1 Eliazar Ortiz [email protected] 1 CXI Final Instrument Design Review – DCO June 3, 2009 Diagnostics & Common Optics LUSI WBS 1.5 Yiping Feng –

1 Eliazar [email protected]

1CXI Final Instrument Design Review – DCOJune 3, 2009

Diagnostics & Common Optics

LUSI WBS 1.5

Yiping Feng – DCO Lead ScientistEliazar Ortiz – DCO Lead Engineer

DCO Engineering Staff

June 03, 2009



Acknowledgment

DCO Engineering StaffTim Montagne

Profile/wavefront monitor

Intensity monitor

Intensity-position monitor

Harmonic rejection mirror

Marc CampellAttenuator

X-ray focusing lens

Richard JacksonSlits system

Pulse picker



Outline

DistributionDiagnostics Status

Profile Monitor Profile-Intensity MonitorIntensity-Position Monitor

Common Optics StatusSlitsAttenuator & Pulse PickerX-Ray Focusing Lens

Cost & ScheduleSummary



Components Distribution

Components locationsDistributed throughout the XPP, CXI, and XCS instruments, including X-ray transport tunnel

SXR

CXIEndstation

Near Experimental Hall

Far Experimental Hall

X-ray Transport

Tunnel

XCSEndstation

XPPEndstation

AMO

MEE

LCLS X-ray FEL



Components DistributionDiagnostics/Optics XPP CXI XCS Total

Total Location Total Location Total Location

Profile Monitor 31 in Hutch 2

2 in Hutch 3 (combined with Intensity monitor)

32 in Hutch 5


64 in XRT (combined with

Intensity monitor)


12

Wavefront Monitor - - 1 Hutch 5 - - 1

Intensity Monitor 2 Hutch 3 (combined with Profile monitor) 1 Hutch 5 (combined with Profile

monitor) 64 in XRT (combined with

profile monitor)

2 in Hutch 4 (combined with Profile monitor)

9

Intensity-Position Monitor 31 in Hutch 2

2 in Hutch 3 2 Hutch 5 64 in XRT

2 in Hutch 4 11

X-Ray Focusing Lenses 1 Hutch 3 2 Hutch 5 1 XRT 4

Slit System 31 double slit system in Hutch 3

1 single slit system in Hutch 3

1 single slit system in Hutch 24 Hutch 5 7

2 double slit systems in XRT

2 single slit systems in XRT

3 single slit systems in Hutch 4

14

Attenuators-Filters 1 Hutch 3 1 XRT 1 Hutch 4 3

Pulse Picker 1 Hutch 3 1 XRT 1 Hutch 4 3

Harmonic Rejection Mirrors 1 Hutch 3 - - 1 Hutch 4 2

Total 15 15 29 59



DCO Distribution on CXI

CXI Instrument*

Slits

Intensity-positionIntensity/

profileIntensity-position

SlitsSlits

wavefront

Intensity-positionProfile/

Intensity

Slits

*There are 15 diagnostics/common optics components in CXI

Not shown are attenuator, pulse picker situated in X-ray transport



Profile & Intensity Monitor Status

PM and IM collocated in same chamber when applicable

FDR completed April 2009

Commonality for all MonitorsChamber

6 DOF Alignment Stands

Stages

Same design for wavefront monitor

w/o intensity monitor

Attenuation needed

Diagnostics Status

YAG:Ce screen

Diode Assy.

