UV-Consulting Peschlpreparative photochemistry and photochemical environmental techniques We sell UV-radiation sources and standard photo-chemical reactors for immediate use to perform

■Ph

otoc

hem

istry

UV-Consulting Peschl

Weberstrasse 19

55130 Mainz / Germany

Copyright © 2009 UV-Consulting Peschl. All rights reserved.

Neither the document nor parts of it may not be reproduced, distributed, transmitted, broad-

casted, publicated, sold, commercially used, redistributed, rewritten, cached or otherwise used,

except with the prior written permission of UV-Consulting Peschl.

This document may only be stored or used on a computer for personal use.

Any information in this document is subject to change without prior notice.

We thank our partners for the provided pictures and kind cooperation:

Heraeus Noblelight GmbH, Hanau

Quantapplic, Prof. Dr. A. M. Braun, Mainz

Imtek, Prof. Dr. P. Woias, Freiburg

Document No.: KP001.00.EN

Light, Not Heat ...............................................................................................4

Typical applications of photochemcial processes ..............................................5

Microphotoreactor ..........................................................................................7

Thin-Layer Photoreactor ................................................................................11

UV Laboratory Reactor System 1 ...................................................................15




Falling Film Reactor System ...........................................................................31

Low-Temperature Reactor .............................................................................35

Excimer Laboratory Reactor ..........................................................................39

Immersion lamp PTQ 1,5 for pilot .................................................................43

Immersion lamp MTQ 2/4 for pilot- & production .........................................47

Immersion lamp MTQ 10/20 for production ..................................................51

Immersion lamp MTQ 40/60 for production ..................................................55

Reflector unit ................................................................................................59

Radiations sources ........................................................................................62

Power supplies ..............................................................................................63

Spectral distribution Hg ................................................................................64

Spectral distribution Hg - ozone free ............................................................64

Spectral distribution Hg - Z1 .........................................................................65



Spectral distribution Hg - Z4 ..........................................................................66

Spectral distribution LP 185 + 254 ................................................................67

Spectral distribution LP 254 ..........................................................................67

Spectral distribution Xe2 Excimer 172 ...........................................................68

Spectral distribution KrCl Excimer 222 ..........................................................68

Spectral distribution XeCl Excimer 308 .........................................................69

Spectral energy distribution tables

TNN 15/32 ....................................................................................................70

TQ 150, undoped .........................................................................................70

TQ 150, Z1 doped ........................................................................................71

TQ 150, Z2 doped ........................................................................................71

TQ 150, Z3 doped ........................................................................................72

TQ 718, undoped .........................................................................................73

TQ 718, Z1 doped .........................................................................................74

TQ 718, Z2 doped ........................................................................................75

TQ 718, Z3 doped ........................................................................................76

TQ 718, Z4 doped ........................................................................................77

UV lamps for industrial scale immersion lamp systems 2-60 kW ............78 - 79

Spectral energy distribution Easy-upsacling lamps .........................................80

Quartz glass mixture types ............................................................................81

Contact persons ...........................................................................................83

Content

3

In synthesis, photochemistry is the method of

choice. UV light can vastly speed up many chemical

syntheses - or make them possible in the first place.

Unlike with thermal excitation, light-induced reac-

tions frequently take place at room temperature and

are therefore less destructive.

Sensitive molecules remain intact and there are

fewer by-products.

Light as a reagent for breaking down organic com-

pounds in liquids. Photochemistry makes the use of,

for example, toxic substances for water treatment

unnecessary. Pollutants are actually broken down

and not simply transferred to another matrix as is

the case with traditional physical methods such as

active charcoal adsorption or filtration.

Rapid and efficient testing of the photostability

of organic molecules. In many countries there are

already regulations governing the testing for photo-

chemically induced degradation of pharmaceuticals

and cosmetics. UV-Consulting Peschl delivers appro-

priate photoreactors.

Our services and competence in the domain of

preparative photochemistry and photochemical

environmental techniques

We sell UV-radiation sources and standard photo-

chemical reactors for immediate use to perform a

great variety of preparative tasks at laboratory and

pilot levels. UV-radiation sources and corresponding

reactors may be adapted and optimized for specific

procedures. ATEX-certification of radiation systems

is available for electrical powers of 2 to 40 kW.

For units of production, we sell entire systems of

irradiation, where parts may be taken from standard

programs comprising a variety of dimensions and

types of radiation sources. We neither construct nor

sell photochemical reactors for production units as

this task remaining entirely within the domain of

competence and responsibility of the user. However,

in cooperation with our partner, Professor André

Braun, we offer consulting services based on scientific

and technical results that are periodically updated

4

and reviewed. These consulting services are

offered within the framework of specific con-

sulting and secrecy agreements.

Furthermore we offer the possibility to analyse

the reactor geometry of planned or existing

production scale photoreactors utilizing pro-

fessional flow-simulation along with physical

radiation data, in order to optimise photo-

chemical processes.

Light, Not Heat - or “How, with a well thought-out system, you can use photochemistry in R&D and production scale”

5

Synthesis

■ Isomerization

■ Addition

■ Substitution

■ Polymerization

■ Singlet-oxygen reactions

Analysis

■ TOC-determination

■ Sample pre-treatment for determination

of heavy metals

Waste water treatment

■ Decomposition of chlorohydrocarbons

■ Decomposition of halogenated organic

compounds (AOX)

■ Detoxification of cyanide-containing me-

tal plating effluent

Preparation of ultrapure water

■ Decomposition of organic impurities

Water- and liquid treatment

■ Cold sterilization of protein chains

■ Decomposition of pesticides

Pharmaceutical and cosmetics research

■ Testing for photostabillity

Photo Bioreactions (PBR)

■ Production of phototroph organisms,

e.g. Algae utilizing bio-photo reaction

processes

Typical applications of photochemcial processes:

Microphotoreactor 7

Photochemical microreactors are made of one- or

two-sided micro-structured Si-chips, that are cov-

ered with VUV,UV and/or VIS-transparent materials.

Specific characteristics

■ Optical paths at µm-scale

■ Adapted for liquid and gas phase photolyses

■ Flux domain (liquid reaction systems ): some µL -1

up to a few mL h-1

■ Highly efficient for sensitized, photocatalyzed and

photochemicaly initiated reactions

■ Possible Functionalization of the chip surface

■ Sources of irradiation: VUV, UV, VIS

■ Efficient thermoregulation

8

Advantageous applications

■ Photolyses of reaction systems exhibiting

very high absorption values at λexc

■ Photochemical reactions with very small

amounts of starting materials

■ Homogeneous sensitized and photochemi-

caly initiated reactions

■ Heterogeneous sensitized, photocatalyzed

and photochemicaly initiated reactions

■ Quasi-monochromatic irradiation and high

variability of incident photon density

Microphotoreactor

Exhibit shown above with kind permission of Prof. Dr. P. Woias, IMTEK, University Freiburg

9

Microphotoreactors are developed in collaboration with:

Institut für MikrosystemtechnikProf. Dr. P. Woias

Thin-Layer Photoreactor 11

Using a positive (external) geometry of irradiation,

spectrophotometric cuvettes, special tailor made

or cylindrical containers of small diameters are

used for the construction of minireactors.


