118
© REP 06/23/22 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n + L Channel region p-type substrate (Body) Metal Oxide (SiO 2 ) n + MOSFET = Metal Oxide Semiconductor Field Effect Transistor Four terminal device (gate, source, drain, substrate) Unipolar transistor – one type of charge carrier FET is a current control mechanism based on an electric field established by the voltage applied to the control terminal

© REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

Embed Size (px)

Citation preview

Page 1: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-1

NMOS Field Effect Transistor

Gate (G)Source (S)

Body (B)

Drain (D)

n+

L

Channel region

p-type substrate (Body)

MetalOxide (SiO2)

n+

MOSFET = Metal Oxide Semiconductor Field Effect Transistor Four terminal device (gate, source, drain, substrate) Unipolar transistor – one type of charge carrier

FET is a current control mechanism based on an electric field established by the voltage applied to the control terminal

Page 2: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-2

NMOS Cross-section

GS

D

B

Metal

Metal or Polysilicon

Oxide (SiO2)

SourceRegion

DrainRegion

ChannelRegion

P-type substrate(body)

L

W

n+

n+

Page 3: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-3

Creating a Channel for Current Flow

A positive voltage is applied to the gate which forms an inversion layer, or an n-type channel

G

S

B

D

n+

L

p-type substrate (Body)

Induced n-typechannel

n+

+vGS

-

Depletion region

Page 4: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-4

Operation with Small vDS

G

S

B

D

n+

p-type substrate (Body)

Induced n-type channel

n+

+vGS

-

+vDS (small)-

iDiG=0

iS=iD

vDS(mV)

iD(mA)

50 100 150 200

0.4

0.3

0.2

0.1

vGS Vt

vGS=Vt+1V

vGS=Vt+2V

vGS=Vt+3V

vGS=Vt+4ViD

Page 5: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-5

Exercise 5.1

Note that in the small signal linear range, iD is proportional to (vGS-Vt)vDS Find the constant of proportionality for the device below and the range of drain-to-source resistance for vGS=2V to 5V

2502440 : point1 mA/V.V)V(.mA. 2502110 : point2 mA/V.V)V(.mA.

vDS(mV)

iD(mA)

50 100 150 200

0.4

0.3

0.2

0.1

vGS Vt

vGS=Vt+1V

vGS=Vt+2V

vGS=Vt+3V

vGS=Vt+4V

Vt=1V

point 1

point 1

KmA

mVR 2

1.

200

i

v : 4VVv

D

DSDStGS

5004.

200

i

v : 4VVv

D

DSDStGS mA

mVR

Constant of proportionality

Drain-to-source resistance

Page 6: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-6

Uniform Channel Approximation

Assumptions Uniform behavior in the z (channel width)

direction The mobility is a constant The x directed electric field is

approximately a constant within the channel thickness (ych) at a given x. This is known as the gradual channel approximation.

At a given x, The current is constant, independent the

location of the chosen cross-section (i.e. independent of x)

n+x = 0

y

x = Lx

VS VD > VS

p-type depletion region edge

n+ inversion channel

J x y z q n E x y zn n x, , , , x, y, z

dydzxEzyxqnxI xn

yy

y

Wz

zn

ch

0 0,,

VG>>VD and VS

Channel charge

xE

yE

yE

Area

WW=width

Page 7: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-7

Charge per unit length in the channel (VGS >> VDS)

dxVxvvWCxdq tGSox

oxox

rSiO

ox

oxox t

cmFx

ttC

14

01085.89.3

2

channelsource drain

dx

Charge dq

dt

dxvelocity

dx

xdvEx

v(x) = the voltage at point x

dv(x)=the incremental voltage about point x

Gate Oxide

Gate Electrode (metal)

The voltage drop between thegate and the channel, in excessof the threshold voltage Vt

determines the amount of charge

VGS

v(x)

Page 8: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-8

Derivation of the MOSFET current equation in the Linear Region of Operation

I dz qn x y dy E x

Q x

n nw

W

y

y

x

inversion

ch

0 0

,

'

W

dx

xdvxE

dt

dxnn

dx

xdvxE

dt

dxnn

tGSox

n

VxvvWCdx

xdqdx

xdvvelocity

dt

dx

dt

dx

dx

xdq

dt

dqi

xdvVxvvWCdxi tGSoxnD

DSv

tGSoxn

L

D xdvVxvvWCdxi00

2

2DS

DStGSoxnD

vvVv

L

WCi

200mVvDS

vGS=Vt + 1V

vGS=Vt + 2V

vGS=Vt + 3V

tGS Vv

iDS

Terminal potentials

Layout GeometriesProcessTechnology

Page 9: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-9

Exercise 5.2

Find the expression for rDS=vDS/iD when vDS is small. Find the value of rDS for an NMOS transistor having k’n=20mA/V2,Vt=1V, and W/L=100m/10m when operated at vGS=5V

tGSnD

DSDS

DStGSnDDS

DSDStGSnD

VvLW

ki

vr

vVvL

Wkiv

vvVv

L

Wki

'1

': smallfor

2'

2

kr

VVmm

VAi

vr

DS

D

DSDS

25.1108001

1510100

201

6

2

Page 10: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-10

Operation as vDS is Increased

G

S

B

D

n+

p-type substrate

n+

+vGS

-

+vDS

-

Page 11: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-11

Channel pinch off

Increasing vDS causes the channel to acquire a tapered shape

Eventually, as vDS reaches vGS-Vt, the channel is pinched off at the drain end

Increasing vDS above vGS-Vt has little effect (theoretically no effect) on the channel’s shape

Source Channel DrainvDS

vDS vGS-Vt

vDS 0

Page 12: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-12

Operation as vDS is Increased (cont.)

vDS

iD

vDS vGSVtvDS vGSVt

vDSsat vGSVt

vGSVt

Triode Saturation

Curve bends because the channel resistance increases with vDS

Almost a straight line with slope proportional to (vGS-Vt)

Current saturates because the channel is pinched off at the drain end, and vDS no longer affects the channel

Page 13: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-13

Higher Drain Voltages (pinch-off)

n+x = 0

y

x = Lx

VS=0VD > VS

p-type depletion region edge

n+ inversion channel

yE

yE

xE

VDS=VGS-Vt=2V

For Example VG=3V Vt=1VVGD=VG-VD=1V just Vt

VGS=VG-VS

VGS=3V

Page 14: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-14

The Saturation Region of Operation

2

2

2

'2

1

2'

in substitute and 2

'

tGSnoxD

tGStGStGSnoxD

tGSDSDS

DStGSnoxD

VVCL

WI

VVVVVVC

L

WI

VVVV

VVVCL

WI

Square Law - i.e The current is proportional to the voltage in excess of the threshold squared

Page 15: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-15

MOSFET Transistor Operating Regions Summary

Figure taken from Semiconductor Devices, Physics and Technology, S. M. Sze,1985, John Wiley & Sons

Linear (triode)Region

Pinchoff - onset ofSaturation Region

Saturation Region

Page 16: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-16

MOSFET Operation Summary

oxnn Ck 'Let:

Triode Region: vGS >Vt, vDS < vGS-Vt

DSλVtGSnD VVL

Wki 1

2'2

1

Saturation Region: vGS >Vt, vDS vGS-Vt

2'

2DS

DStGSnD

vvVv

L

Wki

Electron mobility: n 580 cm2/Vs

Oxide permittivity: ox =3.97o

= 3.97 X 8.85 X 10-14 =3.5 X 10-13 F/cm

Oxide Capacitance: Cox =ox/tox

= 1.75 fF/m2 for tox=0.02m = 0.35 fF/m2 for tox=0.1mProcess transconductanceparameter: k’n= nCox =ox/tox

= 100V2 for tox=0.02m = 20V2 for tox=0.1m

Typical Process-TechnologyParameter Values

Page 17: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-17

PMOS Field Effect Transistors

Gate (G)Drain (D)

Body (B)

Source (S)

p+

L

Channel region

n-type substrate (Body)

MetalOxide (SiO2)

p+

Page 18: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-18

Sub-threshold Region

I eD

V

nGB

t constant 0 In the sub-threshold regime

3t

weak inversion

junction leakage

VDS

ID

VGS sub-threshold

Moderate inversion

Bipolar-like behavior

MOS behavior

Small current level < ~1A

Page 19: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-19

CMOS technology

Figure taken from supplemental material for Digital Integrated Circuits, A Design Perspective, Jan M. Rabaey,1996, Prentice Hall

