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Subha Chakraborty Department of Electronics and Electrical Communication Engineering (E&ECE) June 27, 2022

Summary of masters work

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Page 1: Summary of masters work

Subha Chakraborty

Department of Electronics and Electrical Communication Engineering (E&ECE)

April 18, 2023April 18, 2023

Page 2: Summary of masters work

Low thickness materials are deposited on top of

April 18, 2023April 18, 2023

Page 3: Summary of masters work

Low and high frequency (RF) switches: Resistive and Capacitive

Tunneling accelerometers

Chemical and Bio sensors

April 18, 2023April 18, 2023

Logic operation

Page 4: Summary of masters work

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Page 5: Summary of masters work

April 18, 2023April 18, 2023

y0

Lbh

insulating base

anchorconducting cantilever beam

W

actuation pad

V Governing equation of motion

txF

t

y

t

yζω

x

y

EI e ),(2

2

2

04

4

External force, for example electrostatic actuation

Spring force

Damping force

Acceleration

Page 6: Summary of masters work

April 18, 2023April 18, 2023

txF

t

y

t

yζω

x

y

EI e ),(2

2

2

04

4

For frequency analysis reduce it to homogenous form

022

2

04

4

t

y

t

yζω

x

y

EI

Use the method of separation of variables )()(),( tTxXtxy

Apply boundary conditions

0;00;0),0(,

3

3

,2

2

,0

tLtLt x

y

x

y

x

yty

Eigen Value Equation

01coshcos

4/124/12

L

EI

ωAρL

EI

ωAρ nn

Page 7: Summary of masters work

April 18, 2023April 18, 2023

Eigen Value Equation

01coshcos

4/124/12

L

EI

ωAρL

EI

ωAρ nn

E

L

hknn

2

2

14

12

Page 8: Summary of masters work

April 18, 2023April 18, 2023

E

L

hknn

2

2

14

12

Page 9: Summary of masters work

April 18, 2023April 18, 2023

E

L

hknn

2

2

14

12

Length of beam in micrometer

Theoretical undamped natural frequency

Theoretical damping ratio for squeezed film damping

Theoretical resonant frequency under forced oscillation

Measured resonant frequency in LDV

100 275.4 KHZ 0.177 266.63 KHZ 265.3 KHZ

130 163.1 KHZ 0.203 156.23 KHZ 163.1 KHZ

160 107.5 KHZ 0.223 102.01 KHZ 93.75 KHZ

190 76.4 KHZ 0.244 71.71 KHZ 78.75 KHZ

220 56.9 KHZ 0.258 52.98 KHZ 45.0 KHZ

250 44.1 KHZ 0.281 40.47 KHZ 38.75 KHZ

280 35.2 KHZ 0.297 31.94 KHZ 32.5 KHZ

310 28.6 KHZ 0.313 25.65 KHZ 27.25 KHZ

340 23.8 KHZ 0.328 21.08 KHZ 21.79 KHZ

370 20.1 KHZ 0.342 17.59 KHZ 19.15 KHZ

400 17.2 KHZ 0.356 14.86 KHZ 16.33 KHZ

410 16.5 KHZ 0.359 14.22 KHZ 15.89 KHZ

420 15.7 KHZ 0.364 13.46 KHZ 14.65 KHZ

430 14.9 KHZ 0.369 12.71 KHZ 14.11 KHZ

440 14.3 KHZ 0.372 12.16 KHZ 13.65 KHZ

450 13.7 KHZ 0.379 11.57 KHZ 13.26 KHZ

Quality factor

)1(2

12ζζ

Q

ω

ω

Δ0

Page 10: Summary of masters work

April 18, 2023April 18, 2023

Quality factor

)1(2

12ζζ

Q

ω

ω

Δ0

Different damping mechanisms affect the response of the cantilever

• Thermo-elastic Damping (QTED ~ 105 – 107)

• Attachment loss (Qattch ~ 103 - 105)

• Squeezed film Damping (Qsqueeze) ~ 1 – 102

Most dominant source of damping is squeezed film damping

squeezeTEDsqueezeattch QQQQQ

11111

Page 11: Summary of masters work

April 18, 2023April 18, 2023

txF

t

y

t

yζω

x

y

EI e ),(2

2

2

04

4

Euler Bernoulli equation under applied force Fe

For electrostatic actuation2

20

0 )()(2

),( tVyy

bεtxF se

Under steady state

20

20

4

4

)(2 yy

bVε

dx

ydEI

Integrating this fourth order differential equation twice using the boundary conditions

')'()]'([2

12

0

20

2

2

dxxxxyy

bVε

dx

ydEI

L

x

;0;0)0(0

x

yy

Boundary conditions

0;03

3

2

2

LLx

y

x

y

Page 12: Summary of masters work

April 18, 2023April 18, 2023

Integrating this fourth order differential equation twice using the boundary conditions

')'()]'([2

12

0

20

2

2

dxxxxyy

bVε

dx

ydEI

L

x

When the beam end deflection exceeds nearly one third of the initial gap between the beam and the actuation electrode, the equilibrium between electrostatic and spring force becomes unstable and the beam collapses on the bottom electrode. This phenomenon is called PULL-IN.

Once the beam pulls in contact stiction forces, namely Van der Waal force and Casimir force come into action and the beam stays stuck to the bottom electrode . This phenomenon is called STICTION.

Due to stiction, the beam cannot release from the bottom electrode come back to its initial position at the same voltage at which it the beam pulled in. Therefore HYSTERISIS takes place.

Page 13: Summary of masters work

April 18, 2023April 18, 2023

The stiction forces strongly depend on the roughness of the contact surface between the beam and the bottom electrode. As the roughness increases, the stiction effects reduce, and hence chances that the beam may release are more.

Pull-in Pull-out characteristics have been experimentally observed for a fabricated cantilever of length 400 μm, width 10 μm, thickness 2 μm. It shows pull-in voltage 5.4 V (design value 4.85 V) and pull-out voltage 0.8 V.

Page 14: Summary of masters work

April 18, 2023April 18, 2023

Vd

0

Vin Vout

0

0

0

Vo

n

Von

0

Vo

n

When input is ‘0’, ‘p_beam’ is turned on while ‘n_beam’ remains off, pulling output to high level.

When input is ‘1’, ‘n_beam’ is turned on while ‘p_beam’ turns off, pooling output to low level.

The working principle is similar to CMOS inverter circuit.

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Static transfer characteristics of the inverter

Dynamic test results

Page 17: Summary of masters work

For more details: [email protected]