■ Optical paths at µm- up to mm-scale

■ Adapted for liquid and gas phase photolyses

■ Flux domain (liquid reaction systems ): mL -1 up

to a few L h-1

■ Efficient for sensitized, photocatalyzed and



■ Efficient thermoregulation


■ Photolyses of reaction systems exhibiting high

absorption values at λexc

■ Photochemical reactions with small amounts of

starting materials

■ Photolyses and homogeneous sensitized and


■ Quasi-monochromatic irradiation and high var-

iability of incident photon density

Thin-Layer Photoreactor

12

Picture shown on page 11 with kind permission of company , holder of IP rights of the pictured installation

13

Technical data irradiation unit

Lamp type MH 250

Lamp power 250 W

Doping (optional) Z4

Total immersion length n.a.

Immersion length - center of concentration of rays n.a.

Effective arc length (electrode gap) Reflector Ø 96 mm

Average lamp lifetime approx. 1.000 hours (doped lamps approx. 800 hours)

Lamp lifetime warranty 500 hours (< 25% intensity drop down in the UVC range)

Glass filter Quartz glass, optional borosilicate glass, UG filter, dichromatic band-pass filter

Dimensions irradiation box 240 x 200 x 156 mm (L x H x T)

Dimensions filter 140 x 180 x 10 mm ( B x H x T)

Cooling integrated forced air cooling

Special features integrated ignitor

Power supply VG MH 250

Mains voltage / Frequency 230 V / 50 Hz

Pre-fuse max. 16 A

UV Laboratory Reactor System 1 15

The standard Laboratory Reactor System 1 is

an immersion-type photochemical reactor with

implemented magnet-driven circulation pump,

which provides a complete mixing of the reaction

liquid. The irradiation is effected by means of a

medium pressure UV lamp (150 Watt), operated

by utilizing a vertically arranged combination-

tube (immersion tube / cooling tube combination)

immersed into the reaction liquid.


■ Optical path: < 2cm

■ 150 W of electrical power

■ Generally adapted for liquid phase photolyses

■ Flux domain (liquid reaction systems ): mL -1 up to a few L h-1

■ Efficient for photolyses, sensitized and photo-chemicaly initiated reactions


■ Efficient thermoregulation possible


■ One of the most frequently used reactor con-figuration at laboratory scale

■ Very useful for product analyses, kinetic inves-tigations and quantum yield determinations as well as for chemical process development

■ Photolyses and homogeneous sensitized and photochemicaly initiated reactions

UV Laboratory Reactor System 1

16

Technical data

Lamp type TQ 150

Lamp power 150 W

Doping (optional) Z1, Z2, Z3

Total immersion length 384 mm

Immersion length - center of concentration of rays 303 mm

Effective arc length (electrode gap) 44 mm

Average lamp lifetime approx. 2.000 hours (doped lamps approx. 1.000 hours)

Lamp lifetime warranty 1.000 hours, < 25% intensity drop down in the UVC range (doped lamps 500 hours)

Working volume 400 ml with inserted cooling tube

Connections 1 x screw joint , 1 x NS 29/32, 2 x GL 18

Pump flow rate approx. 1000 ml/min. at 2000 rpm.

Material of immersion tube n.a.

Material of cooling tube Quartz glass, optional borosilicate glass 3.3 (combined tube)

Connection cooling water circuit Hose olives Ø 10

Power supply VG TQ 150


Pre-fuse max. 16 A

17


The standard Laboratory Reactor System 2 is a

simple immersion-type photochemical reactor

for basic experiments. The irradiation is effected

by means of a medium pressure UV lamp (150

Watt), operated by utilizing a vertically arranged

immersion tube as well as a separate cooling

tube, immersed into the reaction liquid.














20

Technical data

Lamp type TQ 150

Lamp power 150 W








Connections 1 x NS 45/40, 2 x NS 14,5/23, 1 x GL 25

Pump flow rate n.a.

Material of immersion tube Quartz glass

Material of cooling tube Quartz glass, optional borosilicate glass 3.3




Pre-fuse max. 16 A

21


The standard Laboratory Reactor System 3 is a

simple immersion-type photochemical reactor

for basic experiments. The irradiation is effected

by means of a special low pressure UV lamp (15

Watt), operated by utilizing a vertically arranged

immersion tube, immersed into the reaction

liquid. An upgrade to UV Laboratory Reactor Sys-

tem 2 is possible later on, whenever it’s intended

to use the TQ 150 medium pressure lamp with

forced cooling.







■ Sources of irradiation: VUV, UV

■ No thermoregulation required






24

Technical data

Lamp type TNN 15/32

Lamp power 15 W

Doping (optional) -



Effective arc length (electrode gap) 170 mm (lighting lenght)

Average lamp lifetime approx. 4.000 hours

Lamp lifetime warranty 1.500 hours, < 25% intensity drop down in the UVC range

Working volume approx. 700 ml with inserted immersion tube

Connections 1 x NS 45/40, 2 x NS 14,5/23, 1 x GL 25

Pump flow rate n.a.


Material of cooling tube n.a.


Power supply VG TNN 15/32


Pre-fuse max. 16 A

25


The standard Laboratory Reactor System 4 is

an immersion-type photochemical reactor with

implemented magnet-driven circulation pump,

which provides a complete mixing of the reaction

liquid. The irradiation is effected by means of a

medium pressure UV lamp (700 Watt), operated

by utilizing a vertically arranged combination-

tube (immersion tube / cooling tube combination)

immersed into the reaction liquid.









■ Power supply with stepless regulation






28

Technical data

Lamp type TQ 718

Lamp power 700 W

Doping (optional) Z1, Z2, Z3, Z4










Material of cooling tube Quartz glass, optional borosilicate glass 3.3 (combined tube)


Power supply PEVG 10

Mains voltage / Frequency 230 V / 50-60 Hz

Pre-fuse max. 16 A

29

Falling Film Reactor System 31

The photochemical falling film reactor provides a

spatial separation between the reaction medium

and the immersion unit, hence preventing that

macromolecular secondary products arising from

radical intermediates stick to the surface of the

immersion unit (“filming”). The reactor unit ba-

sically consists of the photochemical falling film

reactor, a reservoir and a pump.


■ Optical path: ≥ average thickness of the falling film

■ Optionally up to 1.000 W electrical power

■ Adapted for liquid reaction media and for gas/liquid reaction systems where an optimal (reac-tive) gas saturation is needed

■ Highly efficient for photolyses, sensitized and photochemicaly initiated reactions


■ no “filming”

■ advantageous control of the incident photon density

■ Easy upscaling system


■ Very useful for a large horizon of tasks in the domain of preparative photochemistry, product analyses and for chemical process development


Falling Film Reactor System

32

33

Technical data FF 150 FF 700

Lamp type TQ 150 TQ 718

Lamp power 150 W 700 W

Doping (optional) Z1, Z2, Z3 Z1, Z2, Z3, Z4

Effective arc length (electrode gap) 44 mm 97 mm

Average lamp lifetime approx. 2.000 hours (doped lamps approx. 1.000 hours) approx. 2.000 hours (doped lamps approx. 1.000 hours)

Lamp lifetime warranty 1.000 hours, < 25% intensity drop down in the UVC range (doped

lamps 500 houres)

1.000 hours, < 25% intensity drop down in the UVC range (doped

lamps 500 houres)

Volume reaction vessel n.a. n.a.

