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NanoMaterials Integration Laboratory Nanopatterned ZnCdTe Solar Cells David Zubia April 4, 2013 Energy Efficient Electronics Science For Internal E3S Use Only. These Slides May Contain Prepublication Data and/or Confidential Information.

Nanopatterned ZnCdTe Solar Cells · 2017. 9. 5. · NanoMaterials Integration Laboratory . Nanopatterned ZnCdTe Solar Cells . David Zubia . April 4, 2013 . Energy Efficient Electronics

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NanoMaterials Integration Laboratory

Nanopatterned ZnCdTe Solar Cells

David Zubia

April 4, 2013

Energy Efficient Electronics Science

For Internal E3S Use Only. These Slides May Contain Prepublication Data and/or Confidential Information.

NanoMaterials Integration Laboratory

El Paso Del Norte Safest city in US for 3rd straight year

For Internal E3S Use Only. These Slides May Contain Prepublication Data and/or Confidential Information.

NanoMaterials Integration Laboratory

UTEP Doctoral Enrollment Growth 17 doctoral programs

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Stu

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Total Yearly Doctoral Enrollment

Teaching, Learning and Culture (36)

Computer Engineering (16)

Computational Science (16)

Chemistry (22)

Computer Sciences (24)

Interdisciplinary Health Sciences (32)

Eng. Rhetoric and Composition (22)

International Business (25)

Civil Engineering (11)

History (34)

Biological Sciences (49)

Education Leadership & Admin. (53)

Environmental Science & Engineering (41)

Psychology (35)

Materials Science and Engineering (20)

Electrical and Computer Engineering (12)

Geological Sciences (12)

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NanoMaterials Integration Laboratory

Growth in Research Expenditures

7.8 9.6 10.4

12.9 12.9 13.8 13.7 17.3

14.8

28 29.6 31.1 32.9

36.4 36.9

45.7 46.4

50.6

56.5

66.0

69.5

0

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50

60

70

80

in M

illio

ns

For Internal E3S Use Only. These Slides May Contain Prepublication Data and/or Confidential Information.

NanoMaterials Integration Laboratory

Electrical Engineering Enrollment UTEP: 22,000 students Engineering: 3,000 students

330

377 411

440 416 408 408

440

389 393 409 370

75

93

92

82 94 97 94

84

80 92

81

55 19

27

29 32

22 26 24 24

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F'01 F'02 F'03 F'04 F'05 F'06 F'07 F'08 F'09 F'10 F'11 F'12

UTEP ECE Enrollment

Undergraduate Masters PhD

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NanoMaterials Integration Laboratory

UTEP Enrollment: Student Race/Ethnicity Trends

0.0%

10.0%

20.0%

30.0%

40.0%

50.0%

60.0%

70.0%

80.0%

% HISPANIC

% WHITE

% BLACK

For Internal E3S Use Only. These Slides May Contain Prepublication Data and/or Confidential Information.

NanoMaterials Integration Laboratory

2012 Recognition by Washington Monthly

For Internal E3S Use Only. These Slides May Contain Prepublication Data and/or Confidential Information.

NanoMaterials Integration Laboratory

Faculty in the Area David Zubia (electrical engineering)

Memristors Patterned solar cells Nanoscale crystal growth

Eric MacDonald (electrical engineering) Rad-Hard CMOS design

Jose Mireles (electrical engineering, UACJ-CICTA)

MEMS devices and packaging

John McClure (materials science) Solar cells ZnCdTe layers using CSS

Stella Quinones (electrical engineering)

CdTe single crystal growth using CSS Electrode-less plating

Joseph Pierluissi (electrical engineering) Memristors Electromagnetics

New Hire (fall 2013)

For Internal E3S Use Only. These Slides May Contain Prepublication Data and/or Confidential Information.

NanoMaterials Integration Laboratory

Facilities

Science and Engineering Neighborhood

Campus Transformation

For Internal E3S Use Only. These Slides May Contain Prepublication Data and/or Confidential Information.

NanoMaterials Integration Laboratory

NanoFabrication Facility ~$5.0M investment

6,000 SF total, 2,500 SF clean

Class-100 & Class-1000

23 Major pieces of equipment

Teaching

Research

BS, MS, Ph. D. For Internal E3S Use Only. These Slides May Contain Prepublication Data and/or Confidential Information.

NanoMaterials Integration Laboratory

Research Lines Total Funding ~$5.3M

SnO2-based Memristors CdTe-based Solar Cells NSF, DOE, NINE

SiO2

~100 nmZnxCd(1-x)Te

Cadmium sulfide substrate

CdTe

Memristor Array Solar Cell Array

For Internal E3S Use Only. These Slides May Contain Prepublication Data and/or Confidential Information.

