iTrap® by ZEISS

www.zeiss.com/iTrap

Control your process.In real time.

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ZEISS iTrapHighly sensitive, fast, robust and compact

The new ZEISS iTrap is a highly sensitive process analyzer based on a Fourier Transform mass spectrometer. It monitors reaction products and chamber health in real time.

ZEISS iTrap is an ideal tool for inline process control and trouble shooting when integrated with a production chamber, but also for process analytics in an R&D environment.

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iTrap® by ZEISS

› Introduction

› Benefits

› Applications

› Configuration

› Working Principle

› Software

› technical data

› ZeiSS

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Experience creates trust

ZEISS looks back on nearly 50 years of history in semi-

conductor manufacturing technology. Since 1968,

ZEISS has been shaping and driving the era of micro-

electronics. With our diverse product portfolio, we

cover a wide range of key processes in microchip

manufacturing, including optical lithography and

mask optimization. Our technologies continuously

advance the miniaturization of structures on micro-

chips, enabling chip manufacturers to produce

microchips that are ever smaller, faster and more

energy-efficient.

Our roadmap is drawn for the long term and focuses on the needs of our markets and customers around

the globe. We have taken the first step into the future microchip production with EUV lithography.

By further developing and optimizing EUV lithography systems we discovered the needs for detecting

contaminants in vacuum chambers at extremely low concentration levels. As there were no commercial tools

available on the market with adequate sensitivity, speed and robustness, we decided to develop a tool

by ourselves: iTrap®.

iTrap® by ZEISS

› Introduction

› Benefits

› Applications

› Configuration

› Working Principle

› Software

› technical data

› ZeiSS

iTrap® provides key benefits for process control

SpeedMass spectrum

in ~ 0.5 sec

Sensitivityppb concentration

in ~ 0.5 sec

Compactness3D ion trap at the size of

an apple

RobustnessNo fragile detectors, inert

surfaces only

• Online process control

of etch and deposition

processes

• Real time contamination

monitoring

• Traces of reaction products

and contaminants can be

monitored where typically

off-line analytics had been

used so far

• Sensor can be directly

flanged to process tool via

leak check port or exhaust

line

• Sensor is insensitive to H2

and aggressive etch

gases, resulting in low

maintenance

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iTrap® by ZEISS

› Introduction

› Benefits

› Applications

› Configuration

› Working Principle

› Software

› Technical Data

› ZEISS

iTrap® enables process analytics and advanced process control

Process Analytics andTrouble Shooting

n Evaluate etch byproducts to

optimize chemistry selection

n Watch real time evolution of

etched species for process

development

n Identify run-to-run and

wafer-to-wafer variations

n Identify Memory effects from

unefficient cleans

n Assess size of process window

by response of mass spectra to

parameter variation

Chamber Health

n Evaluate effectiveness of

pre/post cleans in eliminating

contaminant species e.g. metal

halides

n Identify mismatched chambers

and do root cause analysis faster

n Monitor byproducts to predict

chamber lifetime ahead of

inline signals

n Investigate atmospheric leaks

and changes in incoming gas

purity and composition

Process Control

n Call Change Point of

Critical Etch Processes

based on mass spectra

changes

n Call End Point of

cleans to guarantee

efficient cleaning and

minimize process time

n Proactively guard

against leaks and

changes in gas

composition

Productconfigurationwith max.flexibility forR&D and troubleshooting

Productconfigurationfor directintegration witha processchamber

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Real time full mass spectral information from iTrap®

Process Yield / Uptime / Tool Matching

iTrap® by ZEISS

› introduction

› Benefits

› Applications

› Configuration

› Working Principle

› Software

› technical data

› ZeiSS

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Versatile configurations matching to your needs

PGA 1000 atmospheric

n For pressures from P ≤ 10-3 mbar (standard)

up to atmospheric pressure (optional, advanced

gas inlet package)

n To be coupled to your process chamber

(e.g. CVD and etch processes)

PGA 1000 mobile

n For R&D and process engineers

n Maximum flexibility

n Based on a cart

PGA 1000 vacuum*

n For p < 1E-6 mbar (< 1E-6 torr)

n To be integrated in UHV process chamber

(e.g. UHV processes or as add-on detector in

analytics tools)

* PGA = Process Gas Analyzer

~ 150 mm

~ 300 mm

Three configurations are available based on one proven technology platform.

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iTrap® by ZEISS

› introduction

› Benefits

› Applications

› Configuration

› Working Principle

› Software

› technical data

› ZeiSS

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Configuration PGA 1000 mobile

Analyte from

Customer Process Chamber

(1E-3 mbar...1000mbar)

VCR ¼“

iTrap® cage incl. turbo pump,

with M8 mounting interfaces Mobile Cart with electronics

iTrap® technology based on a flexible and cleanroom compatible cart for R&D and trouble shooting

Data System

Rough Pump

Main Power Supply

115 V / 220 V

Pressurized air

TTL Trigger input

Ethernet

Find all relevant information about the ZEISS iTrap in a short video: www.zeiss.com/iTrap/video

iTrap® by ZEISS

› introduction

› Benefits

› Applications

› Configuration

› Working Principle

› Software

› technical data

› ZeiSS

8

Working Principle

Ion Filtering & Detection

n Electron impact (70 eV) generates ions

n Ions are trapped in 3D quadrupole trap by an RF

electric field

n Ion oscillation frequency directly relates to

m/z ratio

n Metal electrodes detect superposition of

electrical signals of all ions

n FFT of electrical signal yields full mass spectrum

in a single shot

Sign

al in

tens

ity [m

V]

Popu

latio

n

n Increased sensitivity and dynamics through

accumulation of ions

n Ion species can be selectively accumulated and

measured, resulting in superior dynamics for

trace constituents

n The same ion population can be repeatedly

measured to improve S/N ratio

Time [ms] Mass/Z

60 80 100 120 140 160

FFT

Find all relevant information about the ZEISS iTrap in a short video: www.zeiss.com/iTrap/video

iTrap® by ZEISS

› introduction

› Benefits

› Applications

› Configuration

› Working Principle

› Software

› technical data

› ZeiSS

9

System Control Parameters

Session Browser

Ion Signal

Mass

Spectrum

1 2

3

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Software Tailored to your needs

iTrap® features an embedded system, allowing for

data processing in Standalone Mode without PC.