Page 20: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-20

MOSFET Circuit symbols

D

S

G

D

S

GB

S

D

G

S

D

G B

NMOS PMOS

Page 21: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-21

The iD-vDS Characteristics (NMOS)

Figure taken from supplemental material for Digital Integrated Circuits, A Design Perspective, Jan M. Rabaey,1996, Prentice Hall

0.0 1.0 2.0 3.0 4.0 5.0

v DS (V)

1

2

i D (

mA

)

Triode

V GS = 5V

VGS = 3V

VGS = 4V

V GS = 2V

V GS = 1V

i D as a function of vDS

Squ

are

Dep

ende

nce

V DS = V GS -V t

Saturation

vDS

vGS

+

-

+

-

iG=0

iD

iS=iD

Page 22: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-22

iD vs. vGS Characteristic for an NMOS transistor in saturation

iDS

vGS (V)

vDS vGS-Vt

Vt

2'2

1tGSnD VV

L

Wki

Page 23: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-23

Large Signal Model of a MOSFET in Saturation

2'2

1tGSnD VV

L

Wki

G

S

D

iG=0 iD

+

-

+

-

vGS vDS

vDS vGS-Vt

vGS Vt

Page 24: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-24

Finite Output Resistance in Saturation

Source Channel Drain

vDSsat vGS-Vt +- +- vDS-vDSsat

L

L

Page 25: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-25

Channel Length (Drain Current) Modulation due to changes in VDS

saturationtGSDS VVV

triode

VA = -(1/)

DStGSnDS vVVL

Wki 1

2

1 2'

Page 26: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-26

Large Signal Model of the MOSFET Incorporating the Output Resistance

2'2

1tGSnD VV

L

Wki

G

S

D

iG=0 iD

+

-

+

-

vGS vDS

vDS vGS-Vt

vGS Vt

rO

1 DD

AO I

I

Vr

Page 27: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-27

Exercises

5.3 An enhancement mode transistor with Vt=2V has its source terminal grounded and a 3V DC source connected to the gate. In which region of operation does the device operate for:

a) VD=0.5V VDS = 0.5V < VGS-Vt, in triode region

b) VD=1V VDS = 1V = VGS-Vt, in saturation region (pinch-off)

c) VD=5V VDS = 5V > VGS-Vt, in saturation region

5.4 If the transistor above has k’n=20A/V2, W=100m and L=10m, find the value of iD in the above cases - ignore the dependence of iD on vDS in saturation.

vD

+

-

+

-

3V

μAv

vVvL

Wki DS

DStGSnD 752

5.05.023

10

1001020

2' a)

26

2

AVvL

Wki tGSnD 10023

10

100

2

1020'

2

1 b) 2

62

AiD 100 c)

Page 28: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-28

Exercises

5.6 An enhancement MOSFET with k’n(W/L)=0.2mA/V2, Vt=1.5V, and l=0.02V-1 is operated with vGS=3.5V. Find iD at vDS=2V and vDS=10V. Determine rO at this value of vGS.

mAvVVL

Wki DStGSnDS 416.0202.015.15.3

2

102.01

2

1 23

2'

mAvVVL

Wki DStGSnDS 480.01002.015.15.3

2

102.01

2

1 23

2'

kmAmA

VV

i

vr

D

DSO 125

416.0480.0

210

Page 29: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-29

The iD-vDS Characteristics (PMOS)

Figure taken from supplemental material for Digital Integrated Circuits, A Design Perspective, Jan M. Rabaey,1996, Prentice Hall

0.0-1.0 -2.0 -3.0 -4.0 -5.0v DS (V)

-1

-2

i D (

mA

)

Triode

V GS = -5V

VGS = -3V

VGS = -4V

V GS = -2V

V GS = -1V

V DS = V GS -V t

Saturation

vDS

vGS

+

-

+

-

iG=0

iD

iS=iD

Page 30: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-30

n-channel Enhancement Mode MOS Transistors

Enhancement Mode Transistors. A normally open switch. At zero volts on the gate no current flows ( a positive Voltage must be applied to the gate to enhance a channel of electrons)

n n

p substrate

Drain

Source

Gate Substrate

Gate DrainSource

n-channel

IDS

+VGS-VGS0

Source - where electrons come from (-)Drain - where electrons flow to (+)

Channel is enhanced (resistive)

Channel is off

Page 31: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-31

n-channel Depletion Mode MOS Transistors

Depletion Mode Transistors. A normally closed switch. At zero volts on the gate a current flows ( a negative Voltage must be applied to the gate to deplete the channel of electrons)

n n

p substrate

Drain

Source

Gate Substrate

Gate DrainSource

n-channel

IDS

+VGS-VGS0

Source - where electrons come from (-)Drain - where electrons flow to (+)

Channel is depleted (Off)

Channel is made stronger

Page 32: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-32

p-channel Enhancement Mode MOS Transistors

Enhancement Mode Transistors. A normally open switch. At zero volts on the gate no current flows ( a negative Voltage must be applied to the gate to enhance a channel of holes)

p p

n substrate

Drain

Source

Gate Substrate

Gate DrainSource

p-channel

IDS

+VGS-VGS

0

Source - where holes come from (+)Drain - where holes flow to (-)

Channel is enhanced

Page 33: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-33

p-channel Depletion Mode MOS Transistors

Depletion Mode Transistors. A normally closed switch. At zero volts on the gate a current flows ( a positive Voltage must be applied to the gate to deplete the channel of electrons)

p p

n substrate

Drain

Source

Gate Substrate

Gate DrainSource

p-channel

IDS

+VGS-VGS

0

Source - where holes come from (+)Drain - where holes flow to (-)

Channel is depleted

Page 34: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-34

The Body or Back Gating Effect on Threshold Voltage

Gate (G)Source (S)

Body (B)

Drain (D)

n+ Channel region

p-type substrate (Body)

n+

Vbody-Source=0

Vt0

ox

SiA

fSBftt

C

qN

VVV

2

220

Gate (G)Source (S)

Drain (D)

n+ Channel region

p-type substrate (Body)

n+

Vbody-Source Slightly(<0.4V)ForwardBiased

Gate (G)Source (S)

Drain (D)

n+ Channel region

p-type substrate (Body)

n+

Vbody-Source ReverseBiased

A slightslight body to source forward bias raises the potential of the electrons in the substrate reducing the gate voltage necessary to invertthe surface

Vt

A reverse body to source bias lowers the potential of the electrons in the substrate increasing the gate voltage necessary to invertthe surface

Gamma -Body EffectParameter

Page 35: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-35

Example 5.1

Design the circuit shown below so that the transistor operates at ID = 0.4 mA and VD= 1V. The NMOS transistor has Vt = 2 V, nCox = 20 A/V2, L = 10m, and W = 400 m. Assume = 0.

VV DD5

VV SS5

RD

RS

I D

I D

Since VD = 1V, we are operating in the saturation region.

1or 3

130

3420

210

4001020

2

14.0

2

1

22

23

2

GSGS

GSGS

GSGSGS

GS

tGSoxnD

VV

VV

VVV

V

VVL

WCI

kI

VVR

D

SSSS 5

4.0

)5(3

Choose VGS = 3V. Since gate is grounded, potential at the source must be -3V.

To establish +1V at the drain,

kI

VVR

D

DDDD 10

4.0

15

V D

Page 36: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-36

Example 5.2

Design the circuit shown below to obtain a current ID = 0.4 mA. Find the value required for R and find the dc voltage VD. Let the NMOS transistor have Vt = 2 V, nCox = 20 A/V2, L = 10m, and W = 100 m. Assume = 0.

VV DD10

RV D

I D

Since VDG = 0V, we are operating in the saturation region.

0or 4

040

424

210

1001020

2

14.0

2

1

22

23

2

GSGS

GSGS

GSGSGS

GS

tGSoxnD

VV

VV

VVV

V

VVL

WCI

Choose VGS = 4V since 0V < Vt and VD = 4V.

Thus,

kI

VVR

D

DDD 154.0

410

Page 37: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-37

Example 5.3

Design the circuit shown below to establish a drain voltage of 0.1V. What is the effective resistance between drain and source at this operating point? Let V t = 1 V, and kn’(W/L) = 1 mA/V2.

