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Thin Film Structures and Phase Stability
www.cambridge.org© in this web service Cambridge University Press
Cambridge University Press978-1-107-41012-1 - Thin Film Structures and Phase Stability: Symposium held April 16-17, 1990, San Francisco, California, U.S.A.Edited by B.M. Clemens and W.L. JohnsonFrontmatterMore information
http://www.cambridge.org/9781107410121http://www.cambridge.orghttp://www.cambridge.org
www.cambridge.org© in this web service Cambridge University Press
Cambridge University Press978-1-107-41012-1 - Thin Film Structures and Phase Stability: Symposium held April 16-17, 1990, San Francisco, California, U.S.A.Edited by B.M. Clemens and W.L. JohnsonFrontmatterMore information
http://www.cambridge.org/9781107410121http://www.cambridge.orghttp://www.cambridge.org
MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS VOLUME 187
Thin Film Structures and Phase Stability
Symposium held April 16-17, 1990, San Francisco, California, U.S.A.
EDITORS:
B.M. ClemensStanford University, Stanford, California, U.S.A.
W.L. JohnsonCalifornia Institute of Technology, Pasadena, California, U.S.A.
MATERIALS RESEARCH SOCIETYPittsburgh, Pennsylvania
www.cambridge.org© in this web service Cambridge University Press
Cambridge University Press978-1-107-41012-1 - Thin Film Structures and Phase Stability: Symposium held April 16-17, 1990, San Francisco, California, U.S.A.Edited by B.M. Clemens and W.L. JohnsonFrontmatterMore information
http://www.cambridge.org/9781107410121http://www.cambridge.orghttp://www.cambridge.org
cambridge university press Cambridge, New York, Melbourne, Madrid, Cape Town, Singapore, São Paulo, Delhi, Mexico City
Cambridge University Press32 Avenue of the Americas, New York ny 10013-2473, USA
Published in the United States of America by Cambridge University Press, New York
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Materials Research Society506 Keystone Drive, Warrendale, pa 15086http://www.mrs.org
© Materials Research Society 1990
This publication is in copyright. Subject to statutory exceptionand to the provisions of relevant collective licensing agreements, no reproduction of any part may take place without the written permission of Cambridge University Press.
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First published 1990 First paperback edition 2012
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isbn 978-1-107-41012-1 Paperback
Cambridge University Press has no responsibility for the persistence oraccuracy of URLs for external or third-party internet websites referred to inthis publication, and does not guarantee that any content on such websites is,or will remain, accurate or appropriate.
www.cambridge.org© in this web service Cambridge University Press
Cambridge University Press978-1-107-41012-1 - Thin Film Structures and Phase Stability: Symposium held April 16-17, 1990, San Francisco, California, U.S.A.Edited by B.M. Clemens and W.L. JohnsonFrontmatterMore information
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Contents
PREFACE xi
MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS xii
PART I: INTERFACE REACTIONS, AMORPHOUS PHASEFORMATION, AND PHASE SEPARATION
*DIFFUSIONAL ASYMMETRY IN AMORPHOUS ALLOYS: IMPLICATIONSFOR INTERFACIAL REACTIONS 3
A.L. Greer, K. Dyrbye, L.-U. Aaen Andersen,R.E. Somekh, J. B0ttiger, and J. Janting
