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EUVEUV LITHOGRAPHYLITHOGRAPHY2006 EUVL Symposium, 16-18 October 2006ASET, Takeichi 1
Accuracy of the ASET Dilatometer for Low Thermal Expansion Materials
Yoshimasa Takeichi, Iwao Nishiyama Association of Super-Advanced Electronics Technologies
(ASET)EUV Process Technology Research Laboratory
Naofumi YamadaNational Institute of Advanced Industrial Science and Technology
(AIST) National Metrology Institute of Japan
(NMIJ)
EUVEUV LITHOGRAPHYLITHOGRAPHY2ASET, Takeichi 2006 EUVL Symposium, 16-18 October 2006
Acknowledgement
This work was supported by the New Energy and
Industrial Technology Development Organization
(NEDO).
EUVEUV LITHOGRAPHYLITHOGRAPHY3ASET, Takeichi 2006 EUVL Symposium, 16-18 October 2006
Outline
1. Background
2. Methodology Principle & design of the dilatometer
3. Results Performance of the dilatometer
Repeatability, Resetability, Accuracy
4. Status of user use
5. Summary
EUVEUV LITHOGRAPHYLITHOGRAPHY4ASET, Takeichi 2006 EUVL Symposium, 16-18 October 2006
1. Background
2. Methodology Principle & design of the dilatometer
3. Results Performance of the dilatometer
Repeatability, Resetability, Accuracy
4. Status of user use
5. Summary
EUVEUV LITHOGRAPHYLITHOGRAPHY5ASET, Takeichi 2006 EUVL Symposium, 16-18 October 2006
(Change in substrate temperature)
Exposure
Before After
Expansion(Shrinkage)
Background (1): CTE Requirement
Mask stage
source
λ:13nm
Waferstage
Illumination Optics
Projection Optics λ:13.5 nm
Reflective Optics
ML,Reflectance :<70%)
Exposure under vacuum
Exposure deforms mask.
Configuration of EUVL system
CTE: Coefficient of Thermal Expansion
Difficult requirement to meet
No commercial dilatometer that meets EUVL requirements
Obstacle to the development of LTEMs
SEMI standards (Class A)0±5 ppb/゚C(19-25゚C)1ppb = 0.1nm (@10cm)
Strong demand for a metrology that meet EUVL
requirement
EUVEUV LITHOGRAPHYLITHOGRAPHY6ASET, Takeichi 2006 EUVL Symposium, 16-18 October 2006
Background (2): CTE Metrology Development Project
Metrology andpatent ownership
EUVL technologyLTEM developer
Metrology user
Research organizationsLTEM suppliers
DevelopmentDevelopmentteamteam
Equipment supplierEquipment supplierOptical heterodyne interferometer,
Thermal control technique
SpecificationsPerformance
evaluation
Manufacture of equipment
Equipment design
EUVEUV LITHOGRAPHYLITHOGRAPHY7ASET, Takeichi 2006 EUVL Symposium, 16-18 October 2006
Background (3): Goal and Targets
Overall Goal• To establish a CTE metrology tailored to meet EUVL
requirements and help bring EUVL closer to the stage of practical use
Target
• Resolution: 1 ppb/゚C or less
• Repeatability(σ): 1 ppb/゚C or less
EUVEUV LITHOGRAPHYLITHOGRAPHY8ASET, Takeichi 2006 EUVL Symposium, 16-18 October 2006
1. Background
2. Methodology Principle & design of the
dilatometer
3. Results Performance of the dilatometer
Repeatability, Resetability, Accuracy
4. Status of user use
5. Summary
EUVEUV LITHOGRAPHYLITHOGRAPHY9ASET, Takeichi 2006 EUVL Symposium, 16-18 October 2006
AOM
AOM
APD1
He-Ne laser
Spec
imen
Reflector
PBS
Referencelight
Measurementlight
Light frequency 1
Light frequency 2
APD2
Change in length due to change in temperature
Vacuum chamber
Ther
mal
con
trol b
lock
Ther
mal
con
trol b
lock
AOM
AOM
APD1
He-Ne laser
Spec
imen
Reflector
PBS
Referencelight
Measurementlight
Light frequency 1
Light frequency 2
APD2
Change in length due to change in temperature
Vacuum chamber
Ther
mal
con
trol b
lock
Ther
mal
con
trol b
lock
Phase difference between APD1 and APD2 at T1: ( φAPD2 -φAPD1)T1
Phase difference between APD1 and APD2 at T2: ( φAPD2 -φAPD1 )T2
( )λπφφ L
APDAPDΔ
=−Δ2
12
Change in phase difference between T1 and T2:
Methodology (1): Principle of Measurement
ΔL:Change in length
(Quadruple - sensitivity)
Optical heterodyne interferometry
Intensity of superimposed light
Electric field intensity
( )1111 2cos φπ += tfaE
( )2222 2cos φπ += tfaE
221 EEI +=
{ }φπ Δ+++
= tfaaaab2cos2
2 21
22
21
( ) ( ){ }212121
22
21 2cos2
2φφπ −+−+
+= tffaaaa
EUVEUV LITHOGRAPHYLITHOGRAPHY10ASET, Takeichi 2006 EUVL Symposium, 16-18 October 2006
Methodology (2): CTE Calculation
Determination of sample length
Determination of change in sample length due to thermal expansion
Stability of thermo control and determination of temperature
This term has a large influence.
