92
UV Measurement & Process Control: Theory vs. Reality Overview of EIT Products & Measurement Techniques Jim Raymont EIT Instrument Markets Sterling, Virginia USA

UV Measurement & Process Control: Theory vs. Reality Overview of

  • Upload
    others

  • View
    2

  • Download
    0

Embed Size (px)

Citation preview

Page 1: UV Measurement & Process Control: Theory vs. Reality Overview of

UV Measurement & Process Control:Theory vs. Reality

Overview of EIT Products & Measurement Techniques

Jim Raymont EIT Instrument MarketsSterling, Virginia USA

Page 2: UV Measurement & Process Control: Theory vs. Reality Overview of

TheoryThe analysis of a set of facts in their relation to one another A plausible or scientifically acceptable general principle or body of principles offered to explain phenomena Assumption, concession, premise, presumption, presupposition; generalization, guess, guesswork, inference, speculation, surmise; proffer, proposal, suggestion; feeling, hunch, impression, inkling, notion, suspicion; abstraction, concept, conception

Laboratory, ideal & very controlled conditions, process development, academic/experiments, projects

RealityThe quality or state of being real, a real event, entity, or state of affairs Something that is neither derivative nor dependent but exists necessarilySomething that actually exists Manufacturing/Production floor, factory conditions, products, deadlines, orders, customers

Theory vs. Reality

Adapted from Online Dictionary & Thesaurus by Merriam Webster

Ivory Tower vs. Production Floor

Theory vs. Reality

Page 3: UV Measurement & Process Control: Theory vs. Reality Overview of

Why measure?Who’s asking? Where do we measure? What should we measure?

Indirect UV parametersIndirect-monitorDirect UV (Joules & Watts)

How do we measure? Types of measurement?When/How often do you measure?

Process ControlUnderstanding UV measurement instrumentsUV Source & Instrument AdvancesHands on Practice

Presentation Content

Keep the UV Monkey off your back

Page 4: UV Measurement & Process Control: Theory vs. Reality Overview of

Are we speaking the same language?

UV Language-Speak the same UV Language

Irradiance (Intensity)• Expressed in watts or milliwatts per square centimeter (W/cm2 or mW/cm2)• Total radiant power of (all) wavelengths passing from all incident directions

onto an infinitesimally small area (cm2)• Depth of cure, penetration through pigments and opaque colors, adhesion to

the substrate

Radiant Energy Density (Dose)• Expressed in joules or millijoules per square centimeter

(J/cm2 or mJ/cm2)• Incorporates time as part of the measurement• One watt for One second = One joule

• Area under the irradiance curve• Often the only UV exposure guide number supplied• Important for total and complete cure of material

UV Glossary & Terminology: www.radtech.org Time

Energy Density

dA

Page 5: UV Measurement & Process Control: Theory vs. Reality Overview of

WhyWhy do we measure?RepeatabilityReliabilityVerificationDocumentationISOTrainingQualityCertificate of Conformance/Customer RequirementBecause we cannot see UVEstablish, Document and Use Process Control Limits to avoid UV Curing by Guessing!Art vs. Science

$

Reality: Many people do not measure until after they have a problem that costs them time & money, and then

it really costs them time and money

Page 6: UV Measurement & Process Control: Theory vs. Reality Overview of

Anything that you can measure, you have a better chance of controlling. Things that you do not measure become the cause of mysterious problems

Larry Goldberg-Beta IndustriesReality: UV can be measured and it can be controlled. If it is not measured it will cause mysterious problems

Not everything that counts can be counted, and not everything that can be counted counts.

Albert EinsteinReality: Document all process parameters initially and then decide what is important to continue counting, measuring, controlling and maintaining.

Why didn’t I think to say that…………

Page 7: UV Measurement & Process Control: Theory vs. Reality Overview of

Substrate

Supplier

UV Equipment

Supplier

ManufacturingEquipmentSupplier

Process Control & UV Measurement Instrumentation

Who is measuring UV and what is their motive?

Communication

Formulator/ChemistEstablish a specificationDetermine a process windowOptimize a processAcquire, service and maintain customerTend to be absolutemeasurements.

Customer/End User(Operator, Maintenance, Business,

Quality)• Maintain the process• Troubleshoot and operate in process

window• Record keeping• Production costs, Scrap, Profit• Tend to be relative measurements.

Reality: Communicate, Communicate, Communicate and work with suppliers that Communicate with each other!