A PHASE DIAGRAM APPROACH FOR PREDICTING REACTIONS INAl/TiW(-NITRIDE) THIN-FILM SYSTEMS 15
A.S. Bhansali, I.J.M.M. Raaijmakers, R. Sinclair,A.E. Morgan, B.J. Burrow, and M. Arst
DECAGONAL AlgPd PHASE FORMATION IN LATERAL ANDCONVENTIONAL THIN FILM Al/Pd DIFFUSION COUPLES 21
B. Blanpain and J.W. Mayer
TRACER DIFFUSION IN AMORPHOUS Ni-Zr ALLOYS 27H.-M. Wu, H. Hahn, and R.S. Averback
Al-Ge PHASE SEPARATION DURING VAPOR DEPOSITION 33C D . Adams, M. Atzmon, Y.-T. Cheng, andD.J. Srolovitz
CU-Cr MULTILAYERS AND METASTABLE ALLOY FILMS 39A.P. Payne and B.M. Clemens
STABILITY AND DECOMPOSITION OF IV-VI SEMICONDUCTORFILMS 47
L. Salamanca-Riba, S. Nahm, M. Wuttig,A. Roitburd, Z. Feit, D. Kostyk, and R. Woods
ANOMALOUS SMALL ANGLE X-RAY SCATTERING STUDIES OFMETAL-GERMANIUM ALLOYS 53
Marybeth Rice, Soichi Wakatsuki, andArthur Bienenstock
PART II: INTERFACE REACTIONS AND METASTABLE PHASEFORMATION IN METAL-SEMICONDUCTOR SYSTEMS
*KINETICS AND THERMODYNAMICS OF AMORPHOUS SILICIDEFORMATION IN METAL/AMORPHOUS-SILICON MULTILAYERTHIN FILMS 61
C.V. Thompson, L.A. Clevenger, R. DeAvillez,E. Ma, and H. Miura
•Invited Paper
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STRUCTURE AND THERMODYNAMICS OF AMORPHOUS Ti-SiPRODUCED BY SOLID-STATE INTERDIFFUSION 71
Karen Holloway, Pierre Moine, Jacques Delage,RUdiger Bormann, Linda Capuano, andRobert Sinclair
FORMATION OF AMORPHOUS INTERLAYERS BY SOLID-STATEDIFFUSION IN REFRACTORY METAL/SILICON SYSTEMS 77
J.Y. Cheng, M.H. Wang, and L.J. Chen
KINETIC AND THERMODYNAMIC ASPECTS OF PHASE EVOLUTIONIN Ti/a-Si MULTILAYER FILMS 83
E. Ma, L.A. Clevenger, C.V. Thompson, andK.N. Tu
FORMATION AND GROWTH OF AMORPHOUS PHASES BY SOLID-STATE REACTIONS BETWEEN Co THIN-FILMS AND III-VCOMPOUND SEMICONDUCTORS 89
F.Y. Shiau and Y.A. Chang
MICROSTRUCTURE AND STABILITY COMPARISON OF NANOMETERPERIOD W/C, WC/C, AND Ru/C MULTILAYER STRUCTURES 95
Tai D. Nguyen, Ronald Gronsky, andJeffrey B. Kortright
INVESTIGATIONS OF CuInSe2 THIN FILMS AND CONTACT 101S. Raud, Quat T. Vu, M-A. Nicolet, G.A. Pollock,K.W. Mitchell, J.A. Leavitt, M.D. Ashbaugh, andL.C. Mclntyre
ROOM TEMPERATURE OXIDATION OF SILICON CATALYZED BYCu3Si 107
J.M.E. Harper, A. Charai, L. Stolt, F.M. d'Heurle,and P.M. Fryer
CRYSTAL NUCLEATION IN AMORPHOUS Si THIN FILMS DURINGION IRRADIATION 113
James S. Im and Harry A. Atwater
CHARACTERIZATION OF SILICON AND INDIUM REDISTRIBUTION INInxGa1-xAs/n
+-GaAs(100) HETEROEPITAXIAL LAYERSFABRICATED USING PULSED LASER MELTING 119
Y. Chang, T.W. Sigmon, A.F. Marshall, andK.H. Weiner
PART III: POSTER SESSION: THIN FILMSTRUCTURES AND PHASE STABILITY
PERCOLATION STRUCTURE OBSERVED IN EVAPORATEDNd-Fe-B FILMS 127
C.H. Shang, B.X. Liu, and H.D. Li
BORON DIFFUSION IN BULK COBALT DISILICIDE 131P. Gas, C. Zaring, B.G. Svensson, M. Ostling,H.J. Whitlow, and T. Barge
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STRUCTURE AND PHASE TRANSFORMATIONS IN THERMOELASTICNirl xvTiCur . THIN FILMS PREPARED BY D.C. MAGNETRONSPUTTERING1 ' 137
L. Chang, C. Hu-Simpson, D.S. Grummon, W. Pratt,and R. Loloee
OXIDATION KINETICS OF METASTABLE ELECTRODEPOSITED ANDSPUTTERED NICKEL THIN FILMS VIA THERMOGRAVIMETRICANALYSIS 143
Ann C. Herrmann, William E. Brower, Jr., andShashi Lalvani
LOW TEMPERATURE DEPOSITED HIGH QUALITY ITO FILMSPREPARED BY E-BEAM EVAPORATION 147
C.S. Chang, J.C. Wang, and L.C. Kuo
