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Towards scalable fabrication of high
efficiency polymer solar cells
Hui Joon Park2*, Myung-Gyu Kang1**, Se Hyun Ahn3, Moon Kyu Kang1,
and L. Jay Guo1,2,3
1Department of Electrical Engineering and Computer Science, 2Macromolecular Science and Engineering
3Mechanical Engineering
The University of Michigan, Ann Arbor, MI 48109
University of Michigan
Work supported in part by NSF, KACST, DOE EFRC
Issues to address for practical solar cells
Transparent electrode
• Conductivity; Flexibility
~3 mm
Power conversion efficiency
• Light absorption
• Low bandgap material
• Light trapping, plasmonics
• Charge separation and transport
• Optimize morphology
• Minimize recombination
Fabrication of OPVs
• Spin-coating
• Annealing (long time)
Organic Electronics 10 (2009) 761–768
All solution roll-to-roll processed polymer solar cells free from ITO
and vacuum coating steps Frederik C. Krebs
PCE of Roll-to-roll
processed device ~ <1%
Roll-to-roll processed polymer tandem solar cells partially
processed from water Solar Energy Materials & Solar Cells 97 (2012) 43–49
Product integration of compact roll-to-roll processed polymer solar cell
modules: methods and manufacture using flexographic printing, slot-die
coating and rotary screen printing
Krebs,et al. J. Mater. Chem., 2010, 20, 8994–9001
Nanoimprinted P3HT nanopillars
15 nm
Substrate
ITO
PEDOT : PSS
P3HT : PCBM
Modified PDMS
Substrate
ITO
PEDOT : PSS
P3HT : PCBM
LiF
Al
Substrate
ITO
PEDOT : PSS
P3HT : PCBM
Modified PDMS
Pressure
Substrate
ITO
PEDOT : PSS
P3HT : PCBM
Modified PDMS
Substrate
ITO
PEDOT : PSS
P3HT : PCBM
LiF
Al
Substrate
ITO
PEDOT : PSS
P3HT : PCBM
Modified PDMS
Pressure
ESSENCIAL Process to make OPV
Evaporation of Solvent through Surface ENCapsulation with Induced
ALignment (ESSENCIAL) of polymer chains by applied pressure
Adv. Mater. 22, E247 (2010)
Advantage 1—enable high P3HT crystallinity
Glass/ ITO /
PEDOT:PSS (~45 nm) /
P3HT:PCBM (~240 nm) /
LiF (~1 nm) /
Al (~80 nm)
UV absorbance
High crystallinity in short
processing time
P3HT crystallization:
ESSENCIAL (a few seconds)
≈ Solvent assisted annealing (~hours)
> Thermal annealing (tens of minutes)
More effective application of shear stress
to the polymer chain across the entire
depth during ESSENCIAL process
P3HT: Sulfur (S) PCBM: Carbon (C)
S → 1
C C-C
-C= (resonance)
C-S
→ 6
→ 2
→ 2
C C-C
-C= (resonance)
C-O
→ 4
→ 66
→ 1
C-O =
→ 1
O
Sulfur (S) Carbon (C) Binding Energy Shift of Carbon
C-C
-C= (resonance)
> C-S
C-O
> C-O =
O
The atomic sensitivity factor
n1
n2
I1 / S1
I2 / S2
I : Peak area
S : Atomic
sensitivity factor
=
XPS
Uniform vertical distribution
10/48 Advantage 2—uniform D/A vertical distribution
ESSENCIAL Device Results AM 1.5G (100mWcm-2)
Roll-to-roll application
Adv. Mater., 2010, 22, E247-E253.
IEEE J. Sel. Top. Quantum. Electron., 2010, 16, 1807
100 270 320 380 100 270 320 380
Bulk Heterojunction
D A
P
r
o
b
l
e
m
s
Thick film Forrest et al. Nature Mater. 2005. 4. 37.