Page 8: UV Measurement & Process Control: Theory vs. Reality Overview of

Where are we measuring? • UVA: 320-390nm Long-wave, blacklight, UV Inks,

• UVB: 280-320nm Middle-wave, erythemal response, medical applications

• UVC: 200-280nm Short-wave, germicidal (254 nm), absorbed by DNA, clear coats, surface cure, tack, chemical or scratch resistance

• UVV: 395-445nm Ultra Long-wave, wood products, opaques/whites, thick coats, adhesion, depth of cure

• VUV (Vacuum UV): 100-200 nm, Ozone < 200 nm

Reality: Don’t assume, clarify the bandwidth you are talking about

Page 9: UV Measurement & Process Control: Theory vs. Reality Overview of

Where the UV goes-relative penetration

Substrate Surface

Ink, coating, adhesive thickness

UVC UVB UVA UVV

Reality: Understand what kind and quantity of UV your formulation needs to cure. Match the source and equipment to it

Page 10: UV Measurement & Process Control: Theory vs. Reality Overview of

Reality Check: When is a Joule not a Joule?

Bandwidths are not defined and vary from manufacturer to manufacturer and how they are specified

EIT UVA 320-390 nm, Full Width Half Max (FWHM), CWL 365 nmIL UVA 250-415 nm CWL 365 nm

Specify units in measurement to avoid confusion and apples to oranges comparisons

300 mJ/cm2 Good300 mJ/cm2-UVA Better300 mJ/cm2-UVA EIT 320-390 nm Best

Where are we measuring?

Reality: Be specific when communicating instrument values

Page 11: UV Measurement & Process Control: Theory vs. Reality Overview of

EIT UVA 320-390 nm

IL UVA 250-415

nmEITUVA

The half power points or the full width half max (FWHM) defines EIT Bandwidths (i.e. 320 nm)

Where are we measuring? UVA-Spectral Bandwidth Comparisons

Page 12: UV Measurement & Process Control: Theory vs. Reality Overview of

What should we monitor?Dwell Time or Belt/Line Speed• Affects the amount of energy reaching the substrate• Actual speeds may vary widely from settings on the speed controller

and may not be linear (±25%)

Effects of varying the process speed from 4 fpm (blue) to 10 (black) fpm

Peak Irradiance remains the

same-Slight 2.9% difference

Radiant Energy Density changes as a function of the

process speed

At 4 fpm: 2096 mJ/cm2

At 10 fpm: 860 mJ/cm2

143% difference in Radiant Energy Density between the

two speeds

Reality: Independently test and confirm dwell time or belt/line speed

Page 13: UV Measurement & Process Control: Theory vs. Reality Overview of

Hour Meter• Number of hours on the current UV bulb• Hour meter does not indicate the number of starts and stops on the

bulb• Hour meter does not indicate at what temperature the bulb was

generating UV• Hour meter does not tell you the amount of UV being generated

What should we monitor?

Reality:

• Hour meter only gives you a rough indication of when you will need to replace the bulb

• Use a radiometer for confirmation

• Sourcing bulbs from one supplier will lead to consistent results-Buy on value, not price

• Changes in cooling can impact bulb life

Page 14: UV Measurement & Process Control: Theory vs. Reality Overview of

Electrical PowerAmp Meter

Measures the input power applied to the systemVariations in line voltage (up to 20%), system efficiency

Lamp Power SettingsThis is a measure of power applied to the “bulb”Watts per inch or cm (200-800+ WPI)WPI/CM estimate:Voltage x Amperage/Arc length of bulbWPI/CM settings-variations from actual, linearity of systemPower applied to system, not the effective amount of UV generated or effective amount reaching the cure surfaceDescribing lamp power is not the same as describing its output.A 600 watt/inch lamp does not produce 600 watts/inch of UV-it consumes it

What should we monitor?

Reality: Lamps with a (applied) power of 600 W/inch vary in UV output from <1 W/cm2 (arc) to > 6 W/cm2 (microwave) of UVA (EIT

320-390) Do not confuse input power to effective UV output.

Page 15: UV Measurement & Process Control: Theory vs. Reality Overview of

TypesConventional, Solid State, High Frequency, DC, Square vs. Sine

Power Supply

Page 16: UV Measurement & Process Control: Theory vs. Reality Overview of

Where the electrical power goes?

