NATIONAL INSTITUTE OF TECHNOLOGY, KURUKSHETRATIIEORY EXAMINATION

Question paper

Month and Year of Examination: MaylJwe2}l2

Programme: B.Tech. (IEM)

Subject: Non-Conventional Manufacturing Processes

Course No.IEM-310

Semester: VI

Max. Marks: 50

Time allowed: 3 Hrs.

No. of pages used: 02

No. of Questions to be attempted: 05

Total No. of Questions: 07

The Candidates, before starting to write the solutions, should please check the Question paper for any

discrepancy and also ensure that they have been delivered the question paper of right course no. and subject

title.

Notes: Attempt any Five questions. The answers must be supported by drawing appropriate diagrams/sketches.

Use graph paper for plotting the curves/charts.

Discuss the need for'non-conventional manufacturing techniques'giving suitable examples. What is

the 'unconventional' part of the unconventional machining methods? S(s)

Describe the distinguished capabilities and applications of Electron Beam Machining process. Illustrate

its versatility in application giving suitable diagram. How pulse control is obtained in EBM? (5)

Deive the condition of 'Ma,ximum Porver Delivery' in the RC circuit used in an EDM machine by

explaining the time-voltage graph. Define the limiting value of critical resistance as well as the MRR at

Ql a)

b)

Q2a)

b)

Q3.

Q4 a)

b)

Qs a)

b)

Q6 a)

Explain in detail M.C. Shaw's computational model for USM while stating its vital assumptions. For

which parameters the predictions of this model deviate from actual results? (10)

Discuss the concept of generation of laser beam in a gas medium. Explain the working of a COz-Nz

optimum voltage from the derived relation.

Why taper is generated during machining a hole with EDM? How this could be reduced?

based gas laser machining set up while giving the energy diagram.

Briefly discuss why a four level laser is more enerry efficient than a three level laser.

principle, construction and working of an IBM set up giving aneat,labelled diagram.

State the industrial applications and the technical capabilities of IBM.

Describe the following parametric relationships in EBM by plotting graphs and including their

explanation:

a) Beam current/density vs. Cathode temperature and Acc. Voltage

b) No of pulses needed vs. Acc. Voltage

c) No. of pulses vs. Pulse duration

(6)

(4)

(4+ 4)

(2)

Differentiate between the EBM and IBM for their mechanism of material removal. Describe the basic

(2+6)

(2\

(8)

b)

'dlsiffia of&qt*lq.ag& . .i .,

Discuss'optical ppmg' phanomenon alorrg m@ffies.

: ril

QI

Q7: ,

:..

forAJll, A.&[ applications (materhlg ryerctior.rs) ' . : :.,.-

ffiffifrffi"accor&gto.ED!#esenafietr.1.." i

frof€g*manf,rfuo of:

. ::

,.:::::&- - .]:"::.\1.

-,. i" I

::..:: .'' :i,"i t:::rt ::lariS'.:t ,l: ii: :i'r

lr

: ..-l

,i:

a:

I

-.i'I

I

,i

I

I

I

!,i

J:i

.J

I

.,1