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SEMICON Russia 2015 – TechLounge
The Next Generation of FAB Cleanroom Design
M+W Group 16. June 2015
© M+W Group 2 The Next Generation of FAB Cleanroom Design
M+W Group in the Semiconductor Industry
Leading global engineering and construction company… More than 7,000 employees worldwide World-class Environmental Health & Safety standards Technical expertise in process and automation
… for semiconductor production facilities 70% of the world’s 300mm Fabs were designed by M+W Group
More than 200 semiconductor Fabs designed and built Over 4 million m² of manufacturing area designed and built
Installed over 11,000 tools since 2003 Constructed NanoFab Xtension (NFX) facility for G450C program operations
450 mm Wafer IMEC 450 mm CNSE NanoFab Xtension
© M+W Group 3 The Next Generation of FAB Cleanroom Design
Contents
FAB Cleanroom Concept Overview
New Process Challenges and FAB Cleanroom Solutions
Energy Conservation / CO2 Footprint Reduction
Summary
© M+W Group 4 The Next Generation of FAB Cleanroom Design
Fab Concept Overview
2 Level 3 Level 2+1 Level Stacked
Sites with area limitations but no height restrictions
R&D centers in urban environment
Upper subfab level for auxiliary equipment
Ground level for utilities, support or selected process areas
Common concept for 300 mm
Two subfab levels (clean and non-clean)
Key driver: Advanced 200 mm equipment
Utilities in wings of building
Single level subfab Can compromise
layout flexibility / tool density
Accessibility and EHS concerns in the tall subfab
Building footprint requirements
© M+W Group 5 The Next Generation of FAB Cleanroom Design
ITRS Roadmap - Cleanroom
No changes expected for cleanroom particle, temperature and humidity control
Particles: ISO Class 6 Temperature Litho / Non-Litho: +/-1K / +/- 3K
(short term variation) Humidity Litho / Non-Litho: +/- 2% / +/- 5%
(short term variation)
In the case of tool maintenance, sporadic concentrations of contamination may have to be controlled locally
Source: ITRS Roadmap 2013
© M+W Group 6 The Next Generation of FAB Cleanroom Design
Cleanroom Air Recirculation Concepts Clean Subfab versus Segregated Subfab Clean Subfab Concept
with Standard FFUs Segregated Subfab Concept
with Return FFUs
Cleanroom Area
Basement
100 %
Clean Subfab RCUs MUA MUA2
MUA1
50 %
50 %
Segregated Subfab
Closed off waffle slab Subfab is segregated from cleanroom area Less environmental conditions/specifications
required in segregated Subfab (separate MUAs)
Open waffle slab Cleanroom air flows through Subfab Similar environmental conditions/
specifications in Subfab (humidity)
Source: M+W Group
© M+W Group 7 The Next Generation of FAB Cleanroom Design
Clean Sub-Fab versus Segregated Sub-Fab Sample CAPEX and OPEX Comparison
SUBFAB CONCEPT
CAPEX/ OPEX
PROOF OF CONCEPT CLEAN
PHILOSOPHY
OPERATIONAL ASPECTS
CAPEX savings approx. 15 Mio US$ with a segregated subfab
OPEX savings with segregated subfab approx. 1.6 Mio US$/yr (Power, water, cleanroom protocol)
Majority of 300mm wafer FABs have clean subfabs
Segregated subfab cleanroom concept implemented and in operation
Concept selection depends on detailed analysis of CAPEX & operational factors
Clean Subfab: Staff movement, raised floor height
and equipment maintenance… Segregated Subfab: Safety, installations/modifications,
noise impact, segregation requirements…
Source: M+W Group
© M+W Group 8 The Next Generation of FAB Cleanroom Design
Contents
FAB Cleanroom Concept Overview
New Process Challenges and FAB Cleanroom Solutions
Energy Conservation / CO2 Footprint Reduction
Summary
© M+W Group 9 The Next Generation of FAB Cleanroom Design
Impact of Process Scaling on Wafer FAB Capacity and Size
Reduction of fab productivity through multiple patterning Investment and operational cost of multiple patterning Increased yield degradation with number of patterning steps per layer
Need for EUV insertion to mitigate process complexity:
0
0.1
0.2
0.3
0.4
0.5
0.6
0.7
0.8
0.9
1
40 28 20 16 10 7 5
Prod
uctiv
ity [W
SPW
/m2 N
MA]
[nm]
Fab Productivity vs. Technology Node (without EUV)
Source: M+W Group
Trend towards larger FABs for
equivalent output
Node
© M+W Group 10 The Next Generation of FAB Cleanroom Design
450 mm Wafer / Sub-10 nm Lithography EUV Scanner Raised Floor Load Requirements
Three sided access for installation, service and maintenance of exposure unit Floor load capacity of 30kN / raised floor tile
High density of hook-up connections between raised floor and waffle table Impaired by standard floor system with additional pedestals
Heavy duty raised floor system for scanner service areas and move-in path
EUV Scanner EUV Coater / Developer Track
EUV Coater / Developer TrackEUV Scanner
Service Area
Service Area
Service Area
Equipm
ent Move-In P
ath
© M+W Group 11 The Next Generation of FAB Cleanroom Design
OHT rail actually limited to ~ 5,300 mm height above RMF ART / Crane installation requires tight coordination Additional cleanroom height for sprinklers and lighting (~ 200 mm)
450 mm Wafer / Sub-10 nm Lithography Cleanroom Height Development
3700
ART
≥ 42
00
5300
Side View – not to scale // all dimensions in mm M+W Sketch – based on available information
Crane
Scanner
???
