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College of Nanoscale Science and Engineering
D. Coolbaugh 1
CNSE College of Nanoscale Science and Engineering
D. Coolbaugh 1
CNSE
Electronic Packagaing Fundamentals
Section 1 – Semiconductor Overview
Dr. Douglas Coolbaugh
Albany CNSE Use ONLY - Packaging Fundamentals ClassCourse Material – Not for distribution
All References given on last page
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What is packaging – Provide wiring from chip to external electronics
0 Level Package Chip Wiring / Far BEOLFar BEOL – Al Pads forWirebond or Solder Bump
1st Level packageSingle or multiple chipsOn chip Carrier
Al Wirebond or Solder Bump Pads Wirebond
BGA
PLCC
PGA
Chip on Ceramic Carrier
2nd Level Pkg – Assemble components on PCBThru-Hole Attach
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Levels of Packaging
Level Type
0 Chip Level Wiring / Metal Contacts
1, 1.5 Single / Multi -Chip Pkg
Chip to Package
2 Chip Pkg on PWB Chip on board
3 Multiple PWB / Full Machine Assembly
Wiring of PWBsCables etc
Ref 4 - Text
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ICs and Packaging
Performance Driven Markets•Computers – Cost Performance•Hi-end Computers•Military•Medical•ASICs
•Hi Reliability•Space•Automotive•Sensors•Memory
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ICs and Packaging
• Cost / Size Driven Market• Low Cost Hi Volume• Cell Phones• Camcorders• Laptops• Digital Cameras • PDAs
• These markets may require different levels of IC Technologies –Performance Driven or Cost Driven (Low Power
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IO drives packaging complexity and cost
Ref 6
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IOs
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IC fabrication and basics
• ICs have evolved rapidly since 1950
• Ge was 1st transistor produced in 1950s
• Si replaced Ge due to quality and stability of SiO2
• Major take-off of Semiconductors in 60s• Fairchild / Intel / IBM others
• Microprocessors – Intel 1971
• DRAM – Dynamic Access Memory – 1970s
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Derivatives R&D at CNSE - Ref 7
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ITRS Raodmap for Hi-Performance CMOS – Ref 1
Node units 250 180 % Scale
130 % scale
90 % Scale
65 %Scale
Lgate nm 180 130 73% 92 71 63 68 43 68%
Tinv nm 6.2 4.45 72% 3.12 70% 2.2 70% 1.95 89%
Vdd V 2.5 1.8 72% 1.5 83% 1.2 80% 1 83%
MxPitch
0.8 0.56 70% 0.4 71% 0.28 70% 0.20 71%
Data from J. Pekarik IBM CMOS Node Scaling
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Gate Scaling – Contacted Pitch - IBM
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PC Contacted Pitch – IBM – Ref 9
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Contact / Spacer / Gate Scaling – IBM – Ref 9
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Scaling for Logic Applications – Ref 9
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IC Drivers
• Overall IC Drivers• Performance• Cost• Complexity• Size
• Critical Features that are used to determine scaling density
• Shallow Trench Isolation Pitch• Gate Length • Dielectric Thickness / Leakage• Contact Size• Metal 1 Pitch
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Key Semiconductor Features
• Feature size is driven by Lithography and Etch
• Key Features
• RX – Shallow Trench • PC – Gate Length• CA – Contact size• M1 – Metal 1
• Pitch used to measure feature size
• Pitch is the width of a line and space
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Pitch
RX Pitch – in 45 nm this is 140 nm (70 line / 70 space)
Sometimes Pitch is thought of ½ line / space / ½ lineIn both cases it is the same number
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Key feature sizes
• Key Features
• RX Pitch
• Lpoly – PC minimum gate length – Ldrawn – Lpoly is the electrical measurement
• CA CD – this is the size of the contact to the gate / diffusions at the topfor 45 nm it is 65 nm CD. CD means critical dimension
• M1 Pitch – this is cirtical for wiring
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CMOS Integration
TrenchIsolation
WellImplants
Gate OxGate polySpacer 0/1
Pwell Nwell
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Litho Exposure Wavelengths
MUV
EUV – 13.5
Wikipedia
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Lithography Scaling and ITRS Roadmap – Ref 9
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Basic Lithography Process
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CMOS Integration
Pwell Nwell
ImplantExt/HaloCMOS
Pwell Nwell
NFET PFET
Spacer IIN/P SDOPSilicide
N+P+
Pwell Nwell
N+P+
Barrier Nitride
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CMOS Integration
Pwell Nwell
N+P+
CA Oxide
Pwell Nwell
N+P+CA ContactsM1 Oxide - Etch
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CMOS Integration
Pwell NwellGe
N+P+
Pwell NwellGe
N+P+
FinalMetallizationTo Mx,etc
ILD For V1/M2
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HiK MG – Intel – Replacement Metal Gate – Ref 3
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Gate First vs Replacement MG – Note FUSI Gate does not work
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2 types of MG integration – gate first versus replacement gate
Ref 3
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Intel Process Flow – HK MG
Intel 45 nm HiKRef 3
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HK – Higher Ion due to increase in Capacitance
Metal Gate adds No depletion like Poly Gate
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45 nm HiK-MG vs Poly Gate / SiON - Intel
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References1. Pekarik, John, “Scaled CMOS Technology and Models to Support Wireless Applications,” IBM Corp., 2008.2. Horowittz, Mark, Packaging and IO, Stanford University, 2010.3. Mistry, K. et al. “ A 45nm Logic Technology with High-k+Metal Gate Transistors, Strained Silicon, 9 Cu Interconnect Layers,
193nm Dry Patterning, and 100% Pb-free Packaging,” Intel Corp.4. Greig, William J.,”Integrated Circuit Packaging, Assembly and Interconnections, “2007 Springer Science and Business.5. Tarter, Thomas S., “Design of High Density Packaging: Tools and Knowledge, Packaging Science Services, 2010.6. Leonardo, System in a Package, Single Chip Packaging, 2004.7. Stork, Hans, Nanotechnology in the Semiconductor Industry, Applied Materials, 2010.8. Morris, James, E., Electronics Packaging, Fall 2007, Portland State University.9. M. Guillorn, J. Chang and W. Haensch, FinFETS for 22 nm node, IBM Research, 2007.
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