hour

NW25/NW25

0.34

710 to 10,000 m3/h

15

30 to 75 mbar

1 x 10-2/10-1

≤1.1 to 7.5 kW

500 grams/hour350 grams/hour

NW40/NW25NW40/NW25

1.10.59

253 to 2,050 m3/h

6036

50 to 80 mbar

1 x 10-2/2 x 10-21 x 10-2/10-1

Ruvac WH 7000 Ruvac WAU 501

EV-A03 EV-A06 EV-A10


Screw Pumps


Description Rough Vacuum • Gas Transfer Removal Method • Dry Pump Operation Twocontra-rotating‘screws’mesh(butdon’ttouch)witheachother&whenthescrews arerotated,gasiscompressed/transferredfromoneendtotheother.Theconstruction materialenablesoperationintheharshenvironmentsofaggressivegases&particulates foundinsemiconductoretching&CVDprocessesApplications Industrial,food&beverage,freezedrying&centralvacuumsystems

Dry Vacuum Solution for Industrial Applications

One Design Platform - Numerous Configurations

Power plus High Performance

Building-Wide (‘House’) Central Vacuum Systems

Drycompressingpumpsforspecialindustrialapplicationswherereliable, compact&lowmaintenancevacuumtechnologyisdemanded Idealalternativetoconventionaloil-sealedvacuumsystems EffectivePumpingSpeed(50Hz):270to630m3/h UltimatePressure:≤0.01mbar

Dryvacuumpumpsdesignedforapplicationsinthephotovoltaicproductionchain (egPECVD,PVD&crystalgrowing,etc.),coatingapplications&processindustryingeneral Rugged,reliable&durable-readytofulfillstringentprocessrequirements NominalPumpingSpeed(50Hz):450to5,000m3/h UltimatePressure:5x10-3 mbar

Rangeofpumpsidealforroughapplications&highprocessthroughput Optimisedperformanceforlightgases NominalPumpingSpeed(50Hz):80to3,800m3/h UltimatePressure:1x10-2 mbar

Modularsystemsengineeredforimprovedoperationalreliabilitywithfrequentvarying vacuumrequirements…deliveryofturnkeyready-to-operate&testedunits Industrialdutyquality TypicallyconsistingofSOGEVACpump(s),buffervessel,electricalcabinetwith controller&allconnectingcomponents Pumpingspeedsfromaslowas25m3/huptolargeturn-keyinstallations Ultimatepressuredownto10-3mbar Vesselvolumestartingfrom60L ControltypeBASICorfullfeatured

At John Morris we provide a total solution in catering for your vacuum network needs - from conceptual design, co-ordination of external contractors (plumbers, electricians, etc), complete installation & commissioning plus staff training & equipment servicing.

Subject to your particular requirements, we provide a number of options in designing your central vacuum systems requirements - building-wide (‘house’) & local area networks

ScrewLine Pumps

Dryvac

Leyvac LV 140



Local Area Vacuum Networks (VACUU•LAN)

Modular in design allowing you to tailor your specificneeds&makeiteasytosupplyseveral differentworkstationswith1vacuumpump Avoidsthedrawbacksofacentral‘house’ vacuumsupply(expensiveredundancy, rigidpipework&limitedchemicalresistance) Modulesaresolventresistant Built-incheckvalvesensureadjacent applicationsdonotcontaminateorinterfere withoneanother Idealforneworexistinglaboratorieswith harshsovents/chemicalvapours

Design&manufactureofcustomindustrialvacuumsolutions Highflexibility&reliability Integratedforevacuum&highvacuumpumpsystemsfor

custom requirements Customsoftwareprogrammingandcustomisation On-site commissioning & training

Base Pump

Ultimate Vacuum mbar (without gas ballast)

Ultimate Vacuum mbar (with gas ballast)

ATEX - Category 3 (internal Atm only)


Separator Catchpot

Chemical Resistant

Exhaust Vapour Condenser

1003

19.34.6

ME 16C NT VARIOMD 4C NT VARIO701.5

PC 3004 VARIO PC 3016 NT VARIO


High to Ultra High Vacuum Pumps

Turbomolecular Pumps

Description High & Ultra Vacuum • Gas Transfer Removal Method • Dry Pump Operation Pumpingeffectiscreatedbymultiplespinningrotordiscswhichtransfermomentumto gas molecules through various compression stagesApplications High energy physics, synchrotrons, microscopy, mass spectrometers, surface analysis, thinfilmcoating,spacesimulationchamber&opticallasers

Mechanical Rotor Suspension

Maintenance-Free Turbo Pump - Hybrid Bearings

Magnetically Levitated Turbomolecular Pumps

Cleanhigh&ultrahighvacuumgenerationwithceramiclife-timelubricatedbearings Pumpingspeedupto1,150L/s Versionswithhighresistancetomechanicalshocks&shockventing,plusremovableelectronics forradiationapplications PumpingSpeeds(L/sec):

Hybrid design with permanent magnet upper & ceramic lower bearing Industry leading pumping speeds for light gases (He & H2) Lowerceramicbearingisfieldreplaceablewithnooil/operatingfluidchanges Integrated electronics Forevacuumconnection:DN25KF PumpingSpeeds(L/sec):

100% maintenance free with no mechanical bearings Eliminatetheneedforaconventionalrack-mounted controller&inter-connectingcablesviafullyintegrated converter&powersupply HighVacuumFlange:100to250ISO-K/CF

N2

Model

Maximum Forevacuum Pressure (N2)

Pumping Speeds (L/sec) • N2

• Ar • He • H2

HeAr H2

Forevacuum Pressure

(Max)

Flange Size

33 to 1,150

Turbovac 350 iTurbovac 450 i

Turbovac T 350 iTurbovac T 450 i

36 to 1,15030 to 960

N2

290430290430

260400260400

360440360440

350420320400

DN100 (ISO/CF)DN160 (ISO/CF)DN100 (ISO/CF)DN160 (ISO/CF)

10 mbar10 mbar0.5 mbar0.5 mbar

Ar He H2

28 to 690

Nominal Speed (min-1)

300 to 2,1001,050 to 1,900260 to 2,050190 to 1,750

2.5 to 8.0 mbar30,600 to 58,000

300 to 3,200260 to 3,000260 to 3,000190 to 2,250

2.0 to 8.0 mbar28,800 to 58,800

Turbovac SL 300

Turbovac 450 i

Turbovac Magintegra Turbovac Mag Digital


Oil Diffusion Pumps

Cryogenic Pumps & Cryostats

Compact Turbomolecular Pump System

High Vacuum Without Moving Parts

Cryopumps & Systems

Fully assembled & ready-to-use high vacuum system Wide range turbomolecular pump system with ceramic ball bearings (200,000hourlife-time) Dual-stage, DIVAC 0.8 T diaphragm vacuum pump Allconnection&sealingcomponentsarelocatedwithinpumpsystemassembly Highvacuumconnection:DN63ISO-K/CForDN63CF PumpingspeedforN2:65L/sec Ultimatepressure:10-8mbar(max)

InletConnections:FromISO250toISO1,000DNFlange Pumpingspeedforair:From3,000to50,000L/s Ultimatetotalpressure<5x10‐7mbar Integratedwater-cooledcoldcapbaffleguaranteeslowoilback-streamingintothechamber

No moving parts within vacuum system (low maintenance) Single,doubleormultiplesystems-choosefrom30models Intelligentregenerationpreventsformationofignitablegasmixtures(H2 & O2) Highlyeffectivepumpingspeedforallgases(watervapourinparticular) 100%availablepumpingspeed&capacityaftereachregenerationrun Insensitivetomechanicaldisturbances(egprocessparticlesorexternalvibrations) HighVacuumFlange(160to1250ISO-FDN)-ForevacuumFlange(25KFto63ISO-K) Pumping Speeds (L/sec):

