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Plasmonic Imaging for Optical Lithography X-ray Wavelengths at Optical Frequencies Experiments: Progress and Plans Yunping Yang Josh Conway Eli Yablonovitch

Plasmonic Imaging for Optical Lithography X-ray Wavelengths at Optical Frequencies

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Plasmonic Imaging for Optical Lithography X-ray Wavelengths at Optical Frequencies Experiments: Progress and Plans Yunping Yang Josh Conway Eli Yablonovitch. The Problem. Classically the resolution limit is determined by the Rayleigh Criterion: - PowerPoint PPT Presentation

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Page 1: Plasmonic Imaging for Optical Lithography X-ray Wavelengths at Optical Frequencies

Plasmonic Imaging for Optical Lithography

X-ray Wavelengths at Optical Frequencies

Experiments: Progress and Plans

Yunping YangJosh Conway

Eli Yablonovitch

Page 2: Plasmonic Imaging for Optical Lithography X-ray Wavelengths at Optical Frequencies

The Problem

Classically the resolution limit is determined by the Rayleigh Criterion:

Various schemes have been developed to push this to finer resolution than the wavelength itself, but the scale will always be set by wavelength

dSin

Page 3: Plasmonic Imaging for Optical Lithography X-ray Wavelengths at Optical Frequencies

Constant Energy CurvesBy adiabatically tapering the thin film thickness,

very small (<50nm) plasmon wavelengths are attainable for in plane imaging.

0 20 40 60 80 1000

100

200

300

400 1.5 eV

2.0 eV

2.5 eV

0

100

200

300

20 40

400

60 80

Plas

mon

Wav

elen

gth

in n

m

Silver Film Thickness in nm

Silver Film on Sapphire

t

p

SapphireAg Air

Page 4: Plasmonic Imaging for Optical Lithography X-ray Wavelengths at Optical Frequencies

0 0 . 0 2 0 . 0 4 0 . 0 6 0 . 0 8 0 . 1 0 . 1 2 0 . 1 4 0 . 1 6 0 . 1 8 0 . 2 0 . 2 2 0 . 2 4 0 . 2 6 0 . 2 8 0 . 3 0 . 3 2 0 . 3 4 0 . 3 6 0 . 3 8 0 . 4 0 . 4 2 0 . 4 4 0 . 4 6 0 . 4 8 0 . 5 0 . 5 2 0 . 5 4 0 . 5 6 0 . 5 8 0 . 6 0 . 6 2 0 . 6 4W a v e n u m b e r ( r a d / n m )0

0 . 5

1

1 . 5

2

2 . 5

3

3 . 5

4

w(eV)

t=1nm

t=20nm t=5nmt=2nm

0 0.1 0.2 0.3 0.4 0.50

1

2

3

4 200 100 50 20 15 30 40 10

0.6

Plasmon Wavelength in nm

Plasmon Wave-Vector (2/wavelength in nm)

Plas

mon

Ene

rgy

in e

Vh

k

t=thickness of metal film

Optical frequencies, but with X-ray wavelengths!

SapphireAg Air

Dispersion Relation: Constant Thickness Curves

Page 5: Plasmonic Imaging for Optical Lithography X-ray Wavelengths at Optical Frequencies

Grating Coupler

Silver

Glass

Grating

• Design and fabricate gratings to maximize the coupling efficiency;• Verify the DR with constant thickness;• Find some material parameters

Page 6: Plasmonic Imaging for Optical Lithography X-ray Wavelengths at Optical Frequencies

Launching of Surface Plasmons: ATR Coupler

Page 7: Plasmonic Imaging for Optical Lithography X-ray Wavelengths at Optical Frequencies

Optical Setup for ATR Coupler

Laser/2

PBS

BeamExpander

Iris Mirror

Detector Lens LensLens

Lens

4f

4f

SapphireHemisphere

Ag Thin Film

Page 8: Plasmonic Imaging for Optical Lithography X-ray Wavelengths at Optical Frequencies

Optical Setup for ATR Coupler

• Characterize thin film, such as roughness, thickness;• Experimentally verify the dispersion relation;• Launching a standing wave for Plasmon Wavelength Measurement

Page 9: Plasmonic Imaging for Optical Lithography X-ray Wavelengths at Optical Frequencies

A Possible Solution

This permits X-ray wavelengths at optical frequencies

photoresistsilicon

light h=2.5eV

plas

mon

wav

epl

asm

on w

ave

sapphire plas

mon

wav

e+

++

+-

--

-

sapphire plas

mon

wav

e+

++

+-

--

-

grat

ing

coup

ler

Page 10: Plasmonic Imaging for Optical Lithography X-ray Wavelengths at Optical Frequencies

Plasmon Wavelength Measurement

Antonello Nesci, Rene Dandliker, Hans Peter Herzig, “Quantitative amplitude and phase measurement by use of a heterodyne scanning near-field optical microscope,” Optics Letters, Volume 26, Issue 4, 208-210.

Resolution: 1.6 nm

Page 11: Plasmonic Imaging for Optical Lithography X-ray Wavelengths at Optical Frequencies

Taper Motivation

dimple lens

out-coupling slot

far-field fromconventional lens

taper

Taper design will be a trade

between absorption

(joule heating),

scattering (an adiabatic

profile), and maintaining a high enough

effective index at all points of

propagation to maintain

features

n9> n8> >n1>n0

Page 12: Plasmonic Imaging for Optical Lithography X-ray Wavelengths at Optical Frequencies

Criteria

0 50 100 1500.0

0.1

0.2

0.3

0.4

Loss

/

Wavelength (nm)

It is clear that Loss/ becomes

prohibitively large at

short wavelengths

Thus we change are adiabatic criteria

accordingly

/ = constant

Page 13: Plasmonic Imaging for Optical Lithography X-ray Wavelengths at Optical Frequencies

Length (nm)

Silv

er F

ilm T

hick

ness

(nm

)

100 200 300 400 500 600

10

20

30

40

50

60

Taper Profile