LASER-ARC MODULE - Fraunhofer€¦ · Laser-Arc Module & ta-C Coatings LASER-ARC MODULE IN...

Laser-Arc Module & ta-C Coatings

LASER-ARC MODULE

IN COOPERATION WITH

Fraunhofer USA

1449 Engineering Research Ct.

East Lansing, MI 48824, USA

Contact

Thomas Schuelke, Director

Phone: +1 517 4328709

ccd-info@fraunhofer.org

ccd.fraunhofer.org

Center for Coatings and

Diamond Technologies (CCD)

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The Laser-Arc Module (LAM) is a modularplasma source for the large scale and highvolume deposition of tetrahedral amorphouscarbon (ta-C) thin film coatings in industrialphysical vapor deposition machines. Suchta-C coatings are extremely hard and have alow coefficient of friction, which make themideally suited for wear resistance applications.Ta-C is also biocampatible making it anexcellent coating material for medical deviceapplications.

The German engineered Laser-Arc plasmasource can be installed on production machinesfrom various coating equipment suppliers. Itis available in new machine installations andalso as a retrofit solution for existing coatingmachines.

The Laser-Arc Technology

The Laser-Arc technology combines theadvantages of pulsed laser deposition andvacuum arc deposition processes. The lasercombined with an optical scanner definesthe location of arc discharge for maximumgraphite target utilization. The efficient pulsedarc process in combination with high repetitionrates yields energetic plasma pulses andcompetitive deposition rates.

The process deposits highly sp3 bondedamorphous carbon films (ta-C) of extremehardness and durability. The temperatureimpact on the substrate is minimized allowingfor a deposition temperature well below100°C. Typical film thicknesses range fromnanometers to tens of micrometers, depend-ing on the application requirements. Themodular design of the Laser-Arc technologyallows for customized implementations.

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1. Laser-Arc discharge

2. Optional plasma filter

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F R A U N H O F E R U S A C E N T E R F O R C O AT I N G S A N D D I A M O N D T E C H N O L O G I E S

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2018

Fraunhofer CCD Offer

Our engineering team offers retrofit soluti-ons and complete coating machines withLaser-Arc technology. Engineering servicesinclude system and coating demonstrations,application and coating process developm-ent, support during coating and equipmentselection, installation and start-up. We offerall services necessary to successfully transferthe technology to our customers.

The high hardness and low friction of ta-Ccoatings in conjunction with biocompatibi-lity and chemical resistance are particularlysuitable for:

Components and parts in autom-otive and mechanical engineering,e.g. piston pins and rings, pumpcomponents, etc.

Cutting and forming tools

Components for packaging, foodprocessing and textile machinerythat do not tolerate liquid lubrication

Implants, components, devices forthe pharmaceutical and biomedicalindustry

Protective coatings for temperaturesensitive materials (e.g. plasticsand foils)

Ta-C Applications

Laser(moves across

height of graphite)

Graphite

Mirror

C+

C+

C+

C+

C+

C+

Rotating Cathode

Substrate

C Plasma +

Anodes

Laser(moves across

height of graphite)

Graphite Mirror

C+

C+

C+

C+

C+

C+

Rotating Cathode SubstrateC Plasma +Anodes

1. Inside the Laser-Arc Module2. Industrial Laser-Arc Module3. Laser-Arc Module coating process

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Laser-Arc Process

Precise arc discharge control by pulsedlaser for high energy density

Oscillating laser in combination withcathode rotation for uniform targetutilization

High current pulse discharge: 1500 A

Pulse duration: 0.13 – 0.33 ms

Pulse frequency: 200 – 1000 Hz

Deposition rate: up to 6 µm/hour

Deposition conditions: gas-free, highvacuum (p 10 mbar)

Deposition temperature: T < 100°C

Ta-C Coating Properties

Hardness: 40 – 60 GPa

Young’s modulus: 400 - 600 GPa

Coefficient of friction: 0.1 (dry);< 0.05 (lubricated)

Thermal stability: 400°C (air); 650°C(vacuum)

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Laser-Arc System Components®

Laser-Arc Module plasma chamberwith adapter to connect to coatingmachine flange

Computer controlled system

Pulsed high current arc power supply

Optional: Pulse-synchronized powersupply for substrate bias

Optional: Plasma filter for particleminimization

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