Capacity (bar x L): Ar/N2 (300 to 6,500); H2 at 10-6 mbar (4.5 to 150) Max Forevacuum Pressure (N2): 2.5 to 8.0 mbar

H2O N2Ar H2

2,600 to 18,000 800 to 57,000640 to 47,000 1,000 to 60,000

Description High Vacuum • Gas Transfer Removal Method • Wet (Oil-Sealed)Operation Vacuum oil is heated, vapourised & accelerated (to speed of sound) & collides with gas molecules,forcingthemtowardsthepumpexhaust-thuscreatingavacuumApplications Suitableforapplicationsrequiringhugepumpingspeeds(molecularbeamsystems, largescalevacuumfurnaceprocessing,spacesimulationchambers)

Description High & Ultra High Vacuum • Gas Capture Removal Method • Dry Pump Operation Traps gases & vapours by condensing them on a cold surfaceApplications Suitedfornon-aggressiveprocesseswhereoil-freeoperation&highpumpingspeeds areessential

Leybojet 630

Coolvac

Turbolab 80


Ion (Sputter) Pumps

Cold Heads for Cooling Cryo Pumps/Cryostats

Gasrefrigeratingsystemsforcryogenictemperaturegeneration (basedonGifford-McMahonprinciple) Designedforcoolingsuper-conductors(magnets,samples)formedicalresearch Longmaintenance-freeoperatingtimewithlowvibration Refrigeratingcapacity:two-stagedownto8K;single-stagedownto25K Resistanttoparticles&deposits Simple&intuitiveoperation Noneedforliquidhelium&liquidnitrogen

Description Ultra High Vacuum (dependent upon design) • Gas Capture Removal Method • Dry Pump Operation Theprocessgasisionised&isattractedtoacathodeplate(typicallytitanium) withsufficientforcetosputterthetitanium.Thesputteredmaterialcoatsthe processgas&trapsitwithintheionpump,creatingavacuumApplications PrimarilythechoiceforalltrueUHVchamber-theyareclean,bakeable, vibration-free,operatefrom10-5to10-12mbar&havelongoperatinglives

Choice of 3 options dependent upon desired orientation

MAGNET Ti/Ta PLATES

We supply an extensive range of remanufactured pumps from quality manufacturers - all types, dry or wet … simply contact us to discuss your requirements

Remanufactured Vacuum Pumps

Max Start Pressure (mbar)

Ultimate Pressure (mbar)

Pumping Speed (L/sec) 3 to 75 (Dioxide)

0.2 to 60 (Noble Dioxide)

<10-11

<1 x 10-4

Mounted in any orientation

SmallIon Pumps

300 to 250 (Dioxide)

240 to 250 (Noble Dioxide)

<10-11

<1 x 10-4

Orientates the elements horizontally

Tall ProfileIon Pumps

100 to 1,200 (Dioxide)

80 to 960 (Noble Dioxide)

<10-11

<1 x 10-4

Orientates the elements vertically

Low ProfileIon Pumps

Coolpower


We provide a comprehensive range of vacuum components as building blocks for any vacuum system

For the full range, price & availability see www.johnmorrisgroup.com

Off-the-shelf&turn-keyoptionsavailable High&ultra-highvacuumchambersforR&D&productionenvironments ChoiceofchambersincludeBox,Spherical,Cylindrical,ServiceWell&WaterCooled

Vacuum Components

Vacuum Chambers

Vacuum Manipulation (Heating & Cooling)

Flanges, Viewports & Fittings(KF, CF, ISO, ASA) Vacuum Valves

Oils, Fluids & Greases

Feedthroughs(Electrical, Instrumentation, Gas, Liquid)

Traps & Filters

MultiMotion XYZT

Vacuum manipulation mechanically moves an object inside a vacuum chamber without breaking the vacuum

Devicesincludemotionfeedthroughs,sampletransfer, translationdevices,XYZ&Zonlymanipulation,sample rotation,rotary&lineardrives,wobblesticks,etc Heating&coolingstagesfrom1,800°Ctoliquid heliumtemperatures


All components/systems leak gas to varying degrees. It is important to quantify the leakage rate to determine if it is within acceptable application guidelines (the ‘leak rate’ is typically measured in mbar x Liters x seconds-1).

Leak Detection

Overpressure

Vacuum Test

Leakage Rate (mbar L/s)Vacuum Pump Types <10-10 10-210-6 10210-10 10-110-5 10310-9 10-8 10010-410-7 101 10-3

Helium Sniffer - Selective Ion Pump Based

Helium/Hydrogen Leak Detector - Mass Spectrometer Based

Portable with probe & sampling line Highsensitivityforhelium(1x10-6 mbar L/sec) Responsetime<0.1seconds;Extremelyshortclean-uptime Automatictuning&zeroing

Intuitivetouch-screen operationwithiPadcontrol Integrateddatastorageto generatetestreportsfor accuratequalityassurance Automaticcalibrationwith integratedtestleakplus automaticfunctions Robust&lowmaintenance Availableinoilordryvacuum pumpsystems

Response Time

Helium Pumping Speed

Smallest Leak Rate (Vacuum)

Smallest Leak Rate (Sniffer)

Phoenix L300i

≤5 x 10-12 mbar L/sec

<1 x 10-7 mbar L/sec

>2.5 L/sec

< 1 sec

Portable (with or without cart)

Phoenix L300i Dry



>2.5 L/sec

< 1 sec

Phoenix L500i



50 L/sec

< 0.2 sec

Fastest mobile leak detector on the marketMost compact unit in its class

iPad Touch-Screen

Production

PHD-4

Overpressure (a test piece is pressurised which forces the gas out where leak occurs)

Vacuum Test (a test piece is evacuated under vacuum & a tracer gas is used to meaure leakage rate)

Bubble Testing

Pressure Decay

Thermal Conductivity

Hydrogen Sniffer

Helium Sniffer

Helium/Hydrogen Leak Detector


There are 2 common types of pressure measurement - the right choice depends on the pressure range & the residual gases in the vacuum for your application.

Gas-Type Independent: Have liquid or solid diaphragms that change position under the force of all the gas molecules bouncing off them & measure absolute pressures unaffected by gas/vapour properties Gas-Type Dependent: Measure a bulk property (thermal conductivity, ionisation or viscosity) & the pressure is dependent upon

gas composition

In addition to pressure range other features need to be considered: how it is affected by radiation, magnetism, temperature, vibration & corrosive gases; damage caused by switching it on at atmospheric pressure

1 Torr = 1 mm Hg

Vacuum & Pressure Measurement

Ultimate Vacuum (mbar)Vacuum Gauge Types & Pressure Ranges

Gas-Type Independent

Pressure Unit Conversion Table

<10-10 10-210-6 10210-10 10-110-5 10310-9 10-8 10010-410-7 101 10-3

1

105

0.980 x 105

1.013 x 105

98

133.3

100

3,386

6,890

1 Pa

1 bar

1 Kg/cm2

1 atm

1 g/cm2

1 Torr

1 mbar

1 inch.Hg

1 psi

1.02 x 10-2

1,020

1,000

1,033

1

1.36

1.02

34.53

70.3

1.02 x 10-5

1.02

1

1.033

10-3

1.36 x 10-3

1.02 x 10-3

0.03454

0.0703

10-2

1,000

980

1,013

0.98

1.33

1

33.78

68.947

10-5

1

0.980

1.013

0.098 x 10-2

0.1333 x 10-2

1 x 10-3

3.386 x 10-2

6.89 x 10-2

0.75 x 10-2

750

735

760

0.735

1

0.750

25.4

51.71

0.9869 x 10-5

0.9869

0.968

1

0.968 x 10-3

1.31 x 10-3

0.9869 x 10-3

0.03327

0.068

0.2953 x 10-3

29.53

28.94

29.92

0.02894

0.0394

0.02953

1

2.036

0.1451 x 10-3

14.51

14.22

14.70

1.422 x 10-2

0.0193

0.01451

0.4910

1

Pa bar Kg/cm2 atm g/cm2 Torr mbar inch.Hg psi

PHD-4

Gas-Type Dependent

Bourdon

Capsule

Diaphragm

Capacitance Manometers (Baratron®)

