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Introduction to Sensing And Actuation Methods

MEMS 3

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Page 1: MEMS 3

Introduction to Sensing And Actuation Methods

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Sensing & Actuation Methods

Sensing

• Electrostatic• Thermal• Magnetic• Piezoelectric• Piezoresistive

Actuation

• Electrostatic• Thermal• Magnetic• Piezoelectric• Shape Memory Alloys

Tunneling ,Optical, FET, RF Resonance Sensing

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Design considerations

Sensor

• Sensitivity• Linearity• Responsivity• SNR• Dynamic Range• Bandwidth• Drift• Reliability• Cross talk• Cost

Actuator

• Torque or force output capacity

• Range of motion• Dynamic response• Ease of fabrication• Power consumption &

energy efficiency• Linearity of displacement

as a function of driving bias

• Cross sensitivity & environmental stability

• Foot Print

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Electrostatic Sensing and Actuation

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Principle of operation

• A capacitor is broadly defined as two conductors that can hold opposite charges

• If the distance/relative position or dielectric medium between two conductors change as a result of applied stimulus,the capacitance value will change.This forms the basis of capacitive (Electrostatic) sensing.

• If a voltage or electric field is applied across two conductors,an electrostatic force would develop between these two objects resulting in actuation. This is defined as electrostatic actuation.

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Principle of operation ……• Two Types of capacitive electrode geometries

* Parallel Plate Capacitors

* Interdigitated Finger (Comb Drive) Capacitors

• Two Parallel plates can move with respect to each other

* Normal Displacement

* Parallel sliding displacement

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Equilibrium position of Electrostatic Actuator under Bias

Electromechanical model of a // plate capacitor

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Electrostatic Actuation

Electrostatic energy stored by a capacitor

Maximum Energy stored is

Where Eb is the breakdown electric field

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When a voltage V is applied, a force Felectric develops between the plates.The magnitude of force equals the gradient of the stored energy W

• The spatial gradient of Electric Force is defined as electrical spring constant, Ke

Ke changes with position (d) and the biasing voltage (V)

Effective spring constant of the structure: Km-Ke

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Calculation of equilibrium displacement : x

Mechanical restoring force is

At equilibrium,

Equilibrium distance x can be calculated by solving this quadratic equation with respect to x.

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Electrical and Mechanical Force as a Function of Spacing

Graphical solution

Amplitude of electrostatic & mechanical force

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Balance of Electrical and Mechanical Force

Effect of different bias voltages on equilibrium distance, x

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Balance of Forces at the Pull-in voltage

•At tangent,Magnitude of Fe equals Fm

• Pull-in Voltage

•The // plate electrostatic actuator becomes unstable for V greater than Vp

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At Pull in Voltage, magnitudes of electrical and mechanical balance forces are same.By equating these two forces

Analytical Solution

We know

Only solution for x when Ke=Km is satisfied: Independent of Vp &

Spring constant

Putting V2 from above

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We get

And consequently we get

Putting x = xo/3 in

at V = V pull in or Vp

For V>Vpull in, Snap in condition,•There is no equilibrium position and the two plates ‘snap in’ or come in contact

• Idealized case: Two sources of deviation - Fringe caps. & Restoring force considered linear

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Two Types -Transverse - Longitudinal

• Many Parallel plates can increaseActuation force.

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Perspective view of comb-drive sensors and actuators

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Transverse Comb drive

Capacitance at Rest Csl=Csr=є0 l0 t/x0

Capacitance after movement x Csl= є0 l0 t/x0-x Csr= є0 l0 t/x0+x Total value of capacitance= Csl+Csr+Cf

The displacement sensitivity Sx=∂Ct ot/ ∂ xMagnitude of force(Actuator)Fx= | ∂ U/ ∂ x | = | ∂ / ∂ x (1/2CtotV2)I

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Longitudianal Comb Drive

With lateral movement y,the capacitance of single finger Csl=Csr=є0 (l0 - y) t/x0

The displacement sensitivity: Sy= ∂Ct ot/ ∂ y Force (Actuator) Fy= ∂E/ ∂ y= ∂/∂y (1/2CtotV2)

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Applications

• Electrostatic Motor• Inertia Sensor - Parallel plate- capacitive accelerometer - Torsional plate- capacitive accelerometer

• Pressure Sensor - Membrane parallel plate pressure sensor - Membrane capacitive condenser microphone

• Flow sensor• Tactile sensor

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MEMS Electrostatic Actuators

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MEMS Electrostatic Actuators

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An out of plane accelerometer based on comb drive actuation

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Typical Calculations

• The force constant associated with the mass is twice that of each individual fixed-guided cantilever. The overall force constant is

K= 24EI/L3

• The total capacitance at rest is contributed by eight fixed electrodes and therefore 16 vertical wall capacitors .The value of total capacitance is

C(t)= 16 (єo loto/d)

• The displacement in Z axis which is a function of the applied acceleration causes the effective thickness (t) to change. Upon displacement z,the capacitance becomes

C(t)= 16 {єo lo(to-z)/d} and

z= ma/K= maL3/24EI

The relative change of capacitance with respect to acceleration a is

∂C/ ∂a= 2 єo lomL3/3dEI

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Fabrication Process of Torsional Acceleration Sensor

)2( fmfr ll

d

lnC

Change in capacitance under angular displacement

Where,lm :length of inertia masslf: length of sensing fingerd: gap distancen: number of sense fingers

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Example: Force Balanced ADXL-50

ADXL-50

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Accelerometer with Capacitive Sensing

Bulk micromachined capacitive accelerometer. Inertial mass in the middle wafer forms the moveable electrode of a variable differential capacitive Circuit.

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Accelerometer with Capacitive Sensing

Fabrication Process Steps:

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Parallel-Plate Capacitive Accelerometer

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Surface Micromachined Parallel Plate Capacitor as an Accelerometer

RT Process

Ni Plate Size1x0.6mm2 in area5um Thick

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Fabrication Process of Pressure Sensor with Sealed Cavity

Oxidation + Patterning

Anisotropic Etch ( 9um)

Oxide Etch

Oxidation

Patterning

B Diffusion 15um

Reoxidise+Pattern

Thin B-Doping

Dielectric + Patterning

Poly + Doping

CMP + Cr/Au deposition+Oxide Dep+Pattern

Flip chip Bonding

Silicon Etch

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Surface Micromachined Pressure Sensor

Capacitance changes with deflecting membrane which can be measured using AC circuitry.

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Comb-Drive Actuator for Optical Switching

Linearly graded comb teeth

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MEMS Electrostatic Actuators

Electrostatic Optical Switch

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Bulk Micromachined Parallel-Plate Capacitor as Differential Mode Tactile Sensor

dd

LC r

2

20

Capacitance change under normal force

Ld

LC r

5.0

20

Total Capacitance under shear force

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Fabrication Process of Tactile Sensor

Buried n type layer (3um) +6um thick n epi layer

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Scratch Drive Actuator

Square Pulse

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SDA Supported by Elastic Beams

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Fabrication Process: SDA

Oxidation+Poly Si+P Implant+Photolithography+ Nitride deposition

Sacrificial oxide+ Two step Lithography

Poly Si ( Buckling beam)+ P Implant +Photolith. + Dry Etch

Stress Anneal with thin oxide+Sacrificial layer removal

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SDA Actuator and Linked Buckling Beam

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Maximum Deflection Vs Horizontal Displacement

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Generated Force By SDA and Applied Voltage

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3-D Self-Assembled Polysilicon Structure

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MEMS Electrostatic Actuators

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MEMS Electrostatic Actuators

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MEMS Electrostatic Actuators

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