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International Journal of Laser Chemical Vapor Department of Mechanical ABSTRACT Laser Chemi cal Vapor De posi t reactants. These reactants are formed by of materials. Materials are such as se depositio n happens on a pyrolytic che unbeli evable capab ili ties which s tar t fro precis e co ntr ol, of t hermal depo sit ion. T The LCVD process is a mask less techni I. INTRODUCTION LCVD is a recent application of the p produc ing ext remely str ong and ult ra pur Figure 1 shows a typical CVD reaction c to a specific level usually above 1000  energ y fo r the depositio n pr oces s is l ow coating. Over the last decade various re were the first to grow large diameters (<10um/s) . I n th e ne xt 10 years LCVD t breakthrough was when the researchers dimen sio nal shapes by controllin g the su of g raphite. Later Wallenburger l ater a d produce the micro spring. The LCVD pr oc es s is a ma sk l fabrication of polar and non polar which II. RAPID PROTOTYPIN Ra pi d Prototy pi ng sy stem fa br ic occurs at the atomic level, producing a process can fabricate fibers in any given materials to composite structures. There Rapid proto typin g is a tech nolog y whi ch a 3- d tech no lo gy ra th er then 2- d. The m www.ijsret.org  cientific Research Engineering & Technology (I Deposition Applications and Ra KalpeshPradeep Mavalkar 1  Engine ering, Sinhga d Colle ge of engin eering vadg ao ion i s a very special process that a s ol id dep extremely high temperatu res. LCVD results in th mic onduct ors , metal s, dielec tri cs, on to dif fer ical reacti on which occ urs in the focus of a l a m a small size of a heated zone. This is a very he di rect cont ro l o f the d ir ec ti on wh ere the d epo ue.  ro cess CVD which is Ch emical Vapo r De posi e ceramics, metallic fibers and surface coatings. Figure 1 CVD Chamber  hamber. Gas reactants go into the heated chamb C a chemica l reactio n is trigg ered to for m a st at a free surface. The solid reaction occurs at searchers have modified the LCVD process. In (>200um) carbon rods. The problem was the he goal was to decr ease fiber diamete r and inc re ent beyo nd the scop e of fiber gro wth. Eng ineer bstrate movement. By 1991 Zong and Maxwell vanced the technologyby simultaneously moving ess technique which means flexibility and a fas are e xtremely diffic ult to fabri cate by c onve ntion IN LCVD  ates complex net shaped metallic and ceramic st material that is fully dense and pure and mech directions. For the rapid prototyping this will will be no limitations on multiple fabrications in can automatical ly make models from (CAD) dat dels fabricated in this process have many uses. I 647  JSRET), ISSN 2278  0882 Volume 3, Issue 3, June 2014  pid Prototyping  n, pune, India  sit is formed from gaseous  e dep osi tion of var ious types  ent substrate materials. The  ser beam. This process has  special technology used for  ition occurs is extraordinary.  tion. CVD process used for  r.When the temperature rises  olid product. The activation  the surface producing a solid  1972, Nelson and Richards  gro wth rat e was ver y slow  ase the growth rate. Then the  went into using LCVD in 3-  abricated a rectangular block  and rotating the substrate to  t rate process. It enables the  al methods.  uctu res . The LCVD bon ding  anically sounds. The LCVD  ive the capacity for multiple  this method.  a. The rapid prototyping uses  t makes a great visual aid for

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Page 1: Laser Chemical Vapor Deposition Applications and Rapid Prototyping

8/20/2019 Laser Chemical Vapor Deposition Applications and Rapid Prototyping

http://slidepdf.com/reader/full/laser-chemical-vapor-deposition-applications-and-rapid-prototyping 1/4

International Journal of

Laser Chemical Vapor

Department of Mechanical

ABSTRACTLaser Chemical Vapor Deposit

reactants. These reactants are formed by

of materials. Materials are such as se

deposition happens on a pyrolytic che

unbelievable capabilities which start fro

precise control, of thermal deposition. T

The LCVD process is a mask less techni

I. INTRODUCTION

LCVD is a recent application of the pproducing extremely strong and ultra pur

Figure 1 shows a typical CVD reaction c

to a specific level usually above 1000  

energy for the deposition process is low

coating.

Over the last decade various re

were the first to grow large diameters

(<10um/s). In the next 10 years LCVD t

breakthrough was when the researchers

dimensional shapes by controlling the su

of graphite. Later Wallenburger later ad

produce the micro spring.

The LCVD process is a mask l

fabrication of polar and non polar which

II. RAPID PROTOTYPIN

Rapid Prototyping system fabric

occurs at the atomic level, producing a

process can fabricate fibers in any given

materials to composite structures. ThereRapid prototyping is a technology which

a 3-d technology rather then 2-d. The m

www.ijsret.org

  cientific Research Engineering & Technology (I

Deposition Applications and Ra

KalpeshPradeep Mavalkar1

  Engineering, Sinhgad College of engineering vadgao

ion is a very special process that a solid dep

extremely high temperatures. LCVD results in th

miconductors, metals, dielectrics, on to differ

ical reaction which occurs in the focus of a la

m a small size of a heated zone. This is a very

he direct control of the direction where the depo

ue.

  rocess CVD which is Chemical Vapor Deposie ceramics, metallic fibers and surface coatings.