The MOSFET is operating in the triode region, since the drain voltage is lower than the gate voltage, and Vt is 1V.

mA 395.001.02

11.0151

I D

VV DD5

RD

VV D1.0

I D

253395.0

1.0

D

DSDS I

Vr

Effective drain-to-source resistance,

k 4.12395.0

1.05

D

DDDD I

VVR

The required resistor value,

tGSDS VVV Triode, if

Page 38: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-38

Example 5.4 NMOS

Analyze the following circuit to determine all the node voltages and branch currents, given that Vt=1V and k’n(W/L) is 1mA/V2. Neglect the channel length modulation effect (i.e. assume =0)

D

SG

+vS

-

RG1 = 10 M

RG2 = 10 M

RD = 6 k

RS = 6 k

VDD = +10 V

assumed

Since the gate current is zero (why?), the voltage at the gate is simply determined by voltage division between RG1 And RG2, and since they are equal VG is VDD/2 or 5 Volts.

Since the gate voltage is significantly higher than ground it is likely that the transistor is on, but we don not know if it is in the triode region of operation or in saturation.

We will assume that it is saturated and solve the problem and then check the validity of our assumptions (often the hard part for beginners). The saturation equations are easier to work with and that makes a good choice for starting out. If our assumptions do not check out we have to go back and use the triode region equations

The drain current has to be equal to the source current since IG is zero

VGS = 5 - 6,000(ID) And in saturation

+5 V

ID =IS

IS =ID

2'2

1tGSnD VV

L

WkI

Page 39: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-39

Example 5.4 continued

Again, in saturation

Which is a quadratic Eq. in ID

D

SG

+vS

-

RG1 = 10 M

RG2 = 10 M

RD = 6 k

RS = 6 k

VDD = +10 V

assumed

2'2

1tGSnD VV

L

WkI

22

1000,65001.02

1

DD I

V

AI +5 V

082518 2 DD II This yields two values for ID, 0.89 mA

and 0.5 mA Which is valid for our assumption of

saturation? For ID of 0.89 mA the source voltage

would be 6,000(0.00089) or 5.34 Volts which is higher than the gate voltage and since the gate to source voltage to turn the device on (i.e. threshold voltage) is +1 Volt the device would be off not saturated this answer is not valid.

For ID of 0.5 mA the source voltage would be 6,000(0.0005) or 3 Volts which means the gate to source voltage is 5-3 or 2 Volts which is greater than the threshold voltage (+1 Volt) and the device is on. But is it saturated?

The drain is at 10-(6,000)(0.0005) or 7 Volts VDS=7-3 or 4 Volts

Since VDS (4V) is greater than VGS-Vt (2V-1V) the device is by definition in saturation so our initial assumption was correct

Page 40: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-40

Example 5.5 (PMOS)

Design the following circuit so that the transistor operates in saturation with ID=0.5mA and VD=+3V. Let the enhancement type PMOS transistor have Vt=-1V and k’p=1mA/V2. Assume = 0. What is the largest value that RD can have while still maintaining saturation-region operation?

We were given the conditions to be met so lets start there, ID=0.5mA

VG to ground is VDD -VSG = 5-(2)=+3V The gate voltage can be set by picking appropriate

values of RG1 and RG2 in a voltage divider, for example, RG1 = 2M and RG2 = 3M

The drain resistor value can be found from

S

DG

+vD = 3 V-

RG1

RG2 RD

VDD = +5 V

assumed

22

1001.02

10005.0

GSVV

A

VVV

V

GSGS

GS

2,0 11

1001.0

0005.02

negative is For PMOS GStGS VVV

kI

VR

D

DD 6

0005.0

3

The border for saturation to linear occurs at VDS=VGS-Vt so VDSmax=-2-(-1) = -1V, thereforeVD to ground max is VDD-VSD=5-(1)=4V

At VD=4V and ID=0.5mA, RD=8k

Page 41: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-41

Example 5.6 (depletion NMOS)

The depletion MOSFET in the circuit is required to supply the variable resistor RD with a constant current of 100A. If k’n = 20 A/V2 and Vt = -1 V, find the W/L ratio required. Also find the range that RD can have while the current through it remains constant at 100A. Assume l = 0.

The MOSFET in this circuit is conducting (VGS = 0). It must be operated in the saturation mode in order to conduct a constant current ID while RD (and VD) is varying.

The saturated mode of operation will be maintained for

D

SG

+

vD

-

RD

VDD = +5 V

assumed

10

10202

1100

2

1

2

2

L

WL

W

VVL

WkI tGSnD

V1

,110

D

tGSDS

V

VVV

k401.0

15minmax

D

DDDD

DDDDD

I

VVR

IRVV

Thus, RD can vary in range from 0 to 40 k

Page 42: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-42

Example 5.7 (depletion mode FETs)

Design the circuit shown below to establish a dc voltage of +9.9V at the source. At this operating point, what is the effective resistance between the source and the drain of the transistor? Let Vt = -1V and K’n(W/L) be 1 mA/V2.

In this case the gate and the source are just slightly below the drain (0.1V) and VGS=0. VDS is not greater than VGS-Vt (0.1 is not greater than 0-(-1)) so the transistor is in the triode region and the current is

We can now find RS by

The effective source to drain resistance is

D

SG

+VS=9.9V-

RS

VDD = +10 V

assumed

mAI

I

D

D

1.0

1.02

11.010001.0 2

kkI

VR

D

SS 10099

0001.0

9.9

kI

Vr

D

DSDS 1

0001.0

1.0

krDS 1

Page 43: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-43

Exercise 5.13

Consider the circuit below where the voltage VD1 is applied to the gate of another transistor, Q2. Assume that Q1 and Q2 are identical. Find the drain current and voltage of Q2. Assume = 0. (see example 5.3)

Since VD2 > VG2 (4V), we are indeed operating in the saturation region.

From example 5.3, VD=4V and ID1=0.4mA.

Q1 and Q2 are identical and have equal VGS.

Assuming that Q2 is also operating in the saturation mode, it’s drain current will be identical to that of Q1, 0.4mA

Thus, V 6104.0102 DV

VV DD10

kR 4.12

V D1

k 102R

Q2 Q

1

V D1

Page 44: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-44

MOSFET as an Amplifier

Since changes in the drain to source voltage does not change the output much we will focus on the IDS-VGS characteristic

VDS does not change output much

VGS=> Linear Input Change

GS

LinearOutputChange

saturationtGSDS VVV IDS-VDS Characteristic

Page 45: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-45

MOSFET Amplifier Configuration

We can obtain amplification of a small analog signal by use of an enhancement mode MOSFET.

A dc voltage (bias) VGS, is applied along with the input signal to be amplified, vgs superimposed on it. The output voltage is taken at the drain and consists of a dc and ac response.

A circuit for amplification is shown below This circuit is not practical because

The dc voltage source at the input is difficult to implement Integrated circuit resistors take up too much room MOSFETs are used for loads

+

vDS(t) -

vgs(t)

iDS(t)

VGS +DC

ac(DC+ac)

(DC+ac)

D

SG

VDD

RD

To be used as an amplifier the MOSFET must be biased in the saturation region

To find the dc bias we set the ac component of the input to zero and determine the dc drain current in saturation (we will neglect channel length modulation in this case, that is we will assume =0)

2'2

1tGSnD VV

L

WkI

Page 46: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-46

The Signal Current at the Drain

The dc voltage at the drain, VD will be equal to VDD - RDID

To ensure saturation we must have

Now we go back to the situation where we have both the dc bias and the ac signal

The resulting total instantaneous drain current to be

We can focus on the ac response if we keep the input signal small, such that

tGSDS VVV

gsGSGS vVv

2''2'

2'

2

1

2

12

1

gsngstGSntGSnDS

tgsGSnDS

vL

WkvVV

L

WkVV

L

Wki

VvVL

Wki

dc bias ac response non-linear ac response

tGSgsgstGSngsn VVvvVVL

Wkv

L

Wk 2or

2

1 '2'

Page 47: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-47

Transconductance

If the small-signal condition specified on the previous page is satisfied we can neglect the last non-linear term in the current equation and express iD as