45º mirror

Brazed chamber

6 DOF Stand

Motorized zoom lens

Optical CCD Camera

Diode Electronics(Charge sensitive amplification)

Quartz window

Hollow shaft for cable routing

100 mm travel linear stage with smart motor

LCLS Beam



Diagnostics Status

Profile & Intensity Monitor Next StepsPlace orders for vendor items- Started April 09

Place order for fabricated components – June 09

Test First Articles- July 09

Update Models and Drawings based on First Article tests- August 09

Order production chamber assembliesDetail Design PM and PIM–Aug 09



Diagnostics Status

100 mm travel linear stages with smart motor

6 DOF StandBrazed chamber

LCLS Beam

Intensity-Position MonitorFDR completed April 2009

Commonality for all MonitorsChamber


Stages

4-channelDiode Electronics(Charge sensitive amplification)

Be target changer

4-Diode Assy.(inclined in y for uniform response)

Roller Stages

Smart Motor for X-axis motion* Be targets


*IPM needs calibration in both x & y directions



Diagnostics Status

Intensity-Position Monitor Next StepsPlace orders for vendor items- Started April 09

Place order for fabricated components – June 09

Test First Articles- July 09

Update Models and Drawings based on First Article tests- August 09

Order production chamber assembliesDetail Design PM and PIM–Aug 09



Common Optics

Rigid Stand w/oDOF

Slits System UHV compatible

Low-z & high-z blades

Single/Double configurations

Double blades configuration(4 sets of blades)

Blade Form Factor

Single blades configuration(2 sets of blades)

Blades/blade mounts

Optical encoder

High-ZLow-Z

High-Z

Pink beam

Mono beam



Common Optics Status

Slits StatusPurchase ItemVendor Evaluation in ProcessConfirmed compatibility with controlsAdded to APP in JanuaryPerformance data from vendor March 09Coupling for double assembly configuration will be done at SLAC.Coupler has been identified

One has been ordered and received




Slits Next StepsSecure additional funding- June 09

Award Contract June 09

Order Supports – June 09

Detail Assembly Drawings –June 09




Attenuator-Pulse Picker StatusCombined attenuator and pulse picker

Commercial pulse-picker packaged into same chamber

Final Design Review Completed

Chamber shared with Attenuator

Test ProgramBlade coating

PP performance with coated blade

Shared Design6 DOF Alignment Stands

Stage

Motorized actuatorsfor attenuator filters

6 DOF Stand

Optical CCDCamera

LCLS Beam

View port


50 mm travel linear stage with smart motor

6” Rotating flanges

Lens

Si filters

Pulse-picker




Attenuator-Pulse PickerNext StepsFinalize Blade coating test –June 09

Order Supports Design – Feb 09

Place orders for vendor items- June 09Linear stage

Motors

Actuators

Place Order for fabricated Items- June 09Chamber

Stage support bracket

Mirror & Filter holders

Shaft Weldment



6 DOF Stand

LCLS Beam

Z-axis translation stage (±200mm)XPP only

Chamber similar to monitors

Actuator design similar to IPM

Lens Holder

Accommodates 3 different lens configurations

Quick lens stack removal

Common Optics StatusX-Ray Focusing Lenses Status

Commonality with MonitorsChamber


Stages

Final Design Review- June 09



Common Optics StatusX-Ray Focusing Lenses Next Steps

Order lens holder parts for validation test- May 09

Issue award for lenses- July 09

Order other vendor Items- July 09Linear Stages

Motors

Be lenses



Cost

Engineering

Proc/Fab/Assy/Instl

Engineering $2,441,078

Proc/Fab/Assy/Instl $4,375,143

64%

36%



Cost & Schedule Performance – WBS 1.5



Project Critical Path

DCO has one design effort and multiple procurements to support the Instrument requirements.

The project is monitoring strings of activities with the least float

Items on the critical path are: XFLS Procurement Preps (14 day float, start May 2010)

HRM Procurement Preps (19 day float, start Oct 2010)

Activities to monitor from falling on the critical path:Check and Approve Dwgs PP (24 day float, start May 09)

PP procurement preps XPP (24 day float, start June 09)



Major Milestones

Activity Diff.Description Current Dates Accel. Dates (days) COMP: DCO Design Ready for XPP FIDR 02/17/09A 02/17/09A COMP: DCO Design Ready for CXI FIDR 02/27/09A 02/27/09A COMP: DCO Design Ready for XCS FIDR 7/6/09 7/6/09 0 COMP: Diagnostics & Common Optics XPP ES RFI 5/24/10 4/23/10 31 COMP: Diagnostics & Common Optics CXI ES RFI 9/13/10 8/19/10 25 COMP: Diagnostics & Common Optics CD-4 RFI 10/19/11 2/24/11 237

Early Finish



Procurement ScheduleDiff.

