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Measurements of RF properties of Novel Superconducting Materials
Jiquan Guo, Sami Tantawi, Charles
Yoneda, David Martin(SLAC)
Tsuyoshi Tajima(LANL)
Oct. 4, 2010
Sami Tantawi, Thinfilms for SRF
Outline
• Motivation• System description
– Overview– Cavity design
• Experiment results– Bulk Niobium– Thin film
• Summary
Sami Tantawi, Thinfilms for SRF
Motivation
• Test bed for SRF materials– Magnetic quenching field characterization
• Possibly higher than Nb’s 170-180mT• Different thin film or bulk sample
– Quick testing cycles with small samples – Able to explore higher Tc materials (MgB2)
– Surface resistance characterization
• Non-superconducting materials– RRR of Copper in different forms– Other materials
System overview
• Characterize surface impedance by measuring the Qs of a cavity
• Capable of low power(NWA) and high power(Klystron) measurements
• X-band compact design• Interchangeable flat cavity bottom, fits 2-3” diameter
samples• Cavity design maximizes H-field and minimizes E-field on
the sample surface• Can achieve ~360mT Hpeak with 50MW Klystron running
1.6µs flat pulses and Qe~320,000, Q0~320,000
Sami Tantawi, Thinfilms for SRF
Cavity Design
• High-Q hemispheric cavity under a TE013 like mode– Zero E-field on sample– Maximize H-field on the sample,
Hpeak on bottom is 2.5 times of peak on dome
– Maximize loss on the sample, 36% of cavity total
– No radial current on bottom
• Copper cavity body– No temperature transition or
quenching– Higher surface impedance– Coupling sensitive to iris radius
• Possible future Nb cavity body– More precise Rs characterization
Sami Tantawi, Thinfilms for SRF
High-Q cavity under TE013 like mode
Q0,4K=~224,000Q0,290K=~50,000(measured from bulk Cu samples)
Fres, design=~11.399GHzFres, 290K=~11.424GHzFres, 4K=~11.46GHz
Q0,4K=~342,000(Estimated for zero resistivity samples, using measured Cu sample results)
Sample R=0.95”
Tc~3.6µs(using Q value for copper at 4K)
Qe~310,000
H E
Sami Tantawi, Thinfilms for SRF
Cavity Assembly
Sami Tantawi, Thinfilms for SRF
System overviewMeasurement ports:Forward Power: 2 or 5Reflected power: 4 or 3Waveform measured by either a Peak Power Meter or a scope with mixersLow power NWA measurement: 6, 7, or 3
• Cryostat
• Waveguide to Klystron/NWA
1
2
3
4
Cavity
Klystron
10dB
45dB 45dB
5
6
55dB
7
Cryostat
Mode converter Bend
LoadSystem Diagram
AFGI
Q
TWT Klystron
Computer
Cavity
Load
LO
Scope
PPM
Temperature Monitor
Cavity heater power supply
Frequency Control
I/Q control
FWDRF
REFRF
T read/control
Load
Power trace
Amp and phase
LO
phase
Amplitude
Frequency tuning
Measurement Results: Bulk Nb, high power test
Sami Tantawi, Thinfilms for SRF
0
5000
1 104
1.5 104
2 104
2.5 104
0 2 4 6 8 10
Forward and reflected power traceS15-1, H~23mT
Reflected Forward
Pow
er (
W)
Time(s)
0
1 104
2 104
3 104
4 104
5 104
6 104
7 104
8 104
3 4 5 6 7 8 9 10
Reflected power tracesafter forward power turned off
at different power level
H~104mT, no quenchingH~153mT, quenched
Pow
er (W
)
Time(s)
Power traces of the high power test
Nb Measurements vs. Pulse Length and Repetition Rate
Sami Tantawi, Thinfilms for SRF
Sami Tantawi, Thinfilms for SRF
Gradual Quenching Theory
Measurement Results: Bulk Cu
Sami Tantawi, Thinfilms for SRF
5 104
1 105
1.5 105
2 105
2.5 105
0 50 100 150 200 250 300
SLAC Cu sampleLow power test result
Q0Q0
Temperature(K)
This reference Cu sample is used to estimate the surface impedance of the cavity body. It uses similar material as the body, and the same annealing process.