Where

And we know that the ratio of id to vgs is the transconductance gm

In general

dsDSDS iIi

gstGSnd vVVL

Wki '

tGSngs

dm VV

L

Wk

v

ig '

GSGS VvGS

Dm v

ig

Page 48: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-48

Voltage Gain

The total instantaneous drain voltage is

Using the small signal condition

The small-signal component of the drain voltage is

The voltage gain is then given by

DDDDD iRVv

dDDDdDDDDD iRVviIRVv or

gsDmDdd vRgRiv

Dmgs

d

in

out Rgv

v

v

v

Page 49: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-49

DC Bias with an ac small signal

The DC bias level determines the ac parameters

By restricting the input signal swing to small values we can “linearize” the characteristic like we did for amplifier transfer characterisitcs

+

vDS(t) -

vgs(t)

iDS(t)

VGS +DC

ac(DC+ac)

(DC+ac)

VGS

vgs (t)

iDS

vGS (V)

tIDS

Bias Point - Q

tangent at Q

mgslope

ids (t)

Vt

0 0

D

SG

VDD

RD

tinput

Page 50: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-50

The Input and Output Signals

When the gate to source signal is at its maximum the drain current is at its maximum. Maximum drain current means that the drop across the drain resistor is at its maximum or that the drain to source voltage of the MOSFET is at its minimum

The output is therefore 180 degrees out of phase from the input. We have an inverting small signal amplifier in this configuration

In order for the transistor to operate in the saturation region at all times there is a minimum drain voltage that must be maintained.

The input signal must be small enough to keep the output above the minimum

0

gmRD

VD

vD

vGS

VGSvGS tGS

gs VVv

22

vgs

t

t

tGD Vvv maxmin

Dmgs

d

in

out Rgv

v

v

v

cutoffprevent to

max DDD Vv

Page 51: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-51

Small-Signal Saturation Equivalent Circuit Models

From a small-signal point of view the FET behaves like a voltage controlled current source as shown on the top figure to the left.

Th input resistance is high (ideally infinite) After the DC analysis is done to determine

the ac parameters and then the ac equivalent circuit is drawn.

A DC voltage source is ideally immune to changes in current so small ac voltage changes do not cause change in current (dI/dV is zero or R is zero) it is replaced by a SHORT circuit.

Current source are replaced by OPEN circuits

In the first model is was assumed that the drain current did not change with increasing VDS in saturation but we know that it does. The dependence can be modeled by a finite resistance ro, between source and drain, whose value is approximated by the equation shown at the left.

+vgs

- D

gmvgs

S

G

+vgs

-

D

gmvgs

S

G

ro

D

Ao I

Vr

Page 52: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-52

Applying the small-signal model

On the previous page VA = 1/ . Which we can determine from the Id-Vd characteristic, typically in the 10k to 1,000k range

Remember, the ac parameters, gm and ro depend on the DC bias point

The gain for the following circuit is given below (note that ro reduces the gain)

oDmgs

d rRgv

v||

+

vDS(t) -

vgs(t)

iDS(t)

VGS +DC

ac(DC+ac)

(DC+ac)

D

SG

VDD

RD

+vgs(t) -

D

gmvgs

G

rovgs RD

ac small-signal circuit

+vds -

Page 53: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-53

The transconductance of a bipolar transistor is proportional to the bias current (not the square root of it) and does not depend on the physical size or geometry

We can write gm in another useful way, as shown

Vt is ~25mV but

MOSFETs are smaller and use less power

The Transconductance - gm

The transconductance as we have seen already is the incremental change in drain current due to an incremental change in gate voltage or

If we solve the saturation current equation for VGS-Vt we get

and by substitution

So gm is proportional to the square root of the dc bias current

At any bias current gm is proportional to the square root of W/L

tGSnm VVL

Wkg

'

LW

k

IVV

n

DtGS

'

2

Dnm IL

Wkg '2

tGS

D

tGS

Dm

tGS

Dn

VV

I

VV

Ig

VV

I

L

Wk

21

2

22

'

rs transistoBJTfor

tocomparecan we which2

1

for

T

Cm

eff

Dm

tGSeff

VIg

V

Ig

VVV

mVVV tGS 100~2

1

Page 54: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-54

Example 5.8 - Complete Amplifier Analysis

In the following circuit, a discrete MOSFET amplifier is shown in which the input signal vi is coupled to the gate via a large capacitor, and the output signal at the drain is coupled to the load resistance RL via another large capacitor. We will assume that the coupling capacitors are large enough so that they act as short circuits for the ac signal frequencies of interest. We wish to analyze the amplifier circuit to determine its small-signal voltage gain and its input resistance. The transistor has Vt=1.5V, kn

’(W/L) = 0.25mA/V2, and VA = 50V.

+

vDS(t) -

+vi

-

ac

D

SG

VDD=15VRD=10k

Rin

RG=10M

RL=10k

Start by doing the dc analysis

25.100025.02

1 GSD VI

2

2

5.1000125.0

5.100025.02

1

0 since

DD

GSD

GDGS

VI

VI

IVV

DDDD IIRV 000,101515 mAIVV DD 06.1 4.4

The other solution is not valid (contradictory)

Page 55: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-55

ac equivalent circuit for Example 5.8

+

vDS(t) -

+vi

-

ac

D

SG

VDD=15VRD=10k

Rin

RG=10M

RL=10k

+vgs

-

D

gmvgs

G

ro+vgs

-RD

+vo -

RL

Rin

vi

RG

ac small-signal equivalent circuit

VDD is shorted to ground in the ac circuit

Page 56: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-56

ac analysis for Example 5.8

The value of gm is given by

The MOSFET output resistance ro is

We can now us the ac equivalent circuit to determine the expression for the output voltage in terms of the gate to source small-signal voltage

V

mAg

VVL

Wkg

m

tGSnm

725.05.14.400025.0

'

kI

Vr

D

Ao 47

00106.0

50

igs

oLDgsmo

vv

rRRvgv

||||

V

VA

A

rRRgv

vA

v

v

oLDmi

ov

3.3

47||000,10||000,10000725.0

||||

Since RG is so large

The value of the voltage gain Av is given by

Page 57: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-57

Evaluation of the Input Resistance for Example 5.8

To find the input resistance we note that the input current is given by

M33.23.4

000,000,10

3.4

3.43.31 1

G

i

iin

G

i

G

i

i

o

G

i

G

oii

R

i

vR

R

v-

R

v

v

v-

R

v

R

vvi

Page 58: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-58

The Source Absorption Theorem (Appendix E)Used to derive the “T” Model for a MOSFET

12 KVV

1I

Y

1V

2I Node 2Node 1

12 KVV

1I

1Y

1V

2I Node 2Node 1

2Y

KYVI

VVYVI

VVYI

1

1

11

1211

211

111 IVY

KYY 11

2122

122

1 VVYVI

VVYI

22 11 VKYI

222 IVY

KYY 112

Page 59: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-59

The “T” Equivalent Circuit Model

+vgs

- D

gmvgs

S

G +vgs

- Dgmvgs

S

G Xig = 0 id

gmvgs

is

+vgs

- Dgmvgs

S

GX id

gmvgs

is

ig = 0

+vgs

-

G

ig = 0

S is

D

gmvgs

id

mg

1 or

Page 60: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-60

Modeling the Body Effect

The body effect (or back gate effect) occurs when the source is NOT at the same potential as the substrate (body). The substrate acts as a second gate and therefore we include a second dependent current source in our model, as shown below

+vgs

-

D

gmvgs

S

G

ro gmbvbs Bvbs

+

constant constant,

DSGS vvBS

Dmb v

ig

SBfSB

t

mmb

VV

V

gg

22

D

SG

the dependence is linked to the threshold voltage

3.01.0

Page 61: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-61

Exercise 5.17

For the following amplifier, let VDD = 5V, RD = 10k, Vt = 1 V, kn’ = 20 A/V2, W/L = 20, VGS = 2V and = 0.