Piezo Gauge

Thermocouple

Pirani

Convection/Pirani

Spinning Rotor

Hot Cathode (Ionization)Cold Cathode (Ionization)

i

Pages 19 - 20

Pages 20 - 21


Bourdon GaugeThe circular arc (Bourdon tube) is connected to the vacuum system & due to the external atmospheric pres-sure exerted, the end of the tube bends (more or less) during the evacuation process which moves the pointer

Capsule Vacuum Gauge Contains a hermetically sealed, evacuated, thin-walled diaphragm capsule - as the pressure reduces, the capsule deflects & mechanically moves a pointer to display a vacuum reading

Diaphragm Vacuum Gauge A sealed & evacuated vacuum chamber is separated by a diaphragm from the vacuum pressure to be measured. This serves as the reference quantity. With increasing evacuation, the difference between the pressure (which is to be measured) & the pressure within the reference chamber becomes less, causing the diaphragm flex.

PiezoA silicon crystal diaphragm is placed over a vacuum reference pressure. The measured change in resistance (as a result of diaphragm deflection) serves as a parameter for the pressure. These gauges are accurate between the pressures of 1 mbar to ATM.

ThermocoupleA wire filament is heated by running current through it. A thermocouple or resistance thermometer (RTD) is used to measure the temperature of the filament. This temperature is dependent on the rate at which the filament loses heat to the surrounding gas & therefore indicates vacuum level.

Pirani (Thermal Conductivity) GaugeUtilises the thermal conductivity of gases. The filament within the gauge head forms one arm of a Wheatstone bridge. The heating voltage which is applied to the bridge is controlled in such a way that the filament resistance & thus the temperature of the filament remains constant regardless of the quantity of heat given off by the filament. Since the heat transfer from the filament to the gas increases with increasing pressures, the voltage across the bridge is a measure of the pressure.

Convection/PiraniA standard Pirani gauge has an accurate measuring range 10-4 to 10 mbar. By taking advantage of the convection currents that are generated above 1 mbar, convection-enhanced Pirani gauges increase the accuracy of the vacuum range to atmosphere.

Spinning RotorMeasures the amount a rotating ball is slowed by the viscosity of the gas being measured. The ball is magnetically levitated inside a steel tube closed at one end & exposed to the gas to be measured at the other. The ball is brought up to speed & the speed measured after switching off the drive, by electromagnetic transducers - most useful in calibration & R&D laboratories where high accuracy is required.

Hot Cathode (Ionization) Gauge Commonly use 3 electrodes. A hot cathode emits electrons which impinge on an anode. The gas is ionized & the resulting positive ion current is detected through the third electrode (ion detector) & this current is used as the pressure measurement (hot cathode sensors are based on the Bayard-Alpert principle).

Cold Cathode (Ionization) Gauge (Penning) Pressure is measured through a gas discharge (within a gauge head) which is ignited using a magnetron source - the resulting ion current is measured & is proportional to the prevailing pressure.

Vacuum Gauge Descriptions




Single Range Gauges

Capacitance Manometers (Baratron® Gauges)‘Capacitive measurement’ is a plate capacitor comprising of a variable diaphragm & a fixed electrode. When the distance between the 2 plates change, a change in capacitance results. This change, proportional to the pressure, is then converted into a corresponding electrical measurement signal. An evacuated reference chamber serves as the reference for the pressure measurements.

• Fullyadjustablesetpointfrom0.2%to100%ofFullScale• Corrosionresistant• Fastresponseswitching

• Fullyadjustablesetpointfrom0.2%to100%ofFullScale• Corrosionresistant;Fastresponseswitching

• 15-pinD-subminiatureelectricalconnectorwithoutrelays• RoHScompliant

• Helps reduce system size• 0-10 VDC or 0-5 VDC output available• Corrosion resistant; RoHS compliant

• Smallest heated Baratron® manometer• Designed for semiconductor precursor gas delivery, biopharm & thermal processing, etc

• Accurate to 0.1% of Reading • 15-pin D subminiature electrical connector• RoHS compliant

• Five decades of measurement range• Independentofgascomposition• Integratedsignalconditioner

• Accurate to 0.05% of Reading• High accuracy for process or metrology environments

• Accurate to 0.05% of Reading• High accuracy for process or metrology environments

• 0-10 VDC for 10% or 100% of Full Scale • Five decades of measurement range • Independentofgascomposition• Optimalforenginetesting,flowteststands

• Idealforfreezedrying&demandingetchapplications•Canbesterilised

• Ethernet/IP-compatible• ExternalLEDsindicatedevicestatus• UsesMKS’standardcapacitancesensor• DeviceNet digital or analog • Etch sensor available below 130 mbar• RoHS compliant

• DeviceNet digital or analog • RoHS compliant

Absolute

Absolute

Absolute

Absolute

Absolute

1 to 1,300

1 to 1,300

1 to 1,300

1 to 1,300

1 to 1,300

0.1 to 1,300

1 to 1,300

1 to 1,300

1 to 1,300

1 to 1,300

1 to 1,300

1 to 1,300

1 to 1,300

1 to 33,000

Ambient

Heated

Ambient

Ambient

Heated

Heated

Heated

Heated

Heated

Ambient

Ambient

Heated

Heated

Ambient

0 to 50°C

100°C

0 to 50°C

0 to 50°C

45°C

45° to 100°C

45°C/200°C

45°C

45°C

0 to 50°C

45°C

45°C

45°C

Bakeableto 200°C

Absolute

Absolute

Absolute

Absolute

Absolute

Absolute

Absolute

Differential

Absolute

141A

142A

626B

722B

727A

120AD/AD

690A

698A

121A

a-Baratron®

631D Baratron®

627C e-Baratron®

i-Baratron® DMB (45°C)

i-Baratron® DMB (Ambient)

Instrument

Entry Level

Mid Range

High End

Measurement Range mbar(Full Scale)

Heated or Ambient

Temp Comments


902B MEMS based Piezo sensor with diaphragm based sensor


Single Range Gauges

Ultimate Vacuum (mbar)<10-10 10-210-6 10210-10 10-110-5 10310-9 10-8 10010-410-7 101 10-3


Connection flange: DN-16 ISO-KF

Burdonvac A

Burdonvac C

Capsule Vacuum Gauge

Capsule Vacuum Gauge

Diavac DV 1000 (Diaphragm)





Gas-Type Dependent

Single Range Gauges

Thermocouple gauge controller with 2 set point controls

Measurement 1-2 decades lower than standard Pirani

615 Series

925

205 Series

971B

500

354

274

275

355

370

275

347

423, 431

Thermocouple controller with accurate calibration with dry air

Stand-alone compact cold cathode

Double inverted magnetron for unprecedented accuracy

High sensitivity for low noise & higher accuracy

Available with burn-out resistant filaments & standard connections

Convection enhanced Pirani & factory calibrated

Smallest Bayard-Alper style with greater burnout resistance

Most accurate B-A - all metal gauge tube for stability & long-term repeatability

Provides high accuracy & repeatability

Stabil-Ion gauge provides unmatched stability/ repeatability over time

Based on inverted magnetron design with unique dual feedthrough

Cold Cathode Ion Sensor

GlassNude

Absolute Piezo

Mini-Convectron®

Convectron®Pirani

Micro-Ion®Bayard-Alpert

Cold CathodeGauge

Bayard-AlpertIonization

Stabil-Ion®Bayard-Alpert

I-Mag® ColdCathode

Micro Pirani

UniMag™

Micro-Ion®

Stabil-Ion®


Vacuum Gauge ControllersUltimate Vacuum (mbar)