Activity ID Activity Description Early Start Activity Description Early Start (days)

9110522 Procurement - Pop-in Profile Monitor DI 01940 AWARD: PO - XPP PM Parts 7/8/2009 AWARD: PO - XPP PM Parts 9/10/09 -64DI 10640 AWARD: PO - CXI PM Parts 1/18/2010 AWARD: PO - CXI/XCS PM Parts 11/2/09 77DI 13320 AWARD: PO - XCS PM Parts 10/25/2010 11/2/09 3579110566 Procurement - Wavefront Monitor DI 13460 AWARD: PO - CXI Wavefront Monitor Parts 10/23/2009 AWARD: PO - CXI Wavefront Monitor Parts 10/1/09 229110526 Procurement - Pop-In Intensity Monitor DI 02600 AWARD: PO - XPP IO Mon 1st Article Parts 6/30/2009 AWARD: PO - XPP IO Mon 1st Article Parts 7/31/09 -31DI 10960 AWARD: PO - CXI IO Mon Parts 1/18/2010 AWARD: PO - CXI/XCS IO Mon Parts 11/2/09 77DI 13640 AWARD: PO - XCS IO Mon Parts 10/25/2010 11/2/09 3579110530 Procurement - Intensity-Position Monitor DI 03340 AWARD: PO - XPP IPM 1st Article Parts 6/29/2009 AWARD: PO - XPP IPM 1st Article Parts 7/31/09 -32DI 11280 AWARD: PO - CXI IPM Parts 1/18/2010 AWARD: PO - CXI/XCS IPM Parts 11/2/09 77DI 13960 AWARD: PO - XCS IPM Parts 10/4/2010 11/2/09 3369110534 Procurement - X-ray Focusing Lenses DI 09560 AWARD: PO - XPP XFL Long Lead Parts 8/17/2009 AWARD: PO - XPP XFL Long Lead Parts 8/19/09 -2DI 09640 AWARD: PO - XPP XFL Parts 10/4/2010 AWARD: PO - XPP XFL Other Parts 11/9/09 329DI 14200 AWARD: PO - XCS XFL Long Lead Parts 10/4/2010 AWARD: PO - XCS XFL Long Lead Parts 1/22/10 255DI 14280 AWARD: PO - XCS XFL Parts 11/15/2010 AWARD: PO - XCS XFL Other Parts 1/6/10 3139110538 Procurement - Primary Slits DI 41040 AWARD: PO - XPP Slits Long Lead Parts 5/18/2009 AWARD: PO - XPP/CXI/XCS Slits Long Lead Parts 5/18/2009 0DI 41075 AWARD: PO - XPP Slits Other Parts 9/14/2009 AWARD: PO - XPP/CXI/XCS Slits Other Parts 10/14/09 -30DI 41210 AWARD: PO - CXI Slits Long Lead Parts 1/18/2010 5/18/2009 245DI 41290 AWARD: PO - CXI Slits Other Parts 1/18/2010 10/14/09 96DI 42120 AWARD: PO - XCS Slits Other Parts 11/15/2010 10/14/09 397DI 42110 AWARD: PO - XCS Slits Long Lead Parts 1/5/2011 5/18/2009 597