Find the dc current ID and the dc voltage VD

Find gm

find the voltage gain If vgs = 0.2sint volts, find vd assuming that the small-signal approximation holds. What

are the maximum and minimum values of vD. Use the following equation to find the various components of the drain current

+

vDS(t) -

vgs(t)

iDS(t)

VGS +DC

ac(DC+ac)

(DC+ac)

D

SG

VDD

RD

2''2'

2

1

2

1gsngstGSntGSnDS v

L

WkvVV

L

WkVV

L

Wki

Page 62: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-62

Exercise 5.17 continued

Using the following identity show that there is a slight shift in ID (by how much?) and that there is a second harmonic component (2nd harmonic has a frequency of 2)

Express the amplitude of the second harmonic component as a percentage of the amplitude of the fundamental (this is known as the second-harmonic distortion)

tt 2cos2

1

2

1sin 2

Page 63: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-63

Biasing MOSFET Amplifier Circuits

Biasing is the establishment of an appropriate dc operating point for the transistor. An appropriate dc bias point has a stable and predictable dc drain current ID, and a dc

drain to source voltage that ensures operation in the saturation mode for all expected input signal levels.

Discrete component MOSFET circuits are not common but we will use them to introduce various biasing techniques.

VDS does not change output much

VGS=> Linear Input Change

GS

LinearOutputChange

saturationtGSDS VVV IDS-VDS Characteristic

Page 64: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-64

MOSFET Biasing - Single Supply

Plus side of MOSFET bias circuit design - the gate current is zero (easier to design)

Negative side of MOSFET bias circuit design - Vt (VGS response) varies more than vBE does in BJT circuits.

The circuit shown at the right is commonly used when a single power supply is available. A voltage divider is used to establish a fixed dc voltage at the gate. Since the gate current is zero the two gate bias resistors

RG1 and RG2 can be selected to be very large (M range) This will provide a large amplifier input resistance

A resistor, called a self bias resistor is connected to the source. If the device is turned on more (more source current) the drop across source resistor will increase and reduce the current. A balance (negative feedback) situation will be created.

RD is selected to be as high as possible to obtain high gain but small enough to allow for a large enough output signal swing at the drain while still keeping the MOSFET in saturation at all times.

V DD

RG1

RS

I D

RG2

RD

Page 65: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-65

MOSFET Biasing - Dual Supplies

For symmetric supplies (positive and negative of the same magnitude) a simpler bias arrangement can be used.

The resistor RG establishes a dc ground at the gate of the transistor.

Directly grounding the gate will also establish a dc bias but RG is used to increase the input resistance seen by a signal source that may be capacitively coupled to the gate

RD is selected to be as high as possible to obtain high gain but small enough to allow for a large enough output signal swing at the drain while still keeping the MOSFET in saturation at all times.

V DD

RS

I D

RG

RD

V SS

Page 66: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-66

MOSFET Biasing with a Constant Current Source

Having a constant current source establishes the source and drain current level.

We will look at how to construct a constant current source shortly

As before RD is selected to be as high as possible to obtain high gain but small enough to allow for a large enough output signal swing at the drain while still keeping the MOSFET in saturation at all times.

As before, The resistor RG establishes a dc ground at the gate of the transistor.

Directly grounding the gate will also establish a dc bias but RG is used to increase the input resistance seen by a signal source that may be capacitively coupled to the gate

I D

RG

RD

V SS

I

Page 67: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-67

Common-Source Circuit with Resistive Gate Feedback

The feedback resistor RG forces the dc voltage at the gate to be the same as that of the drain (since IG = 0).

The input can be capacitively coupled to the gate and the output can be taken at the drain to form a simple common-source amplifier.

The output signal swing is limited on the low side since the drain (which is tied to the gate) must be high enough to satisfy the threshold voltage gate to source. If the output goes too low the transistor slips out of saturation into the triode region of operation and the output will be distorted.

As before RD is selected to be as high as possible to obtain high gain but small enough to allow for a large enough output signal swing at the drain while still keeping the MOSFET in saturation at all times.

V DD

I D

RG

RD

0

Page 68: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-68

Biasing of Discrete MOSFET Amplifiers

Four circuits for biasing the MOSFET in discrete-circuit design.

classical arrangement 2 power suppliescommon-source circuit

V DD

RG1

RS

I D

RG2

RD

V DD

RS

I D

RG

RD

V SS

I D

RG

RD

V SS

I

V DD

I D

RG

RD

0

constant current source

Page 69: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-69

Biasing of Discrete MOSFET Amplifiers

Exercise 5.22 Design the circuit below for a MOSFET having k’n(W/L) = 0.5 mA/V2 and Vt = 2V, and utilizing two power supplies, ± 10V. Design for ID = 1mA and allow for a signal swing at the drain of ±2V. The amplifier is required to present a 1M input resistance to a signal source that is capacitively coupled to the gate. Assume =0. V10

RS

I D

RG

RD

V10

M1

kR

VV

V

V

IR

VL

Wk

S

SG

GS

GS

DG

tn

6001.

104

V4 ,0

V4

25.02

11

Thus,

mA1 ,M1

V2 and mA/V5.0'

2

2

V220min tGD VVV

kRV DD 10001.

010 thusV,0

To allow for a ±2V signal swing at the drain, Where we have neglected the signal component of VG

Page 70: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-70

Design Philosophy

The circuits that we have just looked at are not suitable for integrated circuit design. They use too many resistors which take up room and are therefore expensive. It turns out that since we are making small MOSFETs anyways, that if we can use

transistors that act sort of like resistors we can make much smaller (more dense) circuits.

The coupling capacitors also take up way to much room so coupling and bypass capacitors are not used in the design of MOSFET amplifier circuits. You can learn more about integrated circuit fabrication in EGRE435 during the fall

of 2000. You can learn more about MOS analog circuit design in EGRE307 during the fall of

2000. You can learn more about MOS digital circuit design in VLSI Design EGRE429.

Page 71: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-71

Basic MOSFET Constant Current Source

Use a reference current through one transistor (Generated through Q1) to set the voltage across the gate to source of another transistor (Q2) and hence replicate the reference current through the drain of the second transistor.

Q1 is saturated since VGS = VDS

V DD

R

V O

Q1

-

V GS

0 0

0

I REF

I D1

Q2

I O

R

VVII

VVL

WkI

GSDDREFD

tGSnD

1

2

11 '

2

1

1

2

2

22 '

2

1

LW

LW

I

I

VVL

WkII

REF

O

tGSnDO

constant current source

V DD

_

V O

Q

1

-

V GS

I REF

I D1

Q2

I O

current mirror

For Q2,

For Q1,

Page 72: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-72

Effect of VO on IO

In the previous current source description we assumed that the transistor Q2 is operting in saturation

GSVtGS VV

OI

Or

1Slope

OV

tGSO VVV

O

AO

O

OO I

Vr

I

VR 2

2

REFI

Region of “constant” current operation

Page 73: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-73

Example 5.9

Given VDD=5V and using IREF=100A, it is required to design the circuit shown below to obtain an output current whose nominal value is 100A. Find R if Q1 and Q2 are matched, have channel lengths of 10m and channel widths of 100m, Vt=1V and k’n=20A/V2. What is the lowest possible value of VO? Assuming the fabrication technology results in an Early voltage that can be expressed as VA=10L, where L is in microns and VA in volts, find the output resistance of the current source. Also find the change in output current resulting from a 3V change in VO.

21 1

10

10020

2

1100 GSREFD VII

V112

k30A100

25

V2

min

tGSO

GS

VVV

R

V

Since L=10m,

M1A100

V100

V1001010

O

A

r

V

The output current will be 100A at VO=VGS=2V. If VO changes by +3V, the corresponding change in IO will be 3%,

A3M1

V3

O

OO r

VI

V DD

R

V O

Q1

-

V GS

0 0

0

I REF

I D1

Q2

I O

Page 74: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-74

Current-Steering Circuits

I REF

V DD

V DD

Q4

-

5V GS

R

Q1

-

1V GS

I D1

Q2

I 2

Q3

V SS

I 5I 4

I 3

Q5

1

33

1

22 and

LW

LWII

LW

LWII REFREF

where, 34

4

545 II

LW

LWII

tnGSSSDD VVVVV 132 ,

tpGSDDD VVVV 55

threshold voltage for n-channel devices

threshold voltage for p-channel devices

Page 75: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-75

Basic Configurations of Single-Stage IC MOS Amplifiers

I

V DD

vOvI

I

V DD

vO

vI V SS

V DD

vO

vI

Page 76: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-76

Resistive Load Common Source Amplifier

An ideal current source has an infinite resistance, the current does not depend on the voltage at the node to which it is connected, but what happens if we use a resistive load

REFI

1DiQ1 in triode

Q1 in saturation

0

IAGS VVv 11

DDV ODS vv 1

ICGS VVv 31

Load curve

A

B

1 2 3 4 5V

IBGS VVv 21

IDGS VVv 41

CD

A’

D’

R

V DD

vOvI

common-source

The resistor constrains the current flow through the transistor and vice-versa. For the solid resistor load curve plotted on the transistor characteristic shown below the resistance is less than that of the dashed curve.