Reality: Only a small portion of the applied power generates UV

Page 17: UV Measurement & Process Control: Theory vs. Reality Overview of

Reflectors• 60-80% of energy reaching the substrate is reflected• Optimize reflected energy, reflector focus and lamp position

through design and maintenance programs • Shape, type, material, coating of reflector matched to process

What should we monitor?

Parabolic Reflectors

Elliptical Reflectors

Page 18: UV Measurement & Process Control: Theory vs. Reality Overview of

Parabolic vs. Elliptical reflectors, Time X-axis, Irradiance Y-Axis

Elliptical ReflectorParabolic Reflector

What should we monitor?UV Source to Cure Surface Distance

Page 19: UV Measurement & Process Control: Theory vs. Reality Overview of

Focused lamp

Time in seconds

UV

W/c

m2

What should we monitor?

Non-Focused lamp

UV

W/c

m2

Time in seconds

Reality: Non-focused lamps can be used for dimensional curing and to achieve the desired properties (gloss control)

UV Source to Cure Surface Distance

Page 20: UV Measurement & Process Control: Theory vs. Reality Overview of

The effect of moving the UV housing away from the cure surface

FOCUSED858 mW/cm2

2096 mJ/cm2

NON-FOCUSED290 mW/cm2

1707 mJ/cm2

UV Source to Cure Surface DistanceWhat should we monitor?

Time in seconds, All values UVA EIT 320-390

UV

W/c

m2

Page 21: UV Measurement & Process Control: Theory vs. Reality Overview of

Look across the bulb length• Middle to end comparison

• Middle reading lowerSagging-15 % difference in irradiance

levels • Rotate bulbs• Cooling issues

EndMiddle

What should we monitor?

Middle

End

Look across the bulb length• Middle to end comparison

• Middle reading higher• Arc bulb aging on ends

• 440mW/cm2 in the middle vs.317 mW/cm2 at the end

• Width of source to width of product?• Time to replace bulb?

Page 22: UV Measurement & Process Control: Theory vs. Reality Overview of

Lamps 1-3• Parabolic reflectors

Lamp 8• Out of focus

What should we monitor? Variation in a multi-lamp production line

1-3

7

8

9

Time in seconds

UV

W/c

m2

Lamp 7 vs. Lamp 9• Irradiance: 173 vs. 440 mW/cm2

• Energy Density: 58 vs. 93 mJ/cm2

• All values UVA EIT 320-390

Page 23: UV Measurement & Process Control: Theory vs. Reality Overview of

Before: Readings on a two lamp system Energy Density: 953 mJ/cm2 (UVA EIT 320-390)

Irradiance: 313 mW/cm2 (UVA EIT 320-390)

After: Readings on the same systemEnergy Density: 1203 mJ/cm2 (UVA EIT 320-390) + 26%Irradiance: 449 mW/cm2 (UVA EIT 320-390) + 43%

Only one thing doneReflectors were cleaned

What should we monitor?

Reality: One little thing can have a big impact in the UV reaching the cure surface

Page 24: UV Measurement & Process Control: Theory vs. Reality Overview of

• Match the UV light to your process and chemistry

What should we monitor? UV Spectral Output

• Different types of bulbs, variations in the bulb over time and variations in the bulb with power, power supplies

• Diameter of bulb, cooling system and airflow in lamp housing

• System manufacturer can tell you what types of bulbs your system can use

• Not always interchangeable due to power supply-kicker

• Variations between manufacturers, match to process

• Ozone producing (more UVC) or Ozone free (material)

Reality•Buy bulbs based on best value and not the cheapest cost.•Watch purchasing staff getting ‘specials’

Bulb Type & Focus Indicator

Page 25: UV Measurement & Process Control: Theory vs. Reality Overview of

Mercury Lamp Spectra“H” Lamp

Iron Additive Lamp Spectra“D” Lamp

Gallium Additive Lamp Spectra“V” Lamp

What should we monitor? UV Spectral Output

Page 26: UV Measurement & Process Control: Theory vs. Reality Overview of

UV Bandwidths- EIT Instruments

0.00

10.00

20.00

30.00

40.00

50.00

60.00

200 250 300 350 400 450 500

Wavelength (nm)

Tran

smis

sion

%

T %(New Extrernal Transmittance Proposed D) C B A V

CB

A

D

V

Page 27: UV Measurement & Process Control: Theory vs. Reality Overview of

UVA Energy Density: 537 to 487 mJ/cm2

UVA Irradiance: 309 to 290 mW/cm2 UVA EIT 320-390

NEWOLD

With 600 hours of run time would you change this bulb?

