LPP collector mirrors coating, metrology and refurbishment

LPP collector mirrors –

coating, metrology and refurbishment

2013 International Workshop on EUV and soft X-Ray Sources

Torsten Feigl, Marco Perske, Hagen Pauer, Tobias FiedleroptiX fab GmbH

Christian Laubis, Frank ScholzePTB Berlin

Dublin, November 5, 2013

2 I 2013 International Workshop on EUV and soft X-Ray Sources, November 5, 2013

Outline

Introduction to optiX fab

History of LPP collector mirror coating at IOF / optiX fab

NXE:3100 LPP collector lifetime

Refurbishment of EUV collector mirrors

- top layer refurbishment

- multilayer stripping and recoating

Summary and acknowledgement


Outline









Team and organization

Organization: GmbH (limited liability company)

Mission: Fabrication of customized optics and optical components forEUV lithography @ 13.5 nm, synchrotron and FEL beamlines,metrology, R&D applications, etc.

Team: Torsten Feigl, Marco Perske, Hagen Pauer, Tobias Fiedler


Contact information

mailing address optiX fab GmbHHans-Knöll-Str. 607745 JenaGermany

phone + 49 3641 675 500

fax + 49 3641 675 509

email [email protected]@optixfab.com

President and CEO Dr. Torsten Feigl


Outline









Multilayer coated collector optics for LPP sources


First p sr multilayer collector realized in 2004

Measured EUV reflection and angle of

incidence on EUV collector mirror

(R-measurement: PTB Berlin).

0

10

20

30

40

50

60

70

0 5 10 15 20 25 30 35 40

Substrate tilt, deg.

Refl

ecti

vit

y,

%

0

5

10

15

20

25

30

35

40

AO

I, d

eg

N = 60

AOI, deg


First 300 mm multilayer collector realized in 2006

RCA > 66.5 % (s-pol)

l = 13.500 nm

FWHM > 0.510 nm

sl = 0.001 nm

Measurements: PTB Berlin

0

0.1

0.2

0.3

0.4

0.5

0.6

0.7

12.8 13.0 13.2 13.4 13.6 13.8 14.0 14.2

wavelength, nm

refl

ec

tiv

ity

49.2 mm, axis 1

49.2 mm, axis 2

49.2 mm, axis 3

87.0 mm, axis 1

87.0 mm, axis 2

87.0 mm, axis 3


High-temperature multilayer collectors realized in 2008

RCA > 58 % (s-pol)

New Mo/X/Si/X coating with

superior thermal stability

up to 600 °C

Measurements: PTB Berlin, BESSY II

0%

10%

20%

30%

40%

50%

60%

12.9 13.1 13.3 13.5 13.7 13.9 14.1

wavelenght, nm

refl

ect

an

ce

r = 40mm

r = 50mm

r = 60mm

r = 70mm

r = 80mm

r = 90mm

r = 100mm

r = 110mm

r = 120mm

r = 130mm


Outline









LPP collector coating challenges

R > 50 % (uncapped ML)

l = (13.50 ± 0.03) nm

Dd = 0.015 nm = 15 pm

Diameter: > 660 mm

Lens sag: > 150 mm

Tilt: > 45 deg

Weight: > 40 kg


. Champion lifetime in the field ~11 months

(~120 billion pulses)

Six collectors with >6 months lifetime

Update given at SPIE in February Cap layer development has greatly increased

average collector lifetime

NXE:3100 - Improved collector lifetime in the field


Collector damage and degradation mechanisms

Impact of particles, ions, radiation onto the collector

Degradation mechanisms on the surface: tin accumulation, ion

damage, oxidation, blistering,…

Tin deposition is the dominant mechanism

Damage occurs only at the top section of the coating

With additional coating protection, the collector field performance

has become much more mature

Huge lifetime improvements were achieved by the introduction of

new and improved cap layers


Outline









-300 -200 -100 0 100 200 300

-300

-200

-100

0

100

200

300

Y /m

m

X /mm

0,050000,070000,090000,11000,13000,15000,17000,19000,21000,23000,25000,27000,29000,31000,33000,35000,37000,39000,41000,43000,45000,47000,49000,51000,53000,55000,57000,59000,61000,63000,6500

EUV reflectance mapping after coating

Measurement of s-polarized EUV

reflectance at 13.500 nm over full

collector CA

(3360 measurement points)

Average reflectance

<Rs-pol> = 53.5 %

<Rupol> = 44.7 %

EUV reflectance map @ 13.5 nm:

Measurements: PTB Berlin

65 %

5 %


EUV reflectance mappings at different stages of refurbishment

-300 -200 -100 0 100 200 300

-300

-200

-100

0

100

200

300

Y /m

m

X /mm

0,050000,070000,090000,11000,13000,15000,17000,19000,21000,23000,25000,27000,29000,31000,33000,35000,37000,39000,41000,43000,45000,47000,49000,51000,53000,55000,57000,59000,61000,63000,6500

-300 -200 -100 0 100 200 300

-300

-200

-100

0

100

200

300

Y /m

m

X /mm

0,050000,070000,090000,11000,13000,15000,17000,19000,21000,23000,25000,27000,29000,31000,33000,35000,37000,39000,41000,43000,45000,47000,49000,51000,53000,55000,57000,59000,61000,63000,6500

-300 -200 -100 0 100 200 300

-300

-200

-100

0

100

200

300

Y /m

m

X /mm

0,050000,070000,090000,11000,13000,15000,17000,19000,21000,23000,25000,27000,29000,31000,33000,35000,37000,39000,41000,43000,45000,47000,49000,51000,53000,55000,57000,59000,61000,63000,6500

-300 -200 -100 0 100 200 300

-300

-200

-100

0

100

200

300Y

/m

m

X /mm

0,050000,070000,090000,11000,13000,15000,17000,19000,21000,23000,25000,27000,29000,31000,33000,35000,37000,39000,41000,43000,45000,47000,49000,51000,53000,55000,57000,59000,61000,63000,6500

-300 -200 -100 0 100 200 300

-300

-200

-100

0

100

200

300

Y /m

m

X /mm

0,050000,070000,090000,11000,13000,15000,17000,19000,21000,23000,25000,27000,29000,31000,33000,35000,37000,39000,41000,43000,45000,47000,49000,51000,53000,55000,57000,59000,61000,63000,6500

-300 -200 -100 0 100 200 300

-300

-200

-100

0

100

200

300

Y /m

m

X /mm

0,050000,070000,090000,11000,13000,15000,17000,19000,21000,23000,25000,27000,29000,31000,33000,35000,37000,39000,41000,43000,45000,47000,49000,51000,53000,55000,57000,59000,61000,63000,6500


Averaged EUV reflectance at different stages of refurbishment

0%

10%

20%

30%

40%

50%

60%

70%

as-deposited end of life 1st step 2nd step 3rd step 4th step 5th step

Average s-pol EUVR Average unpol EUVR


BB04: EUV reflectance after coating of capping layer

Measurement of s-polarized EUV

reflectance at 13.500 nm over full

collector CA

(3360 measurement points)

Average reflectance

<Rs-pol> = 47.7 %

<Rupol> = 39.8 %


Measurements: PTB Berlin -300 -200 -100 0 100 200 300

-300

-200

-100

0

100

200

300

Y /m

m

X /mm

0,050000,070000,090000,11000,13000,15000,17000,19000,21000,23000,25000,27000,29000,31000,33000,35000,37000,39000,41000,43000,45000,47000,49000,51000,53000,55000,57000,59000,61000,63000,6500

65 %

5 %


Outline









Complete multilayer stripping and recoating – initial reflectance

Initial coating

Average reflectance

<Rupol> = 39.8 %



Complete multilayer stripping and recoating

Complete ML stripping + recoating

Average reflectance

<Rupol> = 43.8 %



Outline









Summary

Collector lifetime: 120 Billion pulses with new collector coating

It is possible to refurbish multilayer LPP collector mirrors!

Collector refurbishment:

- keeping initial ML coating: 90 % of initial EUVR

- stripping initial ML coating and ML recoating: no EUVR loss


Acknowledgements

EUV source development team @ Cymer and @ ASML

EUV collector team @ Fraunhofer IOF:

Christoph Damm, Andreas Gebhardt, Tobias Herffurth, Robert Jende,

Johannes Paul Jobst, Thomas Müller, Michael Scheler, Thomas Peschel,

Stefan Risse, Steffen Schulze, Ronald Schmidt, Sven Schröder,

Mark Schürmann, Marcus Trost, Sergiy Yulin, Uwe Zeitner,

and many others

EUV reflectivity measurement team @ PTB Berlin:

Christian Buchholz, Annett Barboutis, Martin Biel, Benjamin Dubrau,

Andreas Fischer, Anne Hesse, Jana Puls, Christian Stadelhoff

optiX fab.www.optixfab.com

Documents

LPP collector mirrors coating, metrology and refurbishment