Figure 1 CVD Chamber

  hamber. Gas reactants go into the heated chamb

C a chemical reaction is triggered to form a

st at a free surface. The solid reaction occurs at

searchers have modified the LCVD process. In

(>200um) carbon rods. The problem was the

he goal was to decrease fiber diameter and incre

ent beyond the scope of fiber growth. Engineer

bstrate movement. By 1991 Zong and Maxwell

vanced the technologyby simultaneously moving

ess technique which means flexibility and a fas

are extremely difficult tofabricate by convention

IN LCVD

  ates complex net shaped metallic and ceramic st

material that is fully dense and pure and mech

directions. For the rapid prototyping this will

will be no limitations on multiple fabrications incan automatically make models from (CAD) dat

dels fabricated in this process have many uses. I

647  JSRET), ISSN 2278 – 0882Volume 3, Issue 3, June 2014

  pid Prototyping

 n, pune, India

  sit is formed from gaseous

  e deposition of various types

  ent substrate materials. The

  ser beam. This process has

  special technology used for

  ition occurs is extraordinary.

 

tion. CVD process used for 

r.When the temperature rises

  olid product. The activation

  the surface producing a solid

  1972, Nelson and Richards

  growth rate was very slow

  ase the growth rate. Then the

  went into using LCVD in 3-

  abricated a rectangular block 

  and rotating the substrate to

 

t rate process. It enables the

  al methods.

 

uctures. The LCVD bonding

  anically sounds. The LCVD

  ive the capacity for multiple

  this method.  a. The rapid prototyping uses

  t makes a great visual aid for

Page 2: Laser Chemical Vapor Deposition Applications and Rapid Prototyping

8/20/2019 Laser Chemical Vapor Deposition Applications and Rapid Prototyping

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International Journal of

co workers and customers to elaborate i

typical rapid prototyping system is illust

Fi

In figure 2 this typical setup of a rapid

certain amount of gas is induced in the r

An argon laser produces a localized heat

begins to deposit materials on the heate

movement of the substrate where needed

III. APPLICATIONS IN RAPID P

This process builds 3-d models

light. The model is built on a platform th

Layers of adhesive coated she

consists of paper laminate with heat acti

the build platform, where there is doubl

Then the laser is used to cut an outline

needed to build the component which wiso the component will not get moisture d

www.ijsret.org

  cientific Research Engineering & Technology (I

deas and thoughts. Prototypes can be used for t

ate

gure 2 Setup LCVD Rapid Prototyping

  rototyped system. There are certain deposits re

action chamber.

  spot on the substrate surface. Extremely high te

area. Then the computer measures the deposit

.

  ROTOTYPING USING LCVD

Figure3. LCVD Stereo Lithography

  from liquid photosensitive polymers that solidif

at is submerged in a liquid epoxy or acryl ate resi

  t materials are bonded together to form a pro

vated glue rolled up on spools. The feeder colle

d sided foam tape. Then the heated roller applie

on the first layer, making it easy to remove. Th

ll have a wood like finish because it is made outamage.

648  JSRET), ISSN 2278 – 0882Volume 3, Issue 3, June 2014

  sting a design. In figure 5 a

 

uired on a given layer. So a

 

mperatures the CVD reaction

  growth rate and controls the

 

when exposed to ultraviolet

  in.

  totype.The original material

  ctor advances a sheet over to

  s pressure to bond the paper.

  n this process is repeated as

  of paper, then a sealer is used 

Page 3: Laser Chemical Vapor Deposition Applications and Rapid Prototyping

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International Journal of

IV. NEEDS, GOALS AND OBJEC

In the United States rapid prototyping i

techniques has developed slower. In Ja

prototyping in these areas is very limitedThe needs, goals and objectives of rapid

Japan has a inclination to strive on accur

V. CONCLUSION

The LCVD process is a fantast

different substrate materials. The extraor

method is astonishing in using various

applications, failure analysis.

Rapid prototyping is a phenom

design. The three dimensional printers ald picture.This method is a great visual a

www.ijsret.org

  cientific Research Engineering & Technology (I

Figure4 Laminated Oil Manufacturing

Figure 5 Ink Jet Printing

  IVES FOR RAPID PROTOTYPING

  used more than in any other country. In Europ

an and in Europe rapid prototyping are being u

and slow. In Europe metal components and toolprototyping are the same in Europe and Japan b

acy, but in Europe the tooling industry is predom

  ic method which allows deposition of a variet

dinary part of this is that it takes place in the are

types of applications in rewiring and connect

nal method, which allows you to construct a

llow engineers to quickly create prototypes fromid for conveying ideas to other co-workers and

649  JSRET), ISSN 2278 – 0882Volume 3, Issue 3, June 2014

 

e and Japan layered building

  sed. The production of rapid

  ing are the predominate task.  t the importance is different.

  inate.

  of types of materials on to

  of a laser beam. The LCVD

  ing IC boards, laser etching

 

hysical model from a CAD

  there design, rather than a 2-  lients. Rapid prototyping for

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www.ijsret.org

650International Journal of Scientific Research Engineering & Technology (IJSRET), ISSN 2278 – 0882Volume 3, Issue 3, June 2014

complicated objects is the best manufacturing process available today. Depending on the complexity of the prototype.

They require 3 to 72 hours to build; this depends on the size and difficulty of the prototype.

ACKNOWLEDGEMENT

The author is grateful to the support of Prof. S.D. Lokhande, Principal, Sinhgad College of engineering vagabond

pune, and prof. Vanakudre HOD of mechanical engineering department.

REFERENCES

1. “Rapid Prototyping and engineering applications” by Frank W. Liou publisher CRC press 2007.

2. “Chemical Vapour Deposition" by Yan Xiu- Tian 1st ED. publisher "Springer" in 2010 engineering

materials and processes.