nnovation

of Touch Panel Technology

Material(Film) Product lineups Focused market

• ANW • ITO

•MP: ~42” based on Silver Nanowire •New: 55”/65” sample in Q3~Q4 2015

•Industrial purpose

Product / Application

ANW P-Cap information

Stack-Up structure: GFF

Sheet resistance: 50Ω/60Ω/80Ω

Light transmittance: ≤87% typical

Sensor lamination: sheet base

Glass: Chemically strengthened glass DOL: ≤8µm, CS: ≤450MP

Factory

Product Capacity Remark

•Hwasan

•Bekam

Projected Capacitive

Surface Capacitive

50K/M 23”basis

10K/M 23”basis

2014 Laser 1~4 2015 Laser 5~6

Factory Information

ANW Process

Front-end

Printing & patterning by laser etching

Back-end

Sheet & glass lamination, FPC bonding

Advantages

INOTOUCH provides full line up of P-Cap MP: ~32”, New product: 42” OS: The Win8 touch “Logo” specification support Glass: CGS(Chemically Strengthened Glass), Glass available: 0.7t~6t

Slim bezel

Laser etching process on Silver Nanowire (ANW) substrate

45 pattern width, 35 interval: ~24” 65 pattern width, 35 interval: 27”

Response ability to diverse demand Sensor design: Able to provide purpose-built sensors Controller solution: Strong partnership with controller provide

Delivery Shortened sample delivery Sensor: 2 weeks + Glass: 3weeks=4 weeks normally

Roadmaps

INOTOUCH

NEW sensor solution

Silver Nanowire(ANW)

Contents

Laser etching process overview

Advantage of laser etching system

• 1. Outstanding response ability to narrow bezel

• 2. Process simplification

• 3. Dispersion

• 4. Short delivery time for user sample

• 5. Dedicated for small medium-volume batch-line

Comparison with mesh type

1.Laser etching process overview

Patterning of active and electrode area are formed sequentially in the patterning process.

Possible to control laser line within 30 ~ 60 um width.

Using IR laser causes no damage to film.

Can reduce width of silver tracer pitch (narrow bezel) . Easy to make large size sensor.

2. Advantage of laser etching

•2-4 Shortened sample delivery time for sensor

▷Before : 3 weeks(14 working days) Improvement : 2 weeks (11 working days)

• 2-5 Dedicated for small medium-volume batch production

ANW Metal Mesh ITO Remark

General sensitivity depending

on surface resistance

R: 60Ω~80Ω

Sensitivity: High

R: 20Ω

Sensitivity: High

R: 150Ω typical

Sensitivity: Low

Relative sensitivity depending

on deviation value in between

channels

Deviation value: Low

Sensitivity: Keeps quite

high level

Deviation value: High

Sensitivity: It’s very hard to keep balance

the value between channels even though

it has lower surface resistance than others

Deviation value: Low

Sensitivity: Keeps high

level

Tracer surface resistance value Pure silver paste:

0.075Ω

Silver alloy: 20Ω or metal sputtering Pure silver paste:

0.075Ω

Invisibility/Moiré

Invisibility: Excellent

Moiré: No

Invisibility: Poor

Moiré: Yes

Invisibility: Excellent

Moiré: No

Light transmittance 86% 82% 88%

Versatility in pattern design/

MOQ

Unlimited design by

CAD(Laser patterning)

MOQ: ~100pcs/lot

Limited: needed individual pattern

mold(mask) per each model

Mold cost: $30,000/model

MOQ: 2K~3K/lot

Unlimited design by

wet chemical etching

MOQ: ~100pcs/lot

Customizability Easy enough Consumer: O.K,

Industrial: refusal of admittance

Easy enough

Productivity on mass

production

Yield rate: <90s% Yield rate: 20s~30s%→very poor

Yield rate: 80s~90s%

Comparison table