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8/7/2019 3. Jessen - AOARD Physics
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AOARD Physics & Electronics16 March 2011
Gregg JessenProgram Manager
AFOSR/AOARD
Air Force Office of Scientific Research
Distribution A: Approved for public release; distribution is unlimited. 88ABW-2011-0761
AFOSR
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2011 AFOSR SPRING REVIEWAOARD Physics & Electronics
NAME: Gregg Jessen
BRIEF DESCRIPTION OF PORTFOLIO:Physics and electronics in Asia. Covers theoretical and experimentalaspects of new technologies in the areas of electronic devices, opticaldevices, nanotechnology and enabling materials over the entire
electro-magnetic spectrum. Provide support for domestic programsas needed.
Strategy for sub-area selection:1. Interesting new science2. Customer/need driven3. Funds
LIST SUB-AREAS IN PORTFOLIO:Thin-film transistors, tunable metamaterials, wide-bandgap materials,reliability physics, bio-inspired nano-fabrication, topological insulators
Needs
Funds Interest
Scope
Opportunity!
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Challenges and Opportunities
• CSWAP (Cost, Size, Weight, and Power) is acontinuous challenge
• Limitations are fundamental capacitance limitingspeed, fundamental understanding of
particle/quasi-particle interaction• Design of new materials to perform new functions
and availability of such materials
• Scaling challenges in terms of both devicephysics and techniques to produce ultra-lowdimensions
• Improving performance of low-cost devices
• Fundamental physical understanding of failuremechanisms of electronic devices
TopologicalInsulators
Activelytunable
metamaterials
Bio-inspired
nanostructures
ZnO TFTs
UF Reliability
MURI
Projects
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AOARD Physics & ElectronicsProgram Trends
• Low-cost, high performance electronics: (InGa)ZnOTFTs
• Novel fabrication techniques: Bio-nano devices
• Topological insulators
• Reliability physics (MURI and support projects)• Actively tunable metamaterials – plasma, capacitor,
FET, slow light
• Wireless interconnects: Open ring resonators
• E/M simulation: Inverse scattering algorithms
• Materials growth and characterization: Widebandgap
• THz sources
• Graphene FETs, CNT films
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Challenges and Opportunities
• For physics and electronics, CSWAP (Cost, Size,Weight, and Power) is a continuous challenge
• Limitations are fundamental capacitance limitingspeed, fundamental understanding ofparticle/quasi-particle interaction
• Design of new materials to perform new functionsand availability of such materials
• Scaling challenges in terms of both devicephysics and techniques to produce ultra-low
dimensions• Cost of production and improving device
performance for economical devices
• Fundamental physical understanding of failuremechanisms of electronic devices
TopologicalInsulators
Activelytunable
metamaterials
Bio-inspired
nanostructures
ZnO TFTs
UF Reliability
MURI
Projects
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• Search for new topological insulatormaterials
• Exploring ternary chalcogenidesbased on theoretical predictions
• Address material quality issuesinterfering with advanced transportmeasurements
• Could fabricate TI-ferromagnetdevices
• Spintronics, sensitive microwavedetectors, quantum computing
Challenges/Opportunities:
New class of materials that are internally insulating with a spin polarized conductive surface.Entirely new classes of electronic devices are possible.
New Science: Finding materials with large enough bandgap to observe physics at room temperature.Directly measuring spin polarized states remains a goal for everyone in the field.
Topological Insulators“Exploration of New Principles in Spintronics Based on Spin Hall Insulators”
Prof. Yoichi AndoOsaka University, Japan
Spin-Filtered
Surface State
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Topological Insulators: Recent Results
Phys. Rev. Lett. (Sept. 2010)
• Found new TI material: TlBiSe2
• Largest bandgap to date! 0.35 eV
• Room temperature physics possible!
• Most insulating TI materials to date!