NanoMaterials Integration Laboratory

Patterned Solar Cells

V. G. Karpov, et. al., Phys. Rev. B 69 (2004) 045325

Sample "b5" - CuTe-doped Graphite Contacts

-30

-20

-10

0

10

20

30

40

50

60

-1.5 -1 -0.5 0 0.5 1 1.5

Voltage (V)

Cur

rent

Den

sity

(mA

/cm

2)

Cross-sectional view

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NanoMaterials Integration Laboratory

Graded Bandgap Nanoarrays

Pseudomorphic growth of graded ZnxCd(1-x) in nanoscale windows of ~100nm

SiO2

~100 nmZnxCd(1-x)Te

Cadmium sulfide substrate

CdTe

CdSBandgap 2.50eVL.P. 0.582nm

ZnTeBandgap 2.39eVL.P. 0.582nm

CdTeBandgap 1.44eVL.P. 0.648nm

c

Combined 3D strain relief (grid) and bandgap variation (color).

For Internal E3S Use Only. These Slides May Contain Prepublication Data and/or Confidential Information.

NanoMaterials Integration Laboratory

Graded Bandgap Solar Cells

Electric fields act on electrons and holes

Increase collection efficiency

Absorption over wider spectrum Improved lattice matching at CdS/ZnTe interface compared to CdS/CdTe.

Decreases mismatch: 10% to 3% Pseudo-morphic growth possible

Reduces SRH recombination Increases Voc

CdS/ZnTe Band-offset enhances electron-hole charge separation

Increases fill-factor

Excellent ZnTe Ohmic contact Reduce series resistance

Zero Valence-band offset between CdTe and ZnTe

Holes pass freely from CdTe to ZnTe

p-CdTe

p-ZnxCd1-xTe

p-ZnxCd1-xTe n-CdS

2.4 eV

1.5 eV 2.3 eV

Ef EC

EV metal

For Internal E3S Use Only. These Slides May Contain Prepublication Data and/or Confidential Information.

NanoMaterials Integration Laboratory

Experimental/Computational Collaboration

For Internal E3S Use Only. These Slides May Contain Prepublication Data and/or Confidential Information.

NanoMaterials Integration Laboratory

16

BOP-based MD

• Emerges to be a new,

powerful method to

study thin film growth

• Captures the crystalline

growth of

stoichiometric films

(Cd/Te = 1) under non-

stoichiometric, random

vapor fluxes

• Reveals misfit

dislocation formation

J. J. Chavez, D. K. Ward, B. M. Wong, F. P. Doty, J. L. Cruz-Campa, G. N. Nielson, V. P. Gupta, D. Zubia,

J. McClure, and X. W. Zhou, Defect formation dynamics during CdTe overlayer growth, Unpublished

Crystal Growth Simulation Xiaowang Zhou, Sandia National Labs

For Internal E3S Use Only. These Slides May Contain Prepublication Data and/or Confidential Information.

NanoMaterials Integration Laboratory

17

• BOP allows system

energy as a function of

dislocation spacing to be

derived

• Minimization of system

energy with respect to

dislocation spacing

leads to an equilibrium

spacing around 3.8 nm,

matching remarkably

well with experiments

J. J. Chavez, D. K. Ward, B. M. Wong, F. P. Doty, J. L. Cruz-Campa, G. N. Nielson, V. P. Gupta, D. Zubia,

J. McClure, and X. W. Zhou, Defect formation dynamics during CdTe overlayer growth, Unpublished

Validation of Crystal Growth Simulation Xiaowang Zhou, Sandia National Labs

For Internal E3S Use Only. These Slides May Contain Prepublication Data and/or Confidential Information.

NanoMaterials Integration Laboratory

CdTe/CdS(0001) growth is simulated Predicted defects are validated by experiments

18 Exp. from Y. Yan, R. G. Dhere, K. M. Jones, and M. M. Al-Jassim, J. Appl. Phys. 89, 5844

(2001).

Simulation from Xiaowang Zhou, Sandia National Labs

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NanoMaterials Integration Laboratory

Selective-Area Crystal Growth

Tilted 60o

Prior to

Deposition

Tsub = 350oC

Tso = 530oC

Tsub = 450oC

Tso = 530oC

P = 4-5 Torr

t = 15 min

Stella Quinones, UTEP For Internal E3S Use Only. These Slides May Contain Prepublication Data and/or Confidential Information.

NanoMaterials Integration Laboratory

SEM of 2 µm vs. 300 nm patterning

2 𝝁m

b) 300 nm feature

20 𝝁m

a) 2 𝝁m feature

5 𝝁m 500 nm

400 nm 1 𝝁m

d) 300 nm feature c) 2 𝝁m feature

f) 300 nm feature e) 2 𝝁m feature

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NanoMaterials Integration Laboratory

Diminishing the window size reduces the number of grains grown per window

21

Cross-section SEM View 1 𝝁m window size 130 nm window size

1 𝝁m 1 𝝁m Single crystal CdS

SiO2

SiO2

CdTe CdTe

Single crystal CdS

Multiple CdTe grains

Single CdTe seed?

