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Stanford Synchrotron Radiation Laboratory More Thin Film X-ray Scattering and X-ray Reflectivity Mike Toney, SSRL 1. Introduction (real space – reciprocal space) 2. Polycrystalline film (no texture) – RuPt 3. Textured film: MnPt 4. X-ray Reflectivity 5. Summary how do you get diffraction data from thin films how to choose what to do (what beam line & scans) what do you learn

Stanford Synchrotron Radiation Laboratory More Thin Film X

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Page 1: Stanford Synchrotron Radiation Laboratory More Thin Film X

Stanford Synchrotron Radiation Laboratory

More Thin Film X-ray Scattering and X-ray Reflectivity

Mike Toney, SSRL

1. Introduction (real space – reciprocal space)2. Polycrystalline film (no texture) – RuPt3. Textured film: MnPt4. X-ray Reflectivity5. Summary

• how do you get diffraction data from thin films• how to choose what to do (what beam line & scans)• what do you learn

Page 2: Stanford Synchrotron Radiation Laboratory More Thin Film X

Real and Reciprocal Space

epitaxialfilm

“powder” film(polycrystalline)

Arturas

Real space Reciprocal space

spotsorigin

spheres

Page 3: Stanford Synchrotron Radiation Laboratory More Thin Film X

Real and Reciprocal Space

Real space Reciprocal spacetextured film

differences in extent of texture

rings

slice gives spots

Page 4: Stanford Synchrotron Radiation Laboratory More Thin Film X

Thin Film Scattering

What do you do?• what beam line? (2-1, 7-2, 11-3)

• area vs point detector; flux; energy• what scans? (“where” in reciprocal space)

• what do you want to learn:phase identificationlattice parametersdefectstexture crystallite sizeatomic structure

Page 5: Stanford Synchrotron Radiation Laboratory More Thin Film X

Thin Film Scattering

Q

Two ways: Area detector & Point detector

Page 6: Stanford Synchrotron Radiation Laboratory More Thin Film X

RuPt Thin FilmsDirect Methanol Fuel Cell (DMFC)• low operating temperature & high energy density• low power applications (cell phones, PCs,)

RuPt alloys used as catalysts for DMFCs• as nanoparticles, but also films• catalytic activity of RuPt depends on

composition and structure (hcp or fcc)

anode: CH3OH + H2O => CO2 + 6H+ + 6e-

cathode: 3/2O2 + 6H+ +6e- => 3H2O sum: CH3OH + 3/2O2 => CO2 + 2H2O

Hamnet, Catalysis Today 38, 445 (1997)Park et al., J. Phys. Chem. B 106, 1735 (2002)

Page 7: Stanford Synchrotron Radiation Laboratory More Thin Film X

RuPt Thin Films

• T-W Kim, S-J Park, Gwangju Institute of Science & Technology, South Korea

• K-W Park, Y-E Sung, Seoul National University, South Korea

• Lindsay Jones, (SULI Internship)

SiRuPt: vary %

thin films of RuPtrf sputtered13 nm thick

Goal: Correlate crystal structure of RuPtalloys to catalytic activity

Pt is fcc; Ru is hcpfcc->hcp transition as Ru increases

Page 8: Stanford Synchrotron Radiation Laboratory More Thin Film X

Polycrystalline (powder) film

Cu

“Powder”: randomorientation of many smallcrystals (crystallites)

QIn

tens

ity

Q

Page 9: Stanford Synchrotron Radiation Laboratory More Thin Film X

RuPt Thin FilmsArea

Detector2θ incident

α ~ 0.1−0.2 degQ scattered

Beam line11-3 incidentscattered

Detector

Q

Page 10: Stanford Synchrotron Radiation Laboratory More Thin Film X

RuPt Thin FilmsRu() Pt ()

fcc(111)

glitchfcc

(220)fcc

(200)

fcc(311)& (222)

Q

in-plane scan

Q

Page 11: Stanford Synchrotron Radiation Laboratory More Thin Film X

RuPt Thin Films: diffraction

T-W. Kim et al., J. Phys. Chem. B 109, 12845 (2005)

Increasing Ru =>transition from fcc to mixed fcc/hcp to hcp

Page 12: Stanford Synchrotron Radiation Laboratory More Thin Film X

RuPt Thin FilmsUse peak intensities to quantify phases

Thin Film Phase Diagram

Thin film different from bulk, due to sputter depositionKinetics do not allow equilibrium

Page 13: Stanford Synchrotron Radiation Laboratory More Thin Film X

RuPt Thin Films

0 20 40 60 80 1000.000

0.002

0.004

0.006

0.008

0.010

0.012

0.014

0.016

at 0.4 V vs. Ag / AgCl

Percentage of Ru / %

C

urre

nt d

ensi

ty /

mA

cm

-2

fccfcc/hcp hcp

• composition dependent activity similar to pure fcc alloys • hcp RuPt does not adversely affect activity• may be manifestation of surface properties (similarity of fcc(111) and hcp(002)