<10-10 10-210-6 10210-10 10-110-5 10310-9 10-8 10010-410-7 101 10-3


Stand-alone, single channel or for configuration & advanced system diagnostics

For Series 900Transducers

Vacuum SystemController

Bayard-Alpert

Bayard-AlpertUHV

Micro-Ion®

Stabil-Ion®

Convectron®

Vacuum GaugeController

Versatile half-rack controller - pressure measurement plus flow & pressure control

Bayard-Alpert full rackcontroller with optional2 Convectron gauges

Bayard-Alpert UHV half rack controller with optional 2 Convectron gauges

Micro-Ion half rack with optional 2 convectrons

Dual (sequential) Stabil-Ion full rack controller - high accuracy & repeatability

Single controller includes pre-programmed gas curves

Supports wide range of sensor technologies (eg cold & hot cathode, Pirani, Piezo & Baratron® gauges)

PDR900

307

358

475

946

350

370

937B

Wide Range Gauges

Micro Pirani & absolute Piezo for increased accuracy

Dual Trans™Micro Pirani/Absolute Piezo

Micro Pirani ™/Piezo Loadlock

Micro-Ion ATM

DualMag™

QuadMag™

Micro-Ion PlusMicro-Ion & Conductron are combined for full range measurement

910

392

390

901P

972B

974B

Micro-Ion, Conductron & 2 Piezo sensors for extended range

Fast, accurate, gas independent atmospheric measurement on loadlocks

Combination cold cathode, Micro Pirani

Combination cold cathode, Micro Pirani, differential Piezo

Monitor & Control the Entire Vacuum Process

Control of all vacuum components (eg fore & high vacuum pumps, up to 5valves&5activesensors) Self-detectionofconnectedvacuumdevices VisualisationoftheentirevacuumsystemonalargeTFTgraphicdisplay Intuitive&easytoprogramwithplug-&playcompatibility

Absolute/Differential Diaphragm SensorHeat-Loss Sensor

Hot Cathode Ion Sensor

Hot Cathode Ion Sensor



Heat-Loss Sensor

Heat-Loss Sensor

Heat-Loss Sensor

Heat-Loss Sensor

Heat-Loss Sensor

Absolute/Differential Diaphragm Sensor



Vacvision

Flow Range 2 x 10-3 sccm to 1,000 SLM

1 or 2 Gauges

Optional UHV Gauge

Optional 2 Convectron Gauges

1 UHV Gauge


1 Micro-Ion Gauge


1 or 2 Stabil-Ion Gauge


1 Convectron Gauge

Cold Cathode Sensor

Heat-Loss Sensor

Capacitance Diaphragm & Piezo Diaphragm Gauge

Pressure Control Range


Vacuum Gauge DescriptionsMass Flow, Control & Verification (Gas & Vapour)

Gaseous Flow Rate

A gas flow rate describes a pressure change within a defined volume versus time.

Common measurement units include the mbar.L/s (millibar x litres/seconds), SCCM (Standard Cubic Centimetres per Minute) & slm = standard litres per minute

Pressure Unit Conversion Table

1

10

1

1.3

1.3 x 10-3

1.66 x 10-2

atm.cc/s

Pa.m3/s

mbar.L/s

Torr.L/s

Lusec

SCCM

760

7,500

760

1,000

1

12.7

1

10

1

1.3

1.3 x 10-3

1.66 x 10-2

0.1

1

0.1

0.13

1.3 x 10-4

1.66 x 10-3

0.76

7.5

0.76

1

10-3

1.27 x 10-2

60

600

60

78.7

7.87 x 10-2

1

atm.cc/s Pa.m3/s mbar.L/s Torr.L/s Lusec SCCM

Connector Board

Valve Body

Metal Valve Seal

Valve Plug

Valve Orifice

Bypass

Sensor SealsMetal

Sensor Tube

A mass flow controller (MFC) is a device which sets, measures & controls the flow of a particular gas or liquid. Our range of MKS flow controllers are designed for control of gases.

Applications for MFCs include the semiconductor & coating industry, flat panel display production, gas & emission analysis as well as fuel cell technology.

MFCs can be configured for either analog or digital communications.

All MFCs have an inlet port, an outlet port, a mass flow sensor & a proportional control valve. The MFC is fitted with a closed loop control system which is given an input signal by the operator (or an external circuit/computer) that it compares to the value from the mass flow sensor & adjusts the proportional valve accordingly to achieve the required flow.

The flow rate is specified as a percentage of its calibrated full scale flow & is supplied to the MFC as a voltage signal.

MKS integrated products combine mass flow control options with pressure measurement & control - saving space plus helps optimise investment & minimise operation costs by reducing the total number of system components needed.

i


Gas/Vapour flow control can be either controlled with Mass Flow Controllers (MFC), Mass Flow Meters (MFM) or flow verifiers. Accurate, reliable gas flow delivery & control is crucial to many of today’s advanced processes.

Thermal based meters sense the flow by measuring the thermal transfer between a heated tube wall & the gas stream (heat loss being directly proportionate to the gas flow).

atm.cc/s Pa.m3/s mbar.L/s Torr.L/s Lusec SCCM

Thermal Based MFCs & Meters

High Flow Rate

General Purpose IP66 Rated for Harsh Conditions

Choice of options to suit your requirements

100 to 250 slm1% of Set Point

±0.5% of Reading0.1% of Reading

<1 x 10-9 scc/sec HeAnalog & Digital

100 to 250 slm±1% of Set Point±0.5% of Reading0.1% of Reading


250 to 1,000 slm±1% of Set Point±0.5% of Reading0.1% of Reading


Full Scale Flow Rate (N2 equivalent)

Accuracy (N2 calibration gas)

Repeatability

Resolution

Leak Integrity - External

Input/Output Options

Fast & Repeatable PerformanceG Series

IP66 Rated for Harsh Conditions I Series

High PerformanceP Series

5 sccm to 50 slm

±1% of Set Point

±0.3% of Reading

0.1% of Full Scale

<1 x 10-10 scc/sec He

Analog & Digital

General purpose thermal MFCs & MFMs suitable for most applications -elastomer & metal sealed

Designed for industrial MFC applications (protect against water & dust) -elastomer & metal sealed

Ideal for critical applications where accuracy, repeatability & pressure insensitivity are vital

5 sccm to 50 slm

±1% of Set Point

±0.3% of Reading

0.1% of Full Scale


Analog & Digital

5 sccm to 50 slm

±1% of Set Point

±0.3% of Reading

0.1% of Full Scale


Analog & Digital



Repeatability

Resolution





Repeatability

Resolution



Full Scale Flow Rate (N2)Accuracy RepeatabilityResolutionLeak Integrity - ExternalInput/Output Options

GE50

IE50A

P9B

Special Applications

1640A

Certain process vapours & gases require MFC’s of a special design specific to the material plus process conditions - requiring flow control at elevated temperatures &/or low pressure drop conditions given the source material characteristics

Contact us for further information regarding your specific needs

General purpose MFC for diverse applications in

research & industry

General purpose, elastomer sealed, MFC (resistant to

liquid & dust)

Industrial use MFC, elastomer sealed (resistant to liquid

& dust)

GE250 IE250 IE1000


General Purpose & Compact MFC

Wide range of analytical, enviro, PVD & coating applications - MFM versions are available

MF-1

Tru-Flo

10 to 50,000 sccm

+0.2% of Full Scale

±0.2% of Full Scale

0.1% of Full Scale




Repeatability

Resolution



In-Situ Mass Flow Verifiers

Pressure Controllers

Flow Ratio Controllers

Provide fast, accurate verification of MFC & MFM performance - fully integrated diagnostic instruments that measure a pressure rate-of-rise into a known volume at a known temp to determine mass flow (±1% of Reading)