Selected as BHJ (thermal) control device
Thick film:
Requires new structures/processing
Jsc (mA cm-2) Voc (V) FF (%) PCE (%)
BHJ (TA) 9.84 ± 0.44 0.59 ± 0.00 58.96 ± 1.20 3.43 ± 0.17
Jsc (mA cm-2) Voc (V) FF (%) PCE (%)
BHJ (TA) 9.84 ± 0.44 0.59 ± 0.00 58.96 ± 1.20 3.43 ± 0.17
Spin-Spin 5.57 ± 0.54 0.52 ± 0.02 47.87 ± 2.06 1.40 ± 0.17
Jsc (mA cm-2) Voc (V) FF (%) PCE (%)
BHJ (TA) 9.84 ± 0.44 0.59 ± 0.00 58.96 ± 1.20 3.43 ± 0.17
Spin-Spin 5.57 ± 0.54 0.52 ± 0.02 47.87 ± 2.06 1.40 ± 0.17
Spin-Spin (TA) 6.88 ± 0.87 0.58 ± 0.00 47.28 ± 3.62 1.88 ± 0.31
Jsc Voc (V) FF (%) PCE (%)
As-cast 5.85 ± 0.51 0.37 ± 0.02 48.00 ± 2 1.05 ± 0.20
Thermal 8.20 ± 0.30 0.60 ± 0.01 72.00 ± 2 3.50 ± 0.19
* Bilayer formation: Solvent → Methlylene Chloride
Thickness → P3HT (~350 nm), PCBM (~100 nm)
Jsc (mA cm-2) Voc (V) FF (%) PCE (%)
BHJ (TA) 9.84 ± 0.44 0.59 ± 0.00 58.96 ± 1.20 3.43 ± 0.17
Spin-Spin 5.57 ± 0.54 0.52 ± 0.02 47.87 ± 2.06 1.40 ± 0.17
Spin-Spin (TA) 6.88 ± 0.87 0.58 ± 0.00 47.28 ± 3.62 1.88 ± 0.31
Spin-ESS 12.41 ± 0.70 0.54 ± 0.03 60.98 ± 3.89 4.09 ± 0.30
Lee et al. Adv. Mater. 2011, 23, 766
Jsc (mA cm-2) Voc (V) FF (%) PCE (%)
BHJ (TA) 9.84 ± 0.44 0.59 ± 0.00 58.96 ± 1.20 3.43 ± 0.17
Spin-Spin 5.57 ± 0.54 0.52 ± 0.02 47.87 ± 2.06 1.40 ± 0.17
Spin-Spin (TA) 6.88 ± 0.87 0.58 ± 0.00 47.28 ± 3.62 1.88 ± 0.31
Spin-ESS 12.41 ± 0.70 0.54 ± 0.03 60.98 ± 3.89 4.09 ± 0.30
ESS-ESS 15.10 ± 0.44 0.51 ± 0.01 67.70 ± 5.00 5.12 ± 0.32
Jsc (mA cm-2) Voc (V) FF (%) PCE (%)
BHJ (TA) 9.84 ± 0.44 0.59 ± 0.00 58.96 ± 1.20 3.43 ± 0.17
Spin-Spin 5.57 ± 0.54 0.52 ± 0.02 47.87 ± 2.06 1.40 ± 0.17
Spin-Spin (TA) 6.88 ± 0.87 0.58 ± 0.00 47.28 ± 3.62 1.88 ± 0.31
Spin-ESS 12.41 ± 0.70 0.54 ± 0.03 60.98 ± 3.89 4.09 ± 0.30
ESS-ESS 15.10 ± 0.44 0.51 ± 0.01 67.70 ± 5.00 5.12 ± 0.32
* ESSENCIAL process
Evp. time: ~10 min
Similar PCE as BHJ
Jsc (mA cm-2) Voc (V) FF (%) PCE (%)
BHJ (TA) 9.84 ± 0.44 0.59 ± 0.00 58.96 ± 1.20 3.43 ± 0.17
Spin-Spin 5.57 ± 0.54 0.52 ± 0.02 47.87 ± 2.06 1.40 ± 0.17
Spin-Spin (TA) 6.88 ± 0.87 0.58 ± 0.00 47.28 ± 3.62 1.88 ± 0.31
Spin-ESS 12.41 ± 0.70 0.54 ± 0.03 60.98 ± 3.89 4.09 ± 0.30
ESS-ESS 15.10 ± 0.44 0.51 ± 0.01 67.70 ± 5.00 5.12 ± 0.32
Russell et al. Nano Lett. 2011, 11, 2071
PCBM diffuses into P3HT film through the P3HT amorphous
domains. Russell et al. Nano Lett. 2011, 11, 2071
CBM diffuses within the film without affecting the crystal size,
structure, or orientation of P3HT (diffusion occurs only through
the disordered regions of P3HT)
Heat
Kramer, Hawker & Chabincy et al. Adv. Energy. Mater. 2011, 1, 82
Amorphous P3HT PCBM
DSIMS From UCSB with Dr. Mates
Park et al. manuscript in preparation
High performance Bilayer-based Devices
Park et al. manuscript in preparation
Mobility (μh, 10-4 cm2/V*s)
BHJ (Thermal) 0.35
Spin-ESS 0.61
ESS-ESS 1.58
* BHJ (thermal) :
• Limitation on high crystalline donor polymer
• Isolated donor & acceptor nanodomains
* In this work (Spin-ESS & ESS-ESS) :
• Maximal crystallinity
• Bicontinuous nanodomainsbetter carrier transport
tdel = 40 μs
Improved Mobility
Absorbance
AFM
SEM Well organized nanodomain
Better domain organization: facilitate transport
Reduced recombination
& Reduce recombination
ESSENCIAL Spin-coating
Commercial materials
Develop novel R2R coating process
- Uniform thin film, crystallization, fast or no annealing
Manufacture polymer PV without vacuum process