Page 28: UV Measurement & Process Control: Theory vs. Reality Overview of

Change Now?

OLDNEW

UVV Energy Density: 737 to 1331 mJ/cm2

UVV Irradiance: 397 to 734 mW/cm2 UVV EIT 395-445

Page 29: UV Measurement & Process Control: Theory vs. Reality Overview of

Do you have any additional parameters unique to your process or environment?

Examples:Inert Curing-Nitrogen, Quartz Plates, Supplier ChangesTemperature: Ambient, Exhaust, Water Cooled Humidity, Static, Handling, Storage

What should we monitor?

Page 30: UV Measurement & Process Control: Theory vs. Reality Overview of

State of the Art Equipment• Touch screen PLC controller

• Image based controls

• Lamp status

• Trouble shooting guides

• Wiring diagrams

• Focus Adjustment

Images courtesy of Miltec UV

Lamp Ready Lamp 80% Lamp 100%

Page 31: UV Measurement & Process Control: Theory vs. Reality Overview of

Images courtesy of Miltec UV

State of the Art Equipment-PLC Screens

Page 32: UV Measurement & Process Control: Theory vs. Reality Overview of

PLC Screen Images courtesy of InPro Technologies

State of the Art Equipment-PLC Screens for Online UV, Temperature and Airflow

Page 33: UV Measurement & Process Control: Theory vs. Reality Overview of

Irradiance (Intensity)• Expressed in watts or milliwatts per square centimeter (W/cm2 or mW/cm2)• Total radiant power of (all) wavelengths passing from all incident directions

onto an infinitesimally small area (cm2)• Depth of cure, penetration through pigments and opaque colors, adhesion to

the substrate

Radiant Energy Density (Dose)• Expressed in joules or millijoules per square centimeter

(J/cm2 or mJ/cm2)• Incorporates time as part of the measurement• One watt for One second = One joule• Area under the irradiance curve• Often the only UV exposure guide number supplied• Important for total and complete cure of material

Wavelength• Nanometers

UV Glossary & Terminology: www.radtech.org

Time

Energy Density

dA

UV Measurement Terms (Again)

Page 34: UV Measurement & Process Control: Theory vs. Reality Overview of

RadTech North AmericaMission: Expand the use of UV and EB technology through:

Information: technical; environmental health and safety; marketingEducation: government and non government organizations; potential usersPartnering: trade groups, publications, international counterparts Website: www.radtech.org

Glossary on UV Measurement

Page 35: UV Measurement & Process Control: Theory vs. Reality Overview of

Irrad

ianc

e

distance

Light intensity decreasesWith the square of theDistance.

Irradiance as function of distance

Page 36: UV Measurement & Process Control: Theory vs. Reality Overview of

surface area = 4/3πr2

Irradiance as function of distance

Page 37: UV Measurement & Process Control: Theory vs. Reality Overview of

Energy Density as a Function of Time

Ener

gy D

ensi

ty

Time

Page 38: UV Measurement & Process Control: Theory vs. Reality Overview of

Equal Joules = Equal Cure?• Area in each figure approximately equal• Represents the ‘area under the curve” or Joules/cm2

• Equal Joules ≠ Equal Cure?

Irrad

ianc

e

Time

Page 39: UV Measurement & Process Control: Theory vs. Reality Overview of

UV Measurement StrategiesFormulator/Chemist

Process Development and Design Goals:Reproduce & transfer the process to productionOptimize the cured properties of end product Tend to be absolute measurementsQuantify and communicate cure conditions

Irradiance (W/cm2, J/cm2)Bulb TypeExposure profile (speed, focus)Infrared?

