Furnaces and wet benches

Savitha P

Boron Diff-

off hrs

Boron- non offhrs

Dry-ox- off

hrs

dry ox- non

off hrs

M An-

neal- off hrs

MA- non

off hrs

pyro ox- of-

fice hrs

pyro- non

office hrs

Phos Diff- office hrs

Phos- non

office hrs

LP-CVD SiN

(tube 3)- of-fice hrs

LP-CVD SiN- non

office hrs

Used 28 0 NaN 110 0 NaN 16 0 NaN 60 0 NaN 40 0 NaN 88 0

Not Used 120 0 NaN 38 0 NaN 148 0 NaN 88 0 NaN 108 0 NaN 60 0

Downtime 0 0 NaN 0 0 NaN 0 0 NaN 0 0 NaN 0 0 NaN 0 0

Unavail-able

32 450 NaN 32 450 NaN 16 450 NaN 32 450 NaN 32 450 NaN 32 450

Total 180 450 NaN 180 450 NaN 180 450 NaN 180 450 NaN 180 450 NaN 180 450

25

75

125

175

225

275

325

375

425

475

Equipment Utilization Chart

Tota

l hrs

• TEOS installed– problems stabilizing temperature and pressure

• Solved with First Nano’s help

– Under optimization• Status of new equipments

– Idonus HF vapouriser: Open for user training– AS one 150 RTP: Under installation– Ultrascan wafer curvature measurement: tool arrived

• Tool distribution– First Nano furnaces (10 tubes) + Tempress (2 tubes) + RTP (2) + IV-

CV + Four probe+ Dektak + maintenance : Raghu, Madhuri & Mirji– Wet benches (8) + HF vapouriser + Chemical storage: Deepa and

Ujwala– CPD + Electroplating + ALD : Advaitha

Furnaces & Wet benches - update

Thank you