Volume storrage vessel 500 ml, optional 1000 ml and 3000 ml. Vessels ≤ 1000 ml can be

supplied with outside cooling jacket

500 ml, optional 1000 ml and 3000 ml. Vessels ≤ 1000 ml can be

supplied with outside cooling jacket

Connections 1 x screw joint , 1 x NS 29/32, 2 x GL 18 1 x screw joint , 1 x NS 29/32, 2 x GL 18

Pump flow rate approx. 1000 ml/min. at 2000 rpm. approx. 1000 ml/min. at 2000 rpm.

Static head max. 1300 mm at 2000 rpm max. 1300 mm at 2000 rpm

Dimensions frame 580 x 580 x 1860 mm 580 x 580 x 1860 mm

Cooling water alarm sensor optional optional

Material of immersion tube n.a. n.a.

Material of cooling tube Quartz glass, optional borosilicate glass 3.3 Quartz glass, optional borosilicate glass 3.3

Connection cooling water circuit Hose olives Ø 10 Hose olives Ø 10

Power supply VG TQ 150 PEVG 10

Mains voltage / Frequency 230 V / 50 Hz 230 V / 50-60 Hz

Pre-fuse max. 16 A max. 16 A

Low-Temperature Reactor 35

The low-temperature reactor may be described

as an immersion-type reactor of smaller diameter

but larger surface. Temperatures close to that of

liquid nitrogen may be reached by positioning

the reactor unit into a “Dewar” containing the

cooling liquid. The reaction system is circulated by

means of a spiral (Archimedes) stirrer that is inte-

grated in one of the three necks of the reactor.

The immersion lamp system consists of three

tubes insulating the circulating cooling liquid

(water) by an evacuated space from the reaction

system at low temperature.



■ Usually up to 150 W electrical power


that remain liquid at low temperatures

■ Efficient for photolyses, sensitized and photo-

chemicaly initiated reactions

■ Sources of irradiation: UV, VIS

■ Efficient thermoregulation possible by immers-

ing the reactor unit into a cooling liquid


■ Very useful for product analyses and for chemi-cal process development


Low-Temperature Reactor

36

37

Technical data

Lamp type TQ 150

Lamp power 150 W








Connections 1 x NS 45/40, 3 x NS 19/26, 1 x GL 25

Agitator KPG type

Temperature range +40°C to -50°C


Material of cooling tube Quartz glass, optional borosilicate glass 3.3




Pre-fuse max. 16 A

Excimer Laboratory Reactor 39

Excimer Laboratory Reactor Systems exhibit im-

mersion lamp systems that are specially designed

for the use of these light sources. Their operation

at high voltage and frequency requires different

and more stringent security conditions that are

leading to a larger lamp head in comparison to

conventional arcs.


■ Quasi-monochromatic irradiation




■ Optimum specificity of the electronic excitation

■ Efficient for photolyses, sensitized and photo-

chemicaly initiated reactions

■ Sources of irradiation: VUV, UV


■ High variability of the electrical lamp power

■ Relative moderate incident photon densities


■ Recommended for high value-adding prepara-tive tasks product analyses, kinetic investiga-tions and quantum yield determinations as well as for chemical process development


Excimer Laboratory Reactor*

40

41

Technical data

Lamp type ELR 222/150 LR* (222nm) , ELR 308/150 LR* (308nm)

Lamp power <120 Watt

Doping (optional) n.a.

Total immersion length n.a.



Average lamp lifetime approx. 2.000 hours

Lamp lifetime warranty 1.000 hours, < 30% intensity drop down in the UVC range (222nm), respectively

< 30% intensity drop down in the UVB range (308nm)





Material of cooling tube Quartz glass


Power supply HFEVG 12*


Pre-fuse max. 16 A

* upon request

Immersion Lamp PTQ 1,5 43

Pilot reactors represent important intermediate

steps in the upscaling of all laboratory reactors

mentioned in this catalog right up to an opti-

mized and well operating production system.

They may also be used for the production of lim-

ited amounts of chemical compounds. The PTQ

1,5 immersion lamp series has been developed

especially to be retrofitted onto existing vessels

already available in the R&D lab. Furthermore

optional universal reactors, skid mounted on a

mobile rack, are available.


■ Usually up to 1,8 kW electrical power




■ Power supply with stepless regulation

■ Retrofit onto most standard vessels

■ Universal reactor vessels available


■ Technical process development

■ Production of smaller amounts of chemical

compounds (kg d-1)

Immersion lamp PTQ 1,5 for pilot

44

45

Description TQ 1,5 AOP PTQ 1,5 KQ PTQ 1,5 KG PTQ 1,5 KQS PTQ 1,5 KGS

Lamp power 1.000-1.800 W 1.000-1.800 W 1.000-1.800 W 1.000-1.800 W 1.000-1.800 W

Lamp type TQ 1024.10 (Z1. Z2, Z3, Z4)

TQ1524.15 (Z1. Z2, Z3, Z4)

TQ 2024.100 (Z1, Z3)

TQ 2024.20 (Z1. Z2, Z3, Z4)

TQ 1024.10 (Z1. Z2, Z3, Z4)

TQ1524.15 (Z1. Z2, Z3, Z4)

TQ 2024.100 (Z1, Z3)

TQ 2024.20 (Z1. Z2, Z3, Z4)

TQ 1024.10 (Z1. Z2, Z3, Z4)

TQ1524.15 (Z1. Z2, Z3, Z4)

TQ 2024.100 (Z1, Z3)

TQ 2024.20 (Z1. Z2, Z3, Z4)

TQ 1024.10 (Z1. Z2, Z3, Z4)

TQ1524.15 (Z1. Z2, Z3, Z4)

TQ 2024.100 (Z1, Z3)

TQ 2024.20 (Z1. Z2, Z3, Z4)

TQ 1024.10 (Z1. Z2, Z3, Z4)

TQ1524.15 (Z1. Z2, Z3, Z4)

TQ 2024.100 (Z1, Z3)

TQ 2024.20 (Z1. Z2, Z3, Z4)

DN base flange DN 50 / PN 10 DN 80 / PN 10 DN 80 / PN 10 DN 100 / PN 10 DN 100 / PN 10

Ø outer tube (mm) 45 76 76 95 95

Immersion tube can be used as filter glass - X X X X

addtional protection tube - - - X X

Cooling tube material - quartz glass borosilicate glass 3.3 quartz glass borosilicate glass 3.3