MORPHOLOGY OF E-BEAM EVAPORATED Cr THIN FILMS 151Y. Cheng, M.B. Stearns, and David J. Smith
MICROSTRUCTURE AND STABILITY OF TiB~ AND Cu MULTILAYERS 157S.N. Basu, K.M. Hubbard, J-P. Hirvonen,T.E. Mitchell, and M. Nastasi
COMPOSITION AND STRUCTURE CHARACTERIZATION OF WNX FILMSPRODUCED BY RF REACTIVE SPUTTERING 161
Dongliang Lin (T.L. Lin), Benda Yan, andWeili Yu
LASER DEPOSITION OF MOLYBDENUM OXIDE THIN FILMS FROMORGANOMETALLIC PRECURSORS 167
Kurt A. Olson and Glenn L. Schrader
SXES STUDY OF TRANSITION METAL SILICIDE FILMS AND THEIRCONTACTS TO SEMICONDUCTORS 173
H. Watabe, M. Iwami, M. Hirai, M. Kusaka, M. Kubota,H. Nakamura, M. Kawai, H. Soezima, and F. Akao
COMPUTER SIMULATION STUDY OF THIN FILM FORMATION PROCESS 177Yasushi Sasajima, Satoru Ozawa, and Ryoichi Yamamoto
INVESTIGATION INTO THE THIN-FILM FABRICATION OFINTERMETALLIC NiTi 181
A. Peter Jardine, Hong Zhang, and Lysa D. Wasielesky
CHEMICAL VAPOR DEPOSITION OF BINARY METAL GERMANIDES 187M.J. Hampden-Smith, J. Garvey, D. Lei, andJ.C. Huffman
CHEMICAL VAPOR DEPOSITION OF COPPER FROM METAL-ORGANICCOPPER(I) PHOSPHINE COMPLEXES 193
H.-K. Shin, M.J. Hampden-Smith, T.T. Kodas,E.N. Duesler, J.D. Farr, and M. Paffett
ON THE FORMATION OF AMORPHOUS AND METASTABLEPVD-COATINGS 199
O. Knotek, A. Barimani, F. Loffler
CORRELATING CVD PROCESS PARAMETERS AND FILM PROPERTIES 203D.K. Chow
vii
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PART IV: EPITAXY AND MULTILAYER STRUCTURE I
*MBE GROWTH OF ARTIFICIALLY-LAYERED MAGNETIC METALSTRUCTURES ON SEMICONDUCTORS 211
R.F.C. Farrow and C.H. Lee
MAGNETIC ORDERING OF Tb OVERLAYERS ON Ni(lll) 225D. LaGraffe, A. Miller, P.A. Dowben, andM. Onellion
EPITAXY OF IRON ON VARIOUS RUTHENIUM SURFACES:OCCURRENCE OF A NEW Fe PHASE 231
Michel Piecuch, Marie Francoise Ravet, andMarc Maurer
EPITAXY OF Ni ON Si(111) BY ION BEAM ASSISTEDDEPOSITION 237
K.S. Grabowski and R.A. Kant
STRUCTURAL AND ELECTRONIC CHANGES IN THE GROWTH OFMERCURY OVERLAYERS ON Cu(OOl): A HELIUM BEAMSCATTERING, LEED AND ARPES STUDY 243
G. Vidali, W. Li, P.A. Dowben, M. Karimi,C.W. Hutchings, J. Lin, C. Moses, D. Ila, andI. Dalins
THE EPITAXIAL GROWTH OF COPPER ON THE (111) SURFACEOF SILICON 249
F.J. Walker, J.R. Conner, and R.A. McKee
SCANNING TUNNELING MICROSCOPY OF PLATINUM CLUSTERS ONHOP-GRAPHITE 255
Klaus Sattler, Ulrich Mueller, Jie Xhie,Narayana Venkateswaran, and Gargi Raina
EPITAXY OF TiO2 THIN FILM ON SAPPHIRE BY MOCVD 261H.L.M. Chang, H. You, J.C. Parker, and D.J. Lam
X-RAY DOUBLE CRYSTAL DIFFRACTION CHARACTERIZATION OFEPITAXIAL MAGNETIC TRANSITION METAL DIFLUORIDES 267
M. Lui, A.R. King, V. Jaccarino, R.F.C. Farrow,and S.S.P. Parkins
EPITAXIAL GRAIN GROWTH AND ORIENTATION METASTABILITYIN HETEROEPITAXIAL THIN FILMS 273
J.A. Floro and C.V. Thompson
SOLID PHASE EPITAXY OF STRAINED S i ^ G e ALLOYS FORMEDBY HIGH-DOSE ION IMPLANTATION INTO SILICON 279
D.J. Howard, D.C. Paine, and N.G. Stoffel
PART V: EPITAXY AND MULTILAYER STRUCTURE II
ATOMISTIC STRUCTURE AND COMPOSITION OF A Ag/NiINTERPHASE BOUNDARY 287
P. Gumbsch, M.S. Daw, S.M. Foiles, andH.F. Fischmeister
*Invited Paper
viii
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Cambridge University Press978-1-107-41012-1 - Thin Film Structures and Phase Stability: Symposium held April 16-17, 1990, San Francisco, California, U.S.A.Edited by B.M. Clemens and W.L. JohnsonFrontmatterMore information