OHT Rail
Track
FOU
P
Wafer Loadport
Reticle Loadport
913
Max
. 410
0
5500
to 6
000
© M+W Group 12 The Next Generation of FAB Cleanroom Design
Integrated Project Delivery Challenges and Drivers
18 Months First Concrete (FC) to
Ready for Equipment (RFE)
< 15 Months Fast Track FC to RFE
< 12 Months Ultra-fast Track
FC to RFE
1990’s (200 mm) 2000’s (300 mm) Today (450 mm ready)
Fab Size and Complexity
Construction Time
*The
Ore
goni
an,
02/0
6/12
Integrated Project Delivery (IPD)
Contracting Model
2D CAD / Schedule / BoM 5D BIM
Site Selection
Design
Construction
Standard ModelSite Selection
Design
Construction
Turnkey Approach
Potential time
+ cost savings
BoM = Bill of Material BIM = Building Information Modelling
Source: M+W Group Source: M+W Group
?
© M+W Group 13 The Next Generation of FAB Cleanroom Design
Contents
FAB Cleanroom Concept Overview
New Process Challenges and FAB Cleanroom Solutions
Energy Conservation / CO2 Footprint Reduction
Summary
© M+W Group 14 The Next Generation of FAB Cleanroom Design
Energy Conservation and Energy Efficiency Optimization through FAB Energy Modelling
Finite natural resources can be saved through decreased energy consumption, increased efficient energy use and/or renewable energy supply sources.
The effect of savings and the complex primary, secondary and tertiary interactions between facility systems can only be analyzed by modelling
Make-up Air
Hot Water System
Water Treatment
Cooling TowerCW System
WWT
Water
Electrical PowerNatural Gas Water
CHW System
Utility Supply
Secondary& TertiarySystems
Chiller
Boiler
Waste Water
GEX
Waste Water
Effected Systems through Exhaust Reduction A detailed FAB energy modelling tool:
Analyzes all energy fluxes of facility systems as well as process tools
Determines optimal saving potential scenarios within an acceptable ROI
Further cost saving potential through downsizing of facility systems
© M+W Group 15 The Next Generation of FAB Cleanroom Design
Green Design – Regenerative AMC Filters Extended Lifetime
Activated carbon material or ion
exchange Filters
Multiple reuse of filters reduces waste and operational costs
Carbon footprint can be reduced by more than 80% with regenerative filters
Regeneration of Activated Carbon Filters
Regeneration of Ion Exchange Filters
© M+W Group 16 The Next Generation of FAB Cleanroom Design
Green Design – FAB Idle Mode Reduction of Annual CO2 Emissions
Integration of energy saving modes into FABs Green Idle modes for Vacuum pumps and Local Abatement;
modeling in collaboration with Edwards Secondary and tertiary effects by facility systems
European Equipment & Materials Program
CO2 Emission Saving t/a Electrical Power 8,958 Natural Gas 8,119
Total 17,077
HVM Fab ~ 40,000m² GMA
R&D Fab ~ 4,000m² GMA
CO2 Emission Saving t/a
Electrical Power 851 Natural Gas 828
Total 1,679
x 10,000
Europe China x 450
© M+W Group 17 The Next Generation of FAB Cleanroom Design
Contents
FAB Cleanroom Concept Overview
New Process Challenges and FAB Cleanroom Solutions
Energy Conservation / CO2 Footprint Reduction
Summary
© M+W Group 18 The Next Generation of FAB Cleanroom Design
The Next Generation of FAB Cleanroom Design Summary FAB cleanroom development progresses toward 450mm
ready concepts and solutions with sufficient flexibility for: Diversified new processing materials Continuous process scaling Focus topics by global initiatives and consortia
Multiple subfab cleanroom concept most common Alternative recirculation air concept enables a segregated
subfab from the main cleanroom
Larger, more complex new FABs must be built faster Integrated project delivery approach
Energy conservation and CO2 reduction: Overall mass and energy flow analysis Alternative green design solutions or systems Detailed FAB Energy modelling to identify scenarios and
determine total savings and ROI
© M+W Group 19 The Next Generation of FAB Cleanroom Design
…mastering your Project
Contact (Germany): Dr. Rudolf Simon Senior Fellow Semiconductor M+W Group, Germany E-Mail: [email protected]
Contact (Russia): Tatyana Yaroshenko Manager, Customer Relations M+W High Tech Projects, Russia E-Mail: [email protected]