Customer/End UserMonitoring Goals:

Verify that the key conditions remain

within specified limits

Measure and document changes

Ship good quality products

Communicate

Tend to be relative measurements

Page 40: UV Measurement & Process Control: Theory vs. Reality Overview of

0

20

40

60

80

100

120

140

160

180

1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17

Trial Number

Peak

Irra

dian

ceProcess Design: Path Tuning for Uniform Peak Intensity

Page 41: UV Measurement & Process Control: Theory vs. Reality Overview of

UV Instrument SelectionEvaluate Application

LinearLinear travel, flat

Area FloodFlat or complex travel, lower irradiance levels, motion varies from timed exposure with no movement to complex

SpotSmall areas, liquid or fiber guides

OtherGermicidal

Select Right Instrument For ApplicationReading Type

Absolute or Relative

SizeProduct Type

Continuous-onlineNumeric Display of Irradiance & Energy DensityProfiling-irradiance over time

Source/Bulb TypeArcMicrowavePulsed (Xenon) LED

Bandwidth(s) (UVA, UVB, UVC, UVV, New-UVD)

Dynamic RangeExposure vs. curingBut I get readings…..

User Expectations

Page 42: UV Measurement & Process Control: Theory vs. Reality Overview of

Pulsed or Flash UV ApplicationsXenon “Pulsed UV light produces complete, deeper and faster curing, in the most demanding applications requiring low heat with high throughput.”

Applications• Optical disc manufacturing (CD lacquer curing, DVD Bonding, Blu-ray Disc™ top-coat curing)

• Medical device manufacturing (hydrogels, coatings on guide wires)

• Semiconductor manufacturing (wafer manufacturing, tape removal)

• Rapid curing of coatings on hard drives• Curing of sensitive wood finishes

Page 43: UV Measurement & Process Control: Theory vs. Reality Overview of

UV LED: Development of Semiconductor Based UV Sources

Packaged –Single Diode

Low Power –Small Arrays

Phoseon’s Systems -

Integrated Industrial System High Power – Large Arrays

Output: 0.5 W/cm2

Size: 12mm Dia

Output: 0.01 W/cm2

Size: 0.2mm DiaOutput: 4.0 W/cm2

Size: Scalable to 4m!

Fully Integrated SystemsWith Built-In Controls

Information Courtesy

Page 44: UV Measurement & Process Control: Theory vs. Reality Overview of

Irradiance Improvements

Information Courtesy

Page 45: UV Measurement & Process Control: Theory vs. Reality Overview of

Applications – Printing/InksDigital Printing – UV Inkjet (Wide Format and Single Pass)Screen and Press Applications

Information Courtesy

Page 46: UV Measurement & Process Control: Theory vs. Reality Overview of

UV LED

Images Courtesy Phoseon Technology & Summit UV

Page 47: UV Measurement & Process Control: Theory vs. Reality Overview of

How do we measure?Absolute Instruments

Absolute units (mJ/cm2 and mW/cm2), compare readings between curing units and locations

Relative InstrumentsRelative units, electronic signal proportional to lamp brightness (% intensity), on line continuous monitoring, feedback to display, PLC

Page 48: UV Measurement & Process Control: Theory vs. Reality Overview of

Absolute Instrument Examples

Absolute Instruments• Absolute units (mJ/cm2 and

mW/cm2)• Compare readings between curing

units and locations• Communication• Used in relative mode?

Page 49: UV Measurement & Process Control: Theory vs. Reality Overview of

Relative Instrument Examples

Relative Instruments• Relative units, electronic signal proportional to lamp brightness (%

intensity), • On line continuous monitoring, feedback to display, PLC• Long lasting stability of sensor • Can be used when an absolute instrument will not fit into the process

Page 50: UV Measurement & Process Control: Theory vs. Reality Overview of

UV Measurement and Process Control

We aren’t smart enough to know what matters and what doesn’t so

we copy everything Brian Harrison-Intel

Goals are deceptive-the unaimed arrow never misses

Charles Knief (Kimo’s Rules)

UV measurement can’t help you unless you document and record

the readings! Jim Raymont-EIT

Reality

1. Be as smart as Intel

2. No process window-will never be out of it. Know your process window, know your process, know you will have a job

3. Where did I put those readings?.......

Page 51: UV Measurement & Process Control: Theory vs. Reality Overview of

Process WindowThe range in which a process will work with the desired results

Adhesion, hardness, flexibility, gloss, texture, stain or scratch resistance, chemical rub, cross hatch, abrasion rub, color ID, registration

Ideal if the Process Window is forgiving and has a wide latitude. It takes work and timeInvest before production & confirm when things are working!