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ON GEOMETRIC MODELS FOR INTERPHASE BOUNDARIES 293Hans J. Fecht
MOLECULAR DYNAMICS STUDY OF (001) AND (111) THINFCC FILMS 299
F.H. Streitz, K. Sieradzki, and R.C. Cammarata
STRUCTURES OF SILVER/CHROMIUM METALLIC SUPERLATTICE 305Takeo Kaneko, Kentaro Kyuno, Osamu Niikura,Shigeki Hara, and Ryoichi Yamamoto
STRUCTURES OF SILVER/COBALT METALLIC SUPERLATTICE ANDCHANGES DUE TO ANNEALING 309
T. Kingetsu, K. Sakai, T. Kaneko, A. Yamaguchi,and R. Yamamoto
INTERFACIAL COMPOSITION AND STRUCTURE IN Pt/Ni ANDPt/Nb MULTILAYER FILMS 315
J.A. Bain, B.M. Clemens, and S. Brennan
STRUCTURAL AND ELASTIC PROPERTIES OF Hf/Zr MULTILAYERTHIN FILMS 321
W.J. Meng, G.L. Eesley, K. Svinarich, andG.P. Meisner
DETERMINATION OF THE STRAIN SOURCE IN Mo/Ni MULTILAYERS 327L.J. Chyung, B.M. Clemens, and S. Brennan
ATOM PROBE AND HREM CHARACTERIZATION OF TRANSITIONMETAL MULTILAYERS 333
A. Cerezo, M.G. Hetherington, andA.J.K. Petford-Long
AUTHOR INDEX 339
SUBJECT INDEX 341
MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS 345
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Cambridge University Press978-1-107-41012-1 - Thin Film Structures and Phase Stability: Symposium held April 16-17, 1990, San Francisco, California, U.S.A.Edited by B.M. Clemens and W.L. JohnsonFrontmatterMore information
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Cambridge University Press978-1-107-41012-1 - Thin Film Structures and Phase Stability: Symposium held April 16-17, 1990, San Francisco, California, U.S.A.Edited by B.M. Clemens and W.L. JohnsonFrontmatterMore information
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Preface
Symposium J, Thin Film Structures and Phase Stability,focused on the ability which thin film deposition and reactiontechniques give to engineer materials on the atomic scale. Thekinetic and thermodynamic phenomenon in these processes can beused to produce materials with unusual, often metastable,chemical and structural environments. Artificially producedmultilayer structures often have unusual conditions of strain,chemical proximity, structure or disorder. The symposiumfocused on thin film structures, with emphasis on situationswhere thin film processing allows formation of metastablephases, highly strained materials, and novel solid statereaction phenomenon.
This was a two day symposium, with invited and contributedpapers as well as an evening poster session. The first dayconcentrated on solid state reactions with invited talks byLindsay Greer from the University of Cambridge, King Tu from IBMYorktown Heights, and Carl Thompson from MIT. Professor Greerobserved that the diffusion of Zr is 10 times slower than thatof Ni in amorphous NiZr, confirming that Ni is the mobilespecies in solid state amorphization. King Tu explained theformation of metastable phases in thin film diffusion couples bythe concept of 'maximum rate of free energy change.' CarlThompson discussed the formation of amorphous phases in metalsilicon systems, and discussed a two stage nucleation and growthprocess. The contributed papers also generated discussion ontopics such as phase segregation, amorphous silicide formation,room temperature oxidation of silicon, and nucleation during ionbeam irradiation. There was a lively poster session on Mondayevening with papers on a wide variety of topics covering thegeneral area of thin film science.
