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The top documents tagged [gate oxides]
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Fabrication of CMOS Integrated Circuits
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THIN FILM DEPOSITION – Chapter 9 Introduction Many films, made of many different materials are deposited during a standard CMOS process. Requirements or
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What is the limit of nanolaminate layer thickness in ALD? What is the limit of nanolaminate layer thickness in ALD? Oskari Elomaa, 20.4.2010
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pi-fp-man-2015
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Semiconductor Fabrication
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Department of Chemistry (Chemicum) research in society from basics to applications research-based education knowledge in service Welcome to the Department
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Simulations of sub-100nm strained Si MOSFETs with high- gate stacks Lianfeng Yang, Jeremy Watling *, Fikru Adamu-Lema, Asen Asenov and John Barker Device
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On Modeling the Lifetime Reliability of Homogeneous Manycore Systems Lin Huang and Qiang Xu CUhk REliable computing laboratory (CURE) The Chinese University
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Items for Discussion Chip reliability & testing Testing: who/where/what ??? GBTx radiation testing GBTx SEU testing Packaging – Low X0 options, lead free
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Ultrathin Gate Dielectrics on SiGe/SiGeC Heterolayers By Siddheswar Maikap
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On Modeling the Lifetime Reliability of Homogeneous Manycore Systems
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Thin Film Deposition Quality – composition, defect density, mechanical and electrical properties Uniformity – affect performance (mechanical, electrical)
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