On the solid curve the valid operating points (curve intersections) are labeled with a letter and on the dashed curve the letters have a prime On the next page we plot the voltage transfer characteristic of this amplifier

Vout

Vin

VVtn 8.0

VVtn 8.0

G

S

D

+VR

-

VR=VDD-VDS

Page 77: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-77

Resistive Load Common Source Amplifier continued

The plot of the transfer characteristic of the common-source amplifier with a resistive load is shown below

Since the resistor is not an ideal current source the gain varies with the load resistance The higher the load resistance the higher the gain but the smaller the allowed input signal

swing (an still have the transistor saturated)

DDV

tnV

A’

B’

0 1 2 3 4 5

5

4

3

2

1

0

A

B

C D

D’C’

Vin

Vout

R1>R2

gain is proportional to the slopeGain1>Gain2

triode

saturation

Page 78: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-78

The CMOS Common-Source Amplifier(PMOS current source load)

If the PMOS active load device is made with a long channel then lambda is small (the magnitude of VA is large or the transistor output resistance ro is large). In other words a long channel load acts more like an ideal current source.

vO

vI

V DD

Q3

iI REF

-

V SG

Q1

Q2

-

v

+-

i-v characteristic of the active-load Q2CMOS common-source amplifier circuit

SGV

tpSG VV

REFI2

1Slope

Or

v

iQ2 in triode

Q2 in saturation

SGSG Vv

0

one curve not a family of curves

REF

AO I

Vr 2

2

Page 79: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-79

Graphical construction to determine transfer characteristic

We expect to have a transfer characteristic that has a high gain since output resistance of the load transistor can be made high (long channel) The load curve is like a high value resistor that has been translated upwards We are most interested in the area of intersection between A and B for amplification

SGDD VV

tpSGDD VVV

REFI

1DiQ1 in triode

Q1 in saturation

0

AGS Vv 11

DDVODS vv 1OBV

BGS Vv 11

Load curve

AB

Page 80: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-80

Transfer Characteristic of the active load common source amplifier

When the input is low the load transistor is in the triode region, as the input voltage is increased the active load becomes saturated. The gain is relatively high and depends on the output resistance of the transistor used in the current mirror

I

II

III

IV

Q1 Cutoff

Q1 Saturation

Q2 Triode

Q1 Triode

Q2 Saturation

Q1 Saturation

Q2 Saturation

tpSGDD VVV

I II III IVDDV

OBV

BV1AV1tnV

A’

B’

Page 81: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-81

Small-signal equivalent circuit of the common-source config.

REF

AnV

AA

REF

AA

n

v

REF

AoREFnm

I

V

L

WkA

VV

IVV

LW

k

A

I

VrI

L

Wkg

1

21

21

1

11

11

'2

1

that assume weIf

111

'2

becomesgain then The

'2

+-

11 gsm vg1or 2or

-

1vgs

iv

-

vo

D1,D2

S1,S2 211 oomi

oV rrg

v

vA

If we use physically based parameters for the transistorswe get a design equation in terms of the transistor’s length,width, transconductance, output resistance and referencecurrent source value

Voltage gains on the order of 20-100 are obtained usingCMOS common-source configuration

The source of each device is connected to the bodyso the body effect on the threshold voltage is not a factor

Since ro1 and ro2 are usually large the gain can be large without taking up a lot of room on the chip with anintegrated resistor.

Page 82: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-82

Effect of RS on AC gain

In section 5.6 we discussed various DC biasing schemes and in those schemes we saw that the source resistor, RS (like its counterpart RE in the BJT case) provides negative feedback to the gate to source voltage and helps to stabilize the DC value of ID.

If the DC bias point of the gate is increased the source current will increase but not by as much as when there is no source resistance

This source resistance DOES affect the AC gain! Consider the case of a MOSFET biased to have a gm of 30mA/V, rO=16K, and RD=470 AC model WITHOUT RS:

DR

V DD

vOvI

common-source with a source resistance

GS

D

+VRD

-

SR

+vgs(t) -

D

gmvgs

G

rovi RD

+vo -

VVKXrRgv

vODm

i

o 7.13)16470(1030 3

Page 83: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-83

Effect of RS on AC gain (cont.)

Now consider AC gain WITH RS, let RS=10:

+vgs(t) -

D

gmvgs

G

rovi RD

+vo -

VV

vv

i

o 54.10

More easily analyzed with the T model:

+vgs

-

G

S

D

gmvgs

mg

1 or DR

+

vo

-

vi

SRii

Sm

migs vv

Rg

gvv 7692.0

1033.33

33.331

1

iiODgsmO vKvXrRvgv 54.10)16470(7692.01030 3

Page 84: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-84

The use of a Source By-Pass Capacitor

In the circuit shown on this page, at low frequencies, the source capacitor CS is an open circuit and the source resistance has a voltage drop across it which reduces the gate to source voltage across the transistor.

On the next page the ac equivalent circuit is shown DR

V DD

vOvI

common-source with a source resistance

G

S

D

+VRD

-

SRSC

SZ

Page 85: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-85

The use of a Source By-Pass Capacitor (ac circuit)

+-

gsmvgDR

-

vgs

iv

-

vo

S1

SRSC

SZ CS open circuit (low frequencies)Note that Vgs does not equal vi now

CS short circuit (high frequencies)

0 as 1

CsCs ZCj

Z

Page 86: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-86

The CMOS Common-Gate Amplifier

V DD

vOvBIAS

Q3

iI REF

-

V SG

Q1

Q2

-

vI B1+

-

11 gsm vg1or

-

1vgs

iv

-

vo

D1,D2

2or11 bsmb vg

G1

S1 vbs1+

-

iRcommon-gate amplifier

vi=VSG vo=VDGsmall-signal equivalent circuit

In this case a constant dc level is applied to the gate of the transistor and the input signal is applied to the source

The signal source at the gate will be zero (hence the name common gate) There will be a potential difference between the source and the bulk (body) so

we need to use the model which includes that effect.

Body effect

Vgs1=-vi vbs1=-vi

Page 87: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-87

Simplified circuit

The body effect adds to the gain but reduces the input resistance The active load (ro2) reduces the gain but slightly increases the input resistance By comparison the Common-Gate configuration has a gain similar to that of the common-source amplifier but the input resistance is much lower The common-gate configuration is used in a combination circuit called a cascode amplifier that we will study later in EGRE307.

+-

imbm vgg 11

1or

2oriv

-

vo

D1,D2

S1

iR

1ooi rvv

2111

211

11

211

1

//

//1

oombmv

ooo

mbmi

ov

o

oimbm

o

oi

rrggA

rrr

ggv

vA

r

vvgg

r

vv

ii

2

2

11

111

11

o

o

mbmi

ii

o

oiimbmi

r

r

ggi

vR

r

vvvggi

output node equation

if 1/ro1<<gm1

Input resistance(input node equation)

Page 88: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-88

The Common-Drain or Source-Follower Configuration

V DD

V DD

Q3

Q2

V SS

I REF Q5

vi

vo

B1

+-

11 gsm vg1or

-

1vgs

iv

-

vo

2or

11 bsmb vg

G1

S1 vbs1+

-

D1

common-drainor

source-followersmall-signal equivalent circuit

(again the body effect is included)

The common-drain or source follower configuration is used as buffer amplifier. Although its voltage gain is less than unity it has a low output resistance and is therefore capable of driving low impedance loads with little loss of gain.

