Simple & Versatile Solution

ICOTALD

W W W . I C O T C O M P A N Y . C O M

ICOTAtomic Layer Deposition

LA

B &

SM

AL

L S

CA

LE

AL

D S

YS

TE

MS

+ C U S T O M I Z E D A L D S Y S T E M S

+ H I G H Q U A L I T Y C O A T I N G S E R V I C E

+ C O N S U L T I N G F O R A L D R & D

+ I C O T M I N I - D E S K T O P – S I Z E A L D

Simple & Versatile Solution

ICOTALD

Sensor & flow

part

600 mm

300 mm600 mm

Carrier & source gas

flow

Exhaust

Source gas

inlet

Source

cylinder (50cc)

Manual

diaphragm

valve

Pneumatic

diaphragm

valve

ALD

chamber

Substrate holder

Vent valve

Technical specs

▪ Dimension (w × d × h) = 600 × 300 × 600 mm

▪ Chamber design : viscous flow

▪ Chamber construction : 316L stainless steel

▪ Substrate size : up to 10 mm

▪ Substrate temperature : up to 300 °C

▪ Ports : up to 3 precursor lines available

▪ Precursor cylinder : Swagelok® 50 cc cylinder

▪ Carrier gas : N2 mass flow controlled, 20 SCCM

▪ Controls : LabVIEW TM software (NI 9472)

▪ Certification : Federal Communications Commission (FCC)

Chamber & precursor delivery> Suitable for small scale prototype production> Low precursor consumption

Cabinet & control> Compact design> Digital sensors & controllers for precise operation

Software> User-friendly interface> Compatible with PC & mobile platform

Basic model (ICOT mini basic)

A simple, versatile ALD system for various R&D needs

SP

EC

IF

IC

AT

IO

NBasic model + Glove Box (Option)

Options

▪ Heating jacket unit

▪ Powder coating assembly

▪ Glove box unit

Small system size similar to a desktop computer

Simple & Versatile Solution

ICOTALD

A simple add-on, a powerful result – powder coating

▪ Enabling of powder ALD by mounting multi-directional flow type powder holder

▪ Facile handling and compatibility with existing chamber

▪ Conformal and uniform coating on powder

Conformal coating.

> Uniform ultra-thin coating on 3D-complex structure> Able to coat thin film with well-crystallized lattice structure

Pure composition.

> High quality films with low impurity level> Precise stoichiometry and thickness control

Assemblies for powder coating.

> A simple add-on for enabling powder coating

> Various customization (volume, length and etc.)

High quality ALD thin film

▪ Research solutions for small-scale labs, universities and companies

▪ Rapid prototyping with easy-to-use device operation

▪ Reproducible nanoscale thin film with high quality

Uniform coating on powder.

> Conformal and uniform coating through multi-directional flow

> Appropriate for small-scale prototyping

0200400600800100012001400In

ten

sit

y (

a.u

.)

Binding Energy (eV)Z

n 2

s

Zn

2p

Zn

2p

O 1

s

Zn

3s

Zn

3p

Zn

3d

Polycrystalline

YSZ

Ag

ALD nano-laminate

Bare powder After deposition

ZnO 100cycles

Uniform

coating on

powder

OU

R S

ER

VI

CE

S

Materials

Applications

▪ For R&D use in energy, electric device, fuel cell etc.

Paper published using ICOT ALD

1. Shim et al., J. Mater. Chem. A, 1 (2013)

2. Son et al., J. Vac. Sci. Technol. A 31 (2013)

3. Park et al., J. Vac. Sci. Technol. A 32 (2014)

4. Choi et al., Appl. Phys. Lett. 104 (2014)

5. Choi et al., J. Electrochem. Soc. 162 (2015)

6. Lee et al., J. Vac. Sci. Technol. A 33 (2015)

7. Park et al., J. Vac. Sci. Technol. A 33 (2015)

8. Jeong et al., ACS Catal. 5 (2015)

9. Kim et al., Electrochimica Acta 184 (2015)

10. Neoh et al., Nanotechnology 27 (2016)

11. Jeong et al., ACS AMI 8 (2016)

12. Han et al., Chem. Eng. J. 328 (2017)

13. Alizera et al., ACS Omega. 2 (2017)

ICOT Inc.8, Nonhyeon-ro 102-gil, Gangnam-gu, Seoul, South KoreaTel : +82-2-741-1532E- mail : hjchoi@icotcompany.comHomepage : www.icotcompany.com

ALD research trend related review papers

1. George et al., Chem. Rev. 110 (2010)

2. Kim et al., Adv. Funct. Mater. 20 (2010)

3. Cassir et al., J. Mater. Chem. 20 (2010)

4. Elam et al., MRS Bull. 36 (2011)

5. Marichy et al., Adv. Mater. 24 (2012)

6. Peng et al., J. Vac. Sci. Technol. A 30 (2012)

7. Miikkulainen et al., J. Appl. Phys. 113 (2013)

8. Shim et al., J. Mater. Chem. A, 1 (2013)

9. Parsons et al., J. Vac. Sci. Technol. A 31 (2013)

10. Johnson et al., Mater. Today. 17 (2014)

11. Malachi et al., ACS Nano 9 (2015)

12. Shim et al., J. Mater. Chem. C 5 (2017)

Simple & Versatile Solution

ICOTALD

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There are many more materials and processes available in ALD today.Contact us for your specific needs.

Installation List

REFERENCES CONTACT US

▪ Stanford University, USA

▪ Korea University, Korea

▪ Seoul National University, Korea

▪ SNUST, Korea

▪ UC Merced, USA

▪ DGIST, Korea

▪ Youngyiel precision Inc., Korea

▪ Binary oxides1-8

Al2O3, ZnO, TiO2, SnO2, HfO2, Y2O3, ZrO2,

Li2O, SrO, CoOx, La2O3, CeO2 and etc.

▪ Ternary/quaternary oxides4-8

YSZ, SnOx-POX, SrTiO3,

Sr-doped LaCoO3 (LSC) and etc.

▪ Metals9-10

Pt, Pd, Ru and etc.