• Bulk defects mask surface spin
• Observed surface quantum oscillation
Phys. Rev. B (Dec. 2010)
TlBiSe2
ARPES measurement
EG
Prof. Yoichi AndoOsaka Universit
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Challenges and Opportunities
• For physics and electronics, CSWAP (Cost, Size,Weight, and Power) is a continuous challenge
• Limitations are fundamental capacitance limitingspeed, fundamental understanding ofparticle/quasi-particle interaction
• Design of new materials to perform new functionsand availability of such materials
• Scaling challenges in terms of both devicephysics and techniques to produce ultra-low
dimensions• Cost of production and improving device
performance for economical devices
• Fundamental physical understanding of failuremechanisms of electronic devices
TopologicalInsulators
Activelytunablemetamaterials
Bio-inspired
nanostructures
ZnO TFTs
UF Reliability
MURI
Projects
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Challenges/Opportunities:
Metamaterials offer potential for synthetic materials with programmable properties. Manytheoretical predictions exist. Materials with real-time tunable properties can be realized.
New Science: Design tunable complex permittivity/permeability leveraging expertise in plasma physics asa function of applied voltage, pressure, gas, etc. RF band-structure properties unknown.
Actively Tunable Metamaterials“Plasma Metamaterials for Arbitrary Complex-Amplitude Wave Filters”
Prof. Osamu SakaiKyoto University
• Arrays formed by micro-cavity plasmasand double helical plasmas onmicrostrip waveguides
• Tune real and imaginary portions ofpermittivity by changing voltage andgas pressure/composition
• Control amplitude and phaseindependently by switching periodicity
• Demonstrated band-pass and phase-delay tunability in X-band range
• Materials can be flexible andaccommodate multi-input/output
• Applications include band-pass/stopfilters, arbitrary complex-valueconverters, phase-shifters
microplasma array
double-helix
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Actively Tunable Metamaterials“Plasma Metamaterials for Arbitrary Complex-Amplitude Wave Filters”
• Directly tunable permittivity viavoltage and gas pressure/composition
• Tunable in µ-second regime
n)/ (1
11m
2
2
pe
j
double-helix index plasma permittivity
-0.10 -0.05 0.00 0.05 0.10 0.15
-0.05
0.00
0.05
0.10
0.15
0.20
4
3
2
1
Im
(S21)
Re(S21
)
~10 µs
~2 µs
S21
-10 -5 0 5 100
5
10
15
Ar at 5 Torr
Ar at 50 Torr
Ar at 200 Torr
n e
1x1011
cm-3
2x1011
cm-3
5x1011
cm-3
1x1012
cm-3
2x1012
cm-3
5x1012
cm-3
1x1013
cm-3
2x1013
cm-3
5x10
13
cm
-3
Im()
Re()
He at 760 Torr
Ar: 50Torr
Ar: 5Torr
Im(ε)
Re(ε)
Ar: 760Torr
He: 760Torr
ne (cm-3)
low
high
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Challenges and Opportunities
• For physics and electronics, CSWAP (Cost, Size,Weight, and Power) is a continuous challenge
• Limitations are fundamental capacitance limitingspeed, fundamental understanding ofparticle/quasi-particle interaction
• Design of new materials to perform new functionsand availability of such materials
• Scaling challenges in terms of both devicephysics and techniques to produce ultra-lowdimensions
• Cost of production and improving deviceperformance for economical devices
• Fundamental physical understanding of failuremechanisms of electronic devices
TopologicalInsulators
Activelytunablemetamaterials
Bio-inspired
nanostructures
ZnO TFTs
UF Reliability
MURI
Projects
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Bio-Inspired Nanostructures
Prof. UraokaNAIST, Nara Japan
• Use supramolecular protein toself assemble nanostructures
• Uniform dimensions
• Low-temperature process
• Low-cost and easy process
• Can be functionalized for site
selectivity (Ag, Ti, Si)• Ferritin can be used to
incorporate Fe, Ni, and Co
• Core size controllable
“New Functional Devices Using Bio-Nano Process”
DNA RNA polymerase
Ribosome
mRNA Polypeptide
Protein
FoldingAssembly
Supramolecular protein
φ 12 nm
Ferritin
φ 7 nm
Challenges/Opportunities:
Top down lithography approaches limited at extremely small scales. Combination of bottom-up and top-down is required for next-generation devices.