Measurements are self-triggered or triggerd

remotely by process control systems.

Log in as a Manufacturing Engineer:

n Start / stop pre-defined jobs

n View output data

Log in as a Process Development Engineer:

n Modify job sequences

n Generate new jobs

n Analyze data in detail

n Export data for further data analysis

Graphical User Interface

simple, intuitive, efficient

n All control parameters are accessible on a single

screen.

n Both Ion Signal and Mass Spectrum are visible

for online analysis.

n Measurements are stored in a session browser

within the workspace for immediate access.

n All measurements can be automatically saved

and exported.

iTrap® can also be controlled directly from a PC by

an intuitive graphical user interface :

iTrap® by ZEISS

› introduction

› Benefits

› Applications

› Configuration

› Working Principle

› Software

› technical data

› ZeiSS

Type

Configuration

Mass Range

Mass Resolution

Ionization Method

Working pressure inside gas analyzer

Max. Temperature

Software Config

Material Exposed

Cable length

Weight

Certification

Cleanroom Compatibility

INPUT interfaces

OUTPUT interfaces

Dry Pump

Cooling

User interface

User Output

PC

Ion Trap based Fourier Trap Mass Spectrometer

PGA 1000 atmosphericPortable Analyzer, with separate electronics rack for transport and control Software

15..200 amu

> 200 m/∆m

EI (70 eV), W/Ta filament (Y coating optional)

1E-6 mbar or below (internal turbo pump)

Up to 150°-200°C (internal temperature)Bakeout jacket optional

V19.1

304L Stainless Steel, 316L Stainless Steel, Alumina Ceramic Al2O3 98% min., Nickel, Copper, Gold, Wolfram, Tantal

Standard 5 m between analyzer and 19“ electronics rack

Sensor head < 50 kg, including turbo pump, excluding cables and separate electronics rack

CSA and CE

Yes

Analyte gas: 1E-3 mbar...1000 mbar input, CF or VCR ¼“ fitting, closest possible to chamberPressurized Air: 7.2 bar absPower Supply: 115 V / 220 V, 60 Hz, 250 W (max 2000 W during bakeout)Optional: calibration gas, purge gas

Forevacuum by dry pump (to be provided by customer)Data: EthernetHeat: approx. 300 W to ambient

To be provided by customer, pumping speed ≥ 5 cbm/h, p ≤ 0.1mbar, interface KF16

Air cooling of Turbo and electronics

ZEISS Software GUI on customer‘s PC (tb provided by customer)

Mass spectrum in HDF5 format

To be provided by customer, 64 Bit Operating System Windows 7, RAM ≥ 16 GB, Hard disk ≥ 1 TB, CPU Intel i5 or better, Ethernet access recommended; remote access to PC recommended

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Technical DataConfiguration: PGA 1000 atmospheric

iTrap® by ZEISS

› introduction

› Benefits

› Applications

› Configuration

› Working Principle

› Software

› Technical Data

› ZeiSS

11

ZEISS – An internationally leading enterprise

Manufacturing site

Sales and service site

Research and development site

ZEISS is an internationally leading technology enterprise operating in the fields of optics and optoelectronics. In the previous fiscal year, the ZEISS Group generated annual revenue totaling more than 5.8 billion euros in its four segments Industrial Quality & Research, Medical Technology, Consumer Markets and Semiconductor Manufacturing Technology (status: 30 September 2018).For its customers, ZEISS develops, produces and distributes highly innovative solutions for industrial metrology and quality assurance, microscopy solutions for the life sciences and materials research, and medical technology solutions for diagnostics and treatment

in ophthalmology and micro-surgery. The name ZEISS is also synonymous with the world's leading lithography optics, which are used by the chip industry to manufacture semiconductor components. With approximately 30,000 employees, ZEISS is active globally in almost 50 countries with around 60 of its own sales and service companies, more than 30 production sites and around 25 development sites.

For more information please visit us at www.zeiss.com/iTrap

iTrap® by ZEISS

› introduction

› Benefits

› Applications

› Configuration

› Working Principle

› Software

› technical data

› ZEISS

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Headquarters:Carl Zeiss SMT GmbHZEISS GroupRudolf-Eber-Strasse 273447 OberkochenGermanyTel. +49 7364 20 0Fax +49 7364 20 6808info.smt@zeiss.com

Carl Zeiss Co. Ltd. ZEISS Group22 Honshio-cho, Shinjuku-kuTokyo 160-0003JapanTel. +81 3 3355 0256Fax +81 3 3358 7554info@zeiss.co.jp

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www.zeiss.com/iTrap

Learn more under www.zeiss.com/iTrap

iTrap® by ZEISS

› introduction

› Benefits

› Applications

› Configuration

› Working Principle

› Software

› technical data

› ZeiSS