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e-kolawa documents
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Amorphous Ta-Si-N diffusion barriers in Si/Al and Si/Cu metallizations
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Studies of Local Structure and Thermal Annealing Processes in Implanted Iron–Gadolinium Alloys by Conversion Electron Mossbauer Spectroscopy
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Microstructure of reactively sputtered oxide diffusion barriers
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Indium oxide diffusion barriers for Al/Si metallizations
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Reactive sputtering of RuO2 films
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Reactively sputtered indium oxide diffusion barrier