Immersion depth ~ 450 mm ~ 470 mm ~ 470 mm ~ 550 mm ~ 550 mm

Required service high 100 cm 100 cm 100 cm 100 cm 100 cm

H2O supply line 1/4" female thread 1/4" female thread 1/4" female thread 1/4" female thread 1/4" female thread

H2O return line 1/4" male thread 1/4" male thread 1/4" male thread 1/4" male thread 1/4" male thread

N2 supply line 1/4" female thread 1/4" female thread 1/4" female thread 1/4" female thread 1/4" female thread

N2 return line 1/4" male thread 1/4" male thread 1/4" male thread 1/4" male thread 1/4" male thread

Universal reactor setup with frame available - X X optional optional

ATEX certification possible - - - - -


PEVG 15

PEVG 10

PEVG 15

PEVG 10

PEVG 15

PEVG 10

PEVG 15

PEVG 10

PEVG 15

Immersion Lamp MTQ 2/4 47

Pilot systems represent important intermediate

steps in the upscaling of all laboratory reactors

mentioned in this catalog right up to an opti-

mized and well operating production system.

They may also be used for the production of lim-

ited amounts of chemical compounds. Immersion

lamp units of > 2 kW electrical power may be

ATEX certified.

The MTQ 2/4 immersion lamp series is suitable for

an easy upscaling, however, representing at the

same time the entrance for the production scale,

particular whenever an ATEX certification is im-

perative. Furthermore optional universal reactors,

skid mounted on a mobile rack, are available.


■ Usually up to 4 kW of electrical power




■ Optional ATEX certificate can be provided

■ Universal reactor vessels available


■ Technical process development

■ Production of smaller amounts of chemical

compounds (kg d-1)

Immersion lamp MTQ 2/4 for pilot- & production

48

49

Description MTQ 2/4 AOP MTQ 2/4 KQ MTQ 2/4 KG MTQ 2/4 KQS MTQ 2/4 KGS

Lamp power 2.000-4.000 W 2.000-4.000 W 2.000-4.000 W 2.000-4.000 W 2.000-4.000 W

Lamp type TQ 2024.100 (Z1, Z3)

TQ 4024.100

TQ 2024.100 (Z1, Z3)

TQ 4024.100

TQ 2024.100 (Z1, Z3)

TQ 4024.100

TQ 2024.100 (Z1, Z3)

TQ 4024.100

TQ 2024.100 (Z1, Z3)

TQ 4024.100


Ø outer tube (mm) 60 100 100 160 160






H2O supply line DN 25 / PN 10 DN 25 / PN 10 DN 25 / PN 10 DN 25 / PN 10 DN 25 / PN 10

H2O return line DN 25 / PN 10 DN 25 / PN 10 DN 25 / PN 10 DN 25 / PN 10 DN 25 / PN 10


N2 return line 1" male thread 1" male thread 1" male thread 1" male thread 1" male thread

Universal reactor setup with frame available - X X optional optional

ATEX certification possible - X X X X


PEVG 40

PEVG 20

PEVG 40

VG-SR ATEX 40

PEVG 20

PEVG 40

VG-SR ATEX 40

PEVG 20

PEVG 40

VG-SR ATEX 40

PEVG 20

PEVG 40

VG-SR ATEX 40


The MTQ 10/20 immersion lamp series de-

fines the worldwide standard for photochemical

production systems, particular at operation in

hazardous areas.

On account of the modular construction, MTQ

immersion lamps are safe about future demands

and can be adapted to changed process param-

eters. In addition to the robust and safe design,

an optionally available third protection tube in-

creases the operational safety of the equipment

when necessary.


■ Up to 20 kW of electrical power






■ Operation in the production scale

■ Production of large amounts of chemical com-

pounds (kg d-1 up to t d-1)

Immersion lamp MTQ 10/20 for production

52

53


Lamp power (W) 10 / 20 10 / 20 10 / 20 10 / 20 10 / 20

Lamp type TQ 10030.150 (Z2)

TQ 20040.150 (Z1)

TQ 10030.150 (Z2)

TQ 20040.150 (Z1)

TQ 10030.150 (Z2)

TQ 20040.150 (Z1)

TQ 10030.150 (Z2)

TQ 20040.150 (Z1)

TQ 10030.150 (Z2)

TQ 20040.150 (Z1)


Ø outer tube (mm) 100 160 160 200 200










Universal reactor setup with frame available - - - - -

ATEX certification possible - X X X X

Power supply VG 100 / VG-R 100

VG 200 / VG-R 200

VG-SR 200

VG 100 / VG-R 100

VG ATEX 100

VG-R ATEX 100

VG-SR ATEX 100

VG 200 / VG-R 200

VG-SR 200

VG ATEX 200

VG-R ATEX 200

VG-SR ATEX 200

VG 100 / VG-R 100 VG

ATEX 100

VG-R ATEX 100

VG-SR ATEX 100

VG 200 / VG-R 200

VG-SR 200

VG ATEX 200

VG-R ATEX 200

VG-SR ATEX 200

VG 100 / VG-R 100

VG ATEX 100

VG-R ATEX 100

VG-SR ATEX 100

VG 200 / VG-R 200

VG-SR 20

VG ATEX 200

VG-R ATEX 200

VG-SR ATEX 200

VG 100 / VG-R 100 VG

ATEX 100

VG-R ATEX 100

VG-SR ATEX 100

VG 200 / VG-R 200

VG-SR 200

VG ATEX 200

VG-R ATEX 200

VG-SR ATEX 200


The MTQ 40/60 immersion lamp series represent

the most powerful immersion lamp system avail-

able and has been certified up to 40 kW as per

ATEX directive for operation in hazardous areas.

On account of the modular construction, MTQ

immersion lamps are safe about future demands

and can be adapted to changed process param-

eters. In addition to the robust and safe design,

an optionally available third protection tube in-

creases the operational safety of the equipment

when necessary.


■ Up to 60 kW of electrical power






■ Operation in the production scale

■ Production of large amounts of chemical com-

pounds (t d-1)

Immersion lamp MTQ 40/60 for production

56

57


Lamp power (W) 40 / 60 40 / 60 40 / 60 40 / 60 40 / 60

Lamp type TQ 40055.200 (Z1, Z2)

TQ 60055.200 (Z1)

TQ 40055.200 (Z1, Z2)

TQ 60055.200 (Z1)

TQ 40055.200 (Z1, Z2)

TQ 60055.200 (Z1)

TQ 40055.200 (Z1, Z2)

TQ 60055.200 (Z1)

TQ 40055.200 (Z1, Z2)

TQ 60055.200 (Z1)


Ø outer tube (mm) 120 200 200 225 225

Immersion tube can be used as filter glass - - - - -









Universal reactor setup with frame available - - - - -

ATEX certification possible - X (40 kW) X (40 kW) X (40 kW) X (40 kW)

Power supply VG 400 / VG-R 400

VG-SR 400

VG 600 / VG-R 600

VG-SR 600

VG400 / VG-R 400

VG-SR 400

VG-SR ATEX 400

VG 600 / VG-R 600

VG-SR 600

VG400 / VG-R 400

VG-SR 400

VG-SR ATEX 400

VG 600 / VG-R 600

VG-SR 600

VG400 / VG-R 400

VG-SR 400

VG-SR ATEX 400

VG 600 / VG-R 600

VG-SR 600

VG400 / VG-R 400

VG-SR 400

VG-SR ATEX 400

VG 600 / VG-R 600

VG-SR 600

Reflector unit 59

By already available glass reactors the reaction me-

dium is irradiated by means of several reflector units

which are arranged radial - in positive irradiation

geometry - around the reaction vessel. Thereby

photolyses, sensitized and photochemicaly initiated

reactions >300nm become allowed. The reflector

units can be pursued indoor and outdoor as well as

in hazardous areas (zone 1 and 2).


