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November 2010 Water Reduction Efforts Analog Devices, Inc.

Water Reduction Efforts Analog Devices, Inc....`Tool Upgrades Oxide etch sinks were upgraded to more effectively utilize water, which resulted in an 83% reduction in DI water usage

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Page 1: Water Reduction Efforts Analog Devices, Inc....`Tool Upgrades Oxide etch sinks were upgraded to more effectively utilize water, which resulted in an 83% reduction in DI water usage

November 2010

Water Reduction EffortsAnalog Devices, Inc.

Page 2: Water Reduction Efforts Analog Devices, Inc....`Tool Upgrades Oxide etch sinks were upgraded to more effectively utilize water, which resulted in an 83% reduction in DI water usage

Sand to silicon

Ingot to wafers

Photolithography

Clean/Etch

Implant/Deposition

Test/Slice

Assembly/Packaging

Page 3: Water Reduction Efforts Analog Devices, Inc....`Tool Upgrades Oxide etch sinks were upgraded to more effectively utilize water, which resulted in an 83% reduction in DI water usage

Where does the water go?

Page 4: Water Reduction Efforts Analog Devices, Inc....`Tool Upgrades Oxide etch sinks were upgraded to more effectively utilize water, which resulted in an 83% reduction in DI water usage

Typical Water Use Wafer Manufacturing

Total Use = Total Use = 0.25 to 0.350.25 to 0.35 gal/cmgal/cm22

UPW use = UPW use = 0.10 to 0.200.10 to 0.20 gal/cmgal/cm22

* Normalized to Surface area of wafer outs x mask layers**Semiconductor Industry Association Benchmark Study

Page 5: Water Reduction Efforts Analog Devices, Inc....`Tool Upgrades Oxide etch sinks were upgraded to more effectively utilize water, which resulted in an 83% reduction in DI water usage

City Water City Water

UPWUPW or DIor DI◦◦

Ultrapure Water, Deionized Water

RECYCLERECYCLE◦

UPW returned as UPW make-up

RECLAIMRECLAIM◦

UPW downgraded to another process◦

UPW downgraded to facility use

Page 6: Water Reduction Efforts Analog Devices, Inc....`Tool Upgrades Oxide etch sinks were upgraded to more effectively utilize water, which resulted in an 83% reduction in DI water usage

Install Flow meters and regulators

Audit for checking reset points after a shutdown (Facilities and Fab)

Water efficiency audits on process tools and facilities equipment

SOPs for installation and modification of any equipment utilizing water

New equipment approvals

Identify opportunities for reclaim/reuse

Water Conservation Activities

Page 7: Water Reduction Efforts Analog Devices, Inc....`Tool Upgrades Oxide etch sinks were upgraded to more effectively utilize water, which resulted in an 83% reduction in DI water usage

Tool Upgrades

Oxide etch sinks were upgraded to more effectively utilize water, which resulted in an 83% reduction in DI water usage 83% reduction in DI water usage (or approximately 15 million gallons per year 15 million gallons per year at an estimated cost savings of $115,000 per year).

Decreased overall water use by 50% in Mod B

Water Conservation Activities

DI Water Usage by Service Chase Sink types - Before Upgrade

11 7 2.5 1.5

34

08

162432404856

Oxide E

tch Sink

s

Diffusio

n Clea

n ...

Solvent

Sinks

Spin R

inser/D

ryers

Back E

tchers

0%20%40%60%80%100%

Avg Usage

%Cum

DI Water Usage by Service Chase Sink Types - After Upgrade

11 7 2.5 1.56

08

162432404856

Diffusio

n Clea

n ...

Solvent

Sinks

Oxide E

tch Sink

s

Spin R

inser/D

ryers

Back E

tchers

0%20%40%60%80%100%

Avg Usage

%Cum

Page 8: Water Reduction Efforts Analog Devices, Inc....`Tool Upgrades Oxide etch sinks were upgraded to more effectively utilize water, which resulted in an 83% reduction in DI water usage

The use of city water for industrial/facilities equipment has been reduced by approximately 200,000 gallons per day or 75% via water treatment/reuse for scrubbers and cooling towers.

Incoming City Water

Process Reclaim Water

Water Reclaim Activities

Page 9: Water Reduction Efforts Analog Devices, Inc....`Tool Upgrades Oxide etch sinks were upgraded to more effectively utilize water, which resulted in an 83% reduction in DI water usage

To date, efforts have saved >250,000 gallons per day of city water use.

> 50,000 gallons per day of DI Water

Dl water has been reduced in one wafer fab by over 50% while production output was increased – Tool Upgrades

Continuing improvements to DI water system efficiency are ongoing.

Page 10: Water Reduction Efforts Analog Devices, Inc....`Tool Upgrades Oxide etch sinks were upgraded to more effectively utilize water, which resulted in an 83% reduction in DI water usage

Monitoring the Results….

23

Page 11: Water Reduction Efforts Analog Devices, Inc....`Tool Upgrades Oxide etch sinks were upgraded to more effectively utilize water, which resulted in an 83% reduction in DI water usage
Page 12: Water Reduction Efforts Analog Devices, Inc....`Tool Upgrades Oxide etch sinks were upgraded to more effectively utilize water, which resulted in an 83% reduction in DI water usage

AWARDS and RECOGNITION

24

*Excerpt from Wilmington Town Water Report

*

"Analog Devices was the most concerned and proactive firm of all the industrial water users assessed under this program…taking the issue of water conservation the most seriously".

Page 13: Water Reduction Efforts Analog Devices, Inc....`Tool Upgrades Oxide etch sinks were upgraded to more effectively utilize water, which resulted in an 83% reduction in DI water usage

Ipswich River Ipswich River Watershed Watershed

Association Association (IRWA)(IRWA)

25

Page 14: Water Reduction Efforts Analog Devices, Inc....`Tool Upgrades Oxide etch sinks were upgraded to more effectively utilize water, which resulted in an 83% reduction in DI water usage

Current maintenance goal of zero % increase in water use while increasing production output

Continue to optimize with the addition of new and existing operations

On-Going Water Conservation Activities

Page 15: Water Reduction Efforts Analog Devices, Inc....`Tool Upgrades Oxide etch sinks were upgraded to more effectively utilize water, which resulted in an 83% reduction in DI water usage

Dan Forsythe◦

508-970-0033 x135

[email protected]

Contact Information