9110546 Procurement - Attenuators / FiltersDI 12580 AWARD: PO - CXI Attenuator Parts 1/18/2010 AWARD: PO - XPP Attenuator Parts 9/8/09 132DI 10025 AWARD: PO - XPP Attenuator Parts 10/4/2010 AWARD: PO - CXI/XCS Attenuator Parts 11/2/09 336DI 14600 AWARD: PO - XCS Attenuator Parts 11/15/2010 11/2/09 3789110552 Procurement - Pulse Picker DI 12820 AWARD: PO - XPP Pulse Picker - Long Lead Parts 8/24/2009 AWARD: PO - XPP Pulse Picker - Long Lead Parts 9/29/09 -36DI 12900 AWARD: PO - XPP Pulse Picker - All Other Part 10/5/2009 AWARD: PO - XPP Pulse Picker - Other Parts 10/6/09 -1DI 13000 AWARD: PO - XPP Pulse Picker Parts w/Coating 11/16/2009 AWARD: PO - XPP Pulse Picker Parts w/Coating 11/10/09 6DI 14105 AWARD: PO - CXI Pulse Picker - Long Lead Parts 1/18/2010 AWARD: PO - CXI/XCS Pulse Picker - LL Parts 12/3/09 46DI 16025 AWARD: PO - CXI Pulse Picker - All Other Part 2/10/2010 AWARD: PO - CXI/XCS Pulse Picker Other Part 1/28/10 13DI 16065 AWARD: PO - CXI Pulse Picker Parts w/Coating 4/7/2010 AWARD: PO - CXI/XCS Pulse Picker Parts w/Coating 2/25/10 41DI 16005 AWARD: PO - XCS Pulse Picker - Long Lead Parts 10/4/2010 12/3/09 305DI 16045 AWARD: PO - XCS Pulse Picker - All Other Part 10/4/2010 1/28/10 249DI 16085 AWARD: PO - XCS Pulse Picker Parts w/Coating 10/4/2010 2/25/10 2219110562 Procurement - Harmonic Rejection Mirrors DI 10445 AWARD: PO - XPP HRM Long Lead Parts 11/15/2010 AWARD: PO - XPP HRM Long Lead Parts 9/17/09 424DI 14840 AWARD: PO - XCS HRM Long Lead Parts 11/15/2010 AWARD: PO - XPP HRM Other Parts 4/6/10 223DI 10465 AWARD: PO - XPP HRM Parts 1/12/2011 AWARD: PO - XCS HRM Long Lead Parts 11/2/09 436DI 14920 AWARD: PO - XCS HRM Parts 1/12/2011 AWARD: PO - XCS HRM Other Parts 4/6/10 281

Current Schedule Accelerated Schedule



Summary

Scope of DCO components for XPP, CXI, and XCS instruments has not changed significantly since CD-02The design of key diagnostics devices and optical components is mature and based on proven developments

at synchrotron sources worldwideby XTOD and LCLS e-beam groups

No major risks associated with the design or procurement of the DCO components

Bought components (slits) are “off the shelf” items Assembly components (CCD cameras, zoom lens, actuators, connectors) are commercially made with known performanceIn-house electronics design are based on proven technology and implementations

DCO overall cost and schedule performance is kept within margins.Critical Path is defined and monitoredAdvanced Procurements identifiedDCO is on track to support accelerated schedule!



Backup



Overview

DCO will provide to all LUSI instrumentsCommon diagnostics for measuring FEL properties

Transverse beam profile

Incident beam intensity

Beam positions and pointing

Wavefield measurement at focus

Common Optical components for performing FEL manipulationsBeam size definition and clean-up

Attenuation

Pulse pattern selection and/or repetition rate reduction

Isolation of fundamental from high order harmonics

Focusing

Monochromatization*

*Engineering of mono is now managed by the XCS team




DCO CD-2 Scope

DCO suites

Diagnostics suite

Pop-in Profile/Wavefront Monitor

Pop-in Intensity Monitor

Intensity-Position Monitor

Common Optics suite

Offset Monochromator (XCS only)*

X-ray Focusing Lenses (XPP & XCS only)

Slits System

Attenuators

Pulse Picker

Harmonic Rejection Mirrors (XPP & XCS only)



Global Physics Requirements

Physics requirements remained same as CD-2 and were based on characteristics of LCLS FEL

Ultra short pulses ~ 100 fs, and rep. rate of 120 Hz

Pulse energy 2 mJ, peak power ~ 20 GW, ave. power ~ .24 W

Fully coherent in transverse directions ~ expected to be predominantly TEM00

*

Exhibiting intrinsic intensity, temporal, spatial, timing fluctuations on per-pulse basis†, i.e.,

