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Contents 1. Two – Temperature Model 1 2. Conclustion 2
Citation preview
Two –Temperature Model (Chap 7.1.3)
6 Dec 2011Injoo Hwang
Thermal Engineering & Manufacturing Process Laboratory
Contents
1. Two – Temperature Model1
2. Conclustion2
Thermal Engineering & Manufacturing Process Laboratory
Two-Temperature Model
Two – Temperature Model A pair of coupled nonlinear equations governing the effective temperatures of electrons and phonons (by S.I. Anisimov et al. 1974)
Assumed in the Two – Temperature Model
Electron System Phonon System
Equilibrium Equilibrium
Mutually
Non-Equilibrium
Thermal Engineering & Manufacturing Process Laboratory
Two-Temperature Model
aseee
e qΤΤGΤtΤC
ses
s ΤΤGtΤC
: Electron System
: Phonon System
: the volumetric heat capacityepe cC )(
G
aq
e
sps cC )(
: the electron – phonon coupling constant
: the source term ( during the laser pulse )
: the thermal conductivity ( heat conduction by phonons is neglected )∵
Thermal Engineering & Manufacturing Process Laboratory
Two-Temperature Model
Examining parameters
esee
epeeepe TTkncmncC
F
2B
2
, 2)(
- The thermal conductivity
eevc F,31
e
e
mTkn
F
F
2B
2 223
1
es
eqe
e
e TT
Tmkn
3
2B
2
F
2B
2
, 2 Tknc e
ev e
e m F2
FF2
- The coupling constant- The volumetric heat capacity
s
aee
TvnmG
6
22
eq
Bae
e
eeq
aee kvn
knmvnmG
18
)(36
24
2B
2
22
or
se
eeq T
knm
2
B2
3
G is independent of temperature and proportional to the square of the speed of sound in the metal
Thermal Engineering & Manufacturing Process Laboratory
Two-Temperature Model3/1
DB
34
aa nhkv
0
2D
2B
0
2D
2B
3
2
518.0412
s
e
s
e
Tkn
TknG
goldfor K)W/(m109.2 316
The associated electron and phonon temperatures near the surface
Ultrafast thermoreflectance experiments
tpt
eT
sTaq
Specimen
Probe beam
Pump beam
Thermoreflec-tance signal
The electron temperature rises quickly during the pulse and begins to decrease afterward
The lattice temperature gradually increases until the electron and lattice systems reach a thermal equilibrium
Measuring the effective electron temperature by no contact thermometer which performs the femtosecond or picosecond thermoreflectrance technique
Thermal Engineering & Manufacturing Process Laboratory
Two-Temperature Model
aseee
e qTTGTtTC se
ss TTGtTC
as
see
e qtTCT
tTC
t
TCC
CqT
CtT e
s
e
s
ae
s
s
2
aseee
e qTTGTtTC asee
ee q
tTT
tGT
ttT
tC
tq
tTG
tTGT
ttTC ase
ee
e
2
2
2
tq
GtTT
tGtT
GC
tT ae
eees
11 2
2
2
tq
GtTT
tGtT
GC
tT
CC
CqT
Cae
eeee
s
e
s
ae
s
11 2
2
22
2
222
tT
GCC
tTCC
tq
GCqT
tGCT eseeseasa
es
e
2
2qT2
T2 1
tT
tT
tqqT
tT eeaa
ee
qT
q
T
1
see
se
se
s
CCCGCC
CCGC
Differential equations for the electron temperature
Thermal Engineering & Manufacturing Process Laboratory
Two-Temperature Model
2
2q2
T2 1
tT
tTqT
tT ssa
ss
Differential equations for the phonon temperature
se CC / GCs /T TTq // GCCCC esee
- Identical to the lagging heat equations
- Following the general trends
- τq : Thermalization time
(thermal time constant for the electron system to reach
an equilibrium with the phonon system)
Thermal Engineering & Manufacturing Process Laboratory
Two-Temperature Model
- For noble metals at room temperature -
• Relaxation time : τ ~ 30 to 40 fs• Thermalization time : τq ~ 0.5 to 0.8 ps• Retatdation time : τT ~ 60 to 90 ps
The two-temperature model cannot be applied to t < τ ( the limitation of Fourier’s law )
- Difficult issues -
The processes below 20 fs (relaxation time of Cr is about 3 fs)
• Electron – electron inelastic scattering• Thermionic emission, ionization, phase transformation, chemical reaction• The reduced pulse width include widened frequency spectrum• Increased pulse intensity, decreased pulse energy
Thermal Engineering & Manufacturing Process Laboratory
Conclusion
Two – Temperature Model (their own local equilibrium not in mutual equilibrium)
Examine parameters (the volumertic heat capacity, the thermal conductivity, the coupling constant)
The behavior of the electron and phonon temperatures
Non contact thermometer ( thermoreflctance technique known as pump-and-probe method)
Derive PDE for the electron or phonon temperature