Fully Integrated Diagnostics

Tru-FloMFVconsistsofasmallgasvolume,MKSBaratronpressuresensor,shutoff valves & control electronics combined into a single compact package ProvidesinsituverificationofMFCperformanceonsemiconductorprocesstools

Fast & Accurate Verification of MFCs & MFMs

HA-MFV(HighAccuracy-MassFlowVerifier)isdesignedforuseonprocesstools Gasflowsareverifiedsignificantlybetterthanolderrate-of-risedevicesorprocesschamberrate-of-risemethods

Delta Series

Criticalprocesscontrolinstrumentprovidingthelatestingasflowratiomeasurement&controltechnology Providestheabilitytodistributegasorgasmixturesto2,3&4differentzonesrespectively Divides&controlsmixedprocessgasflowstomultiplechambersorzonesatratiosspecifiedbytheuser Widelyusedinavarietyofflowsplittingapplicationssuchasetching,stripping&PECVD

Delta II Delta III Delta IVGeneral Purpose

Used to contol pressure/vacuum applications where precise pressure control is required

10 mbar to 6.9 bar50 to 50,000 sccm±0.5% of Reading

>2 to 100% of Full Scale

10 to 1,300 mbar50 to 5,000 sccm±0.5% of Reading


1,300 mbar to 6.9 bar50 to 50,000 sccm±1.0% of Reading


1,300 mbar to 6.9 bar50 to 30,000 sccm±1.0% of Reading


Pressure Range (Full Scale)Orifice Range (Full Scale)Reading AccuracyConrol Range

640B 649B πPC πPC with MFM

Electronic Pressure Controller

Electronic Pressure Controller with

Mass-Flo® MeterIntegrated Pressure

ControllerIntegrated Pressure

Controller with MFM

1HA-MFV


Vacuum Quality Monitor (VQM) Systems

Residual Gas Analysers - Quadrupole

World’s Fastest, Lowest Power Mass Spectrometer

Fulldatacollection,spectraldeconvolution&datalogging Ultimatevacuumrange(mbar):10-5to<10-10

MassRange(&ScanTime):1to145amu(in85msec); 1to300amu(in120msec) Consistsofauto-resonantiontrapmassspectrometergauge,VQMcontroller &VQMviewersoftware Smaller,easiertocalibrate&20timesfasterthantraditionalQuadrupoleRGAs Instantaccesstocriticalmeasurementinformationincludingthe10most prevalentgasesinnormalised,percentage&absolutevaluesplustotal& partialpressuretrendgraphs

General Purpose RGA

Ranges (amu) 100 or 200 Maximumdataacquisitionspeed<3msperpointforanalogscans Maxoperatingpressure10-4 Minimumdetectablepartialpressure:Faraday(2.6x10-11mbar),Multiplier (6.7x10-14 mbar) Dedicatedreal-timeacquisitionprocessorwithweb-serverinterface Applicationsincludeleakdetectionofvacuumlines,welds&seals,vacuum diagnostics,pumpdownmonitoring,chamberbakeoutmonitoring,monitor cryo-pumpperformance

Stability, Accuracy & Speed Come Together

Ranges (amu) 100, 200 or 300 Collects data at <3 milli-second speeds per data point for analog scanning Maxoperatingpressure10-4

Mindetectablepartialpressure:Faraday(2x10-11 mbar), Microchannel plate (5 x 10-14 mbar) Idealforapplicationswhereknowingthecontentsofyourchamberis critical-semiconductormanufacturing,largescalecoatingtools, ultra-high vacuum & harsh environments

Extends Pressure Range of 835 VQM Up to 4 mbar

Ultimatevacuumrange(mbar):4to10-10

Applicationsincludemonitoringgasreactions,detectingcontaminants,controlling theamountofreactivegasintroduced,leakdetection,detectingwhentostartaprocess Calibrationcompletedinsecondswithjustafewclicksofthemouse Intuitivegraphicaluserinterfacesoftware

Microvision 2

Vacuum Gauge DescriptionsGas Analysis - Mass Spectrometry

e-Vision 2

835 VQM Differential Pump System

835 VQM System


Non-Dispersive InfraRed (NDIR )

Fourier Transform InfraRed Spectroscopy (FTIR)

Real Time, Continuous Detection of Toxic Gases

Self-contained,ultra-sensitive,FTIRbasedgasanalyserthatrapidlydetectstoxicgases &chemicalwarfareagents(withnofalsepositivealarms&>97%detection) Single-digitpartsperbillion(ppb)detectionofabroadrangeofthreats Rapidresponse-typically<20seconds Ethernetconnectivityforremotemonitoring Compact&ruggeddesignforreliableperformance

Complete Continuous Emissions Monitoring Systems (CEMS)

Designedforintegrationwithcompletecontinuousemissionsmonitoringsystems tomeasuregaseousemissionsfromstationarysourcessuchaswaste incinerators,powerplants,cementkilns,largecombustionplants,turbineengines Meets DIN EN 15267-3 standard SpectralResolution0.5cm-1

Directlyanalyseshot,weteffluentgasstreamswithouttheneedforsample pre-treatment Permanentreferencecalibrationspectra(allbuteliminatescostlycalibration gascylinders)

Atmospheric Quadrupole Mas Spec

WorkbeyondthelimitsofconventionalquadrupoleMStechnology-moreeasily detect&monitortracegasesforextremedetectioncapability TheprovenquadrupoleMSplatformutilisespatentedV-lensionopticswitha double-focussing&deflectioncapability(producingaconsistentlylowbaselinefor anygasspecies-enablingtraceleveldetectionwithgreaterclarity&confidence) Idealforon-linemonitoring&analysisofgases&gasmixtures-includingtrace contaminantsinprocessgases,solventvapours,hydrocarbons,atmospheric& inorganicgasspecies(includingcorrosives),freons&noblegases Easytoinstall&operate-featuresautomaticstart-up&shut-downroutinesplus built-invacuum&heaterinter-lockingforsystemprotection Versatile,compactdesignpluspowerfulautomatablesoftwarecontrol

0 to 10 mg/m3

0 to 75 mg/m3

0 to 75 mg/m3

0 to 200 mg/m3

0 to 50 mg/m3

0 to 15 mg/m3

0 to 3 mg/m3

0 to 15 mg/m3

0 to 25%

0 to 40%

0 to 50 mg/m3

0 to 75 mg/m3

0 to 300 mg/m3

0 to 300 mg/m3

0 to 400 mg/m3

0 to 100 mg/m3

0 to 90 mg/m3

0 to 10 mg/m3

0 to 50 mg/m3

-

-

0 to 100 mg/m3

-

0 to 1,500 mg/m3

0 to 2,000 mg/m3

0 to 1,500 mg/m3

0 to 1,000 mg/m3

0 to 200 mg/m3

-

0 to 500 mg/m3

-

-

0 to 500 mg/m3

0.35 ppm

0.50 ppm

0.60 ppm

0.50 ppm

0.40 ppm

0.20 ppm

0.25 ppm

0.30 ppm

0.025%

0.25%

0.10 ppm

NH3

CO

SO2

NO

NO2

HCI

HF

CH4

CO2

H2O

N2O

Gas Component Certification Range Supplementary Range 1 Supplementary Range 2 Detection Limit

MGS300

AIRGARDPlus CWA/TIC

CIRRUS 3XD



Compact Sputtering or Thermal Evaporation Thin Film Deposition System

Entryleveldepositionsystemusedinuniversity,government&industrialR&Dlabs Thermalevaporationsystem(withupto4xBoatSources)orMagnetronSputtersources Wetordryroughpumping,diffusionorturbopumphighvacuumpumpingoptionsavailable SimplePLC-basedtouchscreensystemcontrol(withfullyautomaticpump/ventrecipes) 45Lprocesschambervolume 6.6x10-7mbarbasepressure FilmThicknessControl(ClosedLoopPIDControl)