This term has little influence.
This term has little influence.
Consideration of error factors
TLLCTE
Δ⋅
Δ=
1
0
( ) ( ) αδδαδδαTLsp
total TT
TLL
LL
⎥⎦⎤
⎢⎣⎡ΔΔ
+Δ⎥
⎦
⎤⎢⎣
⎡ Δ+⎟⎟
⎠
⎞⎜⎜⎝
⎛=
1
00
0 α:low
Δ T
Δ L
L0 L
EUVEUV LITHOGRAPHYLITHOGRAPHY11ASET, Takeichi 2006 EUVL Symposium, 16-18 October 2006
Methodology (3): ASET’s DilatometerEquipment supplier:CTE-01
Thermal-shield
Stone plateVibration isolation table
interferometer
Frame
Water
sample
LTEM
Inver
Peltier device
Structure of dilatometer
Pertier Device
Con
stan
t tem
pare
ture
blo
ck
radiation radiation
conduction
Con
stan
t tem
pare
ture
blo
ck
conduction
Reference
Sample
EUVEUV LITHOGRAPHYLITHOGRAPHY12ASET, Takeichi 2006 EUVL Symposium, 16-18 October 2006
Methodology (4): Example of Data Ti-doped silica glass
13.2
0
-13.2 Cha
nge
in S
ampl
e Le
ngth
[ nm
]
18
20
22
24
26
0 10 20 30 40 50 60 70 80 90 100 110 120
Time [hr]
Avg
. tem
pera
ture
[ ℃]
ΔT
-30
-20
-10
0
10
20
30
0 10 20 30 40 50 60 70 80 90 100 110 120
Time [hr]
Phas
e diff
eren
ce [d
eg.]
ΔΦ=ΔL
Change in phase difference
TLLCTE
Δ⋅
Δ=
1
0
Change in sample temperature
EUVEUV LITHOGRAPHYLITHOGRAPHY13ASET, Takeichi 2006 EUVL Symposium, 16-18 October 2006
1. Background
2. Methodology Principle & design of the dilatometer
3. Results Performance of the dilatometer
Repeatability, Resetability, Accuracy
4. Status of user use
5. Summary
EUVEUV LITHOGRAPHYLITHOGRAPHY14ASET, Takeichi 2006 EUVL Symposium, 16-18 October 2006
Results (1): Evaluation Items
• ReproducibilityRepeatability (Static) : Reproducibility obtainable from measurements of the same sample without moving it .Resetability (Dynamic) : Reproducibility obtainable from measurements involves changing the sample
• AccuracyComparison with AIST’s measurements
EUVEUV LITHOGRAPHYLITHOGRAPHY15ASET, Takeichi 2006 EUVL Symposium, 16-18 October 2006
Results (2): Reproducibility of Measurements
-20-10
01020304050
0 6 12 18 24 30 36 42 48 54 60 66 72 78 84 90 96 102
Time [hr]
Phas
e D
iffer
ence
[de
g]
(a)
18.0
20.0
22.0
24.0
26.0
0 6 12 18 24 30 36 42 48 54 60 66 72 78 84 90 96 102
Time [hr]
Tem
para
ture
(Ave
rage
) [ ℃
] (b)Change in sample temperature
Change in phase difference
a
a
ResetabilityΔCTE: ±0.85 ppb/°C
Repeatabilityσ: 0.80 ppb/°C
EUVEUV LITHOGRAPHYLITHOGRAPHY16ASET, Takeichi 2006 EUVL Symposium, 16-18 October 2006
Fig. The high precision CTEmeasurement equipment at AIST.
Results (3): AIST’s Dilatometer
EUVEUV LITHOGRAPHYLITHOGRAPHY17ASET, Takeichi 2006 EUVL Symposium, 16-18 October 2006
[ ppb/ ℃]
Sample ASET AISTExpanded
Uncert aint y(AIST)
Difference(ASET - AIST) Remarks
Quart z 460.3 461.3 2.3 -1.0 18-22 C゚, Δ T:4 C゚
LTEM-A 2.0 2.3 1.2 -0.3 19-25 C゚, Δ T:6 C゚
LTEM-B 8.3 9.6 1.1 -1.3 19-25 C゚, Δ T:6 C゚
Results (4): Accuracy of Measurements
Table. Comparison with AIST Measurement.