0.15 0.20 0.25 0.30 0.35 0.40 0.45 0.500.000

0.004

0.008

0.012

0.016

0.020

46.2% of Ru

67.0% of Ru

28.8% of Ru

Potential / V vs. Ag/AgCl

Cur

rent

den

sity

/ m

A c

m-2

Page 14: Stanford Synchrotron Radiation Laboratory More Thin Film X

RuPt Films: Lattice Parameters

bulk alloys• Accurately determine lattice parameters• Cannot use bulk alloy lattice parameters to get composition

Page 15: Stanford Synchrotron Radiation Laboratory More Thin Film X

Summary: polycrystallineRuPt films:

phase identification (hcp, fcc)lattice parameters (strain)no strong texturecrystallite size

• Area detector• Point detector

Scan choice straightforward

Page 16: Stanford Synchrotron Radiation Laboratory More Thin Film X

XRD - BS• GUI for removal of background and thickness corrections

– http://www-ssrl.stanford.edu/~swebb/xrdbs.zip– http://www-ssrl.stanford.edu/~swebb/xrdbs.htm (coming soon)

SamWebb

Page 17: Stanford Synchrotron Radiation Laboratory More Thin Film X

Thin Films for Magnetic Recording

Tsann Lin and Daniele Mauri,Hitachi Global StorageMahesh Samant, IBM

$5.2/MB $0.0003/MB

ContactHard Bias

ContactHard Bias

Read Head

Write Head

500 nm

2 μm

PinnedFerromagntic

Film

Page 18: Stanford Synchrotron Radiation Laboratory More Thin Film X

Exchange bias (Heb)

Thin Films for Magnetic Recording

current flow

Toney, Samant, Lin, Mauri, Appl. Phys. Lett. 81, 4565 (2002)

• Understand this behavior (for MnPt)

Page 19: Stanford Synchrotron Radiation Laboratory More Thin Film X

MnPt Films: chemical order

chemically disorderedfcc structurenot antiferromagnetic

chemically orderedL10 structure (face centered tetragonal)c/a = 0.92antiferromagnetic (TN = 700-800o C)

Cebollada, Farrow & Toney, in Magnetic Nanostructures, Nalaw, ed. 2002

Mn

Mn

Pt

Page 20: Stanford Synchrotron Radiation Laboratory More Thin Film X

partial chemical order: S=1/2

Cebollada, Farrow & Toney, in Magnetic Nanostructures, Nalaw, ed. 2002

No chemical order: S=0 Full chemical order: S=1

S=0S=½S=1

MnPt Films: chemical order

Mn

chemical order parameter (S): extent of chemical order

a

determine S from peak intensities(110)/(220) ratio

(111)(200)

(220)

(111) (200)

(220)(202)

(002)(110)

(001)

(111)(200)

(220) (202)

(002)(110)(001)

Page 21: Stanford Synchrotron Radiation Laboratory More Thin Film X

Highly Textured Thin Films

rings

slice gives spots

sputteredannealed at 280C

for 2 hours(111)

(110) (220)

(111)

(200) Q

Page 22: Stanford Synchrotron Radiation Laboratory More Thin Film X

2θα

β

2θ is scattering angleQ = scattering vectorQ = (4π/λ) sin θα = incidence angleβ = exit angle

Si

MnPt

MnPt Films: diffraction

(111)

(110) (220)

(111)

(200)

Q

Page 23: Stanford Synchrotron Radiation Laboratory More Thin Film X

fcc(220)

(220)

(202)(110)

(001)

(111)

(110)(200)

(002)

• increased thickness: the superlattice (001) and (110) peaks increase => more chemical ordering

• coexistence of fcc and L10 Toney, Samant, Lin, Mauri, Appl. Phys. Lett. 81, 4565 (2002)

MnPt Films: diffraction

(110) (220)

(111)

Q

Page 24: Stanford Synchrotron Radiation Laboratory More Thin Film X

• coexistence of fcc and L10 MnPt (inhomogeneous)• complete chemical order for highest Heb

MnPt Film Structure

Page 25: Stanford Synchrotron Radiation Laboratory More Thin Film X

MnPt (111)

as depositedannealed

as deposited

annealed

NiFe, Cu (111)

more chemically ordered MnPt -> larger grains

NiFe & Cu do not change much with annealing

MnPt Films: crystallite size

(110) (220)(111) Q

Page 26: Stanford Synchrotron Radiation Laboratory More Thin Film X

L1 (202)0

L1 (220)0

fcc(220)fcc(220)

L1 (220)0

L1 (202)0

fcc(220)

(220)

(202)(110)

(001)

(111)

(110)(200)

(002)

MnPt Films: crystallite size

datafit

resolvedpeaks

L10 (transformed) regions have larger crystallite than fcc regions

fcc regions close to unanneled crystallite size

Page 27: Stanford Synchrotron Radiation Laboratory More Thin Film X

Texture in Thin Films• Pole figure measures orientation distribution of diffracting planes

