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The top documents tagged [ti film]
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IC Processing. Initial Steps: Forming an active region Si 3 N 4 is etched away using an F-plasma: Si3dN4 + 12F → 3SiF 4 + 2N 2 Or removed in hot
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Hydrogen sensor application of Pd doped anodic TiO 2 film
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Key points: TG in optical range has been used to study coherent phonons and thermal transport
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