The second day had sessions Epitaxy and Multilayer Struc-ture I and II, with the morning focussing on epitaxial andheteroepitaxial growth of thin films. Robin Farrow of IBMAlmaden led off with an invited talk where he reported on someremarkable success he and his co-workers have had in growingsingle crystal epitaxial thin films and superlattices of silver,iron, cobalt and platinum on GaAs. This was followed by severaltalks on epitaxial growth and characterization. The afternoonfocused on interfaces and structure of multilayered materials.A session on possible stress origins of the supermodulus effectwas highlighted by lively interaction from the audience. Mostof the papers presented at the symposium are presented in thisbook.
Bruce M. ClemensWilliam L. Johnson
November 1990
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Cambridge University Press978-1-107-41012-1 - Thin Film Structures and Phase Stability: Symposium held April 16-17, 1990, San Francisco, California, U.S.A.Edited by B.M. Clemens and W.L. JohnsonFrontmatterMore information
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MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS
Recent Materials Research Society Symposium Proceedings
Volume 157—Beam-Solid Interactions: Physical Phenomena, J.A. Knapp, P. Borgesen,R.A. Zuhr, 1989, ISBN 1-55899-045-3
Volume 158—In-Situ Patterning: Selective Area Deposition and Etching, R. Rosenberg,A.F. Bernhardt, J.G. Black, 1989, ISBN 1-55899-046-1
Volume 159—Atomic Scale Structure of Interfaces, R.D. Bringans, R.M. Feenstra,J.M. Gibson, 1989, ISBN 1-55899-047-X
Volume 160—Layered Structures: Heteroepitaxy, Superlattices, Strain, andMetastability, B.W. Dodson, L.J. Schowalter, J.E. Cunningham,F.H. Pollak, 1989, ISBN 1-55899-048-8
Volume 161—Properties of II-VI Semiconductors: Bulk Crystals, Epitaxial Films,Quantum Well Structures and Dilute Magnetic Systems, J.F. Schetzina,FJ. Bartoli, Jr., H.F. Schaake, 1989, ISBN 1-55899-049-6
Volume 162—Diamond, Boron Nitride, Silicon Carbide and Related Wide BandgapSemiconductors, J.T. Glass, R.F. Messier, N. Fujimori, 1989,ISBN 1-55899-050-X
Volume 163—Impurities, Defects and Diffusion in Semiconductors: Bulk and LayeredStructures, J. Bernholc, E.E. Haller, DJ. Wolford, 1989,ISBN 1-55899-051-8
Volume 164—Materials Issues in Microcrystalline Semiconductors,P.M. Fauchet, C.C. Tsai, K. Tanaka, 1989, ISBN 1-55899-052-6
Volume 165—Characterization of Plasma-Enhanced CVD Processes, G. Lucovsky,D.E. Ibbotson, D.W. Hess, 1989, ISBN 1-55899-053-4
Volume 166—Neutron Scattering for Materials Science, S.M. Shapiro, S.C. Moss,J.D. Jorgensen, 1989, ISBN 1-55899-054-2
Volume 167—Advanced Electronic Packaging Materials, A. Barfknecht, J. Partridge,C-Y. Li, CJ. Chen, 1989, ISBN 1-55899-055-0
Volume 168—Chemical Vapor Deposition of Refractory Metals and Ceramics,T.M. Besmann, B.M. Gallois, 1989, ISBN 1-55899-056-9
Volume 169—High Temperature Superconductors: Fundamental Properties and NovelMaterials Processing, J. Narayan, C.W. Chu, L.F. Schneemeyer,D.K. Christen, 1989, ISBN 1-55899-057-7
Volume 170—Tailored Interfaces in Composite Materials, C.G. Pantano, E.J.H. Chen,1989, ISBN 1-55899-058-5
Volume 171—Polymer Based Molecular Composites, D.W. Schaefer, J.E. Mark, 1989,ISBN 1-55899-059-3
Volume 172—Optical Fiber Materials and Processing, J.W. Fleming, G.H. Sigel,S. Takahashi, P.W. France, 1989, ISBN 1-55899-060-7
Volume 173—Electrical, Optical and Magnetic Properties of Organic Solid-StateMaterials, L.Y. Chiang, D.O. Cowan, P. Chaikin, 1989,ISBN 1-55899-061-5