Carbon Nanotube & Graphene Thermal CVD Solutions

TypicalapplicationsincludeChemicalVaporDepositioninR&Dlabs,forexamplecarbon nanostructuresynthesisofGraphene,verticallyalignedcarbonnanotubes&siliconnanowires EasyPCinterface,realtimecontrol,programmableexperiment,safetyalarmalerts Massflowcontrollersforcommongasses(Ar,H2,CH4,C2H4,N2,etc) Onezonetemperature1,000°Cfurnace,resistanceheating Constanttemperaturereactionzone(±2%) Quartzreactiontube2x5cm(standardCVDCube)

Wafer-Scale Deposition of Carbon Nanotubes & Graphene

Fast response heater, up to 300 °C/minute ramp rates Thermal CVD, plasma enhanced CVD, thermal gradient control Excellent reproducibility Closed loop infrared wafer temperature control Advanced design - Plasma with frequency & duty cycle control plus optimisedgeometryforuniformity Automaticprocesscontrol,easyrecipeediting,integratedprocesscamera

Deposit all Types of Nanotubes and Graphene for your Applications

Popular R&D Thin Film Deposition Tool

Mid-level,affordabledepositionsystemforuniversity,industrial&governmentlabR&D, OLED/PLED&organicelectronicsapplications,photovoltaics&semiconductordevices ModulardepositionsourcesincludingThermalEvaporation,MagnetronSputterSources (RF,DC,PulsedDC),electronbeam&organicheaters Superiorchamberdesign,advancedprogrammingsoftware&automaticsubstrate loadingmakethisbestofclass BasePressure:Downto6.6x10-8mbar StandardVacuumPumping:685L/secTurboPumpor1500L/secCryoPumpavailable 81Lprocesschambervolume

Physical Vapour Deposition (PVD)

Chemical Vapour Deposition (CVD)

Plasma Enhanced Chemical Vapour Deposition (PECVD)

Vacuum Gauge DescriptionsThin Film Systems, Nano Fabrication & Materials

Nano 36

PVD 75 Pro Line

CVD Cube

BM Pro


Atomic Layer Deposition (ALD)

DRIE & RIE

Organic Thin Film Deposition & Metalisation System

300 mm Wafer-Scale Production of Carbon Nanotubes & Graphene

1050°C substrate heater Uniform gas delivery through showerhead Preciseprecursorconcentrationcontrol Waferrotationduringprocess ARGUSreal-timewafertemperaturemapping Opticalportsatnormalincidencetowafer

Thermal or Plasma Enhanced

Centrally-pumped chamber for enhanced uniformity & precursor dispersion Expandable solid, liquid & gas phase precursor delivery Substrateheatingupto500°C-heatedchamber,foreline &deliverylinesto200°C Heated(150°C)capacitancemanometerforpressuremeasurement Scalable design allows for future expansion & upgrades PC-basedsoftwareenablingmanual&automaticrecipecontrol Applicationsincludeuniversity,industrial&GovernmentlabR&D, semiconductor,photovoltaics,OLED/organicelectronics

Etching Systems for R&D Applications

Flarion Series plasma reactors are designed for Deep Reactive Ion Etching (DRIE), Reactive Ion Etching (RIE), Plasma-Enhanced Chemical Vapour Deposition (PECVD) or wherever a large, high density plasma is required for surface modification

Max power from 100 W to 1,000 W - continuous or pulsed Modes with or without Faraday filter to modify capacitive coupling effects Samples up to 125 mm diameter or custom size/shape Heating (800°C) or cooling with temp control - vertical or horizontal cylindricals Vacuum to 10-7 mbar with turbomolecular pump backed with rotary vane or

dry scroll mechanical pump

Designed Specifically for Organic R&D Applications

Standardconfigurationswithinternalgloveboxcompatiblewithupto 100mmx100mmsquareor150mmdiametersubstrates(upto350°Cheating &cooling,gloveboxoptionavailable) Offersbothorganic&metaldepositioncapabilitiesinasinglechamber CompletegloveboxR&Dthinfilmdepositiontoolforwater/O2sensitivedevices ModulardepositionsourcesincludingThermalEvaporation,MagnetronSputter sources&Organicheaters Applicationsincludeorganicsemiconductor,nanoscaledevices,metalcathode deposition,organicfilms,OrganicElectronics&Photovoltaics(OPV),OLEDdisplays &lighting,organicelectronics,MEMS/NEMS

BM 300

ALD 150LX (Plasma Enhanced)

ALD 150LE (Thermal)

Flarion Series

Mini Spectros 100


Thin Film System Components

Thin Film Deposition System Materials

Nanomaterials

Sputter Targets Precious metals, ceramics, oxides, alloys & custom mixtures MaterialCertification&USMSDS(AustralianMSDSonrequest)

Pellets, Pieces & Wire Vastrangeofthermalevaporation&E-beammaterials Variousformsincludingpellets,pieces,wire,canes,platedrods,etc MaterialCertification

Boats, Boxes, Crucibles & Filaments Purematerials,evaporationsources&cruciblelinersforuseinboth thermal&E-beamevaporationplussputterdepositionprocesses Pureelements,compounds,alloys,ceramics&mixturesinavariety ofshapes,sizes&purities Wealsooffersputtertargetbonding&preciousmetals reclamationservices-savingyoutime&money

Carbon Alltropes Carbon Nanotubes, Fullerenes C60, C70, .., graphite, graphene nanoplatelets,

monolayer graphene layer, graphene oxide, reduced graphene oxide, carbon black Applicationsincludefieldemission,conductiveplastics,energystorage,thermal materials,fibers&fabrics,biomedical,orthopedicprostheses,refractorymaterials, lubricants,aerospaceapplications

Quantum Dots CdTe, CdSe/ZnS, ZnCdSeS, ZnO, ZnCuInS/ZnS, ZnCdSe/ZnS Applicationsincludecoloursinstainedglasses,composites,laserdiodes,Led’s,opticaldevices,absorbermirrors,photovoltaics

Nanowires Cobalt,lead,nickel,copper,silver,titanium,aluminum,gold,leadzirconatetitanate,leadtitanate,manganeseoxide,vanadium oxide,tungstenoxide Applicationsincludemicroelectronics,solarcells,composites,sensors,opticaldevices,ferromagneticcatalysis,cellmanipulation, anti-fungal

Deposition sources are components that facilitate a physical or chemical change in a base material in order to make it useful for creating thin films - typical sources include magnetron sputtering cathodes, thermal evaporation sources, electron beam evaporation sources, ion beam sources, etc Torus Magnetron

Sputtering SourcesIsoflux Inverted Magnetrons

(3D Sputtering)Thermal Evaporation

Sources

Sputter Targets

Wire

Evaporation Materials

Crucibles

Thermal Boat Sources


Highcoolingcapacitieswithstrongpumps Choosefrom16models-individuallyconfigured Temprange:-20°to80°C Coolingcapacity:0.5to10.0kW(at20°C) Flowrate:20to33L/minute Optionalintegratedheater(upto12kWpower)

Perfect for PVD, Etching, Sputtering, Wet Benches

Vacuum Gauge DescriptionsRecirculating Chillers

SC2500w

FC 1600


Vacuum Gauge DescriptionsVacuum Gauge DescriptionsPlasma & Surface Modification

MKS is the leading manufacturer of high reliability, compact, solid state, mid to extended (VHF) frequency RF power generators, impedance matching networks & plasma metrology, RF amplifiers for MRI equipment plus pulsed & continuous DC power generators in power levels up to 60 kW

Direct Current Power Generators

Pulsed Direct Current Power Generators

Radio Frequency Power Generators

Optima® series offer process versatility & performance via a variety of output regulation modes, user adjustable settings & control options

RPDG series provide asymmetric bipolar & unipolar pulsed DC power while retaining accuracy, repeatability & flexibility

