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Tuning Wear Rate and Surface Roughness of CMP Pads via Precise Control of Pad Conditioner Features CMPUG, Albany, New York, 4/12/2018 Electronics Materials Solutions Division

Tuning Wear Rate and Surface Roughness of CMP Pads via ... · Brent Utech+++ Larry Zazzera+ +3M Company, Electronics Materials Solutions Division Laboratory, St. Paul, Minnesota,

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Page 1: Tuning Wear Rate and Surface Roughness of CMP Pads via ... · Brent Utech+++ Larry Zazzera+ +3M Company, Electronics Materials Solutions Division Laboratory, St. Paul, Minnesota,

Tuning Wear Rate and Surface Roughness of CMP Pads via Precise Control of Pad Conditioner Features

CMPUG, Albany, New York, 4/12/2018

Electronics Materials Solutions Division

Page 2: Tuning Wear Rate and Surface Roughness of CMP Pads via ... · Brent Utech+++ Larry Zazzera+ +3M Company, Electronics Materials Solutions Division Laboratory, St. Paul, Minnesota,

2. All Rights Reserved.19 April 2018© 3M 3M Confidential.

Authors

Matt Fritz+

Alexander Simpson+

Junqing Xie+

Steve Loper+

Gary Palmgren+

James Burke++

Jim Starkey++

Erik Carlson+++

Brent Utech+++

Larry Zazzera+

+3M Company, Electronics Materials Solutions Division Laboratory, St. Paul, Minnesota, United States

++3M Company, Electronics and Energy Group Laboratory, St. Paul, Minnesota, United States

+++3M Company, 3M Film and Materials Resource Division Laboratory, St. Paul, Minnesota, United States

Page 3: Tuning Wear Rate and Surface Roughness of CMP Pads via ... · Brent Utech+++ Larry Zazzera+ +3M Company, Electronics Materials Solutions Division Laboratory, St. Paul, Minnesota,

3. All Rights Reserved.19 April 2018© 3M 3M Confidential.

Introduction

1. Microreplicated Technology for Pad Conditioners2. Decoupling Pad Roughness from Pad Wear Rate3. Test Plan, Input Variables, Response Outputs, Equipment, Materials, & Methods 4. Results

• Pad Wear Rate (PWR) and Average Surface Roughness (Ra)• PWR and Ra from Disk Types• Effluent Particle Concentrations with Disk Types

5. Summary, Conclusions, and Future Work

Page 4: Tuning Wear Rate and Surface Roughness of CMP Pads via ... · Brent Utech+++ Larry Zazzera+ +3M Company, Electronics Materials Solutions Division Laboratory, St. Paul, Minnesota,

4. All Rights Reserved.19 April 2018© 3M 3M Confidential.

Shape of contact features: varies randomlyHeight dispersion of contact features: varies randomlyType of contact features: varies, depends on grit type

Shape of contact features: Designed-in and replicatedHeight dispersion of contact features: Designed-inType of contact features: Designed-in

Why Microreplicated technology for Pad Conditioners?

Grit Type Pad Conditioner Trizact™ Pad Conditioner

Para

digm

Sh

ift

Page 5: Tuning Wear Rate and Surface Roughness of CMP Pads via ... · Brent Utech+++ Larry Zazzera+ +3M Company, Electronics Materials Solutions Division Laboratory, St. Paul, Minnesota,

5. All Rights Reserved.19 April 2018© 3M 3M Confidential.

Trizact™ Pad Conditioner Configuration

3M™ Trizact™ Pad Conditioner

Feature Size

% Primary

Tips

Tip Offset

Tip Aspect Ratio

Tip Density

# elements per disk

Element position

Engineered Microreplicated Elements

Disk Construction

TipGeometry

TipModality

Page 6: Tuning Wear Rate and Surface Roughness of CMP Pads via ... · Brent Utech+++ Larry Zazzera+ +3M Company, Electronics Materials Solutions Division Laboratory, St. Paul, Minnesota,

6. All Rights Reserved.19 April 2018© 3M 3M Confidential.

Microreplication Consistency Enables Advanced Metrology

3M™ Trizact™ Pad ConditionerB75-2990-5S2

Topography of Each Element

Sharpness of Every Abrasive Feature/Tip

Flatness of Every ElementCoplanarity of All Elements

Each TipCharacterized

100% Inspection

Page 7: Tuning Wear Rate and Surface Roughness of CMP Pads via ... · Brent Utech+++ Larry Zazzera+ +3M Company, Electronics Materials Solutions Division Laboratory, St. Paul, Minnesota,

7. All Rights Reserved.19 April 2018© 3M 3M Confidential.

Decoupling Pad Roughness and Pad Wear Rate

Pad

Rou

ghne

ss

Pad Wear Rate

New space decoupling pad

roughness/cut raterelationship

Page 8: Tuning Wear Rate and Surface Roughness of CMP Pads via ... · Brent Utech+++ Larry Zazzera+ +3M Company, Electronics Materials Solutions Division Laboratory, St. Paul, Minnesota,

8. All Rights Reserved.19 April 2018© 3M 3M Confidential.

Test Plan, Input Variables, Response Outputs

Test Plan: Measure pad wear, pad roughness and effluent after 1 hour conditioning in DI water.

