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Accelerating the next technology revolution
Copyright ©2013
SEMATECH, Inc. SEMATECH, and the SEMATECH logo are registered servicemarks of SEMATECH, Inc. International SEMATECH Manufacturing Initiative and ISMI are servicemarks of SEMATECH, Inc.
All other servicemarks and trademarks are the property of their respective owners.
Dan Armbrust
President and CEO, SEMATECH
April 4, 2013
The SEMATECH New York Experience
Growing the Semiconductor Industry in
New York: Challenges and Opportunities
Accelerating the next technology revolution
Semiconductor Industry Virtuous cycle
Lower cost/function
Expanding
applications
(more silicon)
More R&D (innovation)
Increasing
semiconductor
revenue
$’s
www.sematech.org 2
Moore’s Law
Microprocessor Transistor Counts
1971-2011 & Moore’s Law
26 April 2013 3
Semiconductor Industry Virtuous cycle
Lower cost/function
Expanding
applications
(more silicon)
More R&D (innovation)
Increasing
semiconductor
revenue
$’s
www.sematech.org 4
SEMATECH Context Semiconductor supply chain
Industry structure: then and now
Equipment and Materials
Systems
Design
Packaging and Assembly
Chip Technology
EDA Tools
www.sematech.org 5
System
EDA
Equipment
Materials
Memory
Logic
IDM
Package
and
Assembly
Fabless
Fablite
Foundries
Integrated Device Manufacturer (IDM)
Industry Challenges Key stakeholders
www.sematech.org 6
Too Many Challenges to Solve Alone
• Success in semiconductors is driven by technology
innovation and advances in manufacturing
• Success depends on comprehensive industry-wide
collaboration
– Challenges are global, and cut across industry ecosystem
– Solutions require significant investment, leveraged funding
www.sematech.org 7
Expanded membership to international companies
SEMATECH created
Formed subsidiary for 300 mm wafer conversion
Created subsidiary for manufacturing
Entered alliance with New York State (Phase I)
Expanded membership to include industry supply chain companies
Continued alliance with New York State (Phase II)
450 mm wafer conversion G450C
SEMATECH and CNSE launch PVMC
1987 1995 2000 2003 2007 2008 2010 2011
SEMATECH Overview History
www.sematech.org 8
Bridging Research, Development,
and Manufacturing
www.sematech.org 9
• A membership-driven global consortium
• Driving technical consensus for the industry
• Pulling research into the industry mainstream
• Leading major programs to address critical industry transitions
• Focus on manufacturability
www.sematech.org 10
SEMATECH Members
SEMATECH Programs Attract Growth
www.sematech.org
2007 2008 2009 2010 2011 2012 2013 (YTD)
TEL (3D) Accretech (3D) NEXX (3D) TEL (Litho) TSMC Invensas (3D) Advantest (Met)
Rudolph (Met) Asahi Glass (Litho) Atotech (3D) Dow (Litho) Qualcomm Inpria (Litho) Air Products (FEP)
Rudolph (3D) AMAT (ESH) Altera (3D) Centrotherm (FEP) Araca (ISMI)
TEL (FEP) ASML (Litho) ON Semiconductor (3D) SSEC (3D) Morgan Ceramics (ISMI)
Metrosol (FEP) JSR (Litho) LSI (3D, ISMI) Kumho (Litho) Poongsan (FEP)
Canon-Anelva (FEP) AZ Electric (Litho) SK Hynix (3D) Vishay (ISMI)
TOK (Litho) Qualcomm (3D) Fujifilm (3D) SK Hynix (Litho)
Shin-Etsu (Litho) Edwards (ESH) ADI (3D) Winbond (ISMI)
FEI Company (Met) Lasertec (3D) ASE (3D) LinTec (3D)
Core Wafer Sys. (FEP) DNP (Litho) 4DS (FEP) Hewlett-Packard (ISMI)
SUSS (FEP) Panasonic (ISMI) Matheson (ESH) Pall (ISMI)
ASML (FEP) Nanosys (FEP) NIST (3D) Renesas (ISMI)
AMD (ISMI) Sumitomo (Litho) SRC (3D) Spansion (ISMI)
Nissan Chem (Litho) KLA-Tencor (Litho) Cabot (FEP)
Freescale (ISMI) Applied Seals (Litho) Infineon (ISMI)
Infineon (ISMI) Micronix (ISMI) Micron (ISMI)
NXP (ISMI) Aixtron (FEP)
STMicro (ISMI) Soitec (FEP,Met)
Dai Nippon Screen (FEP)
Hoya (Litho)
Texas Instruments (ESH)
0
10
20
30
40
50
60
70
80
90
2007 2008 2009 2010 2011 2012 2013
Me
mb
ers
hip
Ag
ree
me
nts
New members since 2007
• A clear industry-led model and mission
• Leadership from industry champions
• Industry with adequate revenue and maturity
• Ideally, a crisis
• Leveraging of government and industry funds
• Member engagement
• Agility to adapt to changing needs
Consortium Success Factors
www.sematech.org 12
Industry/University/Government Collaboration in Albany
www.sematech.org 13
R&D Costs
www.sematech.org 14
Trends & Challenges
• Rising R&D costs; fewer funders
• Consolidation – device makers, supply chain
• Supply chain challenges
─ Insufficient early feedback
─ Affordable infrastructure
─ Broken business models