Volume 174—Materials Synthesis Utilizing Biological Processes, M. Alper, P.D. Calvert,P.C. Rieke, 1989, ISBN 1-55899-062-3
Volume 175—Multi-Functional Materials, D.R. Ulrich, F.E. Karasz, A.J. Buckley,G. Gallagher-Daggitt, 1989, ISBN 1-55899-063-1
Volume 176—Scientific Basis for Nuclear Waste Management XIII, V.M. Oversby,P.W. Brown, 1989, ISBN 1-55899-064-X
Volume 177—Macromolecular Liquids, C.R. Safinya, S.A. Safran, P.A. Pincus, 1989ISBN 1-55899-065-8
Volume 178—Fly Ash and Coal Conversion By-Products: Characterization, Utilizationand Disposal VI, F.P. Glasser, R.L. Day, 1989, ISBN 1-55899-066-6
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MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS
Volume 179—Specialty Cements with Advanced Properties, H. Jennings, A.G. Landers,B.E. Scheetz, I. Odler, 1989, ISBN 1-55899-067-4
Volume 180—Better Ceramics Through Chemistry IV, C.J. Brinker, D.E. Clark,D.R. Ulrich, BJ.J. Zelinsky, 1990, ISBN: 1-55899-069-0
Volume 181—Advanced Metallizations in Microelectronics, A. Katz, S.P. Murarka,A. Appelbaum, 1990, ISBN: 1-55899-070-4
Volume 182—Polysilicon Thin Films and Interfaces, B. Raicu, T.Kamins,C.V. Thompson, 1990, ISBN: 1-55899-071-2
Volume 183—High-Resolution Electron Microscopy of Defects in Materials, R. Sinclair,D.J. Smith, U. Dahmen, 1990, ISBN: 1-55899-072-0
Volume 184—Degradation Mechanisms in III-V Compound Semiconductor Devices andStructures, V. Swaminathan, S.J. Pearton, O. Manasreh, 1990,ISBN: 1-55899-073-9
Volume 185—Materials Issues in Art and Archaeology II, J.R. Druzik, P.B. Vandiver,G. Wheeler, 1990, ISBN: 1-55899-074-7
Volume 186—Alloy Phase Stability and Design, G.M. Stocks, D.P. Pope, A.F. Giamei,1990, ISBN: 1-55899-075-5
Volume 187—Thin Film Structures and Phase Stability, B.M. Clemens, W.L. Johnson,1990, ISBN: 1-55899-076-3
Volume 188—Thin Films: Stresses and Mechanical Properties II, W.C. Oliver,M. Doerner, G.M. Pharr, F.R. Brotzen, 1990, ISBN: 1-55899-077-1
Volume 189—Microwave Processing of Materials II, W.B. Snyder, W.H. Sutton,D.L. Johnson, M.F. Iskander, 1990, ISBN: 1-55899-078-X
Volume 190—Plasma Processing and Synthesis of Materials III, D. Apelian, J. Szekely,1990, ISBN: 1-55899-079-8
Volume 191—Laser Ablation for Materials Synthesis, D.C. Paine, J.C. Bravman, 1990,ISBN: 1-55899-080-1
Volume 192—Amorphous Silicon Technology, P.C. Taylor, M.J. Thompson,P.G. LeComber, Y. Hamakawa, A. Madan, 1990, ISBN: 1-55899-081-X
Volume 193—Atomic Scale Calculations of Structure in Materials, M.A. Schluter,M.S. Daw, 1990, ISBN: 1-55899-082-8
Volume 194—Intermetallic Matrix Composites, D.L. Anton, R. McMeeking, D. Miracle,P. Martin, 1990, ISBN: 1-55899-083-6
Volume 195—Physical Phenomena in Granular Materials, T.H. Geballe, P. Sheng,G.D. Cody, 1990, ISBN: 1-55899-084-4
Volume 196—Superplasticity in Metals, Ceramics, and Intermetallics, M.J. Mayo,J. Wadsworth, M. Kobayashi, A.K. Mukherjee, 1990, ISBN: 1-55899-085-2
Volume 197—Materials Interactions Relevant to the Pulp, Paper, and Wood Industries,J.D. Passaretti, D. Caulfield, R. Roy, V. Setterholm, 1990,ISBN: 1-55899-086-0
Volume 198—Epitaxial Heterostructures, D.W. Shaw, J.C. Bean, V.G. Keramidas,P.S. Peercy, 1990, ISBN: 1-55899-087-9
Volume 199—Workshop on Specimen Preparation for Transmission ElectronMicroscopy of Materials II, R. Anderson, 1990, ISBN: 1-55899-088-7
Volume 200—Ferroelectric Thin Films, A.I. Kingon, E.R. Myers, 1990,ISBN: 1-55899-089-5
Earlier Materials Research Society Symposium Proceedings listed in the back.
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