Developing Th in F ilms U sing a V acuum E vaporation S ystem and M easurements

DEVELOPING THIN FILMS USING A VACUUM EVAPORATION SYSTEM AND MEASUREMENTS

Student Team:Sedef ÇALIŞKANZeynep KORKMAZ

Supervisors:Prof. Dr. Ziya Burhanettin GÜVENÇProf. Dr. Celal Zaim ÇİLYrd. Doç. Dr. Göknur CAMBAZ BÜKE

MEMD Group – memd.cankaya.edu.tr

Outline• Aim of the project• PVD System• Methodology to be followed

MEMD Group – memd.cankaya.edu.tr

AimTo study the electrical and optical properties of thin films produced by using physical vapor deposition (PVD) system.

MEMD Group – memd.cankaya.edu.tr

Thin Film Technology• Layer of material ranging from nanometer (monolayer) to

several micrometers in thickness. 

• Main applications: Electronic devices and optical coatings 

MEMD Group – memd.cankaya.edu.tr

1. Flexible Solar Cell 2. OLED 3. Transistor

1. http://gotpowered.com/2011/ge-develops-thin-film-photovoltaic-panels/2. http://pinktentacle.com/2007/05/flexible-full-color-organic-el-display/3. http://www.sciencecodex.com/silicon_spin_transistors_heat_up_and_spins_last_longer

Deposition Technologies• Chemical Reaction

• CVD• Electrodepositon• Epitaxy• Thermal oxidation

• Physical Reaction• PVD

• Evaporating• Sputtering

• Casting

Substrate

MEMD Group – memd.cankaya.edu.tr

Deposition source

Why PVD?• PVD processes are environmentally friendly• Cost effective• Suitable for electrical devices• Low process temperatures (with the help of pressure)• Lower process risk

MEMD Group – memd.cankaya.edu.tr

PVD Technology

• Sources are heated to their melting points

• Evaporated molecules freely move in the chamber

• Atoms condense on substrate

MEMD Group – memd.cankaya.edu.tr

MEMD Group – memd.cankaya.edu.tr

Thin film

Power Supply

Substrate Parameters

Process Parameters• Current• Time• Pressure

Material Selection• Substrate• Source

Our PVD System from VAKSİS• High technology

company• Designing and

manufacturing • Vacuum system• Vacuum component• Vacuum coating

system

MEMD Group – memd.cankaya.edu.tr

Our PVD System from VAKSİS1 Torr = 1 mm Hg1 mm Hg = 133.3 Pa

MEMD Group – memd.cankaya.edu.tr

http://microlab.berkeley.edu/labmanual/chap6/vacuum.pdf

Characterization• Electrical • Optical• Structural - microstructure

MEMD Group – memd.cankaya.edu.tr

Summary of the MethodologyDetermination of the starting parameters of PVD

(P, T, t, substrate, target)

Deposition of the Thin Film by PVD

Electrical – Optical - Structural Characterization of these thin films

Studying the effect of process parametersOptimization

Simple Device Fabrication and tests

MEMD Group – memd.cankaya.edu.tr

Near Future Plan• Material Selection• Ordering PVD System (available in two months)• Studying electrical and optical characterization methods• Design of the characterization set-up

MEMD Group – memd.cankaya.edu.tr

Thank You for Listening

MEMD Group – memd.cankaya.edu.tr