Download ppt - Outgassing Evaluation More Moore, SP3 WP6, for Task 3.6.1.6.1 and 3.6.2.3

112&13/05/2005 Review Meeting More Moore_SP3-WP CONSORTIUM CONFIDENTIAL

Outgassing EvaluationMore Moore, SP3 WP6,

for Task 3.6.1.6.1 and 3.6.2.3

Elettra and AZ Electronic MaterialsAthens

12.Mai 2005


Objectives for OutgassingLow or no Outgassing chemicals is a requirement for the EUV exposuretool shelf life

First specifications for outgassing are given byASML

Resist outgas specifications for Alpha tool:H20 4.7E15

(molec/s*cm2)CxHy (integr. > 44 AMU) 4.7E13F/Cl 4.7E14S/P 4.7E11Si 4.7E9

PAG fragments (S/P) most critical

Intel Outgassing 5*1010 [molecules/cm²] at Esize (only

internal)


Intel and Sematech are working on outgassing• test procedure for outgassing• characterization of of outgassing behavior of EUV resists and related

materials:a) qualitativly

• b) quantitativly

Outgassing experiments within More Moore and ExCite

• are needed to have test equipment and to get experience

• are needed to characterize the EUV resist materials

• are needed for selection of appropriate EUV resist material.


Intel


Where More Moore stands

Outgassing test equipment set up at Elettra Synchrotron Trieste


Difference Mass Spectra MMC6 exposed-unexposed

1E-17

1E-16

1E-15

1E-14

1E-13

1 7 13 19 25 31 37 43 49 55 61 67 73 79 85 91 97 103

amu

Ion

Cu

rran

t V

aria

tio

n (

A)

PHS-Methacrylate Polymer

m/e=28,CO, C2H4

m/e=44; CO2

m/e=15,CH3

m/e=12-18, Polymer

m/e=27-30, Polymer

m/e=43-45, Polymer


Difference Mass Spectrum MMC10, exposed-unexposedlow flux

1E-17

1E-16

1E-15

1E-14

1E-13

1 6

11

16

21

26

31

36

41

46

51

56

61

66

71

76

81

86

91

96

10

1

amu

Ion

Cu

rran

t va

riat

ion

(A

)PHS-Methacrylate Polymer + PAG (TPS-Triflat)

m/e=48; SOm/e=64; SO2

m/e=12-18, Polymer

m/e=27-30, Polymer

m/e=44-45, Polymer

m/e=78; C6H6

m/e=69; CF3

m/e=31-40, PAG

m/e=20,HFm/e=26, PAG


Difference Mass Spectrum MMC1, exposed-unexposed

1E-17

1E-16

1E-15

1E-14

1E-131 6

11

16

21

26

31

36

41

46

51

56

61

66

71

76

81

86

91

96

10

1

amu

Ion

Cu

rran

t va

riat

ion

(A

)

PHS-Methacrylate based EUV Photoresist

m/e=48; SO m/e=64; SO2

m/e=12-18, Polymer

m/e=28, Polymer

m/e=43-45, Polymer

m/e=31,38 PAG

m/e=78, C6H6,PAG



Difference Mass Spectra MMC10 exposed-unexposed,high flux

1E-17

1E-16

1E-15

1E-14

1E-13

1E-12

1 5 9 13 17 21 25 29 33 37 41 45 49 53 57 61 65 69 73 77

amu

Ion

Cu

rran

t V

aria

tio

n (

A)

m/e=48; SO m/e=64; SO2

PHS-Methacrylate Polymer + PAG (TPS-Triflat)



1E-17

1E-16

1E-15

1E-14

1E-13

1E-12

1 7 13 19 25 31 37 43 49 55 61 67 73 79 85 91 97 103 109

amu

Ion

Cu

rran

t V

aria

tio

n (

A)

m/e=48; SO m/e=64; SO2

PHS-Methacrylate Polymer + PAG (TPS-Nonaflat)


Difference Mass Spectra MMC5 exposed-unexposed

1E-17

1E-16

1E-15

1E-14

1E-13

1 9 17 25 33 41 49 57 65 73 81 89 97 105 113 121 129 137

amu

Ion

Cu

rran

t V

aria

tio

n (

A)

Methacrylate Polymer Based Resist



1E-17

1E-16

1E-15

1E-14

1E-13

1 9 17 25 33 41 49 57 65 73 81 89 97 105 113 121 129 137

amu

Ion

Cu

rran

t V

aria

tio

n (

A)

Methacrylate Polymer Based Resist


Conclusion

• PAGs, which create Perfluorsulfonic acids outgass under EUV with SO,SO2

• More data needed

• Confirmation of reliability and precicion of measurement

• Analyses of mass fragments

• Quantification of outgassing in relation to specification of exposure tool