Starting guidelines from formulator?Operator Training, ISO/Procedure Documentation

Define your lower limits and document the readingsIncrease line speed/decrease applied power until you undercure, note readings and cushion by 20%

Upper limits? Monitor your readings by job, hour, shift or day as required to maintain quality

Reality:

1. Establish your process window during the design/development phase

2. Establish your process window when things are working

Page 52: UV Measurement & Process Control: Theory vs. Reality Overview of

Powder Cure RequirementsManufacturer’s Recommended Specifications

Page 53: UV Measurement & Process Control: Theory vs. Reality Overview of

Oven Temperature

Page 54: UV Measurement & Process Control: Theory vs. Reality Overview of

Process or Cure Window

Stop!Undercure LimitStop!Undercure Limit

Caution 20% Undercure Buffer RangeCaution 20% Undercure Buffer Range

Normal Operating WindowNormal Operating Window

Page 55: UV Measurement & Process Control: Theory vs. Reality Overview of

Process or Cure Window for Temperature Sensitive Substrates

Stop! Over temperature limit?Stop! Over temperature limit?

Stop!Undercure LimitStop!Undercure Limit

Caution 20% Undercure Buffer RangeCaution 20% Undercure Buffer Range

CautionCaution 20% Over temperature Buffer Range20% Over temperature Buffer Range

Normal Operating WindowNormal Operating Window

Page 56: UV Measurement & Process Control: Theory vs. Reality Overview of

Sample Job Log

Signature

22

Actual. Energy Density (J/cm2)

Irradiance(W/cm2)

Hour Meter

PowerWPI

Ind.

1.450.859780400254/12

OtherUV System: North Line Lamp: 2Line Speed Dwell Time

FPMDate

Equipment variablesIndicated vs. actual process speed

For each UV lamp systemHour meterPower settings (WPI, Amps)Irradiance (W/cm2)Radiant Energy Density(J/cm2)Lamp matched to chemistryFocus/Reflector condition

Other things to considerDate/job number Operator signature Mesh countFormulation typePass/fail on specific QC tests-cross hatch, rub, registrationMaintenance log of systemMaintenance due dateRadiometer type/bandwidths

Page 57: UV Measurement & Process Control: Theory vs. Reality Overview of

Production Floor-Monitor Trends

Spreadsheet or Program based trending

Page 58: UV Measurement & Process Control: Theory vs. Reality Overview of

Outside the Process Window?Relax and breathe deep! You have the process window established! Right?Gradual change towards caution area?Which way do you have to go?Perform system maintenance

Measure,Clean, Rotate, Measure. Any Improvement?

Replace lamps or adjust user controlled variables until you are back in your process windowWork and communicate with suppliers in good times and bad times

Reality: Get into “predict and perform preventative maintenance”routine vs. a “fix it when it breaks” routine

Page 59: UV Measurement & Process Control: Theory vs. Reality Overview of

UV Formulation SpecificationsFormulator Specification:

• 2x Hg lamps 80 W/cm, 5 meters per minute, forward feed

Improving the Specification:• 2x Hg lamps 80 W/cm, 5 meters

per minute, forward feed • Joules or Watts more important?• One 160-200 W/cm lamp work?• Lamp Type? (H, D, V) • Reflector type?• Thermal?

• Coating Thickness (Mils?)

Reality: Most specifications can be improved without revealing proprietary information

Distance from the lamp• Focus? Non Focus?

Radiometer values• Minimum irradiance• Minimum energy density• Instrument type• Bandwidth• 650 mW/cm2, EIT UVA (320-390)• 700 mJ/cm2, EIT UVA (320-390)• UVB?, UVV?, UVC?

Page 60: UV Measurement & Process Control: Theory vs. Reality Overview of

Why Calibrate?Balance the amount of IR, Visible and UV the optics and detector “see” with the output signal from the detectorCompensate for changes in the optics over time

SolarizationInstruments used in harsh production & manufacturing environments

Irradiance levels:Sunlight: 18 mW/cm2 Production UV levels: 100’s to 1000’s mW/cm2

Physical damage to instrumentDrop, crush instrument, scratch optics

Optics/instrument coated with ? Electronics checkup

Physical and/or heat related damage

Page 61: UV Measurement & Process Control: Theory vs. Reality Overview of

Solarization of Optics affects absolute measurement and requires maintenance

Page 62: UV Measurement & Process Control: Theory vs. Reality Overview of

Understand your instrument and its limits

Treat and handle as an instrumentMaintain on daily basisCalibrate & service as requiredEquipment Tune-Up

Belt play/bouncinessBelt smoothnessReflector shape

Users expect the same accuracy as other instruments-current radiometer technology ± 10%