OPT 400

RPDG 200

Power Output 5 to 100 kWMax Output Voltage 800 VPower Limits 5.25 to 63 kWCurrent Limits 5 to 126 ALinearity/Accuracy ±0.1%Regulation Modes Volts, Amps, Watts

High Power Density, Exceptional Stability & Generous Power Margins

Cover the full range of frequencies (from 2MHz to VHF) & power ranges (from 300 to 13,000 W) Responsetimetopowersetpointchanges&processtransitionsis500µS(advancedRFplasmageneration&control forlowcost&highyieldinthemostdemandingthinfilmprocessingapplications) Applicationsincludesemiconductor&thinfilm(etch,deposition),solarcells(PECVD,PVD),LED(deposition,etch)

Choice of 3 models

Elite™ products feature excellent stability, generous power margins & field proven reliability plus can be enhanced with various pulse capabilities - Rated Power Outlet: 1 to 750 W - Frequency: 13.56 MHz - Stability & Accuracy: ±0.005% - Dynamic Power Range: 200 to 750 W

SurePower® platform: - Most advanced class of 13.56 MHz generators commercially available - Highest reliability, reproducibility & accuracy of any generator in the marketplace today - Power levels from 3.5 to 13.0 kW

GHW platform offers power accuracy, repeatability & high yield: - Rated Power Outlet: 1,250 to 5,000 W - Frequency: 13.56 MHz - Stability & Accuracy: ±0.005% - Dynamic Power Range: 10 to 5,000 W

Power Output 5 to 100 kWMax Output Voltage 800 VPower Limits 5.25 to 63 kWCurrent Limits 5 to 126 ALinearity/Accuracy ±0.1%Regulation Modes Volts, Amps, Watts


Microwave Power Generators

Power Output 180 W to 6.0 kWFrequency 2440 to 2470 MHzRegulation >1% of output powerOutput Accuracy ±1.5%Ripple ±1% of output power

Designed for Demanding Semiconductor Fabrication & Plasma Applications

Cost effective, field-proven & high performance family of microwave generators for demanding semi-conductor fabrication

Air Cooled & State-of-the-Art Generator

Small form factor with solid state design 48cmrack-mountableforeasyintegration Advanced high-frequency transistor design for precision power & output

frequency control Integratesadynamicfrequencytuningcapabilitytominimisetheratioof

reverse to forwarded power Withstandsupto100%reversepowerconditionsforoptimumreliability

Microwave Source & Generator Packages

Rugged&reliableswitchmodepowersuppliesfordemandingindustrialapplications Compact generators up to 3 kW in a 48 cm standard rack with a remote head

& integrated isolator Equippedwithreflectedpowerdetection Proven switch mode technology Extremely compact & light weight

915 MHz Industrial Microwave Generators

Provides 15 to 75 kW power Continuouspowerlinecontrol Safetyinterlocks Avarietyofinterfaceoptions(plusoptionalremotecontrol) Switchmodepowersupplysystemswithcontinuouspowercontrol Rugged,lightweight&modularmicrowavegeneratorsystems

AX2500

SG 524

GS Series

AL20000


Vacuum Gauge DescriptionsVacuum Gauge DescriptionsGloveboxes & Anhydrous Solvent Purification

Gloveboxes

Anhydrous Solvent Purification

Modular Platform Design - HE Series

Easilyexpandexistinggloveboxestomeetincreasingworking spacerequirements Expansionfeaturesincludeadditionalantechambersforthru flowworkprocesses,spincoater,coldstoragefreezers,process vacuumovens&furnaceswithfulllineofaccessories Gaspurifiersprovidea<1ppmO2&H2OInertAtmosphere requiredforamultitudeofairsensitiveapplications 304typeStainlessSteeltubingmaterial

Anhydrous Solvent Purification is safe (no sodium & no heat) plus has no recirculated water (environmentally friendly)

Designed for Labs with Multiple Users

Ideal when requiring easy access to more than one anhydrous solvent Multi-wayvalvedesignisregardedthemostefficient&safest

dispensing system on the market Facilitatesproperairfreedispensingtechniquesusingour integratedmanifoldsystem Choiceof24/40,14/20,29/32stainlesssteelglassware adaptorsasstandard(otherconnectionsavailable) Userscanoperateair-freedispensingsystemsimultaneously withnocrossdiffusionofsolvent Largecapacity19Lreservoirswithleaktightscrewcap&

Swagelok quick disconnect valves Availableinfreestanding,benchtoporwallmountedmodels (plusdesignedtomountontopofflammablestoragecabinets andinsideexistingornewfumehoods)

PurSolv MD 3

PurLab HE 4GE 1800

PurSolv MD 5


Capacity

Performance

Temp - Aqueous

- Solvent

Drying Outside Ice Chamber

Drying in Injection Vials with Stoppering

Many more chamber configurations available

Vacuum Gauge DescriptionsVacuum Gauge DescriptionsFreeze Drying

Routine Lab Applications

Entry Level Systems

(day-to-day freeze drying applications)Alpha 1-4 LDplus Alpha 2-4 LDplus Beta 1-8 LDplus

All Martin Christ freeze dryers are modular in design allowing added features to be easily included - choose the right instrument for your needs from the table below.

Alpha 1-2 LDplus

Alpha 1-4 LDplus

Alpha 2-4 LDplus

Alpha 1-4 LSCplus

Alpha 2-4 LSCplus

Epsilon 1 & 2-4 LSCplus

Beta 1-8 LDplus

2 kg

Ice Condenser Capacity

Routine Lab

Aqueous Aqueous Aqueous & Solvent

Pilot

Solvent Solvent

Advanced

Aqueous & Solvent

Production

4 kg

6 kg

8 kg

10 kg

16 kg

24 kg

20 to >1,000 kg

Beta 2-8 LDplus

Beta 1-8 LSCplus

Gamma 1-16 LSCplus

Delta 1-24 LSCplus

Beta 2-8 LSCplus

Epsilon 2-10 LSCplus

Customised

Gamma 2-16 LSCplus

Delta 2-24 LSCplus

Epsilon 2-6 LSCplus

2.5 to 8 kg

2 to 6 kg/hour

-55°C

-85°C

3 to 5 Shelves

ø 200 to 360 mm

≈920 cm2 to 0.5 m2

2 to 4 Shelves

ø 200 to 250 mm

≈557cm2 to 0.18m2

8 to 24 PiecesDrying in Round Bottom Flasks

Product Shelves

Ice Condenser

Base unit + 3 shelves & 8 ports

Base unit + 8 ports Base unit + ampoule manifold

Base unit + 5 shelves

Base unit + stoppering device, 2 shelves

& 8 ports

Base unit + 3 shelves & 24 ports


Capacity

Performance

Temp - Aqueous

- Solvent

Chamber Volume

Inside Condenser & Single Chamber

Vials Inside with Stoppering & Single Chamber

4 to 24 kg

4 to 18 kg/hour

-55°C

-85°C

6.5 to 45 L

1 to 10 Shelves

ø 200 mm

≈0.031 to 0.155 m2

2 to 4 Shelves

ø 200 to 250 mm

≈0.031 to 0.18 m2

12/24/36 PiecesDrying in Round Bottom Flasks/Filters

Product Shelves

Ice Condenser

Advanced Applications

More Advanced/Critical Applications

(such as pharmaceutical & microbiology)

Fastfrontloadingchamberavoidssamplemelting-compatiblewithAlpha1/2-4LSCplus& Beta1/2-8LSCplus 58Lchamberwithmassiveshelfareaupto0.61m2 HeatedshelveswithWirelessShelfTechnology(fasterdryingtime&nocableconnections) OnetemperatureorLyoRxsensorpershelf 1to8usableshelfoptions(withMPTorDeep-WellPlates)-totalshelfarea0.08to0.61m2

