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c-grant documents
Documents
Interfacial Design for Block Copolymer Thin Films
Documents
Coaggregation of B−C and D−C Diblock Copolymers with H-Bonding C Blocks in Block-Selective Solvents
Documents
Plasma developable photoresist systems based on chemical amplification
Documents
Synthesis and Properties of Diazopiperidiones for Use in Nonchemically Amplified Deep UV Photoresists
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Poling and crosslinking processes in NLO polymers
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The Map As Natural Language: A Paradigm For Understanding
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Fundamental Optical Properties of Linear and Cyclic Alkanes: VUV Absorbance and Index of Refraction
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Progress Report on the Generation of Polyfunctional Microscale Particles for Programmed Self-Assembly
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Experimental Techniques for Detection of Components Extracted from Model 193 nm Immersion Lithography Photoresists
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Photopatternable Interfaces for Block Copolymer Lithography
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Chemically amplified imaging materials based on electrophilic aromatic substitution: poly[4-(acetoxymethyl)styrene-co-4-hydroxystyrene]
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Photocrosslinking of Poly(4-hydroxystyrene) via Electrophilic Aromatic Substitution: Use of Polyfunctional Benzylic Alcohols in the Design of Chemically Amplified Resist Materials
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Hydrogel Biosensor Array Platform Indexed by Shape
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Design, synthesis, and study of novel, thermally depolymerizable polycarbonates
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Ferroelectric cyclic oligosiloxane liquid crystals
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Photogenerated amines and their use in the design of a positive-tone resist material based on electrophilic aromatic substitution
Documents
Materials for step and flash imprint lithography (S-FIL®)
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Luekocyte adherence inhibition in response to human orbital and lacrimal extracts in patients with Graves’ ophthalmopathy
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Impact of exposure induced refractive index changes of photoresists on the photolithographic process
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High Index Resist for 193 nm Immersion Lithography
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