Measurement Results: Bulk Nb, low power test
Sami Tantawi, Thinfilms for SRF
FNAL bulk large grain Nb sampleSample surface impedance is estimated from the measured Q0 of the cavity with Nb sample and the measured copper surface impedance. Without magnetic shielding, the residual resistivity is high. After adding a magnetic shielding and 800˚C vacuum bake, surface impedance reduced by a factor of 3.
0
0.002
0.004
0.006
0.008
0.01
0.012
0.014
0 5 10 15 20 25 30
FNAL-Nb S15-1Estimated Rs
W/o shielding, before baking W/ shielding, before bakingW/ shielding, after baking
Rs
(Oh
m)
Temperature(K)
0
5 104
1 105
1.5 105
2 105
2.5 105
3 105
3.5 105
0 20 40 60 80 100
FNAL Nb S15-1measured Q
0
Before baking, w/o shieldingBefore baking, w/ shieldingAfter baking, w/ shielding
Q0
Temperature (K)
Measurement Results: Bulk Nb, high power test
Sami Tantawi, Thinfilms for SRF
FNAL bulk large grain Nb sampleThe residual resistivity is causing pulse heating and degrades the quenching field.Before magnetic shielding and baking, the sample start to quench at ~65mT with temperature rises ~5K.After shielding and baking, quenching starts at about 120mT when temperature rises ~3K.
1.1 105
1.2 105
1.3 105
1.4 105
1.5 105
1.6 105
1.7 105
1.8 105
0 20 40 60 80 100 120 140 160
FNAL Nb S15-1Q vs H, T=3K
w/ and w/o shielding/baking
Ql 04012010, no shielding, no bakingQl 09216010 with shielding, after baking
Qlo
ad
ed
Hpeak (mT)
Sami Tantawi, Thinfilms for SRF
Measurement results: 300nm MgB2 on Sapphire
0
5 104
1 105
1.5 105
2 105
2.5 105
3 105
3.5 105
4 105
0 5 10 15 20 25 30 35 40
300nm MgB2 thinfilm on SapphireQ vs T
H=10mT vs low power
Q0, H=10mTQ0, network analyzer
Q0
Temperature(K)
5 104
1 105
1.5 105
2 105
2.5 105
3 105
3.5 105
4 105
10 15 20 25 30
MgB2 thinfilm on SapphireQvsH
T=3K, 04082010
Q0Q0
Hpeak (mT)
300nm MgB2 thin film on Sapphire substrate, provided by LANL and deposited at STI.
Sami Tantawi, Thinfilms for SRF
Measurement results: MgB2/Al2O3/Nb
200nm MgB2/300nm Al2O3/Nb sample provided by LANL, Al2O3 coated at ANL, MgB2 coated at STI.
1 105
1.5 105
2 105
2.5 105
3 105
3.5 105
8 104
1 105
1.2 105
1.4 105
1.6 105
10 20 30 40 50 60 70
Q vs HMgB
2/Al
2O
3/Nb
T=3K, June 11, 2010
Q0
Qloaded
Q0
Qloa
ded
Hpeak (mT)
5 104
1 105
1.5 105
2 105
2.5 105
3 105
3.5 105
0 10 20 30 40 50
Q vs T for MgB2/Al
2O
3/Nb
Low power test(NWA) vs high power test(12mT)
Q0(NWA, 06112010)Q0(NWA, 06042010)Q0(H=12mT, 06102010)Q0(H=12mT, 06112010)
Q0
Temperature(K)
Sami Tantawi, Thinfilms for SRF
Summary
• Demonstrated a system which can precisely measure the quenching field of up to 300-400mT
• Magnetic shielding is crucial for Nb residual resistivity. At X-band, pulse heating from residual resistivity can easily degrade the quenching field.
• Precision of Rs measurement is currently at the level of 0.1mΩ. It can be improved with a separate Nb cavity.