Interface : how to deposit effective interfacial layer
- cannot be too thin if done by non-vacuum process
Need alternative/better transparent conductor
- flexibility, trade-off between conductivity/transparency
- new functionality
Looking ahead: R2R processed OPV
A roll-to-roll process to flexible polymer solar cells: model studies, manufacture and operational stability studies
Krebs, et al. J. Mater. Chem., 2009, 19, 5442
Device Jsc(mA/cm2) Voc(V) FF(%) PCE(%)
Conventional inverted cell (Evaporated Ag)
9.21 0.56 40.95 2.11
Film transferred 10.87 0.55 46.1 2.76
P3HT/PCBM Cells by Coating Methods
(no vacuum process)
0 4 8 12 16 20
0
20
40
60
80
100
Au
Al
Cu
A
ve
rag
e t
ran
sm
itta
nce (
%)
Sheet resistance (ohm/square)
40nm thick 60nm thick 80nm thick
Wire grid transparent conductors Transparency vs. Conductivity
Adv. Mater. 2007
TME (Cu )with 70 nm line-width ITO
Device structure
Glass or PET ITO or semitransparent Au
PEDOT:PSS (conductive)
P3HT:PCBM 1:0.8
Al (100nm)
Wire grid transparent electrodes for OPVs
<STME with 120nm line-width>
<Nanoimprint mold>
Adv. Mater. 2008, 20, 4408
Plasmon-enhanced OPV
Voltage (V)
0.0 0.2 0.4 0.6
Js
c (
mA
cm
-2)
-6
-4
-2
0
2
ITO device
AgW device
AgN device
35 % enhancement in efficiency as compared with
ITO control devices using unpolarized light
Adv. Mater. 2010, 22, 4378
Colored OPV & Energy-harvesting Color filters
ACS Nano, 2011
Continuous R2R/R2PNIL nano patterning
& ACS Nano, 2009
Roll-to-Roll NIL
Roll-to-Plate NIL
4” by 12”, 350 nm gratings on PET
4” by 10.5”, 350 nm gratings on glass
2/16
Epoxysilicone Pattern
Transferred Au
Adv Mater, 2008
Transparent Electrode by
Roller Phase-shift Lithography
Nanotechnology, 2012
Wire grid electrode by R2R litho
Nanotechnology, 2012
Thank you !
Continuous R2RNIL on 4” wide substrate
ACS Nano, 2009
Simple roll coater with variable coating and temperature control for printed polymer
solar cells
Henrik F. Dam, Frederik C. Krebs Solar Energy Materials & Solar Cells 97 (2012) 191–196
Summary for BHJ optimization
ESSENCIAL process
Bias (V)
0.1 1.0
J (
mA
cm
-2)
10-6
10-5
10-4
10-3
10-2
10-1
100
101
102
103
104
TA
SAA
ESSENCIAL
Further TA
Efficient charge transport
High crystallinity
Uniform distribution
Wavelength (nm)
600 700 800
Ph
oto
lum
inescen
ce (
A. U
.)
0.0
0.2
0.4
0.6
0.8
1.0
Efficient exciton diss.
Hole-only devices Electron-only devices Normal
MoO3
= 5.3 eV
CsCO3
= 2.9 eV
SCLC model
8
9
L3 εoεrμ
V2 J =
Method Electron mobility (μe, 10-4 cm2V-1s-1)
TA -
SAA 4.95
ESSENCIAL 3.61 x 10-3
Method Electron mobility (μe, 10-4 cm2V-1s-1)
Before Further TA
TA -
SAA 4.95 -
ESSENCIAL 3.61 x 10-3 14.6
Method Hole mobility (μe, 10-4 cm2V-1s-1)
TA 1.57
SAA 3.29
ESSENCIAL 11.5
Method Hole mobility (μe, 10-4 cm2V-1s-1)
Before Further TA
TA 1.57
SAA 3.29 2.20
ESSENCIAL 11.5 12.6
Method μe/ μh
TA -
SAA 1.50
ESSENCIAL 1.16
Advantage 3—high carrier mobilities
Solvent assisted annealing ESSENCIAL (Further TA) Thermal annealing
PL (P3HT:PCBM blend)
95.2% RR
90.7% RR
Not annealed
Annealed
Y. Kim et al. Nature Mater. 2006, 5, 197
50 nm 50 nm 50 nm
AFM phase image AFM phase image AFM phase image
Photoluminescence
12/48 Advantage 4—enable efficient exciton dissociation
High transparency by
adjusting the line-width
and period
High conductance by
adjusting the thickness
Less dependency of
transparency and
conductance
High flexibility
Wire grid electrode