•Higher order Laguerre-Gaussian modes possible but negligible†FEL amplification process based on SASE from noise

LCLS Expected Fluctuations

Pulse intensity fluctuations~ 30 %(in contrast to synchrotron where fluctuation is Poisson limited)

Position & pointing jitter (x, y, , )

~ 10 % of beam diameter~ 10 % of beam divergence

Source point jitter (z)~ 5 m (leads to variations in apparent source size, or focal point location if focused)



Challenges Addressed

Scientific/technical challenges that were addressed

Sustaining the instantaneous LCLS X-ray FEL peak power Exercising careful material selection

Filters, scattering target, slits materials, focusing lens, beam stop etc.

Based on thermal calculations including melting threshold and onset of thermal fatigue & limited experimental data from FLASH

But no active cooling necessary

Providing coherent beam manipulationMinimizing wavefront distortion/coherence degradation

Filters, scattering target, slits, focusing lens

Reducing surface roughness and bulk non-uniformities

Minimizing diffraction effects i.e., utilizing cylindrical blades for slits



Challenges Addressed

Scientific/technical challenges that were addressedDetecting ultra-fast signals

Extracting electrical signals in ~ ns to minimize dark current contribution

i.e., charge-sensitive detection using diodes

Making per-pulse measurement if requiredEach pulse is different

Averaging over pulses may NOT be an option, requiring sufficiently high S/N ratio for each pulse

i.e., high-precision intensity measurements at < 0.1% based on single pulses, requiring larger raw signal than synchrotron cases



Pop-in Profile Monitor (WBS 1.5.2.1)

RequirementsDestructive; RetractableVariable FOV and resolution

At 50 m resolution, 12x12 mm2 FOVAt 4 m resolution, 1x1 mm2 FOV

Capable of per-pulse op. @ 120 Hz if requiredAttenuation used if necessary

YAG:Cescreen

45ºmirror

PurposesAid in alignment of X-ray optics

FEL is serial operation, automation enables maximum productivity

Characterization of X-ray beam spatial profile

FEL spatial mode structureEffects of optics on fully coherent FEL beam

Characterization of X-ray beam transverse spatial jitter

FEL beam exhibits intrinsic spatial fluctuations

ImplementationX-ray scintillation

50-75 m thin YAG:Ce single crystal scintillator

Optical imagingCapable ofdiffraction limited resolution if requiredNormal incidence geometry w/ 45º mirrorMotorized zoom lens120 Hz optical CCD camera



Pop-in Intensity Monitor (WBS 1.5.2.2)

RequirementsDestructive; RetractableRelative accuracy < 1%Working dynamic range 100Large sensor area 20x20 mm2

Per-pulse op. @ 120 HzAttenuation used if necessary

Sidiode

PurposesAid in alignment of X-ray optics

FEL is serial operation, automation enables maximum productivity

Simple point detector for physics measurements

In cases where 2D X-ray detector is not suitable

ImplementationDirect X-ray detection using Si diodes

Advantageous in cases of working w/ spontaneous or mono beams

Capable of high quantum efficiency (> 90% at 8.3 keV)

100 – 500 m depletion thickness

Using charge sensitive amplificationApplicable to pulsed FEL

Commercially available

Large working area (catch-all) easily available simplifying alignment procedure



Be thin foil

Array Si diodes

Intensity-Position Monitor (WBS 1.5.2.3)

RequirementsIn-situ, retractable if necessaryHighly transmissive (> 95%)Relative accuracy < 0.1%Working dynamic range 1000;Position accuracy in xy < 10 m;Per-pulse op. at 120 Hz;

PurposesAllow precise measurement of the intensity for normalization

Critical to experiments where signal from underlying physics is very small

Characterization of FEL fluctuationsPositional jitter ~ 10% of beam size Pointing jitter ~ 10% of beam divergenceSlitting beam down creates diffraction which may cause undesirable effects