─ Greater share of the R&D burden
• Increasing need/pressure to collaborate
• A growing and compelling collaborative model in Albany
and clear pathway to 450 mm activities
www.sematech.org 15
SEMATECH Focused on Materials &
Nanostructures
2009 2011 2013 2015 2017 2019
Advanced Materials Advanced Structures
Beyond CMOS
Materials/Structures
LO
GIC
M
EM
OR
Y
www.sematech.org 16
Technology Gap Solution
Early learning and infrastructure
development
SEMATECH Center for
Next-Generation Devices
• Atomic-level chemistries
• <10 nm advanced structures
• Simulation
• Fabrication flows
• Nanoscale equipment
• R&D center that champions and enables
next-generation technologies
• Participation from universities,
equipment and materials makers, and
chip manufacturers
• Establishes complete pilot line for
research, development, manufacturing
enablement
Applied
Research Development Manufacturing
Systems
& Design
IDMs &
Foundries
Equipment
& Materials
www.sematech.org 17
Lithography Scaling
www.sematech.org 18
2003 2004 2005 2006 2007 2008 2009 2010 2011 2012
~10-20 W @IF
Overcome 30 nm resolution brick wall
<4% flare optics
Integrated reticle handling 0 defects
~10-50X defect
reduction
required for
HVM
>100 W @ IF
reliable source
required
LWR needs 2X
improvement for
MPU (OK for
Memory)
Commercial
reticle handling
solution
available
3300 optics
complete
EUV Progress Critical enablers
First EUV tools
installed in Albany
& Belgium
•
•
•
Source power
Defect-free mask
Resist resolution
Reticle protection
Optics quality
EUV Mask
Consortium
EMI
EUV is
REAL
Bacus/EUV
Symposium
3100’s in
the Field
EUV in
Dev @
IDMS
www.sematech.org 19
Technology Gap Solution
Underinvestment in EUV mask
metrology equipment
SEMATECH EUV Equipment
Manufacturing Initiative (EMI)
• Advanced defect metrology for EUV
• Large prototype investment
• Uncertainty in timing
• Common infrastructure
Applied
Research Development Manufacturing
Systems
& Design
IDMs &
Foundries
Equipment
& Materials Connects multiple
segments of the EUV
supply chain in a
partnership to
collectively fund the
development of needed
metrology tools by
equipment suppliers
www.sematech.org 20
Technology Gap Solution
Lack of affordable early access to
EUV imaging
SEMATECH Resist and Materials
Development Center (RMDC)
• Limited access to EUV tools for
research
• Need for early full-field exposures
Applied
Research Development Manufacturing
Systems
& Design
IDMs &
Foundries
Equipment
& Materials
0
1000
2000
3000
4000
5000
2008 2009 2010 2011 2012
Materials Processed by RMDC
www.sematech.org 21
Technology Gap Solution
Insufficient defect identification
and mitigation
SEMATECH Nanodefect Center
• As defect requirements become
more stringent, interdisciplinary
knowledge is needed to understand
defect generation processes
• Characterizing small-sized defects
is costly and time consuming
• Centralized facility providing a
critical mass of expensive
infrastructure with extensive
forensics and analytical capabilities
Applied
Research Development Manufacturing
Systems
& Design
IDMs &
Foundries
Equipment
& Materials
www.sematech.org 22
R&D Pilot Prototyping Manufacturing
Development Manufacturing
Lab Scale &
Testing
NREL, Sandia,
CNSE, Industry,
University
100 kW
PVMC,
Halfmoon, NY
10 MW
PVMC, NY
>100 MW
Industry Sites
Facilities and Equipment Scale-Up Strategy
New Solar Consortium – U.S. PVMC
• Launched the U.S. Photovoltaic Manufacturing Consortium (PVMC) in
September 2011 with CNSE
• Public/private investment of ~$300M over 5 years from U.S. Department of Energy ($62M from SunShot Initiative), industry, New York State
• Partnership with ~40 companies and organizations throughout the industry supply chain
www.sematech.org 23
Lessons Learned from SEMATECH’s
Proven Consortium Model
www.sematech.org 24
• Need an ambitious national and regional strategy to drive broad collaboration at sufficient scale to:
– Build R&D and manufacturing infrastructure
– Provide access to pilot facilities to demonstrate innovations at manufacturing scale
– Create technology roadmaps and standards
– Conduct both collaborative and proprietary technology programs
• SEMATECH has benefited enormously from the shared capabilities at CNSE in Albany, with consistent NY State government support
• Industry participation in NY will continue to expand across the semiconductor industry’s supply chain and into adjacent industries
• It’s all about shared public and private investments in infrastructure and ecosystems