Base unit + 5 heated shelves + 12 ports

Base unit + manifold for 8 ports

Base unit + 2 drying chambers

Base unit + stoppering device & 4 heated

shelves

Base unit + manifold for 20 ports

Base unit + stoppering device & 5 heated

shelves

Base unit + 5 heated shelves

Base unit + 10 heated shelves & 12 ports

Alpha 1-4 LSCplus

LyoCube 4-8 LSCplus

Beta 2-8 LSCplus

Gamma 1-16 LSCplus

Delta 2-24 LSCplus

Many more chamber configurations available

Upto65%savingindryingtimeviauniqueWireless ShelfTechnology(nocables) ConfigurationoptioncompatiblewithallAlpha,Beta, Gamma&DeltaLSCplusunits Temperatureofeachshelfisindividuallycontrolled(±1ᵒKelvin)

Alpha 1-14 LSCplus with Lyocube 4-8 LSCplus (5 heated shelves)

Unique Wireless Heated Shelving

5 heated shelves (more options available)

Chart illustrating the drying time of pure water saved using heated shelves v’s unheated shelves






Capacity

Performance

Temp

Chamber Volume

4 to 10 kg

3 to 10 kg/hour

-55° to -85°C

40 to 50 L

0.1081 to 0.98 m2

-70° to +60°C

±1°C

Shelf Area

Shelf Temperature

Shelf Temperature Accuracy

Ice Condenser

Pilot Applications

Production Applications

From routine drying operations to process optimisation tasks to drying solid or liquid products to meeting stringent pharmaceutical demands

Single or Double Chamber Systems for Bulk or Vial Drying

Icecondensercapacitiesfrom20to>1,000kg Freezing&dryinginthedryingchamber SIP/H2O2disinfection,CIP,IQ/OQ,etc Processintegration(loadingsystems,peripheralequipment) GAMP5&CFR21PartIIcompliant Wecandesigncustom-buildsystemstomeetyourneeds-plusinstall &providetrainingforyourstaff Extensivepharmaceuticalreferencesites Uniquewirelessproducttemperatureprobes

Powerful Benchtop Models with Small Footprint

Modularvacuumpumps&coldtrapstailoredforyourspecificapplication Contaminationfree(hermeticallysealedmagneticdrivetechnology) Reproducibleresults(integratedvacuumcontrol&pressuregauge) Ultraquietconcentrator(fromalow40dBA) Adjustablerotorspeeds Temperaturerange+30°to+80° SampleTypes-Aqueous/Solvent&HCL Containervolume0.2to500mL

Vacuum Gauge DescriptionsVacuum Gauge DescriptionsRotational Vacuum Concentrators (RVC)

Epsilon 1-4 LSCplus

2-18 CDplus

2-33 CDplus(with infrared heating)

Epsilon 2-6 LSCplus


Maintenance & Repair Services

John Morris Vacuum provides an array of capabilities for the preventative maintenance & repair of every brand we sell.

All of our service engineers are tertiary qualified (electrical, mechanical, refrigeration) and attend regular manufacturer conducted factory training programmes to maintain their technical expertise.

Service Agreements Breakdown Service Training & Technical Support ExtendedWarranties

Loan Equipment Trade-In Services Testing&Commissioning Calibration&Verification

NATAcertifiedreferencegases State-of-the-artCO2analysers NISTtraceableMKSmassflowmeters

Gassourcesolenoidactuators (200-15,000ppm) MKS2474-channelMFCcontroller

Areas of Expertise

Mass Flow Controller, Gas Flow & Vacuum Gauge Calibration

Our state-of-the-art MKS calibration bench is appointed with multiple NIST traceable standards providing accuracy to 0.02% of reading with a calibration range from 0.0005 to 1000 Torr.

We are able to calibrate most sensor technologies including Baratron, Capacitive, Piezo & Pirani.

Vacuum Pump Servicing

John Morris Vacuum services all types of vacuum pumps (turbomolecular, rotary vane, diaphragm, screw, roots, etc) for all brands

We offer advanced service facilities nationwide - providing fast local support to ensure your

equipment is running at optimum performance

Our specialised facilities are the only ones of their kind in

the southern hemisphere

Our environmentally controlled facilities include:


Installation & Customisation

Our trained engineers can install your equipment plus offer training to your staff at your premises.

For larger projects requiring purpose-built installation or modifications to existing infrastructure, our team can work with you to co-ordinate external contractors to strict deadlines & specifications in delivering customised instrumentation & solutions to meet your needs.

Our customised solutions include vacuum systems, Thin Film Deposition systems, freeze drying systems, complete laboratory vacuum fit-out (including pumps, tubing, fittings, chillers, taps, instrumentation & integration with other contractors).

John Morris was chosen to install a custom-designed Kurt J Lesker CMS-18 Magnetron Sputtering system at The Robinson Research

Institute - used for fabricating magnetic sensors/devices

John Morris collaborated with other contractors to deliver a complete fit-out of their Chemistry Buildings (Levels 4 & 5).

Over a 3 month installation period we partnered with various staff & external contractors in designing & installing 69 vacuum pumps, 47 fume cupboards, 22 benches, 254 vacuum valves, 750m of vacuum tubing, 700 elbows, 200 Tee pieces.

We are proud the project achieved ‘Perfect Delivery’.

The project accomplished ‘Perfect Delivery’ which is measured on the following criteria:

1. Achieve handover by date of PC 2. Zero Defects 3. O&M Manuals and User Training within 1 week of PC 4. Key Client Values

a. Team Collaboration b. Defect Free due to restricted access post PC c. Deliver project on time ready for semester classes Look forward to working together again soon.

ISIS Chemistry Team

Testimonial

“


More Than Just The ‘Box’

As you face increasing pressures (budget, time & results), the success of our offering is based on more than just supplying you with the‘box’ or its price.

We add value by: Fully supporting our entire product range throughout its operational life Supplying products across all industries from premier global manufacturers Providing you with accurate & in-depth product information & solutions

All too often we hear horror stories where customers have acquired items from other sources & have been: Abandoned on service request Had goods lost in transit or blocked by customs Squandered money on the wrong solution due to incorrect recommendations Wasted precious team resources attempting to install or utilise assets without qualified & available local support

At John Morris we focus on satisfying your end-to-end needs … today & over the longer term.

We offer more than just the ‘box’ – we offer the full package

The service received from John Morris Scientific has been second to none. Immediate responses to enquiries, easy trial of products and professionalism have all made our choice to deal with them a pleasure. We couldn’t have been happier with the standard of service we received and look forward to continuing the relationship in the future.

University of Melbourne

Testimonial

“

We supply an extensive range of instrumentation across a wide selection of industries from premium global manufacturers

We provide Service Agreements & repair facilities on all products we sell plus installation & customisation

We consult in designing tailored solutions to satisfy your individual requirements to complex problems

With a proud heritage spanning over 50 years, we stand behind each & every product we sell

Sales

Service

Support

Solutions



Over 50 Years of Personal Service

AustraliaAddress 61-63 Victoria Avenue Chatswood NSW 2067 AustraliaFree Call 1800 251 799Enquiries +61 (0) 2 9496 4200 Email [email protected] www.johnmorrisgroup.com

John Morris Vacuum is a division of John Morris Scientific

At John Morris Vacuum we offer more than just the product - we provide the full package -

sales and servicing of instrumentation plus design tailored solutions to meet your needs.

Whilst John M

orris Vacuum has taken every care to ensure the accuracy of inform

ation contained within this Guide, no responsibility for errors or om

issions is accepted. All tradem

arks, servicemarks, tradenam

es, company nam

es or logos of third parties are and remain the property of such parties.


SupportSalesSolutions Service

New ZealandAddress 78 Wellesley Street Auckland NZ 1010Toll Free 0800 651 700Enquiries +64 (0) 9 366 3999 Email [email protected] www.johnmorrisgroup.com

Documents

Vacuum Division Catalogue