ImplementationBased on back scattering from thin-foil

Detecting both Compton scattering & Thomson scattering Using Low-z (beryllium) for low attenuation especially at low X-ray energies

Using Si diode detectorsArray sensors for position measurementPointing measurement using 2 or more monitors



Wavefront Monitor (WBS 1.5.2.1)[in lieu of wavefront sensor]

Purposes

Wavefront characterization of focused X-ray beam at focal point

Wavefront measurement at focal point is not feasible by conventional methods due to damages

Providing supplemental scattering data in low Q w/ high resolution

Resolution obtained using X-ray direct detection is limited by detector technology, i.e., pixel sizes and per-pixel dynamic range

ImplementationX-ray scintillation

50-75 m thin YAG:Ce single crystal scintillator

Optical imagingCapable ofdiffraction limited resolution if required

Using computational algorithm for reconstruction of wavefield at focus

Iterative, post processing only if no large computer farm

RequirementsIn-situ; RetractableVariable FOV and resolution

At 50 m resolution,12x12 mm2 FOVAt 4 m resolution, 1x1 mm2 FOV

Per-pulse op. @ 120 HzAttenuation used if necessary

YAG:Cescreen

45ºmirror



X-ray Focusing Lenses (WBS 1.5.3.2)

PurposesIncrease the X-ray fluence at the sampleProduce small spot size in cases where slits do not work due to diffraction,

i.e., sample too far from slits

ImplementationBased on refractive lenses concept*

Concave shape due to X-ray refractive index 1-+i

Using Beryllium to minimize attenuationIn-line focus

Simpler than KB systems

no diff. orders as in Fresnel lens

ChromaticCon: re-positioning of focal point

Pro: Providing harmonic isolation if aperture used

Some attenuation at very low X-ray energies ~ 2 keV

RequirementsProduce variable spot size

For XPP instrument 2-10 m in focus40-60 m out-of-focus

Minimize wavefront distortion and coherence degradationWithstand FEL full flux *B. Lengeler, et al, J. Synchrotron Rad. (1999). 6, 1153-1167

Be Lensstack

Be lenses



RequirementsRepeatability in x&y < 2 m0 – 10 mm gap setting10-9 in transmission from 2-8.3keV10-8 in transmission at 25 keVMinimize diffraction/wavefront distortionWithstand FEL full flux

Slits System (WBS 1.5.3.3)

Purposesdefine beam transverse sizes

Pink and mono beam

Clean up scatterings (halo) around beam perimeter

ImplementationBased on cylindrical blades concept*

Minimize scattering from edges and external total reflections

Offset in Z to allow fully closing

Using single or double configurations for pink or mono beam applications

Single configurationBlade material: Si3N4 to stop low energies

Or blade material: Ta/W alloy to stop low fluence low or high energies

Double configuration1st blades: Si3N4, 2nd blades: Ta/W alloy to stop low and high energies

*D. Le Bolloc’h, et al, J. Synchrotron Rad. (2002). 9, 258-265

High-ZLow-Z

High-Z

Pink beam

Mono beamD=3 mm



Attenuator/Filters (WBS 1.5.3.4)

PurposesReduce incident X-ray flux

Sample damage

Detector saturation

Diagnostic saturation

Alignment of optics and diagnostics

ImplementationUsing Si wafers of various thicknesses

Highly polished to minimize wavefront distortion & coherence degradation

For a given attenuation, use one wafer whenever possible

Commercially available (< 1 nm rms roughness)

For energies < 6 keV in NEH-3 and in pink beam

Employing a pre-attenuator, i.e., LCLS XTOD gas/solid attenuators

Requirements108 attenuation at 8.3 keV104 attenuation at 24.9 keV3 steps per decade for > 6 keVMinimize wavefront distortion and coherence degradationWithstand unfocused flux



Pulse Picker (WBS 1.5.3.5)

