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transistores
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Transistors Bipolars
Bipolar Junction Transistor (BJT)
Bipolar Transistors
N
P
P
N
P
N
Emitter
Base
Collector
Emitter
Base
Collector
Emitter
Collector
Base
Emitter
Collector
Base
2 junctions
JEB
JCB
JBE
JBC
JEB/JBE ON JCB/JBC ON
Saturation
JEB/JBE OFF JCB/JBC OFF
Cut-Off
JEB/JBE ON JCB/JBC OFF
Forward Active
JEB/JBE OFF JCB/JBC ON
Reverse Active
WORKING REGIONS
Bipolar transistors: Ebers-Mll Model
Forward Active
holes
electrons
Recombination
ic
Ie=Ien+Iep
ien
ib
iep
Ie = ic + ib
ic
Ebers-Mll Model
JBE ON JBC OFF
JBE
JBC
E
C
B
JBE
JBC
IF
IR
aR IR
aF IF
JBE
JBC
IF
aF IF
N
N
P
IE = IF
IC = aF IF
IB = IF (1-aF)
Ic = 0
Bipolar transistors: Ebers-Mll Model
JBE
JBC
IF
IR
aR IR
aF IF
IE = IF - aR IR
IC = aF IF - IR
IB = IF (1-aF) + IR (1-aR)
Injection Model
E
JBE
JBC
IBE
IBC
bF IBE - bR IBC
B
C
E
Transport Model
IE = (bF+1) IBE bR IBC
IC = bF IBE (bR+1) IBC
IB = IBE + IBC
IBE = IF (1-aF)
IBC = IR (1-aR)
IE = (bF+1) IF (1-aF) bR IR (1-aR)
(bF+1) (1-aF) = 1
bF = - 1 =
bR (1-aR) = aR
bR =
C
B
JBE
JBC
IBE
IBC
bF IBE - bR IBC
B
C
E
Bipolar transistors: Ebers-Mll Model
Forward Active
Reverse Active
JBE
IBE
B
C
E
bF IBE
VBE 0,7 V
JBC
IBC
B
C
E
bR IBC
VBC 0,5 V
IC = bF IBE= bF IB
IE = bR IBC= bR IB
bF > bR
JBE
JBC
IBE
IBC
bF IBE - bR IBC
B
C
E
Bipolar transistors: Ebers-Mll Model
Cut-Off
Saturation
IC = IB= IE = 0
B
C
E
JBC
IBC
B
C
E
bF IBE - bR IBC
JBE
IBE
VBC 0,5 V
VBE 0,7 V
C
E
B
VBE 0,7 V
VCE 0,2 V
JBE
JBC
IBE
IBC
B
C
E
Bipolar transistors: High frequency model
bF IBE - bR IBC
To be considered only when working at high frequency
+
VCE
-
+
VBE
-
Bipolar transistors
According the model
FORWARD ACTIVE
VCE
IC
IB1
IB2
IB3
CUT-OFF
SATURATION
IC
IB
+
VCE
-
+
VBE
-
VCE
IC
IB1
IB2
IB3
Bipolar transistors
VCE = VCB + VBE
considering VBE constant
VCE => VCB
Emitter
Base
Collector
Recombination decreases
IC
Base width modulation
(EARLY EFFECT)
IC = IB
Forward active region
IC
IB
Recombination
ic
VCE
IB1
IB2
Bipolar transistors
IC = IB
Forward active region
-VA
Safe Operating ARea
VCE
IC
ICmax
VCE0max
Pd = VCE Ic + VBE IB VCE Ic Pdmax
SOAR
VEB VEB0max
VCB VCB0max
To avoid junction rupture
To avoid excesive heating by Joule effect
2N222
Metal-Oxide-Semiconductor Field Effect Transistor
(MOSFET)
MOS transistor
Metal
Oxide
Semiconductor
Bulk
Gate
Drain
Source
CHANEL N
CHANEL P
CHANEL N
Enhancement
-
-
-
-
-
-
-
-
Bulk
Gate
Drain
Source
P
-
-
-
-
ID
VGS
VT
-
-
-
-
-
-
-
-
Bulk
Gate
Drain
Source
CHANEL N
P
Depletion
ID
VGS
VT
-
-
-
-
-
-
-
-
-
-
-
-
16
Bulk
Gate
Drain
Source
CHANEL P
N
ID
VGS
VT
VDS VGS -VDS =VT
VDS = VGS -VT
Saturation
ID
VT
VGS
ID
VT
VGS
DEPLETION
22
CHANEL P
ENHANCEMENT
DEPLETION
ID
VT
VGS
ID
VT
VGS
VDS
ID
VGS
VDS
ID
VGS
VT
VGS
ID
ID
VT
VGS
CHANEL N
ENHANCEMENT
DEPLETION
K = (A/V2)
VT
W and L
L
technological parameters
Circuit designer fixed parameters
W
C
B
E
C
W
(
)
(
)
DS
2
T
GS
D
V
1
V
V
L
W
2
k
I
+
-
=