Input variables

Pad conditioner types A & B. A= commercially available Trizact pad conditioners

B= new experimental Trizact pad conditioners

Pad conditioner designs: 1, 2, 3, 4 for incrementally higher pad wear “aggressiveness”

Pad X, industry standard pad

Response outputs

Pad Wear Rate, PWR (um/hr)

Pad roughness, Ra (um)

Pad debris concentration (#/ml), debris size > 0.56 um .

Page 9: Tuning Wear Rate and Surface Roughness of CMP Pads via ... · Brent Utech+++ Larry Zazzera+ +3M Company, Electronics Materials Solutions Division Laboratory, St. Paul, Minnesota,

9. All Rights Reserved.19 April 2018© 3M 3M Confidential.

Equipment, Materials & MethodsEquipment

AMAT Reflexion™

LASER & Mechanical Profilometer

Optical Particle Counter for pad debris concentration

Materials

30” diameter pad

3M Trizact Pad Conditioners (A1 - A4, B1 - B4)

DI Water

Methods

Pad Wear Measurement: groove depth before / after 1 hr of conditioning

Pad Roughness Measurement: surface roughness before / after 1 hr conditioning

Particle Concentration: Effluent collected during last 5 minutes of 1 hr conditioning process

Pad Conditioner Recipe Settings

Platen Speed 93 rpm

Head Speed 81 rpm

Sweep Linear13 swp/min

DI water flow rate 200mL/min

Down Force 6lbs

Page 10: Tuning Wear Rate and Surface Roughness of CMP Pads via ... · Brent Utech+++ Larry Zazzera+ +3M Company, Electronics Materials Solutions Division Laboratory, St. Paul, Minnesota,

10. All Rights Reserved.19 April 2018© 3M 3M Confidential.

Typical Regime for Type A Pad Conditioners Type A pad conditioners, Pad Surface Roughness vs. Pad Wear Rate

Type A pad conditioner designs show typical relationship between pad roughness and pad wear rate

Pad

Rou

ghne

ss

Pad Wear Rate

New space decoupling pad

roughness/cut raterelationship

RSquare = 0.65

PWR (um/hr)

(um/hr)

Page 11: Tuning Wear Rate and Surface Roughness of CMP Pads via ... · Brent Utech+++ Larry Zazzera+ +3M Company, Electronics Materials Solutions Division Laboratory, St. Paul, Minnesota,

11. All Rights Reserved.19 April 2018© 3M 3M Confidential.

Different pad conditioner designs can modulate pad surface roughness significantly and independently of pad roughness

Comparison of Type A and B Pad Conditioners Pad Surface Roughness vs. Pad Wear Rate

Disk Types and Design

Type A Disks Type B Disks

PWR

(um

/hr)

R

a (u

m)

PWR (um/hr) & Ra (um) vs. Disk PWR (um/hr) Ra (um)

Page 12: Tuning Wear Rate and Surface Roughness of CMP Pads via ... · Brent Utech+++ Larry Zazzera+ +3M Company, Electronics Materials Solutions Division Laboratory, St. Paul, Minnesota,

12. All Rights Reserved.19 April 2018© 3M 3M Confidential.

Both pad conditioner disk types give similar pad wear rate (PWR, um/hr) range; however, the average surface roughness (Ra, um) from Type B > Type A disks

A B A B

Comparison of Type A and B Pad Conditioners Pad Surface Roughness vs. Pad Wear Rate

PWR

(um

/hr)

(um/hr)

Page 13: Tuning Wear Rate and Surface Roughness of CMP Pads via ... · Brent Utech+++ Larry Zazzera+ +3M Company, Electronics Materials Solutions Division Laboratory, St. Paul, Minnesota,

13. All Rights Reserved.19 April 2018© 3M 3M Confidential.

Type B pad conditioner disk seems to generate less pad debris compared to type A disk

Comparison of Type A and B Pad ConditionersParticle Concentrations vs. Size

Part

icle

Con

cent

ratio

n (#

/ml)

Particle Size (um)

Type A DiskType B Disk

Page 14: Tuning Wear Rate and Surface Roughness of CMP Pads via ... · Brent Utech+++ Larry Zazzera+ +3M Company, Electronics Materials Solutions Division Laboratory, St. Paul, Minnesota,

14. All Rights Reserved.19 April 2018© 3M 3M Confidential.

Summary• This work measured and compared the effect of 8 precisely controlled pad conditioner designs on

a typical bulk material removal pad • Pad wear rate, pad average surface roughness, and particle data from effluent were compared for

a range of different pad conditioner designs

Future Work• Wafer level data from chemical mechanical polishing with disk types A and B • Pad conditioner life comparison between disk types A and B• Pad wear, pad roughness, and LPC counts on different pad types

Conclusions• One pad conditioner type modulated pad roughness significantly and independently of pad wear,

so high surface roughness was imparted to pads with relatively low pad wear• These results demonstrate the ability to decouple pad roughness from pad wear rate, and show

potential to enable low pad wear in high wafer removal rate applications