A New X-Ray CD-Metrology for Nanostructure BPM Patterns · 2011. 1. 28. · 2) Year (Product Available :Mobile) 0.1 MR Head Thin Film Media PRML Channel etc. GMR Head MEPRML Channel

Worldwide Best X-ray Partner

Leading with InnovationLeading with InnovationDiskcon-US 2010 Hyatt Regency Santa Clara

A New X-Ray CD-Metrology for Nanostructure BPM Patterns

Asao NakanoVP, X-ray Research Lab.

September 10, 2010Contributors:Dr.Kazuhiko OmoteDr.Yoshiyasu Ito



HQ, Fab :

Subsidary :

Distrubuter :

USAsales :

BeijingShanghai

RC

SSIRAC

RIT

REHQ Berlin

TokyoYamanashiOsaka

NSIRITE

Rigaku Who?

X-rayDiffractometer

ProtainCrystallography

General PurposeXRF

XRFDisc Analyzer

MetalContamination

µXRR/µXRFInline Monitor

SmartLab XtaLABmini Supermini

3650

Worldwide Largest X-ray Scientific Instrument Company

TXRFV300 MFM65



Agenda

1.Market Outlook and Background

2.Why X-ray diffraction method for inspection?

3.Grazing Incidence X-ray diffraction

4.Example of Grating measurement

5.Example of DTR measurement

6.Simulation of BPM measurement

7.Summery



Market Outlook:HDD shipment is projected a healthy increase by the PC & external storage demands

350

300

250

200

150

100

50

2009 2010 2011 2012 201420130

PB s

hipp

ed (K

)

500

400

300

200

100

2009 2010 2011 2012 201420130

PB s

hipp

ed (K

)

Desktop-HDD

PC-SSD

Mobile-HDD

Mobile applicationswill overtake Desktop

Enterprise-HDD

PersonalStorage HDD

ConsumerElectronics HDD

Cloud and External storagein the home will coexist

YearSource: IDC2010,2009

Year



2008 2009 2010 20122011 2013 20141

10

100

1000

16.384(40nm)

32.768(32nm)

65.536 (27nm)

131.072(22nm)

Den

sity

(Gb)

Source: Forward Insights

Data Flash Density Trend

Year60nm

50nm

40nm

Next NAND Flash Technology

Multi-Chip TSVThickness:20µmDie Stacked:32

(Samsung)

8 layers PrototypeNAND FlashMemory Stack



10,000

1000

100

10

1

1990 1995 2000 2005 2010 2015

Are

al D

ensi

ty(G

b/in

2 )

Year (Product Available :Mobile)

0.1

MR HeadThin Film Media

PRML Channel etc.

GMR HeadMEPRML Channel

etc.

AFC LMRTMR Head

PMRTFCetc.

CPP GMR

Advanced PMRDTRBPRTAR

60%CGR90%CGR

25%CGR50%CGR

20-40%CGR

Technology and Historical Areal Density Trend

Source:Diskcon-Japan 2010 (HGST)



New Technology for Higher Density RecordingMagnetic Head Media・Thermally Assisted Recording(TAR)

・Microwave Assisted Magnetic Recording (MAMR)

・Shingled Magnetic Recording(SMR)

・Discrete Track Media (DTM)

・Bit Patterned Media (BPM)

Combination of TAR and BPM is expected to the high density recording of >10Tb/in2

Source: Diskcon-Japan 2010 (Hitachi)



Low cost patterned media production by duplication

DTM & BPM production

TemplateX10,000? ProductsMaster X10,000?

・Nano structures of the Master and Template should be observed precisely, because finally 100,000,000 of products are duplicated from the Master.

・The duplication process from the template to the products is assumed tochecked at least once by the inspection tool.



The Metrology for the DTM & BPM inspection

Why X-ray diffraction method for inspection?The possibility to measure < 10nm without standard Non-destructive/non-contact precise inspectionResist pattern measurement is possible without damage

Weak point?



GI configuration of X-ray Diffraction Measurement



X-ray Diffraction Intensity Evaluation-1



X-ray Diffraction Intensity Evaluation-2



Parameters determinable by X-ray Diffraction Measurement



Simulation of X-ray Diffraction Intensity Distributions-1



Simulation of X-ray Diffraction Intensity Distributions-2



Actual Tool for X-ray Profile Metrology-1



Actual Tool for X-ray Profile Metrology-2

PerformanceLess than 64nm Half PitchLess than 150nm heightMeasurement area 2-3mm(X) by 1mm(Y)Precision <1nm (3 sigma) Measuring time 100 sec/point

ApplicationLine and Space profile measurement of resist , Si or 6025 Quartz



Measurement of Standard SiO2 Grating for CD-SEM



Least Square Fitting of the Grating Profile Parameters-1









X-ray intensity simulation for metal covered structure

Metal: Ti



Application for DTM Profile Measurement



X-ray Diffraction Measurement of DTR Resist PatternSample was provided by Hitachi



Measured DTM Profiles by X-ray Profilometry

The tool uncertainty(3σ) is simulated as <0.2nm, beyond ITRS2019



10 11

X-ray Diffraction Measurement of BPM Pattern

Sample rotation are neededaround the reciprocal axis

Average spacing Fluctuation of the spacing



Simulation of X-ray Diffraction Intensity Distributions from BPM shapes

LB=20nmLT=16nmH =40nm

LB=20nmLT=20nmH =40nm

0 0.2 0.4 0.6 0.8 10

0.1

0.2

0.3

0.4

0.5

0.6

QZ

/ nm

-1

QY / nm-1 0 0.2 0.4 0.6 0.8 1

0

0.1

0.2

0.3

0.4

0.5

0.6

QY / nm-1

QZ

/ nm

-1

LB

LT

H

LB

LT

H

X-ray profilometry can measure the parameters like DTR pattern profiles



Summary

1. Non-Destructive X-ray profile measurement method is available for BPM.2. The X-ray Profilometry tool exhibit the ability of CDmeasurement with 0.2 nm(3σ) accuracy. This is beyondITRS 2019. 3. X-ray Profilometry dose not needs standard becauseX-ray wave length is determined in the 8 digits.4. Resist pattern is measured without damage comparingto electron beam measurement method (SEM).5. Measurement time is currently 100seconds for 1 point.



Thank You !

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Documents

A New X-Ray CD-Metrology for Nanostructure BPM Patterns · 2011. 1. 28. · 2) Year (Product Available :Mobile) 0.1 MR Head Thin Film Media PRML Channel etc. GMR Head MEPRML Channel