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Paper presented at ALD 2009 conference: Affects of plasma-generated co-reactants on atomic layer deposition (growth rates, process temps, new materials, etc).
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Remote plasma source performance and its impact on film deposition rates and properties in a new, commercial ALD
systemMark J. Sowa, Mark J. Dalberth, Eric W. Deguns, Ritwik Bhatia, Ganesh Sundaram, Jill S. Becker
Cambridge NanoTech, Inc., Cambridge, MA, USA