New Science: Design new materials using biological self-assembly processes.
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Bio-Layer-By-Layer Method
nano-particle 1
binding
mineralization
binding
nano-particle 2
bindingprotein
• Method of stacking supramolecular proteinsto form advanced multi-layer structures
• Can be site-selective
• Can use a bio-mineralization process fordielectric formation
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Fabrication of MOS Capacitor
Bio-LBL SiO2 PECVD
deposition
Ti electrode
deposition
20 nm SiO2
3 nm SiO2
Anneal in N2
removes ferritincobalt remains
BND layer
p-Si(100)
Ti
Al
Bio-LBL Capacitor!
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C -V characteristics of MOS capacitors
With cobalt nanodot arraysWithout cobalt nanodot arrays
-10 0 100
0.4
0.8
1.2
Normalized Ca
pacitance (V)
Bias Voltage (V)
Ni CoFe
Charge injected into nanodots
• Demonstration of device potential
• More complex heterostructures
possible!
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Challenges and Opportunities
•For physics and electronics, CSWAP (Cost, Size,Weight, and Power) is a continuous challenge
• Limitations are fundamental capacitance limitingspeed, fundamental understanding ofparticle/quasi-particle interaction
• Design of new materials to perform new functionsand availability of such materials
• Scaling challenges in terms of both devicephysics and techniques to produce ultra-lowdimensions
• Cost of production and improving deviceperformance for economical devices
• Fundamental physical understanding of failuremechanisms of electronic devices
TopologicalInsulators
Activelytunablemetamaterials
Bio-inspired
nanostructures
ZnO TFTs
UF Reliability
MURI
Projects
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[µm]
[ 5 nm]
ZnO Thin Film Transistors
Prof. Yukihara UraokaNAIST, Nara, Japan
• Orbital symmetry makes carriertransport properties robust inpresence of disorder/defects
• Large bandgap (3.4 eV) – Transparent,high breakdown
• Compatible with printable, flexible,large area processing
• Cheap and abundant
• High-performance thin film deviceswith large range of applications
“Unique Degradation Phenomena under Dynamically Stressed IGZO TFTs”
Challenges/Opportunities:
Due to electronic orbital properties of ZnO materials, low-cost electronic devices can befabricated on almost any surface with very high performance
New Science: The exact nature of the carrier transport at the grain boundaries in these devices is stillbeing studied. Physical causes of degradation and instabilities are also unknown.
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100 ns
500 nsVg pulse
Vmax
Vmin
Vg pulse
Vmax
Vmin 100 ns
500 ns
-20 -10 0 10 2010
-14
10-12
10-10
10-8
10-6
10-4
Dra
in Current [A
]
Gate Voltage [V]
Before110100100010000
Stress time (s)
-20 -10 0 10 2010
-14
10-12
10-10
10-8
10-6
10-4
Dra
in Current [A
]
Gate Voltage [V]
Before110100100010000
Stress time (s)
Falling edge of the pulse accelerates degradation
TFT Electrical CharacterizationTransition Time Dependence
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Initial Switching to+Vg Switching to-Vg
Metal
IGZO
DS
Channel E C E C
DS
Channel
DS
Channel E C
Glass sub.