Typically found in the output stage of a multi-stage amplifier. The fact that its impedance is buffered can be used to extend the high-frequency

response range of amplifiers and speed up digital circuits. Vdd is at signal ground hence the name commoncommon drain The input impedance is very high since it is the gate of a MOSFET (THIS IS A

VERY BIG ADVANTAGE OVER BJTs)

Signal Ground

Use the source absorption theorem to transform the dependent source into a resistance 1/gmb1

Page 89: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-89

Simplified circuit

+-

11 gsm vg-

1vgs

iv

-

vo

SR

G1

S1

211

////1

oomb

S rrg

R

1

1

,

11

1

1

1111

1

2121

1

1

1

11

11111

111

v

mmbmbm

mv

oombm

mv

Sm

Sm

i

ov

gsSmi

gsSmgssgsi

gsSmso

A

gggg

gA

rrgg

gA

Rg

Rg

v

vA

vRgv

vRgvvvv

vRgvv

typically 0.1<<0.3

The body effect reduces the gain by ~10 to 30 percent

0

Page 90: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-90

NMOS Load Devices - Saturated Enhancement Mode

v

i+

-v

i

V t

ttn VvVvL

Wki ,'

2

1 2

0

Saturated Enhancement Mode LoadVGS=VDS therefore always saturated

G

D

S

locus of points on many curves

VGS=VDS

2tDD VV

VGS2=VDS2

DDV

i

0

i+

VDS2

-

DDV

G2

D2

S2 +

VDS1=Vout

-

G1

S1

D1

x

xx

VGS1=Vin

Page 91: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-91

NMOS Amplifier with Enhancement Load

22

1

2

1

2

1

2

1

1

1

LW

LWA

LW

LWA

vLW

LWV

LW

LWVVv

v

v

IttDDO

Q2

12 DD ii Q

2

-

vI

-

vO

V DD

2tV

1Di

0

...1 GSv

DDV 1DSv3V

VvGS 1

Load curve

A

B

11 tGS Vv

1V

I Q1 cutoff

3V

1 V

VIv

A’

B’

0

Ov

IIQ1 in

saturation

IIIQ1 in

triode region

Due to the body effect on Vt

VSB for Q2 is not equal to zero(reduces the gain)

2t DDV V

DDV

1t V

Page 92: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-92

NMOS Amplifier with Enhancement Load

Positives

Uses the same type of device for the load as the driver (enhancement)

Negatives

Lower Gain than the Depletion Mode LoadSmaller output signal swing (The output does not go all the way up to VDD)

Page 93: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-93

NMOS Load Devices - Saturated Depletion Mode

v

i +

-

v

i

V tD0

tDnDSS VL

WkI 2'

2

1

2

1Slope

Ortriode saturation

DepletionMode LoadVGS=0Always on

tDnDSS

ADSS

A

tDn

VL

WkI

V

vIi

V

vV

L

Wki

2

2

'2

1

1

1'2

1

D

GS

In saturationDepletionMode Load, VGS=0 Always on

VGS

IDS

Page 94: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-94

NMOS Amplifier with Depletion Load

Q2

Di

Q1

-

vI

-

vO

V DD

+-

11 gsm vg1or 2or

-

1vgs

iv-

vo

D1,G2.S2

D2,B2

G1

S1,B1

22 bsmb vg

1

////1

2

1

2

1

2

1

211

1

LW

LWA

g

g

g

gA

rrg

gv

vA

v

m

m

mb

mv

oomb

mI

Ov

Page 95: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-95

NMOS Amplifier with Depletion Load

tDDD VV

I II III IVDDV

OBVtEV

A’

B’

tDDD VV

1Di

0

...1 GSv

DDV Ov

...1 GSvLoad curve

A

CB

C’

Ov

Iv

Q1 OffQ2 Triode

Q1 SaturationQ2 Triode

Q1 SaturationQ2 Saturation

Q1 TriodeQ2 Saturation

I

II

III

IV

Positives

Higher Gain than the Saturated Enhancement Mode LoadLarger output signal swing (all the way up to VDD)

Negatives

Requires a different type of device (depletion) for the loadand is therefore more complicated

Page 96: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-96

The CMOS Digital Logic Inverter

For any IC technology used in digital circuit design, the basic circuit element is the logic inverter.

The inverter uses two matched enhancement-type MOSFETS; an n-channel and a p-channel. The body of each device is connected to its source which eliminates any body effect.

CMOS inverter simplified inverter circuit

V DD

vOvI

QP

QN

iDNiDP

vOvI

QP

QN

V DD

Page 97: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-97

Circuit Operation

We assume that the n-channel device is the driver, and the p-channel device is the load. When the input is high, vO=VOL=0 Volts, and the power dissipation in the inverter is 0.

Operation of the CMOS inverter when vI is high

DDV0OLV Ov

i DDOHGSN VVv

0

Operatingpoint

Load curve 0SGPv

V DD

0vOrDSN

tnDD

nnDS VVLW

kr '1-

DDSGNVv

V DD

vO

QP

QN

i

V DD-

0

vSGP

Page 98: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-98

Circuit Operation, cont’d

We assume that the n-channel device is the driver, and the p-channel device is the load. When the input is low, vO=VDD, and the power dissipation in the inverter is 0.

Operation of the CMOS inverter when vI is low

DDV0OLV Ov

i

0 OLGSN Vv

0

Operating point

Load curve

DDOH VV

V DD

DLOVv

rDSP

tpDD

ppDSP VVLW

kr '1

V DD

-

0

vSGN

vO

QP

QN

i

-

DDSGPVv

DDGSP Vv

Page 99: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-99

Circuit Operation, cont’d

The basic CMOS logic inverter behaves as an ideal inverter

The output voltage levels are 0 and VDD, and the signal swing is the maximum possible. This results in wide noise margins.

The static power dissipation in the inverter is 0 A low-resistance path exists between the output terminal and ground (in the low-

output state) or VDD (in the high-output state). The low output resistance makes the inverter less sensitive to the effects of noise and other disturbances.

The active pull-up and pull-down devices provide the inverter with high output-driving capability in both directions.

The input resistance of the inverter is infinite (because IG=0). Thus the inverter can drive an arbitrarily large number of similar inverters with no loss in signal level.

Page 100: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-100

Voltage Transfer CharacteristicPMOS Load Lines

VDSp

IDp

VGSp=-5

VGSp=-2VDSp

IDnVin=0

Vin=3

Vout

IDnVin=0

Vin=3

Vin = VDD-VGSpIDn = - IDp

Vout = VDD-VDSp

Vout

IDnV in = V DD -V GSp

IDn = - I Dp

V out = V DD -V DSp

Figure taken from supplemental material for Digital Integrated Circuits, A Design Perspective, Jan M. Rabaey,1996, Prentice Hall

Page 101: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-101

In,pVin = 5

Vin = 4

Vin = 3

Vin = 0

Vin = 1

Vin = 2

NMOSPMOS

Vin = 0

Vin = 1

Vin = 2Vin = 3

Vin = 4

Vin = 4

Vin = 5

Vin = 2Vin = 3

Figure taken from supplemental material for Digital Integrated Circuits, A Design Perspective, Jan M. Rabaey,1996, Prentice Hall

CMOS Inverter Load Characteristics

Page 102: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-102

The Voltage Transfer Characteristic

For QN,

tnIOtnIn

nDN

tnIOOOtnIn

nDN

VvvVvL

Wki

VvvvvVvL

Wki

for '2

1

and

for 2

1'

2

2

tpIOtpIDDp

pDP

tpIOODDODDtpIDDp

pDP

VvvVvVL

Wki

VvvvVvVVvVL

Wki

for '2

1

and

for 2

1'

2

2

For QP,

p

n

n

p

W

W

p

pn

n L

Wk

L

Wk

''

Page 103: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-103

The Voltage Transfer Characteristic, cont’d

DDOH VV

DDVILVtV

A

B

Ov

C

D

t

DD VV

2

t

DD VV

2

0OLVIHV

Iv tDD VV

2DD

th

VV

0

Slope = -1

Slope = -1

QN off

QP off

QN in saturationQP in triode

QN in saturationQP in saturation

QP in saturationQN in triode

OLILL

IHOHH

VVNM

VVNM

Page 104: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-104

The Complementary MOS (CMOS) Inverter

Complementary means both nMOS and pMOS transistors are used

A polite “tug O’War”! Only one device pulls at a time A High Voltage on

Vin turns On the NMOS device and turns Off the PMOS device

A Low Voltage on Vin turns off the NMOS and turns On the PMOS

Power is dissipated only when the output is switching from low to high or high to low

+5 V

Vin Vout

source of electrons

drain for electrons

gaten channel (p wafer)

drain for holes

source of holesgate p channel (n well)

+5 V

Vout = + 5VVin = 0

closed

open

Vout = 0 VVin = + 5V

closed

open

+5 V

s=5

s=0g=5

g=5

Vgsp= Vgp-Vsp

= 5-5 = 0

Vgsn= Vgn-Vsn

= 5-0 = 5

Vgsp= Vgp-Vsp

= 0-5 = -5g=0

s=5

Vgsn= Vgn-Vsn

= 0-0 = 0 g=0s=0

The source is where charge carriers come from and the drain is where they flow to, holes come from the higher voltage and flow towards a more negative terminal, electrons come from the more negative terminal and flow towards the positive

Page 105: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-105

How are Noise Margins Determined?

