Microelectronic Engineering
Rochester Institute of Technology Dr. Lynn Fuller, page 1
SSI Process Backup using the SVG
Lilah Cook
MCEE 550 Fall 2013
Factory Improvement Project
Dr. Lynn Fuller
Revised: 4-8-14
Microelectronic Engineering
Rochester Institute of Technology Dr. Lynn Fuller, page 2
SSI & SVG Coat
SSI Coat Experiment
• 2 Wafers coated using Coat.rcp with Oir620 resist
• Coat.rcp breakdoawn– Acceleration: 15 krpm
– Oven 1 temp: 140 (60s)
– Oven 2 temp: 90 (60s)
– SpinSteps• 0 800 rpm (5s)
• 800 3400 rpm (5s)
• 3400 2000 rpm (25s)
– Automatic dispense
SVG Coat Experiment• 2 Wafers coated using SVG track
with Oir630 resist • Created program 6 on SVG track
1b to emulate the spin steps from the SSI
– Check oven 1 temp ~140 – Change oven 2 temp ~90
• Remove lid on cover for manual dispense
• Select program 1 on track 1a for the standard prime
• Select program 6 on track 1b• Start 1a then 1b• Manually dispense resist when
wafers reach spin coater
Microelectronic Engineering
Rochester Institute of Technology Dr. Lynn Fuller, page 3
Coat Comparison
SVGWafer 1: 10553 A Std 0.36% Wafer 2: 10578 A Std 1.00%
SSIWafer 1: 10354 A Std 0.92%Wafer 2: 10288 A Std 0.81%
Spectramap 49 Point Resist Measurements:
Microelectronic Engineering
Rochester Institute of Technology Dr. Lynn Fuller, page 4
Pattern and Develop
• Lightly scribed the back of the SVG wafers and placed all four wafers into the ASML for level 1 and JG n well patterning
• SSI Develop– Wafers went through the develop.rcp recipe with no problem
• SVG Develop– SVG track has NO post exposure bake oven so replication would
be impossible
– Created Program 6 on track 2 which doubles the standard 60 second develop found in the SSI track
• Needed to be broken up into two steps as max input in SVG in 99 seconds
– Wafers developed with 60 seconds develop ad a 15 second rinse• Waiting for approval to add program steps to manual
Microelectronic Engineering
Rochester Institute of Technology Dr. Lynn Fuller, page 5
Develop Comparison
Microelectronic Engineering
Rochester Institute of Technology Dr. Lynn Fuller, page 6
Conclusions
• The above optical images shows that the nwell pattern has fully been developed
• SVG tracks can be used to emulate the SSI track when patterning large features– Track 1a: Program 1 (standard Prime)
– Track 1b: Program 6 (SSI Coat replica)
– Track 2 : Program 6 (Oir620 Develop)
• Working with SMFL staff to add program descriptions and recipes to the SVG manual