■ Easy to retrofit onto existing reactor vessels

■ Suitability for quick and easy preliminary experi-

ments in pilot scale


■ Integrated power supply

■ Water proof housing with safety glass

■ Sources of irradiation: UV > 300nm, VIS

60


■ Very useful for a large horizon of tasks in the

domain of preparative photochemistry and

for chemical process development

■ Photolyses and homogeneous sensitized and


Reflector unit

61

Technical data

Application Hazardous areas zone 1 and 2 (EN50014, EN50018)

Protection degree IP 67

Ignition class gas EX II 2G Ex de IIB T3

Ignition class dust EX II 2D Ex td A21 IP6X T90°C

Ambient temperature -20°C up to +45°C

Housing Aluminium die-casting, seawater resistant

Diffuser Safety glass

Electric Flexible wiring, silicone insulated, heat resistant up to 180°C

Lamp base E 27 / E 40

Lamp type High pressure sodium (HPS) lamp or metal halide (MH) lamp

Lamp power 400W


Pre-fuse max. 16 A

62

Radiation sources

Lamp Lamp power Arc length Doping Type Easy upscaling

TNN 15/32 15 W 170 mm - LP -

TQ 150 150 W 44 mm Z1, Z2, Z3 MP -

MH 250 250 W Reflector Ø 96 mm Z4 MH -

TQ 718 700 W 97 mm Z1, Z2, Z3, Z4 MP -

ELR 222/150 LR* 120 W 140 mm - EXCIMER -

ELR 308/150 LR* 120 W 140 mm - EXCIMER -

Q 701 700 W 223 mm - MP -

TQ 1024.10 1.000 W 100 mm Z1, Z2, Z3, Z4 MP X

TQ1524.15 1.500 W 150 mm Z1, Z2, Z3, Z4 MP X

TQ 2024.100 2.000 W 1000 mm Z1, Z3 MP -

TQ 2024.20 2.000 W 200 mm Z1, Z2, Z3, Z4 MP X

TQ 4024.100 4. 000 W 1000 mm - MP -

TQ 4024.40 4.000 W 400 mm Z1, Z2, Z3, Z4 MP X

TQ 10030.150 10 kW 1500 mm Z2 MP -

TQ 10024.100 10 kW 1000 mm Z1, Z2, Z3, Z4 MP X

TQ 20040.150 20 kW 1500 mm Z1 MP -

TQ 40055.200 40 kW 2000 mm Z1, Z2 MP -

TQ 60055.200 60 kW 2000 mm Z1 MP -

* upon request

High quality radiation sources manufactured by Heraeus Noblelight GmbH

63

Power supplies

Lamp power EVG VG VG-R VG-SR VG ATEX VG-R ATEX VG-SR ATEX

15 W - VG TNN 15/32 - - - - -

120 W Excimer HFEVG 12* - - - - - -

150 W - VG TQ 150 - - - - -

250 W - VG MH 250 - - - - -

700 W PEVG 10 VG TQ 718 - - - - -

1.000 W PEVG 10 - - - - - -

1.500 W PEVG 15

(up to 1.800 W)

- - - - - -

2.000 W PEVG 20 - - - - - VG-SR ATEX 40

4.000 W PEVG 40 - - - - - VG-SR ATEX 40

10.000 W - VG 100 VG-R 100 - VG ATEX 100 VG-R ATEX 100 VG-SR ATEX 100

20.000 W - VG 200 VG-R 200 VG-SR 200 VG ATEX 200 VG-R ATEX 200 VG-SR ATEX 200

40.000 W - VG 400 VG-R 400 VG-SR 400 - - VG-SR ATEX 400

60.000 W - VG 600 VG-R 600 VG-SR 600 - - -

EVG Electronic power supply, usually with steppless regulation

VG Standard power supply with leakage transformer or choke coil

VG-R Same as VG but with power steps

VG-SR Same as VG but with stepless power regulation

VG ATEX Power supply for ATEX certified immersion lamps including safety control system