The slope of the voltage transfer characteristic of an inverter is the gain.

There are three key points on the gain plot The point at which the

magnitude of the gain is first equal to unity (45 degrees)

The point at which the magnitude is maximum

The point second point at which the gain is again equal to unity

1 2 3 4 5VIN (Volts)0

1

2

3

4

5

VOUT

(Volts)

|slope| = 1

|slope| = 1

|slope| = Maximum = 5

5

|gain|slope

VIHVIL

VOL

VOH

1 VIN (Volts)

max

Page 106: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-106

What Noise Margins really mean

On the previous page VIL was equal to 1.2V and VIH was equal to 3V

VOL was equal to 0.7V and VOH was equal to 4.9V

The Noise Margins are defined as follows

NML = VIL - VOL in our case = 1.2 - 0.7 = 0.5 Volts

NMH = VOL - VIL = 4.9 - 3.0 = 1.9 Volts

What the output produces

Low VOL =(0.7- 0) V

High VOH =(5- 4.9) V

What the input accepts

VIL = 1.2V

VIH = 3V and up

Marginal LowNML = 1.2-9.7=0.5V

“solid”signals

Marginal HighNMH = (5-3)-(5-4.9) =1.9V

0V

+5V

solid low

solid high

1 2 3 4 5VIN (Volts)0

1

2

3

4

5

VOUT

(Volts)|slope| = 1

|slope| = 1

|slope| = Maximum = 5

VIHVIL

VOL

VOH

Page 107: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-107

How does an Inverter (with gain) restorea “poor” signal level?

The output of the first inverter will be _____?? If we take that as the input to the second inverter the output of the second inverter will be ___ ?? Volts.

Is it a solid high? The inverter supplies (+5

and ground) and the gain drives unknown and marginal signals towards solid levels

1 2 3 4 5 VIN (Volts)0

1

2

3

4

5

VOUT

(Volts)

|slope| = 1

Input to inverter # 1 = 3.1V

VIHVIL

VOL

VOH 3.1 ??

Assume that we have two identical inverters in series and that they both have the same voltage transfer characteristic given below.

Lets say that the input to the first inverter is 3.1 Volts, which is about as marginal a high signal as will be recognized as a high by the inverter.

Page 108: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-108

Solution to previous page

1 2 3 4 5 VIN (Volts)0

1

2

3

4

5

VOUT

(Volts)

|slope| = 1

Input to inverter # 1 = 3.1V

VIHVIL

VOL

VOH

Output of inverter # 1 = 0.65V

Input toINV #2

3.1 0.65 5

Page 109: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-109

Propagation Delay and Rise and Fall Times of a signal

Input Signal

Output Signal

Time

Time

50% 1/2(VOL+VOH)

90% of (VOH-VOL)

10% of (VOH-VOL)

VOH

VOL

vI

vO

VOL

VOH

tr tf

tPLHtPHL

tTHLtTLH

Page 110: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-110

The Analog Switch

The MOSFET is often used as a voltage-controlled switch. The voltage applied to the gate of each QN and QP turns them on and off.

In the off position, the MOSFET behaves as an open circuit between drain and source In the on position, the MOSFET presents a resistance rDS between drain and source

Analog Switch

tGSn

DS

VVLW

kr

'

1

+-Av

-

vO

LR LC

for small vDS

More stringent requirements are placed on an analog switch, relative to a digital switch. When the switch is open, we want it to operate as an open circuit--the off-resistance

switch should be very high (ideally infinite) A high on-resistance would result in signal attenuation

The switch should be bidirectional (able to conduct in both directions)

Page 111: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-111

Circuit Operation

Notice that terminals are not labeled; they are interchangeable because the MOSFET is a symmetrical device.

In general, the drain is the terminal which is at the higher voltage.

vC high; vA positive

Vvc 7 vO

LR LC

+-

b

a

VvA 4

vO

LR LC

+-

b

a

VvA 4

vC high; vA negative

Page 112: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-112

Equivalent Circuits for Transmission Gate

vO

LR LC

b’

a’

+-

a

b-+5V 5V

(positive) Av

vO

LR LC

a’

b’

+-

b

a-+5V 5V

(negative) Av

Page 113: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-113

CMOS Transmission Gate and Circuit Symbol

Compared to the single NMOS switch, the transmission gate provides better performance at the expense of greater circuit complexity and chip area.

OutputInput

V SSC (clock)

V DDC

N

PInput Output

C

C

C Characteristics

0 Bidirectional open circuit1 Bidirectional short circuit

Page 114: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-114

MOSFET Internal Capacitances and High-Frequency Model

The MOSFET has internal capacitances, however, they are neglected in the small-signal model.

The gain of every MOSFET amplifier falls off at some high frequency. The MOSFET model must be augmented by including internal capacitances. There are basically two types of internal capacitances in the MOSFET:

The gate capacitive effect: the gate electrode (polysilicon) forms a parallel-plate capacitor with the channel, with the oxide layer serving as the capacitor dielectric.

The source-body and drain-body depletion-layer capacitances: these are the capacitances of the reversed-biased pn junctions formed by the n+ source region (source diffusion) and the p-type substrate, and by the n+ drain region (drain diffusion) and the substrate.

There will be five capacitances in total: Cgs, Cgd, Cgb, Csb, and Cdb, where the substrates indicate the location of the

capacitances in the model.

gsmvgor

-

vgs

bsmbvg

gdC

gbCsbC

dbC

B

G

S

D

gsC

vbs

Page 115: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-115

The Gate Capacitive Effect

The gate capacitive effect can be modeled by three capacitances Cgs, Cgd, and Cgb.

In the triode region at small vDS

In saturation

In the cutoff region

Overlap capacitance

oxgdgs WLCCC2

1

03

2

gd

oxgs

C

WLCC

oxgb

gdgs

WLCC

CC

0

oxovov CWLC

May be zero depending on the bulk potential

Page 116: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-116

The Junction Capacitances

0

0

1V

V

CC

SB

sbsb

0

0

1VV

CC

DB

dbdb

For source diffusion, the source-body capacitance, Csb

For drain diffusion, the drain-body capacitance, Cdb

Csb0 is the value of Csb at zero body biasVSB is the magnitude of the reverse-bias voltageV0 is the junction built-in voltage

Cdb0 is the capacitance value at zero reverse-bias voltageVDB is the magnitude of the reverse-bias voltageV0 is the junction built-in voltage

The above formulas assume small-signal operation.

Page 117: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-117

The High-Frequency MOSFET Model

gsmvg or-

vgs

gdC

dbC

G

S

D

gsC

gsmvgor

-

vgs

bsmbvg

gdC

gbCsbC

dbC

B

G

S

D

gsC

vbs

gsmvg or-

vgs

gdCG

S

D

gsC

Page 118: © REP 8/27/2015 ENGR224 MOSFETs Page MOSFET 5.1-1 NMOS Field Effect Transistor Gate (G) Source (S) Body (B) Drain (D) n+n+ L Channel region p-type substrate

© REP 04/19/23 ENGR224

MOSFETs

Page MOSFET 5.1-118

Unity-Gain Frequency (fT)

The unity-gain frequency (fT) is defined as the frequency at which the short-circuit current-gain of the common-source configuration becomes unity.

gsmvg or-

vgs

gdC

gsC

oI

iI

gsmo

gsgdgsmo

VgI

VsCVgI

gdgs

igs CCs

IV

gdgs

m

i

o

CCs

g

I

I

gdgs

mT CC

g

2T

Tf

gdgs

mT CC

gf

2

The magnitude of the current gain becomes unity at thefrequency