The differences are in the AIST’s uncertainty range. We’ve verified the accuracy of the ASET’s dilatometer.
EUVEUV LITHOGRAPHYLITHOGRAPHY18ASET, Takeichi 2006 EUVL Symposium, 16-18 October 2006
Results (5): Summary of the evaluation results
Table. Summary of the evaluation results for the dilatometer.
Target Result s Evaluat ion
Resolut ion (10-cm-long specimen) <1 ppb/ ℃ <0.35 ppb/ ℃ Good
Reproducibilit y St at ic (σ ) <1 ppb/ ℃ <0.80 ppb/ ℃ Good
Reset abilit y (Δ CTE) ------- <± 0.85 ppb/ ℃ Good
Accuracy Comparison wit h AIST ------- <1.3 ppb/ ℃ Good
Evaluat ion It ems
(wit hin t he expanded uncert aint y)
EUVEUV LITHOGRAPHYLITHOGRAPHY19ASET, Takeichi 2006 EUVL Symposium, 16-18 October 2006
1. Background
2. Methodology Principle & design of the dilatometer
3. Results Performance of the dilatometer
Repeatability, Resetability, Accuracy
4. Status of user use
5. Summary
EUVEUV LITHOGRAPHYLITHOGRAPHY20ASET, Takeichi 2006 EUVL Symposium, 16-18 October 2006
User use (1): Asahi Glass Co., Ltd.AGC has been developing
Low Thermal Expansion Material for EUVL substrate.Material : AZ (TiO2-SiO2 glass)Target of CTE property: 0+/- 5 ppb/oC (at 19-25oC)
-60
-40
-20
0
20
40
60
CTE
at 2
2oC
[ppb
/o C]
TiO2 conc. [wt%]
Fig.: Dependence of CTEon TiO2 conc. in AGC’s LTEM
AGC had investigated the dependence of CTE on TiO2 conc. in their LTEM using ASET’s dilatometer and they demonstrated the CTE at 22oC is in proportion to TiO2 concentration.
The CTE can be optimized to 0+/-5 ppb/oC by the relationship between the CTE and TiO2 conc.
Poster SessionDevelopment of Low Thermal Expansion Material and CTE measurement tool for EUVL
EUVEUV LITHOGRAPHYLITHOGRAPHY21ASET, Takeichi 2006 EUVL Symposium, 16-18 October 2006
User use (2): TOSHIBA CERAMICS CO., LTD.
T/C’s LTEM Product Development Target (6025 Sub. material)Mean CTE : ±5ppb/deg KCTE Spatial Variation : +6ppb/deg K
Now in Development
Static Measurement Stability
Change in Phase difference :Δθ=0.2°(Fig.1 red circle)
Equipment resolution isgood enough forLTEM CTE measurement!!
0 6 12 18 24 30 36 42 48 54
Phas
e D
iffer
ence
[de
g]
Fig. Change in phase differencetime [hrs]
EUVEUV LITHOGRAPHYLITHOGRAPHY22ASET, Takeichi 2006 EUVL Symposium, 16-18 October 2006
User use (3): NIHON CERATEC CO., LTD.MaterialZPF (Zero thermal expansion Pore Free ceramics)Feature :①Low thermal expansion, ②High stiffness(150GPa), ③Pore
FreeApplication:Parts for equipments of LSI manufacturing (Mirror, Chuck, etc)Measured Data Result
(1)23 to 25 ℃
14ppb/ ℃
(2)21 to 23 ℃-14ppb/ ℃18
192021222324252627
1 501 1001 1501 2001 2501 3001- 18- 16- 14- 12- 10- 8- 6- 4- 20
Data Point
Tem
pera
ture
/ ℃
⊿L /
nm
(Sample Length : 100.0 mm)
⊿(⊿L)
EUVEUV LITHOGRAPHYLITHOGRAPHY23ASET, Takeichi 2006 EUVL Symposium, 16-18 October 2006
1. Background
2. Methodology Principle & design of the dilatometer
3. Results Performance of the dilatometer
Repeatability, Resetability, Accuracy
4. Status of user use
5. Summary
EUVEUV LITHOGRAPHYLITHOGRAPHY24ASET, Takeichi 2006 EUVL Symposium, 16-18 October 2006
Summary・ An optical heterodyne interferometric dilatometer (CTE-01)
tailored to meet EUVL requirements has been developed. ・ Reproducibility of data
Repeatability, σ:<1ppb/°C, Resetability, ΔCTE:<±1ppb/°CThese values meet the target specifications.
・ Accuracy of dataThe differences are in the AIST’s uncertainty range.
We’e verified the accuracy of the ASET’s dilatometer.・ LTEM supplier have started CTE evaluation by ASET’s
dilatometer.・ The CTE-01 will be commercialized from next year. We
confirm that it will accelerate LTEM development.