Teaching Demo - CBD

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    previous meeting

    Molecular beam epitaxy

    Metal-organic vapor phase epitaxy

    Spray pyrolysis Magnetron sputtering

    Photochemical deposition (PCD)

    Thermal evaporation Successive ionic layer adsorption and reaction

    (SILAR)

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    on theChemical DepositionHananish Joy G. Odarve

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    in this topic

    a brief history of chemical deposition

    what is chemical deposition what materials can be deposited by CD

    mechanisms of the chemical deposition

    substrates

    exampledeposition of ZnS

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    a brief history of CD

    Liebig (1835): deposition of silver using a chemicalsolution technique

    lsterfarben : its formation on various metals fromthiosulphate solutionsfirst reported CD but therecent studies of this process invoked an

    electrochemical mechanism Beutel and Kutzelnigg : wide range of deposition from

    thiosulphate solutions both CD and electrochemical

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    a brief history of CD

    Emerson-Reynolds (1884): deposition of PbS films,[thiourea (thiocarbamide) + alkaline lead tartrate],

    the metallicsulphide . . . became firmly attached as a

    specularlayer to the sides of the vessel

    Wide range of substrates used for deposition

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    a brief history of CD

    Infrared photoconductivity in CD PbS films -

    central driving force for subsequent investigations in

    CD lead chalcogenide films

    1961: deposition of CdS was explicitly reported 1980s:

    The range of materials deposited by CDgradually extended

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    a brief history of CD

    CdS films by CD were shown to give superiorphotovoltaic (PV) cells compared with the previously

    evaporated CdS

    crystals in most as-deposited CD films are very smalland so we can make nanocrystalline films

    the nanocrystals (small enough) exhibit size quantization- increase in the optical bandgap with decrease in crystalsize

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    What is chemical deposition?

    refers to the deposition of films on a solid substratefrom a reaction occurring in a solution (almost

    always aqueous)

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    What is chemical deposition?

    Example: Cadmium Sulfide (CdS)

    +

    Cd salt Cd salt

    S2-S2-

    S2-

    S2-S2-

    S2- S2-

    =

    free sulfide ions

    CdSCdS

    CdS

    CdS CdS CdS

    CdS

    CdSCdS

    CdSCdS

    CdS

    CdS

    CdS

    CdS

    CdS

    CdSCdS

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    What is chemical deposition?

    Example: Cadmium Sulfide (CdS)

    Cd-thiocomplex

    Free sulfideions

    Cd-thiocomplex

    CdSCdS

    CdS

    CdS CdS CdS

    CdS

    CdS

    CCdSCdS

    CdS

    CdS

    Cd

    CdS

    CdSCdS

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    What is chemical deposition?

    TRICK!

    control the rate of these reactions so that they occurslowly enough to allow the CdS to either form gradually on the substrate

    diffuse there and adhere either to the substrate itself (at the earlystages of deposition) or to the growing film

    we dont want it to aggregate into larger particles in

    solution and precipitate out

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    What is chemical deposition?

    How do we do it?

    generate the sulphide slowly in the deposition solution(reaction rate is also generated) by controlling

    concentration of sulphide-forming precursor

    temperature of the solution

    pH of the solution

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    What is chemical deposition?

    it can be carried out in alkaline and acidic solutions for alkaline solutions, we need to prevent the

    precipitation of metal hydroxides (metal ion must becomplexed)complexing agents reduced the concentration of free metal ions to prevent

    rapid bulk precipitation of the desired product

    not too weakto prevent bulk precipitation of OH

    not too strongit may prevent deposition of desired film together

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    what materials can bedeposited by CD

    1. compound can be made by simple precipitation

    2. compound should be relatively (and preferably highly)insoluble in the solution used

    3. compound should be chemically stable in the solution

    4. the reaction rate should be relatively slow either the

    reaction proceeds via free anion or complex-decomposition type

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    mechanisms

    1. ionic reactions involving free anions

    2. decomposition of metal complexes

    and we can further subdivide to:

    formation of isolated single molecules that cluster and

    eventually form a crystal or particle

    mediation of a solid phase, usually the metal hydroxide.

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    mechanisms

    simple ion-by-ion mechanism

    simple cluster (hydroxide) mechanism

    complex decomposition ion-by-ion mechanism complex decomposition cluster mechanism

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    mechanisms

    simple ion-by-ion mechanism

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    mechanisms

    If the ion product [Cd2+][S2-] exceeds the solubilityproduct, Ksp, of CdS, (10

    -28), CdS will form as a solid

    phase

    in alkaline solution - a complex is needed to keepthe metal ion in solution and to prevent the

    hydroxide from precipitating out

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    mechanisms

    simple cluster (hydroxide) mechanism

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    mechanisms

    complexation of the Cd was necessary to preventCd(OH)2 precipitation

    however, its an important reaction intermediates in theCD process

    if the complex concentration is not high enough to

    prevent completely Cd(OH)2, there will be a smallamount of Cd(OH)2

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    mechanisms

    Reaction 3.5 will likely to happen the solubility product Ksp for CdS is much smaller than for

    Cd(OH)2

    the free energy of formation of CdS is more negative thanCd(OH)2

    this cluster formation acts as a catalyst for thioureadecomposition sulphide formation will occur preferentially at the surface of

    the hydroxide rather than nucleate separately in the solution

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    mechanisms

    mechanism may change in the course of deposition

    complexate themetal

    complex:metalratio increases

    no solid OH- phase presentin the solution

    Hydroxide cluster

    ion-by-ionprocess

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    substrates

    films can be deposited on ANY surface obviuos exceptionsDIRTY substrates , which are

    unstable in the deposition solution

    adherent film on Teflon, CD has the ability to form filmson wide range of substrate

    shape is not usually important, very irregulargy-shapedsubstrates can be used

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    substrates

    nature of the substrate rough surface, we achieve adherent film, could be due to

    greater actual surface area of contact per geometricsurface

    oxides (quite reactive in terms of their adsorptionproperties) due to presence of hydroxyl surface groupsthat can form strong hydrogen bonds

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    exampledeposition of ZnS

    ZnS is a II-VI semiconductor

    Preparation of Stock solutions Preparation of Substrates

    Preparation of Deposition Solution

    Deposition

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    variations

    concentration of reactants

    ratio of the concentration of metal ion with the

    complexant concentrations pH of the solution

    temperature

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    What is chemical deposition?

    CdS forms through a number of different possiblepathways

    simple ionic reaction between Cd2+ and S2-

    conversion of Cd(OH)2 to CdS by sulphide

    decomposition of a complex between Cd (free ion or

    compound) and the sulphide precursor