Optics Electronics User induced errors and comparisons (real vs. perceived)

Comparison to other products

Reality: Use your instrument with design specs

Avoid PICNIC errors: Problem in chair, not in calibration

Page 63: UV Measurement & Process Control: Theory vs. Reality Overview of

Comparison of EIT Optics Designs

Optical Window/Filter

Aperture opening(s)

Diffuser(s)

Optical Filter

Detector

UV UV

0.25”0.50”

Page 64: UV Measurement & Process Control: Theory vs. Reality Overview of

EIT Generated Work/Assembly Instructions

Page 65: UV Measurement & Process Control: Theory vs. Reality Overview of

Filter-Detector-Composite Responses

Filter Detector Composite

Normal to expect small variations between filtersTradeoff is $ vs. performanceEIT is careful to test each filter to avoid wide variationsSelect & test the optics for better performance and unit to unitcomparisons

Page 66: UV Measurement & Process Control: Theory vs. Reality Overview of

Filter response across lotsUV-A Filters LOT2908A & LOT3806A

0.000

10.000

20.000

30.000

40.000

50.000

60.000

70.000

80.000

90.000

100.000

300

306

312

318

324

330

336

342

348

354

360

366

372

378

384

390

396

402

408

wave length (nm)

%T

Series1Series2Series3Series4Series5theory (1.98mm thk)

Page 67: UV Measurement & Process Control: Theory vs. Reality Overview of

θ

Eθ = E x Cosθ

Cosine Error in Measurement

Spatial Response

Page 68: UV Measurement & Process Control: Theory vs. Reality Overview of

θ

Eθ = E x Cosθ

Cosine Error in Measurement

45o = .7 Watt 90o = 1.0 Watt

Page 69: UV Measurement & Process Control: Theory vs. Reality Overview of

Cos Response Curve of Palm Probe

0.0

0.1

0.2

0.3

0.4

0.5

0.6

0.7

0.8

0.9

1.0

1.1

-90 -80 -70 -60 -50 -40 -30 -20 -10 0 10 20 30 40 50 60 70 80 90

Angle (deg.)

Norm

aliz

ed R

espo

nse

Ideal Cos Response

Palm Probe-Old Optics

Palm Probe-New Optics

Spatial Response of Instruments Goal: Cosine Response

Page 70: UV Measurement & Process Control: Theory vs. Reality Overview of

Radiometer Variations-ThresholdStart threshold: Irradiance level which causes the unit to start measuring UV

Counts all UV past that pointVaries due to scale, electronic response, optics, design

Data threshold: PowerView software allows user to discard all readings below a set rangeChallenge: Long slow runs of low irradiance

Potential for wide variation in energy density-Joules

Page 71: UV Measurement & Process Control: Theory vs. Reality Overview of

Radiometer Variations-Threshold

40 mW

UV

W/c

m2

Page 72: UV Measurement & Process Control: Theory vs. Reality Overview of

Radiometer Variations-TemperatureUnknowingly introduce variations to readings based on the internal temperature of the unitAs detector temperature raises, readings may dropTry to maintain consistent conditions and avoid rapid, repeated, long duration high intensity runsTypical detector variation: -0.2% per °C If it’s too hot to touch – it’s too hot to measureInternal temperature alarms (65 ° C)

Page 73: UV Measurement & Process Control: Theory vs. Reality Overview of

Radiometer Variations-Sample Rate

Unknowingly introduce variations to reading based on the sample rate of the unit

Did the unit collect an adequate number of samples to produce a number you can trust?

Slower is better-irradiance values should be similar, calculate energy density information from the reading at a slow speed

Page 74: UV Measurement & Process Control: Theory vs. Reality Overview of

Time

Instrument with Low Sampling Rate & Fast Belt Speed

Page 75: UV Measurement & Process Control: Theory vs. Reality Overview of

Time

Instrument with High Sampling Rate

Page 76: UV Measurement & Process Control: Theory vs. Reality Overview of

Sample 2 Hz

What works well at one line speed…

Page 77: UV Measurement & Process Control: Theory vs. Reality Overview of

Sample 2 Hz

May not work well at another.