VG-R ATEX Same as VG ATEX but with power steps

V-SR ATEX Same as VG ATEX but with stepless regulation

64

Spec

tral

dis

trib

uti

on

Hg

0,0

0,1

0,2

0,3

0,4

0,5

0,6

0,7

0,8

0,9

1,0 20

025

030

035

040

045

050

055

060

0

nm

Rel. units

Spec

tral

dis

trib

uti

on

Hg

- o

zon

e fr

ee

0,0

0,1

0,2

0,3

0,4

0,5

0,6

0,7

0,8

0,9

1,0 20

025

030

035

040

045

050

055

060

0

nm

Rel. units

65

Spec

tral

dis

trib

uti

on

Hg

- Z

1

0,0

0,1

0,2

0,3

0,4

0,5

0,6

0,7

0,8

0,9

1,0 20

025

030

035

040

045

050

055

060

0

nm

Rel. units

Spec

tral

dis

trib

uti

on

Hg

- Z

2

0

0,1

0,2

0,3

0,4

0,5

0,6

0,7

0,8

0,91 20

025

030

035

040

045

050

055

060

0

nm

Rel. units

66

Spec

tral

dis

trib

uti

on

Hg

- Z

3

0

0,1

0,2

0,3

0,4

0,5

0,6

0,7

0,8

0,91 20

025

030

035

040

045

050

055

060

0

nm

Rel. units

Spec

tral

dis

trib

uti

on

Hg

- Z

4

0,0

0,1

0,2

0,3

0,4

0,5

0,6

0,7

0,8

0,9

1,0 20

025

030

035

040

045

050

055

060

0

nm

Rel. units

67

Spec

tral

dis

trib

uti

on

LP

185

+ 2

54

0,0

0,1

0,2

0,3

0,4

0,5

0,6

0,7

0,8

0,9

1,0 15

020

025

030

035

040

045

050

055

060

0

nm

Rel. units

Spec

tral

dis

trib

uti

on

LP

254

0

0,1

0,2

0,3

0,4

0,5

0,6

0,7

0,8

0,91 15

020

025

030

035

040

045

050

055

060

0

nm

Rel. units

68

Spec

tral

dis

trib

uti

on

Xe2

Exc

imer

172

0,0

0,1

0,2

0,3

0,4

0,5

0,6

0,7

0,8

0,9

1,0 15

020

025

030

035

040

045

050

055

060

0

nm

Rel. units

Spec

tral

dis

trib

uti

on

KrC

l Exc

imer

222

0,0

0,1

0,2

0,3

0,4

0,5

0,6

0,7

0,8

0,9

1,0 15

020

025

030

035

040

045

050

055

060

0

nm

Rel. units

69

Spec

tral

dis

trib

uti

on

XeC

l Exc

imer

308

0,0

0,1

0,2

0,3

0,4

0,5

0,6

0,7

0,8

0,9

1,0 15

020

025

030

035

040

045

050

055

060

0

nm

Rel. units

70

λ nm Relative spectral energy radiation flux

248 0,1 0,002

254 100 1,667

265 0,9 0,015

276 0,1 0,002

280 0,1 0,002

289 0,1 0,002

297 0,6 0,010

302 0,4 0,007

313 2,8 0,047

334 0,1 0,002

366 2,2 0,037

405/8 1,6 0,027

436 1,1 0,018

546 1,6 0,027

577/9 0,5 0,008

Radiation flux TNN 15/32

Spectral energy distribution

λ nm

TQ 150 lamp operated in DURAN 50 sleeve

Radiation flux Ф (W)

Mole quanta/h x 10-3



238/40 1 8 - -

248 0,7 5 - -

254 4 30 - -

265 1,4 11 - -

270 0,6 5 - -

275 0,3 2 - -

280 0,7 6 - -

289 0,5 4 - -

297 1 9 0,1 1

302 1,8 17 0,5 4

313 4,3 41 2,5 23

334 0,5 5 0,4 4

366 6,4 71 5,8 64

390 0,1 1 0,1 1

405/08 3,2 39 2,9 35

436 4,2 55 3,6 50

492 0,1 1 0,1 1

546 5,1 84 4,6 76

577/79 4,7 82 4,2 74

TQ 150, undoped

Radiation flux Ф 200 - 600nm: 47W

71

λ nm

TQ 150 Z1 lamp operated in DURAN 50 sleeve





238/40 0,6 4 - -

248 0,7 5 - -

254 2,6 20 - -

265 0,5 4 - -

270 0,8 6 - -

275 1,9 15 - -

280 0,7 6 - -

289 1,6 14 - -

297 2,6 24 0,4 4

302 2,1 19 0,5 5

313 3,2 30 1,9 18

334 0,4 4 0,3 3

352 0,4 4 0,4 4

366 5,5 61 5,0 55

378 0,6 6 0,6 7

390 0,5 6 0,5 6

405/08 4,6 57 4,1 50

417 4,4 56 3,9 49

436 4,3 57 3,9 51

492 0,3 5 0,3 5

535 0,3 5 0,3 5

546 4,7 77 4,2 69

577/79 4,7 82 4,2 73

TQ 150, Z1 doped


λ nm






238/40 0,5 4 - -

248 0,2 1 - -

254 2,1 16 - -

270 1,4 11 - -

275 2,6 22 - -

289 3,3 29 - -

302 0,5 5 0,1 0,1

313 1,8 17 1,0 9

322 1,0 10 0,7 7

334 0,4 4 0,3 3

352 6,3 67 5,6 59

366 3,6 40 3,2 35

378 3,9 44 3,8 43

405/08 1,1 14 1,0 12

436 2,3 30 2,1 28

536 13,5 217 12,6 203

546 2,7 44 2,4 39

577/79 1,7 30 1,5 26

TQ 150, Z2 doped


72

λ nm






238/40 1,1 8 - -

248 0,8 6 - -

254 2,8 22 - -

270 0,6 5 - -

275 0,5 4 - -

280 0,7 6 - -

289 1,0 9 - -

297 1,5 13 0,2 2

302 2,0 18 0,5 5

313 3,7 35 2,1 20

326 0,6 6 0,5 5

334 0,5 5 0,4 4

340 0,6 6 0,5 5

346 1,4 15 1,3 14

361 2,8 31 2,5 27

366 6,4 71 5,8 64

390 0,4 5 0,4 5

405/08 2,1 26 1,9 23

436 4,9 65 4,4 58

467 0,6 9 0,5 7

480 1,5 21 1,5 21

492 0,3 4 0,3 4

508 2,0 31 1,9 29

546 5,0 82 4,5 74

577/79 5,1 90 4,6 80

TQ 150, Z3 doped



73

λ nm

TQ 718 lamp operated in DURAN 50 sleeve

Radiation flux Ф (W) Mole quanta/h x 10-3 Radiation flux Ф (W) Mole quanta/h x 10-3