S
G
D
Gate Insulator
TFT Reliability PhysicsHigh-Energy-Electron Defect Formation
• Switch from +Vg -Vg: electrons gain higher energy andcreate defects at interfaces
• SIMS measurements show H decrease after stress; hotelectrons could interact with defect-passivating H and release it
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Challenges and Opportunities
• For physics and electronics, CSWAP (Cost, Size,Weight, and Power) is a continuous challenge
• Limitations are fundamental capacitance limitingspeed, fundamental understanding ofparticle/quasi-particle interaction
• Design of new materials to perform new functionsand availability of such materials
• Scaling challenges in terms of both devicephysics and techniques to produce ultra-lowdimensions
• Cost of production and improving deviceperformance for economical devices
• Fundamental physical understanding of failuremechanisms of electronic devices
TopologicalInsulators
Activelytunablemetamaterials
Bio-inspired
nanostructures
ZnO TFTs
UF Reliability
MURI
Projects
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“A 21st Century Approach to Reliability”
Prof. Mark LawU. of Florida, Gainesville
University of Florida Reliability MURI
Challenges/Opportunities:
Device reliability remains a critical issue for all DoD applications. Physical understandingand lifetime prediction are notoriously difficult.
New Science: New integrating models are being built to incorporate materials physics, E/M, carriertransport which are material independent. New nondestructive noise measurementtechniques can yield information about trap energy level and spatial location.
EA = 2.0 eV
EA = ?
*2007 Mantech. Singhal, et al. Nitronex
• Device reliability historically isan ENGINEERING approach
• NOT GOOD ENOUGH!
• We require ability to PREDICTbased on FUNDAMENTALPHYSICS
• UF approach uses object-oriented simulator to integratetheory and experiment
• Developing interesting low-frequency noise
characterization technique
D f i i
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Defect spectroscopy using noise
• 1/f noise is an indicator ofinterface quality and defects
• Lorentzian noise is anexcellent point defect probe
• Non-destructive technique
• Sensitive to pre- and post-stress measurements
• Applicable to all devices
• Early predictor for reliability:Large changes in noise areobserved even for modeststress test conditions
“A 21st Century Approach to Reliability”
Prof. Gijs BosmanU. of Florida, Gainesville
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Recent Transitions
• Metamaterials Program – AFRL/RX (Thorp, Urbas) – Plasma metamaterials; Kyoto University, Japan
– Nonlinear optical pulsed controlled metamaterials; IIT Kanpur, India
– Slow-wave metamaterials; Royal Institute of Technology, Sweden
– Electrically tunable; Macquarie University, RMIT; Australia
– Fiber Optic metamaterials; University of Sydney; Australia
– Microwave absorbers; Nanyang Tech.; Singapore
• Nano-bio processing – AFRL/RX (Grote)
– New device fabrication techniques; NAIST, Nara, Japan
• WBG pulsed CL – DARPA/MTO (Albrecht)
– Advanced materials characterization physics, Tohoku U., Japan
AOARD Discoveries Supported by Others
T f ti l O t iti
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Transformational Opportunities
http://farm1.static.flickr.com/51/143833998_bc7dd42e4c.jpg
http://s849.photobucket.com/albums/ab51/apigee/?action=view¤t=flickr-photo-map-world.png
http://uwnews.org/photos.asp?articleID=37724&spid=37725
http://www.garagesalepreview.com/ifixit-completes-early-teardown-of-iphone-4/
Low-Cost
Electronics
Crowd-sourcing
„Internet of Things‟
Composite Data
Reconstruct Environment
Humans as Sensors
Ubiquitous Sensing Paradigm Shift
AOARD Physics & Electronics
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AOARD Physics & ElectronicsSummary
• AOARD Physics & Electronics Strategy:
– Focus on challenges outlined in TD mission statements suchas CTCs and Layered Sensing vision
– Seeks to exploit transformational opportunities
• Current Areas Discussed:– Enabling Physics and Materials: Topological Insulators
– Actively Tunable Metamaterials: Plasma based
– Low Cost Devices and Integration Techniques: Bio-nano, ZnO
– Reliability: ZnO, MURI
• New opportunities observed for „low-grade‟ electronics
• Portfolio always adapts to new opportunities
AOARD Physics & Electronics
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AOARD Physics & ElectronicsSummary
Thank You!Questions?