Page 78: UV Measurement & Process Control: Theory vs. Reality Overview of

Sample 6 Hz

The sampling rate must be appropriatefor the process. Typical rates can vary From 25 to 30,000 samples/second

Page 79: UV Measurement & Process Control: Theory vs. Reality Overview of

Radiometer Variations - Sample Rate

Total Time under UV reflector: 0.83 seconds

Time under Peak irradiance: 0.30 seconds

Inst. Sample Rate (#/sec) Samples

25 2040 33

128 106256 212

1024 8502048 1700

Speed: 33 fpm/10 mpm

Page 80: UV Measurement & Process Control: Theory vs. Reality Overview of

Radiometer Variations - Sample Rate

Total Time under UV reflector: 0.18 seconds

Time under Peak irradiance: 0.08 seconds

Inst.SampleRate (#/sec) Samples

25 440 7

128 23256 46

1024 1842048 368

Speed: 240 fpm/74 mpm

Page 81: UV Measurement & Process Control: Theory vs. Reality Overview of
Page 82: UV Measurement & Process Control: Theory vs. Reality Overview of

Example: EIT Product ComparisonPP/+ PP/+ II PWRMAP MC

Range (H) 5W 10W 20W (10W) 10WUVA, B, V

UVC5mW- 5W5mW-1W

10 mW-10W 5 mW-1W

200 mW-20 W 20 mW-2W

500 mW-10W (A)

Range (L) 50 mW 100 mW 200 mW 2W

UVA, B, C, V

50µW-50 mW

100µW-100 mW

2-200 mWC: 1-100 mW

100 mW-2W (A)

StartThreshold

5 mW 10 mW 1-2 mW 50 mW (10)10 mW (2)

Smooth ON Both Both OFFSampling 25 25/2048 or

30,000128-2048 2048

Page 83: UV Measurement & Process Control: Theory vs. Reality Overview of

Applications/Product Updates

Page 84: UV Measurement & Process Control: Theory vs. Reality Overview of

UviCure® Plus II & UV Power Puck® II

Page 85: UV Measurement & Process Control: Theory vs. Reality Overview of

UV Power Puck® FLASH

Modified electronics for pulsed sourcesPower Puck Flash-four UV Bandwidths Electronics designed for pulses between 100-120 times/secondProvides energy density valuesUser selectable parameters User changeable batteries

Page 86: UV Measurement & Process Control: Theory vs. Reality Overview of

Pulsed Lamp Source - 4 Pulses

X-Axis Milli

seconds

1 2 3 4

Page 87: UV Measurement & Process Control: Theory vs. Reality Overview of

Pulsed Lamp Source-Single Pulse

X-Axis Micro

seconds

Page 88: UV Measurement & Process Control: Theory vs. Reality Overview of

Pulsed Lamp Source-Linearity

Page 89: UV Measurement & Process Control: Theory vs. Reality Overview of

Dimensional Objects

MarketsAutomotive-fenders, hoods, entire bodiesWood-complex edges, furniture, doors, complex edgesLarge dimensional objects-canopies, boats, SMC tubs & shower stalls, swim spas, coffinsPowder coat applicationsStatic and traveling objects exposed to a robotic UV sourceFlood chambers, small exposure systems

Applications• UV measurement on complex, small-large

objects • Provide information for immediate, real-time

adjustment of lamps• Collect lamp output in different spectral

bandwidths

Page 90: UV Measurement & Process Control: Theory vs. Reality Overview of

3DCURETM

Sensors:Calibrated, Single Spectral Bandwidth RadiometerUVA, UVB, UVC, UVVMix & Match Bandwidths in the same stringProvides mW/cm2 and mJ/cm2

Connect up to 32 sensors in a daisy-chain digital networkSensor mounting adapters (“Positioners”) for convenient permanent positioningPowered by a DCMSize: 1.75” diameter x 0.5 h

DCM-Data Collection Module:Collects and transfers data to a PC via EIT Cure3D SoftwareOperation similar to a PowerMAPProvides power to the sensorsPortable, or tetheredRechargeable batterySize: 4.5 l x 2.75 x 0.8”

EIT Cure3D Software:Provides ActiveX controls for user customization.

Page 91: UV Measurement & Process Control: Theory vs. Reality Overview of

3DCure Data Screen (Cure3D)

Page 92: UV Measurement & Process Control: Theory vs. Reality Overview of

Contact Information for UV measurement articles, questions and support

EIT-Instrument MarketsSGIA Booth 3115

108 Carpenter DriveSterling, VA 20164 USA

P:703-478-0700F:703-478-0815E:[email protected]: eitinc.com

Thank You!Questions?