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Work function recovery of air exposed MoO
x thin films
IrfanDepartment of Physics and Astronomy
University of Rochester, New York 14627
Alexander Turinske: University of Wisconsin
Zhenan Bao: Stanford University
Yongli Gao: University of Rochester
Transition Metal Oxides, MoO
x, VO
x, ..
Metal Production
CdTe/CdS basedSolar Cells
Organic Photovoltaic Cells
Organic Thin Film Transistors
Strong Interface p Doping
Organic Light Emitting Diodes
Efficient Spin Injection
Photochromic Lenses
Applications:
Photo-emission Studies
• Photoemission for occupied electronic structure– X-ray and ultraviolet photoemission (XPS & UPS)
• Inverse photoemission (IPES) for unoccupied electronic structure
h v
V a c u u m
F e r m i l e v e l ( = 0 )
I o n i z a t i o n p o t e n t i a l
E = h v - E h
h v = E 0 - E l
P h o t o e m i s s i o n S p e c t r o s c o p y
E l e c t r o n D e t e c t o r
P h o t o n D e t e c t o r
I n v e r s e P h o t o e m i s s i o n S p e c t r o s c o p y
E h
E 0
E l
E l e c t r o n a f f i n i t y
UPS Data: Interface with CuPc
WF recovery after annealing.
Shift of CuPc HOMO levels with increasing thickness.
Discussion:
One hour of air exposure to thermally evaporated MoOx films
(WF ~6.8 eV) substantially reduces WF (~5.4 eV).
The reduction is due to adsorb oxygen rich over layer.
The recovery is due to the detachment of the adsorbed over layer.
The recovery was saturated around 460 ºC, with WF ~6.3 eV.
The work function of air exposed MoOx film gradually recovers
with increasing temperature.
Air exposure of MoOx thin film creates an unfavorable
energy level alignment for charge injection at anode, and so it should either be avoided or work function must be recovered.
Work function of air exposed MoOx films can be
substantially recovered with the annealing around 460 ºC in side vacuum.
Summary:
Vacuum annealed MoOx film has similar energy level
alignment as the pristine MoOx film.
Irfan et al., Appl. Phys. Lett. (Ready for Submission)