700W 600W 500W 700W 600W 500W 700W 600W 500W 700W 600W 500W

238/40 4,8 4,1 3,4 35 29 25 - - - - - -

248 3,2 2,8 2,3 24 21 17 - - - - - -

254 18,6 16,0 13,3 142 122 101 - - - - - -

265 6,6 5,9 4,7 53 47 38 - - - - - -

270 2,6 2,2 1,9 21 18 15 - - - - - -

275 1,2 1,0 0,9 10 8 7 - - - - - -

280 3,2 2,8 2,3 27 24 19 - - - - - -

289 2,1 1,8 1,5 18 16 13 - - - - - -

297 4,7 4,1 3,4 42 37 30 0,7 0,6 0,5 6 5 4

302 8,6 7,4 6,1 78 67 56 2,2 1,9 1,6 20 18 14

313 20,1 17,3 14,4 189 163 135 11,6 10,2 8,3 109 95 78

334 2,4 2,1 1,7 24 21 17 1,9 1,7 1,4 19 17 14

366 30,0 25,9 21,4 331 285 236 27,0 23,6 19,3 298 261 213

390 0,3 0,3 0,2 4 4 3 0,3 0,3 0,2 4 4 3

405/08 14,9 12,9 10,6 183 158 131 13,4 11,7 9,6 164 144 117

436 19,7 17,0 14,1 259 223 185 17,7 15,5 12,6 232 203 166

492 0,3 0,3 0,2 4 4 3 0,3 0,3 0,2 4 4 3

546 23,9 20,6 17,1 393 339 281 21,5 18,8 15,4 353 309 252

577/79 22,1 19,1 15,8 385 332 275 19,9 17,4 14,2 346 303 247

492 0,3 5 0,3 5

535 0,3 5 0,3 5

546 4,7 77 4,2 69

577/79 4,7 82 4,2 73

TQ 718, undoped

Radiation flux Ф 200 - 600nm: 700W: Ф=221W | 600W: Ф=187W | 500W: Ф=163W

74

λ nm



700W 600W 500W 700W 600W 500W 700W 600W 500W 700W 600W 500W

238/40 2,8 2,4 2,0 20 17 14 - - - - - -

248 3,2 2,7 2,3 24 21 17 - - - - - -

254 12,1 10,4 8,6 93 80 66 - - - - - -

265 2,3 2,0 1,6 18 15 13 - - - - - -

270 3,5 3,0 2,5 29 25 21 - - - - - -

275 8,7 7,5 6,2 72 62 51 - - - - - -

280 3,2 2,7 2,3 27 23 19 - - - - - -

289 7,3 6,3 5,2 64 55 46 - - - - - -

297 12,3 10,5 8,8 110 94 79 1,8 1,6 1,3 16 14 11

302 9,8 8,4 7,0 89 76 64 2,5 2,2 1,8 23 20 16

313 15,0 12,9 10,7 141 121 101 8,7 7,6 6,2 82 72 59

334 1,8 1,5 1,3 18 15 1,4 1,2 1,0 14 12 10

352 1,9 1,6 1,4 20 17 14 1,7 1,5 1,2 18 16 13

366 25,9 22,2 18,5 285 244 204 23,3 20,4 16,6 257 225 184

378 2,6 2,2 1,9 30 26 2,5 2,2 1,8 29 25 21

390 2,3 2,0 1,6 27 23 2,2 1,9 1,6 26 23 19

405/08 21,7 18,6 15,5 265 227 189 19,5 17,1 13,9 238 208 170

417 20,7 17,7 14,8 260 223 186 18,6 16,3 13,3 234 205 167

436 20,2 17,3 14,4 265 227 189 18,2 15,9 13,0 234 205 167

492 1,4 1,2 1,0 21 18 15 1,3 1,1 0,9 19 17 14

535 1,5 1,3 1,1 24 21 17 1,4 1,2 1,0 23 20 16

546 21,8 18,7 15,6 358 307 256 19,6 17,2 14,0 322 282 230

577/79 22,0 18,9 15,7 383 328 274 19,8 17,3 14,1 345 302 246

TQ 718, Z1 doped



75

λ nm



700W 600W 500W 700W 600W 500W 700W 600W 500W 700W 600W 500W

238/40 2,3 2,0 1,6 17 15 12 - - - - - -

248 0,8 0,7 0,6 6 5 4 - - - - - -

254 9,9 8,5 7,1 76 65 54 - - - - - -

270 6,5 5,6 4,6 53 45 38 - - - - - -

275 12,2 10,5 8,7 101 87 72 - - - - - -

289 15,5 13,3 11,1 135 116 96 - - - - - -

302 2,5 2,1 1,8 23 20 16 0,6 0,5 0,4 6 5 4

313 8,2 7,0 5,9 77 66 55 4,7 4,1 3,4 44 39 31

322 4,6 3,9 3,3 45 39 32 3,1 2,7 2,2 30 26 21

334 1,7 1,5 1,2 17 15 12 1,4 1,2 1,0 14 12 10

352 29,4 25,2 21,0 312 267 223 26,3 23,0 18,8 279 244 199

366 16,8 14,4 12,0 185 159 132 15,1 13,2 10,8 166 145 119

378 18,0 15,4 12,9 205 176 146 17,3 15,1 12,4 197 172 141

405/08 5,2 4,5 3,7 64 55 46 4,7 4,1 3,4 57 50 41

436 10,7 9,3 7,6 140 120 100 9,6 8,4 6,9 126 110 90

535 63,0 5,4 45,0 1015 870 725 58,8 51,5 42,0 947 829 676

546 12,6 10,8 9,0 207 178 148 11,3 1,9 8,1 186 163 133

577/79 8,0 6,9 5,7 139 119 99 7,2 6,3 5,1 125 109 89

436 20,2 17,3 14,4 265 227 189 18,2 15,9 13,0 234 205 167

492 1,4 1,2 1,0 21 18 15 1,3 1,1 0,9 19 17 14

535 1,5 1,3 1,1 24 21 17 1,4 1,2 1,0 23 20 16

546 21,8 18,7 15,6 358 307 256 19,6 17,2 14,0 322 282 230

577/79 22,0 18,9 15,7 383 328 274 19,8 17,3 14,1 345 302 246

TQ 718, Z2 doped


76

λ nm



700W 600W 500W 700W 600W 500W 700W 600W 500W 700W 600W 500W

238/40 4,9 4,2 3,5 35 30 25 - - - - - -

248 3,9 3,3 2,8 29 25 21 - - - - - -

254 13,2 11,3 9,4 101 87 72 - - - - - -

270 2,8 2,4 2,0 23 20 16 - - - - - -

275 2,2 1,9 1,6 18 15 13 - - - - - -

280 3,2 2,7 2,3 27 23 19 - - - - - -

289 4,6 3,9 3,3 40 34 29 - - - - - -

297 6,9 5,9 4,9 62 53 44 1,0 0,9 0,7 9 8 6

302 9,4 8,1 6,7 86 74 61 2,4 2,1 1,7 22 19 16

313 17,2 14,7 12,3 162 139 116 9,9 8,7 7,1 93 81 66

326 2,9 2,5 2,1 29 25 21 2,3 2,0 1,6 23 20 16

334 2,2 1,9 1,6 22 19 16 1,7 1,5 1,2 17 15 12

340 2,7 2,3 1,9 28 24 20 2,1 1,8 1,5 22 19 16

346 6,5 5,6 4,6 68 58 49 5,8 5,1 4,1 60 53 43

361 13,2 11,3 9,4 146 123 102 11,9 10,4 8,5 129 113 92

366 30,1 25,8 21,5 332 285 237 2701,0 23,7 19,4 299 262 214

390 1,8 1,5 1,3 21 18 15 1,7 1,5 1,2 20 18 14

405/08 9,8 8,4 7,0 120 103 86 8,8 7,7 6,3 108 95 77

436 23,1 19,8 16,5 303 260 216 20,8 18,2 14,9 273 239 195

467 2,9 2,5 2,1 41 35 29 2,6 2,3 1,9 37 32 26

480 6,9 5,9 4,9 100 86 71 6,7 5,9 4,8 97 85 69

492 1,3 1,1 0,9 19 16 14 1,2 1,1 0,9 18 16 13

508 9,4 8,1 6,7 144 123 103 9,2 8,1 6,6 144 123 101

546 23,3 20,0 16,6 383 328 274 21,0 18,4 15,0 345 302 246

577/79 24,0 20,6 17,1 418 358 299 21,0 18,9 15,4 376 329 269

TQ 718, Z3 doped



77

λ nmRadiation flux Ф (W)

700 W

Intensity in 1m

distance

200-280 75 6,3

280-315 45 4,3

315-400 147 13,9

400-700 122 10,9

TQ 718, Z4 doped

Radiation flux Ф 200 - 600nm: 700W: Ф=389W

Summarized in the following tables is the physical radiation

data for immersion lamps. These figures cover the spectral

energy distribution of naked lamps as well as lamps ope-

rated inside borosilicate glass tubes. The radiation data for

naked lamps can be applied when using immersion lamps

made of quartz but reflection loss of approx. 5% should be

decucted for the entire spectral range.