21

Using a precision cutting tool ( Focused Ion beam or FIB)

and a SEM, we were able to see the difference in growth

using different window sizes of the nanopattern. Smaller

sizes are preferred For Internal E3S Use Only. These Slides May Contain Prepublication Data and/or Confidential Information.

NanoMaterials Integration Laboratory

EBSD indicates single domain in windows

Not patterned

22

50 µm

50 µm

2 µm

50 µm

50 µm

2 µm

(a) (b)

(c)

(e) (f)

(d)

2 µm pattern

300 nm pattern

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NanoMaterials Integration Laboratory

Nanoprobing of Patterned Solar Cells

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NanoMaterials Integration Laboratory

Topology images and electric current maps can be obtained using conductive scanning AFM in contact mode

Area A

Area B

Area C

AFM Current Map

SiO2

CdTe

CdTe SiO2

AFM Voltage amplitude

image SEM Image AFM deflection

image

Shaved

Unshaved 24

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NanoMaterials Integration Laboratory

IV data using conductive scanning AFM

IV on CdTe island IV on SiO2

- Zoom-in option in AFM system can be used to analyze individual CdTe islands. - Bright color denotes an area with high electric current (center image)

CdTe

SiO2

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NanoMaterials Integration Laboratory

TEM and FFT Analysis of CdTe/CdS Interface

d-spacing Theory

h k l CdTe (Å) CdS (Å) mismatch %

0 1 0 3.97 3.58 9.82

0 1 1 3.51 3.16 9.97

0 1 2 2.72 2.46 9.56

0 0 2 3.74 3.37 9.89

d-spacing Sample (near junction)

h k l CdTe (Å) CdS (Å) mismatch %

0 1 0 3.45 3.03 12.17

0 1 1 3.03 2.7 10.89

0 1 2 2.27 2.04 10.13

0 0 2 3.13 2.78 11.18

0

2

4

6

8

10

12

14

0 1 2 3 4 5

Mis

mat

ch (

%)

Orientation

CdS/CdTe d-spacing mismatch (sample)

Theory

Near junction

010 011 012 002 9.81% Average

TEM image (real space) FFT (reciprocal space)

CdS

CdTe

CdS

CdTe

11.9% Average

TEM Image

Artificial atoms

Image calibration

Area of Interest for FFT

010

011

012 002

000

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NanoMaterials Integration Laboratory

FFT Analysis of Simulated CdTe/CdS Growth

d-spacing Theory

h k l CdTe (Å) CdS (Å) mismatch %

0 1 0 3.97 3.58 9.82

0 1 1 3.51 3.16 9.97

0 1 2 2.72 2.46 9.56

0 0 2 3.74 3.37 9.89

d-spacing simulated junction (20nm-thick)

h k l CdTe (Å) CdS (Å) mismatch %

0 1 0 1.34 1.2 10.45

0 1 1 1.14 1.07 6.14

0 1 2 0.9 0.82 8.89

0 0 2 1.26 1.14 9.52

0

2

4

6

8

10

12

0 1 2 3 4 5

Mis

mat

ch (

%)

Orientation

CdS/CdTe d-spacing mismatch (simulation)

Theory

Simulation

010

011

012 002

9.81% Average

CdS

CdTe

211.32 Å

TEM image (real space) FFT (reciprocal space)

Note: CdS substrate is fixed

8.75% Average

010

011

012 002

000

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NanoMaterials Integration Laboratory

Unique Ternary Depositor

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NanoMaterials Integration Laboratory

Deposition of ZnCdTe ternary

-Same parameters used

for both samples.

Differences during

depostion:

-CML2 deposition had

less source temp

variation

-Faster cooldown rate

Peaks shifted due to low

grazing angle used on

machine

d-value 3.64

Ternary composition

ZnTe source temp:

675

CdTe source temp:

560

Substrate temp:

400

Ternary composition

found and very clear

specifically in CML1

sample

d-value 2.25

Ternary composition

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NanoMaterials Integration Laboratory

Acknowledgements Jose Cruz-Campa, Sandia National Labs Xiaowang Zhou, Sandia National Labs Doug Pete, Center for Integrated Nanotechnologies John McClure, UTEP Stella Quinones, UTEP Brandon Aguirre, UTEP Jose Chavez, UTEP Damian Marrufo, UTEP Abraham Alvarez, UTEP Francisco Alvarado, UTEP

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NanoMaterials Integration Laboratory

NanoMIL Collaborators Universities

National Labs

Funding

Companies

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NanoMaterials Integration Laboratory

Thank you!

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