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Page 1: Remote plasma source performance and its impact on film deposition rates and properties

Remote plasma source performance and its impact on film deposition rates and properties in a new, commercial ALD

systemMark J. Sowa, Mark J. Dalberth, Eric W. Deguns, Ritwik Bhatia, Ganesh Sundaram, Jill S. Becker

Cambridge NanoTech, Inc., Cambridge, MA, USA

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