Radiation flux Ф[W] (naked lamp)

λ nm TQ 2024.100 TQ 4024.100 TQ 10030.150 TQ 20040.150 TQ 40055.150 TQ 60055.200

200 - 300 95 290 1390 2680 5170 7750

300 - 400 140 390 1600 2640 4800 7200

400 - 500 75 200 620 1160 2740 4110

500 - 600 80 215 1020 2190 4740 7110

200 - 600 390 1095 4630 8670 17450 26170

UV lamps for industrial scale immersion lamp systems 2-60 kW

78

λ nm

Radiation flux Ф [W] (naked lamp) Radiation flux Ф[W] (Lamp with borosilicate 3.3 sleeve)

TQ 2024.100

TQ 4024.100

TQ 10030.150

TQ 20040.150

TQ 40055.150

TQ 60055.200

TQ 2024.100

TQ 4024.100

TQ 10030.150

TQ 20040.150

TQ 40055.150

TQ 60055.200

248 6 19 102 195 300 450 - - - - - -

254 36 96 400 1035 2300 3430 - - - - - -

265 12 55 180 260 450 530 - - - - - -

270 2,8 7,3 46 72 180 180 - - - - - -

275 2,4 6,4 30 68 90 140 - - - - - -

280 4,8 16,5 114 180 300 440 - - - - - -

289 1,7 5,2 42 60 170 190 - - - - - -

292 1 2,6 18 17 50 60 - 0,3 1,8 2 5,9 7,1

296 7,6 23 183 256 540 800 1,1 3,5 28 38 80,2 119

302 17 53 228 349 730 930 4,3 13 57 87 182 232

313 46 110 395 673 1680 1980 25 61 227 370 924 1089

334 2,2 7,3 58 101 210 270 1,8 5,8 46 81 168 217

366 66 165 696 1150 2540 3170 59 149,5 626 1045 2308 2881

391 0,5 1,4 10 22 30 50 0,4 1,3 9 20 27 45,5

405/8 26,0 66 207 386 1200 1290 23 59 186 347 1079 1160

436 40,0 113 332 642 1770 2120 36 102 298 578 1594 1909

492 0,6 1,7 14 5 30 30 0,5 1,5 13 4,5 27 27

546 52 124 361 798 2260 2790 47 112 325 719 2094 2514

577/9 19 68 553 1140 2270 3260 17 61 498 1035 2061 2960

UV lamps for industrial scale immersion lamp systems 2-60 kw


79

λ nm

Mole quanta/h (naked lamp) Mole quanta/h (Lamp with borosilicate 3.3 sleeve)

TQ 2024.100

TQ 4024.100

TQ 10030.150

TQ 20040.150

TQ 40055.150

TQ 60055.200

TQ 2024.100

TQ 4024.100

TQ 10030.150

TQ 20040.150

TQ 40055.150

TQ 60055.200

248 0,045 0,140 0,76 1,40 2,24 3,36 - - - - - -

254 0,280 0,730 3,06 7,90 17,58 26,22 - - - - - -

265 0,096 0,420 1,44 2,10 3,59 4,23 - - - - - -

270 0,023 0,059 0,37 0,59 1,46 1,46 - - - - - -

275 0,020 0,053 0,25 0,56 0,75 1,16 - - - - - -

280 0,040 0,140 0,96 1,50 2,53 3,71 - - - - - -

289 0,015 0,045 0,37 0,52 1,48 1,65 - - - - - -

292 0,009 0,023 0,16 0,15 0,44 0,53 - 0,003 0,016 0,02 0,05 0,06

296 0,070 0,200 1,63 2,30 4,83 7,15 0,010 0,031 0,250 0,34 0,72 1,10

302 0,150 0,480 2,07 3,20 6,64 8,71 0,039 0,120 0,520 0,79 1,70 2,10

313 0,430 1,050 3,72 6,30 15,83 18,65 0,240 0,570 2,140 3,50 8,70 10,30

334 0,020 0,073 0,58 1,00 2,11 2,71 0,018 0,058 0,460 0,81 1,70 2,20

366 0,730 1,820 7,66 12,70 27,98 34,92 0,650 1,640 6,900 11,50 25,40 31,80

391 0,006 0,016 0,12 0,26 0,36 0,59 0,005 0,015 0,110 0,24 0,30 0,50

405/8 0,320 0,800 2,52 4,70 14,70 15,42 0,280 0,720 2,270 4,20 13,20 14,20

436 0,530 1,490 4,36 8,40 23,23 27,82 0,470 1,340 3,920 7,60 20,90 25,10

492 0,009 0,025 0,21 0,07 0,44 0,44 0,008 0,022 0,190 0,07 0,40 0,40

546 0,850 2,100 5,95 13,10 37,14 45,85 0,770 1,840 5,360 11,80 33,50 42,30

577/9 0,330 1,180 9,64 19,80 39,49 56,72 0,300 1,060 8,670 18,00 35,90 51,50

80

λ nmRadiation flux Ф (W) / cm lighting length

W/cm Mole quanta/h per cm

200-220 3,3 20,0

x 10-3

220-240 3,4 23,0

240-260 6,1 43,0

248 1,4 10,4

254 4,4 26,1

265 2,2 17,6

270 0,7 5,8

275 0,4 3,3

280 1,1 9,2

289 0,6 5,2

292 0,6 5,4

297 1,0 8,9

302 2,2 20,0

313 3,4 32,0

334 0,5 5,0

366 5,6 61,7

391 0,1 1,2

405/08 1,7 20,8

436 2,7 35,4

492 0,2 3,0

546 3,1 50,9

577/79 4,6 80,0

λ nm W/cm Lighting length

200 - 280 16,6

280 - 315 7,8

315 - 400 7,7

400 - 700 14,9

Easy-upsacling lamps


81*upon request

Quartz glass mixture types*

Quartz glass mixture types

0

10

20

30

40

50

60

70

80

90

100

200 220 240 260 280 300 320 340 360 380 400

nm

Tran

smis

sio

n %

M280 (M84)

HLX-OHF-ILX

M215

M230

M235 (M68)

M240

M285

M320

M380

M382

83

Contact persons

Alexander PeschlGeneral Manager

+49(6131) 143 845-0

[email protected]

Günther PeschlPhotochemistry

+49(6131) 143 845-10

[email protected]

Bastian EngelDisinfection

+49(6131) 143 845-11

[email protected]

Siegbert WeitmannManufacturing, Service

+49(6131) 143 845-15

[email protected]

■ Equipment for disinfection of - Air - Water - Surfaces - Packaging materials

■ Immersion lamps for industrial photochemistry - Laboratory - R&D - Production

■ Engineering and consultancy services

■ UV curing and drying

■ UV measurement technology

■ UV radiation sources

■ Power supply units

■ Analysis lamps and luminescence excitors

■ Quartz glass products

■ Components

■ Special equipment

■ Training and workshops

www.uv-consulting.de

Weberstraße 19

55130 Mainz / Germany

Phone +49 (0) 6131 143 845-0

Fax +49 (0) 6131 143 845-90

Local agent

Documents

UV-Consulting Peschlpreparative photochemistry and photochemical environmental techniques We sell UV-radiation sources and standard photo-chemical reactors for immediate use to perform