• Ψ = 0 deg planes along substrate

• Ψ = 90 deg planes ┴ to substrate

Page 28: Stanford Synchrotron Radiation Laboratory More Thin Film X

MnPt Films: Texture

20 nm MnPt annealed

annealed

as deposited

MnPt(111)

10 nm

NiFe, Cu (111) NiFe, Cu (111)

MnPt(111)20 nm

5 nm

12x

12x

annealing effect thickness effect

(111)

(110)

(111)

Q

Page 29: Stanford Synchrotron Radiation Laboratory More Thin Film X

MnPt Films

fcc MnPt L1 phase MnPt0

as depositedseed layer induces (111) growth in

NiFe & Cu [(00.2) in hcp Co & CoFe] and columnar morphology

MnPt follows (111) growth

annealedNiFe & Cu maintain (111)

orientation [(00.2) in Co & CoFe]fcc MnPt keeps (111) orientation L10 MnPt:

some keeps (111) orientation some becomes nearly isotropicgrain growth

=> L10 MnPt forms by nucleation and growth

Page 30: Stanford Synchrotron Radiation Laboratory More Thin Film X

MnPt Films: Summarythin MnPt remains fcc => not antiferromagnetic and no

exchange bias coexistence between fcc and L10(inhomogeneous)

need complete L10 order to get highest exchangeno (<0.5 nm) fcc layer near interfacegrain growth and change in preferred orientation with

development of chemical order

=> L10 forms by nucleation & growth

fcc(220)

(220)

(202)(110)

(001)

(111)

(110)(200)

(002)

Page 31: Stanford Synchrotron Radiation Laboratory More Thin Film X

MnPt Thin Films: SummaryMnPt films:

phase identification (L10, fcc)lattice parameters (strain)texturecrystallite size

• Area detector• Point detector

(111)

(110) (220)

(111)

(200)

Q

• Scan choice requires knowledge of reciprocal space & what you want to learn

• Same is true for pentacene

Page 32: Stanford Synchrotron Radiation Laboratory More Thin Film X

X-ray ReflectivityQ = (4π/λ) sin θ

Q < Qc : R ≈ 1Q >> Qc: R ≈ (Qc/Q)4

R= reflectivityQc ≈ √ρe- , electron density

R ≈ | r1 + r2 exp (iQD)|2

incident reflectedQ

D

θ θ

• Lu, Lee, Thomas, Acta Cryst. A52, 11-41 (1996).• Tolan, “X-ray Scattering from Soft-Matter: Materials

Science and Basic Research”, Springer (1998).

Qc

2π/D

Page 33: Stanford Synchrotron Radiation Laboratory More Thin Film X

Lubricant Films

How thick is the lubricant?

CR

F

F

C

F

F

O C

F

F

O R

n m

CR =

F

F

C

H

H

OH 4700 g/mol

CR =

F

F

F 4600 g/mol

Z-Dol

random co-polymer

Z

What we did:use reflectivity to measure various thicknessescompare with ‘established’ methods

FomblinDisk Lubricants:

Page 34: Stanford Synchrotron Radiation Laboratory More Thin Film X

Lubricant Films: Thickness

film thickness (accurate!)film densityfilm roughness

What can you learn?

• Toney, Mate, Pocker, IEEE Trans. Magn. 34, 1774 (1998)• Toney, Mate, Leach, Pocker, J. Coll. Inter. Sci. 225, 119 (2000)

hydrocarbons

2π/D R ≈ | r1 + r2 exp (iQD)|2

Page 35: Stanford Synchrotron Radiation Laboratory More Thin Film X

Lubricant Films: Thickness

organics

ellipsometry and ESCA can provide accurate thickness

organicslubricant

Slope = 1.0

ellipsometry ≡ 0

• Toney, Mate, Pocker, IEEE Trans. Magn. 34, 1774 (1998)• Toney, Mate, Leach, Pocker, J. Coll. Inter. Sci. 225, 119 (2000)

ellipsometry

reflectivity

Page 36: Stanford Synchrotron Radiation Laboratory More Thin Film X

Lubricant Films: Roughness

Toney, Mate, Leach, Appl. Phys Lett. 77, 3296 (2000)

• lubricant smoothes carbon surface

• for thick films, roughness approaches limit due to molecular nature of lubricant molecule

Page 37: Stanford Synchrotron Radiation Laboratory More Thin Film X

X-ray Reflectivity: Summary

What you can learn:accurate film thickness

(Å resolution)film densityfilm roughnesssurface morphology

single and multiple layers

Page 38: Stanford Synchrotron Radiation Laboratory More Thin Film X

Summary

hcpfcc

what do you want to learn:phase identificationlattice parametersdefectstexture crystallite sizeatomic structure

What do you do?• what beam line? (2-1, 7-2, 11-3)

• area vs point detector; flux; energy• what scans? (“where” in reciprocal space)