*http://www.azsol.ch/

PurposesSelect a single pulse or any sequence of pulses

Reduce LCLS repetition rateImportant if longer sample recover time is needed

Damage experiments - sample needs to be translated

ImplementationBased on a commercial mechanical teeter-totter*

Steel blade fully stops beam

Capable of ms transient time

Simple to operateUse TTL pulses

Requires 100 m Si3N4 to protect the steel bladeRequirements

< 3 ms switching time

< 8 ms in close/open cycle time

Only for < 10 Hz operation

Withstand full LCLS flux



A

B

C

Harmonic Rejection Mirrors (WBS 1.5.3.6)

PurposesProvide isolation of FEL fundamental from high harmonics

LUSI detectors not designed to be energy resolved

ImplementationLow pass filter using X-ray mirrors at grazing incidence

Using highly polished Si single crystal substrates

3.5 mrad incidence angle

300 mm long

No pre-figure, no bender

Figure-error specs defined to ensure FEL natural divergence not effected

R ~ 150 km

Roughness specs to minimize wavefront distortion and coherence degradation

rms ~ 0.1 nm

RequirementsEnergy range: 6-8.265 keV

104 contrast ratio between fundamental and the 3rd harmonic

80% overall throughput for fundamental

Minimize wavefront distortion

Withstand full FEL flux



DCO Integration into Instruments

XPP Instrument*

*There are 15 diagnostics/common optics components in XPP

Pulse picker/Attenuator

Be-focusing lens

Slits

Intensity/profile

Intensity-position

Intensity/profile

Intensity-position

Slits

Harmonicrejection




DCO Scope

Work Breakdown StructureScope/CD-2 Includes:

Physics support & engineering integration (WBS. 1.5.1)

Diagnostics (WBS 1.5.2)

Pop-in Profile/Wavefront Monitor (WBS 1.5.2.1)

Pop-in Intensity Monitor (WBS 1.5.2.2)

Intensity-Position Monitor (WBS 1.5.2.3)

Common Optics (WBS 1.5.3)

Offset Monochromator (WBS 1.5.3.1)*

X-ray Focusing Lenses (WBS 1.5.3.2)

Slits System (WBS 1.5.3.3)

Attenuators (WBS 1.5.3.4)

Pulse Picker (WBS 1.5.3.5)

Harmonic Rejection Mirrors (WBS 1.5.3.6)



Device/Component Counts

Total device/component counts

Diagnostics/Optics XPP CXI XCS Total

Pop-in Profiler/Wavefront Monitor (WBS 1.5.2.1)

3 2 6 11

1 1

Pop-in Intensity Monitor (WBS 1.5.2.2) 2 2 6 10

Intensity-Position Monitor (WBS 1.5.2.3) 3 2 6 11

Offset Monochromator* (WBS 1.5.3.1) 1 1

X-Ray Focusing Lenses (WBS 1.5.3.2) 1 2 1 4

Slits System (WBS 1.5.3.3) 3 4 7 14

Attenuators/Filters (WBS 1.5.3.4) 1 1 1 3

Pulse Picker (WBS 1.5.3.5) 1 1 1 3

Harmonic Rejection Mirrors (WBS 1.5.3.6) 1 1 2

Total 15 15 29 59




Progress Since CD-2

DCO progress

Diagnostics/OpticsCD-2

(Aug. 08)

CD-2 status(Apr. 09)

Pop-in Profiler/

Wavefront Monitor

PRD release FDR complete

PRD release FDR in May

Pop-in Intensity Monitor PRD release FDR complete

Intensity-Position Monitor PRD release FDR complete

Offset Monochromator* PRD in work APR on Apr. 23

X-Ray Focusing Lenses PRD release PDR complete

Slits System PRD release RFP sent

Attenuators/Filters PRD release FDR complete

Pulse Picker PRD release FDR complete

Harmonic Rejection Mirrors PRD release PDR in June


Documents

1 Eliazar Ortiz [email protected] 1 CXI Final Instrument Design Review – DCO June 3, 2009 Diagnostics & Common Optics LUSI WBS 1.5 Yiping Feng –