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STUDY OF A HIGH POWER HOLLOW CATHODE WITH STABLE AND LONG LIFETIME Young Wook Choi Korea Electrotechnology Research Institute, Changwon 641-600, Korea A hollow cathode which has extremely stable discharge characteristics has been developed. This is composed of the two separated lanthanum hexaboride (LaB6) in the tube as the electron emitter. The way of design is very useful for stable discharge of hollow cathode. The hollow cathode is capable of producing 30 kW of power continuously with long lifetime. Because the generated plasma beam with the high temperature (5000 - 10000 °C) from the hollow cathode passes through the center of the intermediate electrode, the center part of the intermediate electrode is designed with the high temperature material of tungsten and the suitable structure of the water cooling. The combinations of the hollow cathode and the intermediate electrode are practically useful for the ion plating plasma source. 1-4244-0914-4/07/$25.00 ©2007 IEEE.

[IEEE 2007 IEEE Pulsed Power Plasma Science Conference - Albuquerque, NM, USA (2007.06.17-2007.04.22)] 2007 IEEE Pulsed Power Plasma Science Conference - Study of a High Power Hollow

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STUDY OFA HIGH POWER HOLLOW CATHODEWITH STABLE AND LONG LIFETIME

Young Wook ChoiKorea Electrotechnology Research Institute,

Changwon 641-600, Korea

A hollow cathode which has extremely stable dischargecharacteristics has been developed. This is composed of thetwo separated lanthanum hexaboride (LaB6) in the tube as theelectron emitter. The way of design is very useful for stabledischarge of hollow cathode. The hollow cathode is capableof producing 30 kW ofpower continuously with long lifetime.Because the generated plasma beam with the hightemperature (5000 - 10000 °C) from the hollow cathodepasses through the center of the intermediate electrode, thecenter part of the intermediate electrode is designed with thehigh temperature material of tungsten and the suitablestructure of the water cooling. The combinations of thehollow cathode and the intermediate electrode are practicallyuseful for the ion plating plasma source.

1-4244-0914-4/07/$25.00 ©2007 IEEE.